СПОСОБ ИЗГОТОВЛЕНИЯ МИКРООБЪЕКТОВ ПЕЧАТНОЙ ПРОДУКЦИИ И УСТРОЙСТВО ДЛЯ НЕПРЕРЫВНОГО ИЗГОТОВЛЕНИЯ ТАКОЙ ПРОДУКЦИИ

Изобретение относится в целом к изготовлению печатной продукции и, в частности, к способу изготовления и устройству для изготовления печатной продукции, имеющей микрообъекты, расположенные на поверхности подложки. На поверхность матрицы наносят первое отверждаемое соединение для заполнения им указанных углублений. Поверхность матрицы и заполненные углубления покрывают удерживающим слоем из второго отверждаемого соединения. Матрицу приводят в контакт с поверхностью подложки и обеспечивают отверждение первого отверждаемого соединения и второго отверждаемого соединения. Поверхность матрицы отделяют от поверхности подложки, оставляя удерживающий слой и первое отверждаемое соединение на поверхности подложки. Удерживающий слой и первое отверждаемое соединение, таким образом, переносят вместе с поверхности матрицы на поверхность листа подложки. Первое отверждаемое соединение формирует микрообъекты печатной продукции на удерживающем слое, покрывающем поверхность подложки. Предложенное решение обеспечивает ...

УСТРОЙСТВО ДЛЯ ВЫДАВЛИВАНИЯ РЕЛЬЕФА

Использование: для выдавливания рельефа. Сущность изобретения заключается в том, что устройство для выдавливания рельефа включает кремниевый эталон, который содержит совокупность элементов нанорельефа. На кремниевый эталон нанесен в виде покрытия слой, препятствующий прилипанию, который включает молекулу, содержащую циклосилоксан, имеющий по меньшей мере одну функциональную группу силана. Способ включает образование эталонного шаблона посредством: осаждения на кремниевый эталон, который включает совокупность элементов нанорельефа, композиции, которая включает растворитель и молекулу, содержащую циклосилоксан, имеющий по меньшей мере одну функциональную группу силана; и отверждения композиции, приводящего к образованию препятствующего прилипанию слоя на кремниевом эталоне, где слой, препятствующий прилипанию, включает указанную молекулу. Способ дополнительно включает осаждение материала рабочего штампа на основе кремния на слой эталонного шаблона, препятствующий прилипанию; отверждение материала ...

Установка для безмасочной фотолитографии

Полезная модель относится к технологиям производства полупроводниковых приборов, микроэлектромеханических систем и интегральных микросхем и может быть использована для безмасочной фотолитографии с высоким разрешением.Установка для безмасочной фотолитографии, содержащая несущий каркас, выполненный с возможностью перемещения образца, мультимедиапроектор, включающий источник света, LCD-дисплей, снабженный фильтром и микрообъектив. При этом в проекторе между источником света и LCD-дисплеем установлен светорассеивающий элемент, установка дополнительно содержит светоделительный куб и видеокамеру, при этом мультимедиапроектор, светоделительный куб и микрообъектив расположены последовательно и соосно, кроме того, видеокамера ориентирована таким образом, чтобы ее оптическая ось была перпендикулярна общей оси мультимедиапроектора, светоделительного куба и микрообъектива и проходила через центр светоделительного куба, причем мультимедиапроектор и видеокамера выполнены с возможностью перемещения вдоль своих оптических осей.Технический результат выражается в повышении эффективности безмасочной фотолитографии за счет обеспечения более однородной фокусировки и освещения дисплея по всей площади. 6 ил. РОССИЙСКАЯ ФЕДЕРАЦИЯ (19) RU (11) (13) 199 867 U1 (51) МПК G03F 7/00 (2006.01) ФЕДЕРАЛЬНАЯ СЛУЖБА ПО ИНТЕЛЛЕКТУАЛЬНОЙ СОБСТВЕННОСТИ (12) ОПИСАНИЕ ПОЛЕЗНОЙ МОДЕЛИ К ПАТЕНТУ (52) СПК G03F 7/00 (2020.02) (21)(22) Заявка: 2020112818, 01.04.2020 (24) Дата начала отсчета срока действия патента: (73) Патентообладатель(и): Стеблий Максим Евгеньевич (RU) Дата регистрации: 23.09.2020 (45) Опубликовано: 23.09.2020 Бюл. № 27 1 9 9 8 6 7 R U (54) Установка для безмасочной фотолитографии (57) Реферат: Полезная модель относится к технологиям производства полупроводниковых приборов, микроэлектромеханических систем и интегральных микросхем и может быть использована для безмасочной фотолитографии с высоким разрешением. Установка для безмасочной фотолитографии, содержащая несущий каркас, выполненный с ...

КОМПОЗИЦИЯ КРАСКИ ДЛЯ ВПЕЧАТЫВАНИЯ, СПОСОБ ВПЕЧАТЫВАНИЯ, СВЕТОВОЕ УСТРОЙСТВО, ОПТИЧЕСКИЙ ДАТЧИК И ФОТОЭЛЕКТРИЧЕСКОЕ УСТРОЙСТВО С ОПТИЧЕСКИМ ЭЛЕМЕНТОМ

Изобретение относится к композиции краски для впечатывания, пригодной для впечатывания в структурированную поверхность эластомерного штампа. Композиция краски для впечатывания содержит наночастицы оксида переходного металла. Композиция содержит полярный растворитель, выбранный, по меньшей мере, из одного из воды и метанола, полимеризующийся материал, растворенный и/или диспергированный в полярном растворителе, при этом полимеризующийся материал содержит частицы оксида переходного металла, формирующие, по меньшей мере, 80% масс. от совокупной массы полимеризуемого содержимого, причем полимеризующийся материал формирует 2-25% масс. при расчете на совокупную массу композиции краски для впечатывания и ингибитор полимеризации. При этом ингибитор полимеризации выбран из ингибитора полимеризации формулы 1, ингибитора полимеризации формулы 2, ингибитора полимеризации формулы 3, или ингибиторов полимеризации формулы 1 в сочетании с ингибитором полимеризации формулы 3. Ингибитор полимеризации формулы ...

СПОСОБ ПОЛУЧЕНИЯ МИКРОРЕЛЬЕФА НА ПОВЕРХНОСТИ МЕТАЛЛОВ (ВАРИАНТЫ)

Сущность изобретения: в первом варианте на поверхности металла получают оттиск метки с помощью матрицы, прессующая поверхность которой выполнена в виде изготовленной из никеля фольги с голографическим микрорельефом. Предварительно изделие нагревают и выдерживают при температуре выше температуры рекристаллизации металла, но ниже температуры плавления, после чего производят тиснение изделия, прикладывая к его поверхности матрицы прессующее усилие ступенчатого характера, при котором ступень роста напряжения пластической деформации материала изделия чередуется со ступенью падения напряжения. Во втором варианте на металлическую поверхность наносят слой фоторезиста, проводят его оптическую модуляцию и химическую обработку фоторезиста, в процессе которой удаляют его растворимые участки, после чего слой фоторезиста приобретает вид микрорельефной структуры в виде гребней и борозд. Затем из неудаленных участков фоторезиста производят ионнолучевое травление в вакууме аргоном металлической поверхности ...

ФОТООТВЕРЖДАЕМАЯ СМОЛЯНАЯ КОМПОЗИЦИЯ ДЛЯ СТЕРЕОЛИТОГРАФИЧЕСКОГО ПРОИЗВОДСТВА, ТРЕХМЕРНЫЕ ИЗДЕЛИЯ, ПОЛУЧЕННЫЕ С УКАЗАННОЙ КОМПОЗИЦИЕЙ, И СООТВЕТСТВУЮЩИЙ СПОСОБ ПРОИЗВОДСТВА

Изобретение относится к способу стереолитографического производства. Жидкая фотоотверждаемая смоляная композиция для стереолитографии, содержащая (i) по меньшей мере одно радикально полимеризуемое соединение (А), представленное следующей общей формулой (I): RO-CO-NH-R-NH-CO-O-R-O-CO-NH-R-NH-CO-OR(I), где Rпредставляет собой остаток линейного или разветвленного политетраметиленгликоля со средней молекулярной массой от 200 до 3000 г/моль; Rпредставляет собой остаток диизоцианатного соединения; Rпредставляет собой остаток диизоцианатного соединения, такой же как или отличный от R; a Rвыбран из AcrO-CH-CH-; (AcrO-CH)CH-; (AcrO-CH)C-CH-; AcrO-CH-CHCH-; AcrO-СН-СНСН- и (AcrO-СН)С(СН)СН-, предпочтительно из AcrO-СН-СНи более предпочтительно AcrO-СН-СН-; где Acr представляет собой CH=C(R)-CO- и R представляет собой атом водорода или метильную группу; (ii) по меньшей мере одно радикально полимеризуемое органическое соединение (В), отличное от соединения (А); и (iii) фоточувствительный инициатор ...

Способ изготовления самонесущего рентгеношаблона

Изобретение относится к способу изготовления рентгеношаблона. Способ изготовления рентгеношаблона включает в себя процессы формирования топологического маскирующего рентгенопоглощающего слоя путем перфорации металлической фольги и ее фиксации в опорном кольце. На одной из поверхностей металлической фольги создают защитную маску из металла, имеющего малую по сравнению с металлом фольги скорость травления в соответствующей химически активной плазме, травящей металл фольги, затем фольгу размещают на охлаждаемом столике установки плазмохимического травления и производят сквозное травление отверстий в фольге через защитную маску посредством воздействия потока химически активных ионов. Изготовленный таким образом рентгеношаблон не содержит несущей мембраны и поэтому характеризуется максимально достижимыми уровнями рентгенолитографической контрастности (при заданных материале и толщине маскирующего слоя), а также сравнительно высокой механической прочностью. 4 з.п. ф-лы, 5 ил.

СПОСОБ ПЕРЕНОСА, А ТАКЖЕ УСТРОЙСТВО И КОМПЬЮТЕРНЫЙ ПРОГРАММНЫЙ ПРОДУКТ ДЛЯ ЕГО ОСУЩЕСТВЛЕНИЯ

СПОСОБ ИЗГОТОВЛЕНИЯ ПЕЧАТНОЙ ПРОДУКЦИИ, УСТРОЙСТВО ДЛЯ НЕПРЕРЫВНОГО ИЗГОТОВЛЕНИЯ ПЕЧАТНОЙ ПРОДУКЦИИ И УСТРОЙСТВО ПО ФОРМИРОВАНИЮ СИНТЕЗИРОВАННОГО ИЗОБРАЖЕНИЯ

ТЕРМОРЕАКТИВНЫЕ ИК-ПОГЛОЩАЮЩИЕ ПОЛИМЕРЫ И ИХ ИСПОЛЬЗОВАНИЕ В ТЕРМОЧУВСТВИТЕЛЬНОЙ ОФСЕТНОЙ ПЕЧАТНОЙ ФОРМЕ

... 1. Полимер, поглощающий в близкой инфракрасной области спектра, включающий, по меньшей мере, две различные боковые инфракрасные хромофорные группы, ковалентно соединенные с основной полимерной цепью растворимой в основаниях смолы, по меньшей мере, одна из которых представляет собой индолцианиновый краситель, а другая представляет бенз[e]индолцианиновый краситель.2. Полимер, поглощающий в близкой инфракрасной области спектра по п.1, отличающийся тем, что смолой является растворимая в основаниях фенольная смола, предпочтительно новолачная смола.3. Полимер, поглощающий в близкой инфракрасной области спектра по п.1, отличающийся тем, что индолцианиновый краситель выбран из группы, включающей:гексафторфосфат 1-бутил-2-(2-[3-[2-(1-бутил-3,3-диметил-1,3-дигидроиндол-2-илиден)этилиден-2-хлорциклогекс-1-енил]винил)-3,3-диметил-3Н-индолия;хлорид 2-[2-[2-хлор-3-[2-(1,3-дигидро-1,3,3-триметил-2Н-индол-2-илиден)этилиден]-1-циклопентен-1-ил]этенил]-1,3,3-триметил-3Н-индолия; или4-метилбензолсульфонат ...

Verfahren zur Herstellung einer Matrize zur Erzeugung optischer Scheiben ohne Benutzung einer Hauptplatte

VERFAHREN ZUM PHOTOLITHOGRAPHISCHEN METALLISIEREN ZUMINDEST DER INNENSEITEN VON LÖCHERN DIE IN ZUSAMMENHANG MIT EINEM AUF EINER AUS ELEKTRISCH ISOLIERENDEM MATERIAL BESTEHENDE PLATTE BEFINDLICHEN MUSTER AUFGEBRACHT SIND

Three=dimensional microstructure

In a process for manufacturing three-dimensional microstructures of a desired shape an ionising beam is directed at a radiation-sensitive material(1), especially polymethyl methacrylate(PMMA) while the position of the latter is varied relative to the beam. Process equipment comprises of an ion beam emitter and apparatus for varying the position of the radiation sensitive material(1) at which the beam is directed.

Verfahren zur Herstellung dauerhafter zweidimensionaler photographischer Bilder in der Oberflaeche alkalihaltiger Silikatglaeser

Vorrichtung zum Nachweis von fluoreszenten, der Bindung eines Liganden auf einem Substrat entsprechenden Merkmalen

VERFAHREN ZUR HERSTELLUNG VON STRUKTUREN IM NANOMETERBEREICH ZUR ANWENDUNG IM BEREICH DER MASKENREPARATUR

Verwendung eines superkritischen Fluids zum Trocknen der Scheiben und zum Reinigen der Linsen in einer Immersionslithographie

TERNÄRES PHOTOINITIATORSYSTEM ZUM HÄRTEN VON EPOXIDHARZEN

Structuring a metal layer during semiconductor finishing comprises applying a lacquer layer to a semiconductor substrate, structuring and producing an etching mask and structuring the metal layer using the mask

Structuring a metal layer (M) during semiconductor finishing comprises applying a lacquer layer (L) to a semiconductor substrate; structuring the lacquer layer using lithography and producing an etching mask; and structuring the metal layer using the mask. Initially a hard mask is applied to the metal layer and the lacquer layer is applied to the mask, where the lacquer layer is thin so that only the mask and not the metal layer can be structured with the aid of the lacquer layer. The hard mask is structured to form an etching mask with the aid of the structured lacquer layer. The metal layer is structured with the hard mask as an etching mask. Preferred Features: The hard mask has a first layer (H1) of an oxide, preferably silicon dioxide, and a second layer (H2) to reduce reflection and made of silicon nitride. The metal layer is made of aluminum and/or copper.

PARTIKEL ZUR ORALEN VERABREICHUNG VON PEPTIDEN UND PROTEINEN

VERFAHREN ZUR HERSTELLUNG EINES TRANSFERDRUCKS

Blindplatte für den Offsetdruck

Polymerised flexographic print plates - are moved slower through drying than washing with increasing support from below

To produce polymerised flexographic printing plates, as they are dried with the image side upwards after washing out they are moved at a slower speed than during washing. The plate packing density is increased so that they are increasingly supported from below. The plates are washed out with their image sides downwards, and then inverted and held at the same orientation, and passed to intermediate storage during drying and further treatment on a first-in-first-out principle. USE/ADVANTAGE - The method is for the prodn. of polymerised flexographic printing plates. The technique gives a high throughput, with high quality plates.

IMAGE ON SUBSTRATE

Making printed circuit boards

An insulating substrate (10) coated with a thin copper layer is drilled to form through holes (16) and etched to define a circuit pattern (15). A liquid photopolymer solder mask layer ( 1) having a smooth planar outer surface is applied over the circuit pattern and processed to expose land areas (14) surrounding the through holes (16), the walls (18) of the solder mask surrounding the lands (14) being substantially cylindrical and roughened. A thin copper layer (20) is then applied by electroless deposition overall the exposed surfaces and an insulating resist layer (13) is applied over the copper on the planar surface of the mask (11). A thick copper layer is electroplated onto the copper coating in the through hole (16) and the resist (13), together with the underlying copper layer (20), is mechanically removed. The land (14) then forms the bottom surface of an indentation having copper coated sidewalls. ...

Printing plate and method for fabricating the same

A wafer handling apparatus

A wafer handling apparatus has a common desk including a top surface having a front zone, a middle zone and a rear zone, the front zone being capable of receiving plural indexers functioning as a wafer sender and/or receiver, a couple of wafer processing units disposed adjacent lateral sides of the middle zone, a wafer baking oven disposed adjacent a middle of the rear zone, and a wafer handling mechanism disposed adjacent a middle of the front zone, the wafer processing units and the oven.

Patterning apparatus and film patterning method

A patterning apparatus of the present invention includes a stage (10) on which a substrate (2) is loaded, a coating means (14) for coating a liquid (3) that reacts with an ultraviolet ray to deposit metal on the substrate (2), and an ultraviolet irradiating means (22) for irradiating the ultraviolet ray onto the liquid (3) that is coated on the substrate (2).

Process and material for the production of heat-resistant images

The unprotected areas of a surface of a support formed by an alloy containing at least 10% of nickel and at least 16% of chromium or at least 60% of nickel and at least 12% of chromium and bearing an exposed and developed photo-resist layer are electro-chemically etched by placing two such resist-coated supports parallel to each other (protecting the non-resist side with a lacquer or a plastics strip) and connecting to an A. C. generator in an etching bath of hydrochloric acid and optionally a metal salt. A voltage of 2 to 12 volts is applied for 5 to 15 minutes to etch, to the desired depth. The etched plate is then inked up with a silk screen printing ink and the resist is dissolved away, or a metal e.g. copper, nickel, cobalt or silver may be deposited on the etched image areas unprotected by the photo-resist by cathodic deposition to give a contrasting image, the resist coating then being removed by a solvent. Image contrast may be increased by treatment with an alkaline sulphide solution ...

STRAIN GAUGE ENCAPSULATION PROCESS

A process for encapsulating strain gauges comprising placing a sheet carrying a plurality of strain gauges 10 onto a processing plate, depositing a coat of an imide resin in liquid form over the sheet and spinning the processing plate to spread the resin evenly, baking the resin at 90 DEG for 60 minutes, coating the resin with photo-resist, exposing the photo-resist coated sheet to ultra-violet light using a mask which defines a pair of pads (11) for each of the strain gauges, developing to remove both the photoresist and imide resin, and fully curing the resin by baking at 135 DEG C or above before soldering wires (12) onto the pads. ...

Directly photodefinable polymer compositions and methods thereof

A polymer includes a first type of repeat unit represented by Formula I, where X is selected from -CH2-, -CH2-CH2-, or -O-; m is an integer from 0 to about 5; and where for the first type of repeat unit one of R1, R2, R3, and R4 is one of a maleimide containing group and for the second type of repeat unit one of R1 ,R2, R3, and R4 is a hindered aromatic group, a C8 or greater alkyl group, a C4 or greater halohydrocarbyl or perhalocarbyl group, a C7 or greater aralkyl group, or a heteroatom hydrocarbyl or halohydrocarbyl group.

METHOD FOR MAKING AN AIR COOLED COMBUSTOR

Method of 3D printing in a chamber of adjustable volume using LCD screens as the method of polymerisation

A stereolithographic SLA 3D printer comprises a build vessel having at least one side wall, a print platform 206, a visual display screen 207, such as an LCD screen, that define a sealed build chamber wherein the print platform or visual display screen is moveable within the build vessel allowing the volume of the build chamber to be varied; the build chamber is coupled by a valve 203 to a reservoir vessel 201 that houses a photopolymer 200 such as to allow photopolymer to move between the build chamber and the reservoir. A method of creating objects using the 3D printer comprises exposing a layer of photopolymer within the build chamber to light emitted by the screen, increasing the volume of the build chamber sequentially, exposing a further layer of photopolymer to light. The build chamber is preferably sealed and not open to the atmosphere, such that the build chamber is sequentially enlarged as the print progresses. This enables the printer to be oriented in any direction without recourse ...

Variable sloped etching of thin film heads

A method of fabricating variable sloped, as well as straight, edges on a permalloy body of a thin film head is disclosed. The process comprises forming a titanium layer on the permalloy body covering at least those areas of the body which are intended to exhibit the variable slope. A photoresist layer is formed atop the titanium layer and the permalloy body and is removed in those areas of the titanium layer and permalloy body which are not to be retained as part of the thin film head after etching. The body is then etched with an etchant containing HF and FeCl3 to form variable sloped edges in those areas of the permalloy body covered with titanium and photoresist and straight edges in those areas of the permalloy body covered only with photoresist.

CONTAINER FOR COSMETICS

PNEUMATIC CIRCUIT TRACK BOARD

PHOTOSENSITIVE MATERIALS

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

PROCEDURE FOR THE DUPLICATION OF PLASTIC DATA MEDIA

EXPOSURE STATION FOR FOIL COURSES

THERMALLY REACTIVE ONE, CLOSE INFRARED ABSORBING POLYMERS AND YOUR USE IN HEAT SENSITIVE LITHOGRAPHIC PRESSURE PLATES

PARTICLE FOR THE ORAL ADMINISTRATION OF PEPTIDEN AND PROTEINS

PHOTO-ACTIVE FILM, ITS PRODUCTION AND USE AND PRODUCTION OF A SURFACE RELIEF AND OPTICAL OF ANISOTROPIC STRUCTURES BY IRRADIATION OF THE FILM

PROCEDURE FOR MANUFACTURING A STRUCTURE FOR A MECHANISM FOR MICRO-ELECTROMECHANICAL SYSTEMS (MEMS)

STRUCTURING OF SOLVENT STATE CHARACTERISTICS THROUGH NANO-LITHOGRAPHIC DIRECT POSTING PRINTINGS

Replication apparatus and method for mapping a structure on a substrate

Eine Replikationsvorrichtung (10) zur Herstellung von nano- und/oder mikrostrukturierten Bauteilen hat zwei zueinander bewegbaren Baugruppen (12, 14), wobei eine erste Baugruppe (12) einen Chuck (18) zur Aufnahme eines Substrats (16) und eine zweite Baugruppe (14) eine Aufnahme (20) für eine Prägestruktur (22) aufweist, wobei die Baugruppen (12, 14) relativ zueinander zwischen einer Prägeposition und einer Beladeposition bewegbar sind, und wobei an einer der beiden Baugruppen (12, 14) mindestens eine Dichtlippe (34, 38) angeordnet ist, die der anderen der beiden Baugruppen (12, 14) zugewandt ist und die die andere der beiden Baugruppen (12, 14) in der Prägeposition berührt und den Chuck (18) und/oder die Aufnahme (20) radial umgibt, wobei durch die Dichtlippe (34, 38) in der Prägeposition eine abgedichtete Überdruckkammer (36) zwischen den beiden Baugruppen (12, 14) begrenzt ist. Des Weiteren wird ein Verfahren zum Abbilden einer Struktur auf einem Substrat (16) angegeben.

Method for coating a substrate with a lacquer and apparatus for planarizing a layer of lacquer

Die Erfindung betrifft ein Verfahren zum Beschichten eines Substrats (26) mit einem Lack, mit den folgenden Schritten: - der Lack wird gleichmäßig auf das Substrat (26) aufgebracht, - der Lösungsmittelanteil des auf dem Substrat (26) aufgebrachten Lackes (30) wird verringert, - das beschichtete Substrat (26) wird einer Lösungsmittelatmosphäre ausgesetzt. Die Erfindung betrifft ferner eine Vorrichtung zum Planarisieren einer Lackschicht.

A method for coating a substrate with a lacquer and device for planarizing a lacquer layer

Die Erfindung betrifft ein Verfahren zum Beschichten eines Substrats (26) mit einem Lack, mit den folgenden Schritten: - zunächst wird der Lack gleichmäßig auf das Substrat (26) aufgebracht, - anschließend wird der Lösungsmittelanteil des auf dem Substrat (26) aufgebrachten Lackes (30) verringert, - danach wird das beschichtete Substrat (26) einer Lösungsmittelatmosphäre in einem Behandlungsraum (12) ausgesetzt. Die Erfindung betrifft ferner eine Vorrichtung zum Planarisieren einer Lackschicht.

PRODUCTION OF MICROSTRUCTURES OF DIFFERENT STRUCTURAL HEIGHT OF MEANS ROENTGEN DEPTH LITHOGRAPHY WITH VICTIM LAYER OF METAL

MICRO PLASTIC STRUCTURES, PROCEDURES FOR THE PRODUCTION THE SAME AND PHOTOMASK FOR IT.

PROCEDURE FOR THE PRODUCTION OF HEAT RESISTANT OF STRUCTURING LAYERS.

URPLATTEN FOR THE PRODUCTION OF STENCILS, IN PARTICULAR FOR OPTICAL PLATES, AND PROCEDURES FOR THEIR PRODUCTION

HOLOGRAMME.

PROCEDURE AND DEVICE WITH ENTRANCES AND OUTPUT TREATMENT EXITS FOR LAMINATING UNDER REDUCED PRESSURE.

PROCEDURE FOR THE PRODUCTION OF STRUCTURED ONE, SELFORGANIZED MOLECULAR ONE MONO SITUATIONS OF INDIVIDUAL MOLECULAR SPECIES, IN PARTICULAR OF SUBSTANCE LIBRARIES

Procedure for the production of reproductions of passes, erasures, outline drawings od.dgl.

PROCEDURE FOR MANUFACTURING MICROSTRUCTURE ELEMENTS ON A SUBSTRATE

DEVICE FOR THE EXECUTION OF CHEMICAL AND BIOCHEMICAL REACTIONS WITH USE OF PHOTO-PRODUCED REAGENTS

ALKYLSULFONYLOXIME FOR I-LINE-PHOTORESIST OF HIGH RESOLUTION AND SENSITIVITY

PRINTING DEVELOPMENT EQUIPMENT

PROCEDURE FOR THE PRODUCTION OF AN INK RADIATION RECORDING HEAD

CONDUCTIVE STRIP STRUCTURES AND PROCEDURES FOR YOUR PRODUCTION

CONNECTIONS AND YOUR USE IN A BINARY SYNTHESIS STRATEGY

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

IMPROVED TOPI MEDICINES AS WELL AS PROCEDURE FOR THE PHOTO-DYNAMIC TREATMENT OF DISEASES

METHOD AND APPARATUS FOR CAPTIVATING A SUBSTRATE WITH A HOLDER

Method and system of automatic fluid dispensing for imprint lithography processes

Printing elements and method for producing the same using digital imaging photopolymerization

Method for manufacturing of printed product micro features and arrangement for continuous production of such a product.

A method for manufacturing a printed product comprises provision (210) of a matrix comprising a matrix surface having a plurality of recesses. A first curable compound is applied (212) to the matrix surface to fill the recesses with the compound. The matrix surface and the filled recesses are covered (220) by a pickup layer of a second curable compound. The matrix is brought (230) in contact with the substrate surface and the first curable compound and the second curable compound are cured (232). The matrix surface is separated (234) from the substrate surface, leaving the pickup layer and the first curable compound on the substrate surface. The pickup layer and the first curable compound are thus transferred (240) together from the matrix surface onto a substrate surface of a substrate sheet. The first curable compound forms printed product micro features at the pickup layer covering the substrate surface.

Waterless lithographic plate

Alkysulfonyloximes for high-resolution I-line photoresists of high sensitivity

TRANSFER LAYER SHEETS

METHOD AND APPARATUS FOR GENERATING HIGH-RESOLUTION IMAGES

Alkysulfonyloximes for high-resolution i-line photoresists of high sensitivity

METHOD OF PRODUCING THICK SCHOTTKY-BARRIER CONTACTS

METHOD AND APPARATUS FOR CAPTIVATING A SUBSTRATE WITHIN A HOLDER

PHOTOSENSITIVE ELEMENT INCLUDING SINGLE EFFECTIVE SILVER HALIDE GRAINS IN A REGULAR GEOMETRIC SPACED ARRAY

DIAMOND WITH MICROSCOPIC INSCRIPTION CERTIFYING QUALITY

FABRICATION OF MICROSTRUCTURES AND NANOSTRUCTURES USING ETCHING RESIST

Nanostructures and microstructures are formed by patterning methods such as Dip Pen Nanolithography (DPN) or microcontact printing of organic molecul es functioning as a resist on a substrate followed by an etching step. The e tch resist is a patterning composition and can contain on a substrate includ ing polyethylene glycol (PEG). Positive and negative etch methods can be use d.

METHODS FOR FORMING HYDROGELS ON SURFACES AND ARTICLES FORMED THEREBY

Methods for forming hydrogels on substrates, including patterned hydrogels. One method comprises providing at least one nanoscopic tip, coating the tip with at least one ink composition, and depositing the ink composition onto at least one substrate, wherein the ink composition comprises at least one hydrogel precursor, the hydrogel precursor adapted to form a hydrogel. The precursor can be converted to the hydrogel after patterning. The ink composition can comprise at least two polymers and can be functionalized. The amount of the polymers and the amount of functionalization can be tuned. Also provided are articles formed from the methods, methods for using the articles, ink compositions and related kits.

PHOTOETCHING PROCESS FOR MAKING SURGICAL NEEDLES

PHOTOETCHING PROCESS FOR MAKING SURGICAL NEEDLES Surgical needles are produced by a process which comprises the steps of: (a) coating at least one side of a metal sheet with a light sensitive photoresist; (b) exposing the photoresist with light in the image of a plurality of surgical needles, each needle having a pointed end and a suture attachment end; (c) removing the unexposed photoresist, to thereby leave in place on the metal sheet hardened photoresist in the image of a plurality of surgical needles; (d) exposing the product of step (c) to an etchant to remove metal not protected by said hardened photoresist, to thereby form a plurality of surgical needles.

STRUCTURES FOR CONTROLLED CHEMICAL RELEASE

STRUCTURES FOR CONTROLLED CHEMICAL RELEASE A method of fabricating a structure for the controlled release of a substance located in the structure between two relatively insoluble layers in which a first relatively insoluble layer (9), a soluble layer containing the substance to be released (12a,b) and a second relatively insoluble layer (15) are deposited sequentially on a substrate (8), followed by the removal of the substrate, the shapes of the layers being such that the soluble layer is entirely surrounded by the relatively insoluble layers except for one or more release orifices. The shape of the soluble layer may be designed to provide a pulsed release of the substance or may comprise a plurality of different substances to be released. The structure may conveniently be fabricated by layer processing including photolithography and etching on a soluble layer of silicon dioxide formed on a piece of silicon.

METHOD OF DUPLICATING PLASTICS INFORMATION CARRIERS, AS WELL AS A MOULDING RESIN, SUBSTRATE AND DIE USED IN SAID METHOD

The invention relates to a method of reproducing plastics record carriers, in particular duplicating video records. According to the invention, a metal die is used which is provided with a thin-liquid moulding resin of a particular composition which can be polymerized by radiation. A radiation-pervious substrate which is manufactured from synthetic material, for example polymethylmethacrylate, is provided on the moulding resin. The moulding resin is exposed to light via the substrate after which the cured moulding resin together with the substrate connected thereto is removed from the die. The moulding resin used in the process comprises low-molecular monomers or oligomers which contain on an average 25-70% by weight of hydrocarbon groups and/or phenyl groups. The moulding resin is aprotic and has a functionality as regards unsaturatedness which is between the values 2 and 6. A suitable moulding resin contains mono-, tri- or tetra esters of acylic acid. The moulding resin preferably has ...

TREATING CHARACTER FONTS OF PRINT WHEEL WITH MONOMER AND IRRADIATING

A method for selectively hardening and toughening the bulk mass of predetermined portions of a polymeric structure which includes the steps of contacting the polymeric structure with a multifunctional monomer to diffuse the monomer into the polymeric structure and irradiating the predetermined portions of the polymeric structure with activating radiation to cause the bulk polymeric material at those portions to be hardened and toughened. In a preferred embodiment the character fonts of a print wheel made from nylon 66 are contacted with a multifunctional monomer which is subsequently exposed to electron beam radiation whereby a structural network of monomer or monomer reactive with polymer or mixtures is formed.

PHOTO-SENSITIVE ADHESIVE SYSTEM

METHOD OF PRODUCING THICK SCHOTTKY-BARRIER CONTACTS

Method for producing a stamp for hot embossing

The present invention provides a process for producing a stamp for hot embossing (HE). The stamp can be constructed from any photo-resist epoxy that is stable at temperatures equal to the glass transition temperature (T g ) of the material to be stamped. The stamp can be used repeatedly without significant distortion of features. The stamp benefits from low relative cost, high fidelity of features in all three-dimensions and fast construction. The process for producing a stamp for hot embossing from a resist, comprising the steps of producing a seed layer L 1 from a selected photoresist polymer material, soft baking the seed layer L 1 , exposing said seed layer L 1 to initiate cross-linking and then post-exposure bake L 1 to fully cross-link it, coating the cross-linked seed layer L 1 with a second photoresist polymer layer L 2 ; soft baking the second photoresist polymer layer L 2 ; applying a mask to the top surface of the soft baked layer L 2 and illuminating the unmasked portions of the soft baked layer L 2 with UV radiation through the mask, wherein the exposed areas form the pattern of the embossing features, washing away un-exposed regions of the photoresist with a developer to leave behind a relief pattern formed in the second photoresist polymer layer L 2 , which relief pattern corresponds to a pattern in the mask.

Clamping device of micro-nano imprint process and the method thereof

The invention discloses a clamping device of the micro/nano imprint process and the method thereof for clamping a substrate. The clamping device comprises a first module, a second module and a locking module. The first module and the second module are used to accommodate and support at least one mold. The mold has a predetermined structure. The locking module is used to lock the first module and the second module. The clamping device drives the mold to imprint the substrate or the material layer of the substrate by a predetermined way.

Exposure method, color filter manufacturing method, and exposure device

An exposure method is provided, in which when exposure is performed using a photomask having a plurality of mask patterns, various mask patterns corresponding to various different color filters are exposed in different regions on a substrate, without moving the photomask to an irradiation area in an exposure device. A photomask, having a first mask pattern for exposing a portion of colored pixels constituting a first color filter and a second mask pattern for exposing a portion of colored pixels constituting a second color filter, is fixed with respect to a light source. A light beam from a light source is selectively directed to the first mask pattern while transferring the substrate, to continuously expose a resist in a first region, and the light beam from the light source is selectively directed to the second mask pattern while transferring the substrate, to continuously expose a resist in a second region.

Guided self-assembly of block copolymer line structures for integrated circuit interconnects

Complex self-assembled patterns can be created using a sparse template and local changes to the shape or distribution of the posts of the template to direct pattern generation of block copolymer. The post spacing in the template is formed commensurate with the equilibrium periodicity of the block copolymer, which controls the orientation of the linear features. Further, the posts can be arranged such that the template occupies only a few percent of the area of the final self-assembled patterns. Local aperiodic features can be introduced by changing the period or motif of the lattice or by adding guiding posts. According to one embodiment, an array of carefully spaced and shaped posts, prepared by electron-beam patterning of an inorganic resist, can be used to template complex patterns in a cylindrical-morphology block copolymer. These complex self-assembled patterns can form a mask used in fabrication processes of arbitrary structures such as interconnect layouts.

Template manufacturing method, semiconductor device manufacturing method and template

According to one embodiment, a template manufacturing method is a method for manufacturing a template for use in an imprint processing in which a pattern having irregularities are formed on a principal surface, and the pattern is brought into contact with a resist member formed on a substrate to be processed, to transfer the pattern to the resist member, the method including implanting charged particles at least into the bottoms of concave portions of the template.

Method for Producing a Grating and Phase Contrast X-Ray System

A method is described for producing a grating, in particular an absorption grating, having a grating constant of less than 100 μm, by using a solution of superparamagnetic colloidal nanocrystal clusters (CNCs), a solvent liquid and a photocurable resin, with the following steps:—alignment of the CNCs in the solution by an external magnetic field,—exposure of the solution, so that the resin is cured and grating structures of an intended grating constant are formed, and—removal of the magnetic field.

Low temperature curable polyimide resin and method of preparing the same

In a method for preparing a polyimide resin by reacting diamine and dianhydride, the polyimide resin is polymerized under the presence of a solvent having a boiling point ranging from 130° C. to 180° C. so as to be curable at a low temperature ranging from 150° C. to 250° C. Because the polyimide is curable even at a low temperature, when the polyimide resin is used as an electronic material, damage to equipment due to an otherwise high temperature process can be minimized, and in addition, the polyimide resin can be extensively used as an electronic material such as for a plastic substrate, or the like.

Imprint lithography alignment method and apparatus

A method of aligning a template and a substrate for imprint lithography involves using a mask pattern of the template and a luminescent marker pattern of the substrate, the method including aligning the template mask pattern and the substrate marker pattern using a radiation intensity measurement of radiation emitted by the luminescent marker pattern and having passed the template mask pattern. The mask pattern and the luminescent marker pattern may each be shaped to provide a turning point in the intensity of detected radiation emitted from the marker pattern, and passing through the mask pattern to a detector, as a function of relative displacement at the aligned position. The displacement of the template and substrate may be aligned by identifying the turning point in radiation intensity. The marker pattern may be fluorescent with the emitted radiation excited by a radiation source.

Radiation-sensitive resin composition, method for forming resist pattern, polymer and compound

A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. wherein R C represents a (p+1)-valent aromatic ring group, Q represents a linking group obtained by removing one hydrogen atom from a monovalent hydrophilic group, R E represents a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms, p is an integer from 1 to 5, provided that a plurality of Q and a plurality of R E may respectively be either the same or different when p is an integer from 2 to 5, and “*” indicates a bonding hand.

Method for forming pattern and a semiconductor device

According to one embodiment, a pattern forming method comprises transferring a pattern formed in a surface of a template to a plurality of chip areas in a semiconductor substrate under different transfer conditions. Furthermore, the transferring the pattern formed in the surface of the template to the plurality of chip areas in the semiconductor substrate under the different transfer conditions comprises transferring the pattern formed in the surface of the template to the semiconductor substrate at least twice under each identical transfer condition. Moreover, the pattern forming method comprises dividing each of the plurality of chip areas into a plurality of areas, determining an optimum condition for each set of corresponding divided areas in the plurality of chip areas, and transferring the pattern onto the semiconductor substrate using the optimum transfer condition determined for each divided area.

Self-aligned permanent on-chip interconnect structure formed by pitch splitting

A method of fabricating an interconnect structure is provided. The method includes forming a hybrid photo-patternable dielectric material atop a substrate. The hybrid photo-patternable dielectric material has dual-tone properties with a parabola like dissolution response to radiation. The hybrid photo-patternable dielectric material is then image-wise exposed to radiation such that a self-aligned pitch split pattern forms. A portion of the self-aligned split pattern is removed to provide a patterned hybrid photo-patternable dielectric material having at least one opening therein. The patterned hybrid photo-patternable dielectric material is then converted into a cured and patterned dielectric material having the at least one opening therein. The at least one opening within the cured and patterned dielectric material is then filed with at least an electrically conductive material. Also provided are a hybrid photo-patternable dielectric composition and an interconnect structure.

Method for forming pattern and method for manufacturing liquid crystal display device

A method of forming a pattern and a manufacturing method of a liquid crystal display includes forming the pattern with a thin thickness by coating a pattern material on a printing roll using a nozzle, removing a surplus portion of the pattern material from the printing roll by using a plate, and transferring the pattern material remaining on the printing roll to a substrate to form the pattern.

Liquid photoinitiator blend

The present invention relates to a homogenous liquid blend comprising a photoinitiator and an alkoxylate surfactant for incorporation into aqueous based and solvent based radiation curable systems. In particular the invention relates to a homogenous liquid blend which is liquid at room temperature comprising at least 30% by weight with regard to the whole blend of a solid photoinitiator of the radical type and 1-70% by weight of at least one alkoxylated liquid surface active agent and optionally an organic diluent.

Method for manufacturing porous structure and method for forming pattern

A pattern forming material contains a block copolymer or graft copolymer and forms a structure having micro polymer phases, in which, with respect to at least two polymer chains among polymer chains constituting the block copolymer or graft copolymer, the ratio between N/(Nc−No) values of monomer units constituting respective polymer chains is 1.4 or more, where N represents total number of atoms in the monomer unit, Nc represents the number of carbon atoms in the monomer unit, No represents the number of oxygen atoms in the monomer unit.

Methods Of Forming Patterns, And Methods Of Forming Integrated Circuits

Some embodiments include methods of forming patterns in substrates by utilizing block copolymer assemblies as patterning materials. A block copolymer assembly may be formed over a substrate, with the assembly having first and second subunits arranged in a pattern of two or more domains. Metal may be selectively coupled to the first subunits relative to the second subunits to form a pattern of metal-containing regions and non-metal-containing regions. At least some of the block copolymer may be removed to form a patterned mask corresponding to the metal-containing regions. A pattern defined by the patterned mask may be transferred into the substrate with one or more etches. In some embodiments, the patterning may be utilized to form integrated circuitry, such as, for example, gatelines.

Pattern forming method and pattern forming device

According to one embodiment, a pattern forming method includes transferring a first pattern area of a plurality of pattern areas to a to-be-processed substrate, by using a template on which the plurality of pattern areas, where patterns are formed on a substrate, are disposed, counting up a number of times of transfer of the first pattern area, and storing the number of times of transfer, determining whether the stored number of times of transfer of the pattern of the first pattern area has exceeded a specified number, and executing switching to a second pattern of the plurality of pattern areas when it is determined, at a time of the determining, that the stored number of times of transfer of the pattern of the first pattern area has exceeded the specified number, and transferring the second pattern area to the to-be-processed substrate.

Structure manufacturing method and structure

A structure manufacturing method includes laminating a first film on a base material, selectively irradiating the first film with an energy ray depending on a position of a surface of the first film on the base material, to form a latent image of a pattern on the first film, laminating a second film on the surface of the first film, and supplying a developer to the second film and removing a removal target portion of the first film to be selectively removed along with the second film, thereby developing the pattern.

Nitrogen-containing organic compound, chemically amplified positive resist composition, and patterning process

An aralkylcarbamate of imidazole base is effective as the quencher. In a chemically amplified positive resist composition comprising the carbamate, deprotection reaction of carbamate takes place by reacting with the acid generated upon exposure to high-energy radiation, whereby the composition changes its basicity before and after exposure, resulting in a pattern profile with advantages including high resolution, rectangular shape, and minimized dark-bright difference.

Vapor Delivery System For Use in Imprint Lithography

Described are systems and method of using a vapor delivery system for enabling delivery of an adhesion promoter material during an imprint lithography process.

Resin, resist composition and method for producing resist pattern

A resin having a structural unit derived from a compound represented by the following formula (I), wherein R 1 , A 1 and ring X 1 are as defined in the instant specification:

Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography

A copolymer for positive type lithography, having at least a recurring unit (A) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (A) [in the formula (A), R 10 is a hydrogen atom or a hydrocarbon group which may be substituted by fluorine atom; R 11 is a crosslinked, alicyclic hydrocarbon group; n is an integer of 0 or 1; and R 12 is an acid-dissociating, dissolution-suppressing group], and a terminal structure (B) having a structure wherein an alkali-soluble group is protected by an acid-dissociating, dissolution-suppressing group, represented by the following formula (B) [in the formula (B), R 21 is a hydrocarbon group which may contain nitrogen atom; R 22 is an acid-dissociating, dissolution-suppressing group; and p is a site of bonding with copolymer main chain].

Resist composition, resist film therefrom and method of forming pattern therewith

Provided is a resist composition, including (A) a resin that when acted on by an acid, is decomposed to thereby increase its solubility in an alkali developer, (B) a compound that when exposed to actinic rays or radiation, generates an acid, the compound being any of those of general formulae (I) and (II) below, (C) a resin containing at least either a fluorine atom or a silicon atom, and (D) a mixed solvent containing a first solvent and a second solvent, at least either the first solvent or the second solvent exhibiting a normal boiling point of 200° C. or higher.

Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom and method of forming pattern

Provided is an actinic-ray- or radiation-sensitive resin composition, including a resin comprising a repeating unit (A), the a repeating unit (A) containing a structural moiety (S1) that when acted on by an acid, is decomposed to thereby generate an alkali-soluble group and a structural moiety (S2) that when acted on by an alkali developer, is decomposed to thereby increase its rate of dissolution in the alkali developer, and a repeating unit (B) that when exposed to actinic rays or radiation, generates an acid.

Transparent conductive film having high optical transmittance and method for manufacturing the same

The present invention pertains to a transparent conductive film including a conductive layer having different thicknesses so as to increase the optical transmittance while maintaining the conductivity of the transparent conductive film. The present invention also pertains to a process for the preparation of the above-mentioned transparent conductive film.

Display panel

In a picture-frame region (F) of a liquid crystal display panel ( 1 ), a wall member ( 41 ) is provided, which is formed adjacent to a sealing material ( 40 ) and sandwiches the sealing material ( 40 ). Steps ( 42 a ), ( 43 a ) are formed in the wall member ( 41 ) so that a width (W 1 ) of a portion ( 40 a ) of the sealing material ( 40 ), which contacts a TFT substrate ( 2 ) is larger on a side on which the sealing material ( 40 ) contacts the TFT substrate ( 2 ).

Radiation-sensitive resin composition, polymer and compound

[Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. [Solution] A radiation-sensitive resin composition including (A) a polymer that includes a repeating unit (a1) and a fluorine atom, and (B) a photoacid generator, the repeating unit (a1) including a group shown by any of the following formulas (1-1) to (1-3).

Imprint apparatus and article manufacturing method

The imprint apparatus of the present invention molds an imprint material on a substrate using a mold and cures the imprint material to form a pattern on the substrate. The apparatus includes a holder configured to attract the mold to hold the mold; and a pressure reduction device configured to reduce a back pressure of the mold held by the holder, wherein the apparatus is configured to reduce the back pressure by the pressure reduction device in parallel with release of the mold from the imprint material.

Imprint lithography

An imprint lithography apparatus is disclosed that has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array.

Radiation-sensitive resin composition, polymer, and method for forming resist pattern

The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R 1 represents a hydrogen atom, a methyl group or a trifluoromethyl group. R 2 represents a single bond or a divalent linear, branched or cyclic, saturated or unsaturated hydrocarbon group having 1-20 carbon atoms. X represents a fluorine atom-substituted methylene group or a linear or branched fluoroalkylene group having 2-20 carbon atoms. R 3 represents a hydrogen atom or a monovalent organic group.

Pattern forming process

A resist pattern is formed by coating a first positive resist composition comprising a polymer comprising 20-100 mol % of aromatic group-containing recurring units and adapted to turn alkali soluble under the action of an acid onto a substrate to form a first resist film, coating a second positive resist composition comprising a C 3 -C 8 alkyl alcohol solvent which does not dissolve the first resist film on the first resist film to form a second resist film, exposing, baking, and developing the first and second resist films simultaneously with a developer.

Template, method of forming template, and method of manufacturing semiconductor device

According to one embodiment, a template includes a pattern part which is provided on a substrate and corresponds to a pattern of a semiconductor device, the pattern of the semiconductor device being to be transferred to a wafer, and an alignment mark part which is provided on the substrate, used for positioning of the substrate with respect to the wafer. The alignment mark part has a refractive index that is higher than a refractive index of the substrate.

Flexible gas barrier film, method for preparing the same, and flexible display device using the same

The present invention provides a flexible gas barrier film including: a transparent base film; and a hydrophobic pattern layer formed on the base film. The flexible gas barrier film is capable of maximizing hydrophobicity and effectively reducing water vapor permeability by patterning the hydrophobic layer.

Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin

A resist composition for immersion exposure including: a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid; an acid-generator component (B) which generates acid upon exposure; and a fluorine-containing resin component (F); dissolved in an organic solvent (S), the fluorine-containing resin component (F) including a structural unit (f1) containing a fluorine atom, a structural unit (f2) containing a hydrophilic group-containing aliphatic hydrocarbon group, and a structural unit (f3) derived from an acrylate ester containing a tertiary alkyl group-containing group or an alkoxyalkyl group.

Solution processed thin films and laminates, devices comprising such thin films and laminates, and method for their use and manufacture

Devices having a thin film or laminate structure comprising hafnium and/or zirconium oxy hydroxy compounds, and methods for making such devices, are disclosed. The hafnium and zirconium compounds can be doped, typically with other metals, such as lanthanum. Examples of electronic devices or components that can be made include, without limitation, insulators, transistors and capacitors. A method for patterning a device using the materials as positive or negative resists or as functional device components also is described. For example, a master plate for imprint lithography can be made. An embodiment of a method for making a device having a corrosion barrier also is described. Embodiments of an optical device comprising an optical substrate and coating also are described. Embodiments of a physical ruler also are disclosed, such as for accurately measuring dimensions using an electron microscope.

Compositions comprising base-reactive component and processes for photolithography

New photoresist compositions are provided that are useful for immersion lithography. Preferred photoresist compositions of the invention comprise one or more materials that comprise one or more base reactive groups and (i) one or more polar groups distinct from the base reactive groups, and/or (ii) at least one of the base reactive groups is a non-perfluorinated base reactive group. Particularly preferred photoresists of the invention can exhibit reduced leaching of resist materials into an immersion fluid contacting the resist layer during immersion lithography processing.

Carbon molds for use in the fabrication of bulk metallic glass parts and molds

Novel molds and methods for Bulk Metallic Glass (BMG) molding using carbon templates obtained from pyrolyzed materials are provided. The method employs the Carbon MEMS (C-MEMS) technique to derive molds of different geometries and dimensions. The resultant carbon structures are stable at very high temperatures and have sufficient mechanical strength to be used as master molds for the thermoplastic forming of BMGs.

Photocurable resin composition

Provided is a photocurable resin composition, which has sensitivity equal to or greater than existing compositions, has alkali development properties, and which produces a cured product that does not become brittle with changes in temperature, and which also has excellent reliability in terms of water resistance, electrical insulating properties, PCT resistance, and the like. The photocurable resin composition comprises a carboxyl group-containing resin, a photopolymerization initiator, a vinyl group-containing elastomer, and a styryl group-containing compound.

Micro/nano imprint mold of the fabricating process and the method of fabricating high aspect ratio anti-etch structure by utilizing thereof

The invention discloses a mold performing in the micro/nano imprint fabricating process, wherein the mold is utilized to imprint a pattern on a substrate via a material layer. The mold comprises an upper surface, a lower surface, a pre-determined structure and an overflow controlling device. The upper surface and the lower surface are corresponded to each other. The pre-determined structure is disposed on the lower surface of the mold. The overflow controlling device is utilized to maintain the pressure among the material layer and the substrate.

Pattern forming method

According to one embodiment, a pattern including first and second block phases is formed by self-assembling a block copolymer onto a film to be processed. The entire block copolymer present in a first region is removed under a first condition by carrying out energy beam irradiation and development, thereby leaving a pattern including the first and second block phases in a region other than the first region. The first block phase present in a second region is selectively removed under a second condition by carrying out energy beam irradiation and development, thereby leaving a pattern including the first and second block phases in an overlap region between a region other than the first region and a region other than the second region, and leaving a pattern of second block phase in the second region excluding the overlap region. The film is etched with the left patterns as masks.

Anticorrosion layer and manufacturing method thereof

The present invention relates to an anticorrosion layer and a manufacturing method thereof, wherein the anticorrosion layer is capable of being coated onto the surface of a substrate for preventing the substrate surface from corrosion, the anticorrosion layer comprises: a polymer material layer, coated on the substrate surface; and a continuous rough surface layer, formed on the surface of the polymer material layer, wherein the continuous rough surface layer has a surface roughness great than 10 nm. Moreover, through the manufacturing method, a protective layer (the anticorrosion layer) with excellent anticorrosion efficiency and low pollution property can be rapidly and massively formed on the substrate surface by way of using a replica mold.

Sulfonium salt-containing polymer, resist composition, patterning process, and sulfonium salt monomer and making method

A sulfonium salt having a 4-fluorophenyl group is introduced as recurring units into a polymer comprising hydroxyphenyl (meth)acrylate units and acid labile group-containing (meth)acrylate units to form a polymer which is useful as a base resin in a resist composition. The resist composition has a high sensitivity, high resolution and minimized LER.

Photosensitive copolymer and photoresist composition

A copolymer has formula: wherein R 1 -R 5 are independently H, C 1-6 alkyl, or C 4-6 aryl, R 6 is a fluorinated or non-fluorinated C 5-30 acid decomposable group; each Ar is a monocyclic, polycyclic, or fused polycyclic C 6-20 aryl group; each R 7 and R 8 is —OR 11 or —C(CF 3 ) 2 OR 11 where each R 11 is H, a fluorinated or non-fluorinated C 5-30 acid decomposable group, or a combination; each R 9 is independently F, a C 1-10 alkyl, C 1-10 fluoroalkyl, C 1-10 alkoxy, or a C 1-10 fluoroalkoxy group; R 10 is a cation-bound C 10-40 photoacid generator-containing group, mole fractions a, b, and d are 0 to 0.80, c is 0.01 to 0.80, e is 0 to 0.50 provided where a, b, and d are 0, e is greater than 0, the sum a+b+c+d+e is 1, l and m are integers of 1 to 4, and n is an integer of 0 to 5. A photoresist and coated substrate, each include the copolymer.

Imprinting method, imprinting apparatus and medium

According to one embodiment, there is provided an imprinting method for applying a first hardening resin material on a substrate to be processed and transferring a pattern of a semiconductor integrated circuit formed on a template onto the substrate to be processed on which the first hardening resin material is applied, wherein a second hardening resin material with higher separability than the first hardening resin material is applied on at least part of the outer periphery of an area in which the pattern is formed by one transferring.

Improvements in or relating to printing

A printing form precursor comprises a printing surface which comprises an inorganic metal compound, the printing surface being hydrophobic and capable of being made hydrophilic by energy but capable of becoming hydrophobic again, for reuse, if desired. An associated method of printing includes steps of subjecting the printing surface imagewise to energy so as to locally increase its hydrophilicity sufficient to make the surface differentiated in its acceptance of an oxophilic a printing ink; applying the ink to the printing surface and printing from the printing surface; causing or allowing the printing surface to undergo a reduction in hydrophilicity sufficient again to make the printing surface uniform in its acceptance of a printing ink; and,if wished, repeating these steps on multiple occasions. Thus the invention achieves the goal of providing a printing form precursor which does not need a chemical developer, and which can be used multiple times, to print different images.

Self-assembly of lithographically patterned polyhedral nanostructures and formation of curving nanostructures

The self-assembly of polyhedral nanostructures having at least one dimension of about 100 nm to about 900 nm with electron-beam lithographically patterned surfaces is provided. The presently disclosed three-dimensional nanostructures spontaneous assemble from two-dimensional, tethered panels during plasma or wet chemical etching of the underlying silicon substrate. Any desired surface pattern with a width as small as fifteen nanometers can be precisely defined in all three dimensions. The formation of curving, continuous nanostructures using extrinsic stress also is disclosed.

Dose responsive uv indicator

A UV radiation (UVR) response indicator comprises a first UVB and/or UVA radiation sensitive material which has been modified so as to display an altered characteristic in a delayed manner in response to UVB and/or UVA radiation exposure. The UV indicator is capable of displaying exposure to increased UV radiation over a period of time. The present invention also relates to a method of displaying a relative amount of exposure to UVR by a UV indicator over a period of time. The invention is particularly useful in detecting the level of exposure to sunlight or sunbed radiation.

Method of and apparatus for forming a metal pattern

Provided are methods of and apparatuses for forming a metal pattern. In the method, an initiator and a metal pattern are sequentially combined on a previously-formed bonding agent pattern improving adhesion and/or junction properties between the substrate and the metal. The bonding agent pattern may be formed using a reverse offset printing method. The metal pattern may be formed using an electroless electrochemical plating method. The metal pattern can be formed with improved uniformity in thickness and planar area.

Multi-Layer Method for Formation of Registered Arrays of Cylindrical Pores in Polymer Films

Methods for fabricating sublithographic, nanoscale polymeric microstructures utilizing self-assembling block copolymers, and films and devices formed from these methods are provided.

Photosensitive Resin Composition and Light Blocking Layer Using the Same

Disclosed is a photosensitive resin composition that includes (A) a cardo-based monomer represented by the following Chemical Formula 1 or 2, (B) a cardo-based resin, (C) a reactive unsaturated compound, (D) a pigment, (E) an initiator, and (F) a solvent, and a light blocking layer using the same. In Chemical Formulae 1 and 2, each substituent is the same in the detailed description.

Cyclic compound, process for production of the cyclic compound, radiation-sensitive composition, and method for formation of resist pattern

A cyclic compound represented by formula (1): wherein L, R 1 , R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Color liquid crystal display device

A color liquid crystal display device includes a liquid crystal display element and a backlight unit. The liquid crystal display element includes a color filter having a red filter segment, a green filter segment, and a blue filter segment. The blue filter segment is prepared from blue photosensitive resin composition. The blue photosensitive resin composition includes a pigment combination, an alkali-soluble resin, a compound having an ethylenic group, and a photoinitiator. The pigment combination includes a copper phthalocyanine-based blue pigment. The color filter has a z value ranging from 0.3 to 0.5 in a chromaticity diagram of a XYZ color system. The backlight unit is coupled to the liquid crystal display element and has a color temperature ranging from 8,000 K to 20,000 K.

Cyclic compound, process for preparation thereof, radiation-sensitive composition, and method for formation of resist pattern

A cyclic compound represented by formula (1): wherein L, R 1 , R′, and m are as defined in the specification. The cyclic compound of formula (1) is highly soluble to a safety solvent, highly sensitive, and capable of forming resist patterns with good profile. Therefore, the cyclic compound is useful as a component of a radiation-sensitive composition.

Process for producing article having fine concavo-convex structure on its surface and process for producing wire-grid polarizer

Processes for producing an article having a fine concavo-convex structure on the surface of a transparent substrate and a wire-grid polarizer, with high quality with high productivity, with which a concavo-convex layer having a large area can easily be achieved. The process comprises a step (I) of forming an interlayer (A) on the surface of a substrate film, a step (II) of forming a concavo-convex layer (B) having a fine concavo-convex structure on its surface, on the surface of the interlayer (A) by imprinting technology, and a step (IV) of separating a laminate comprising the interlayer (A) and the concavo-convex layer (B) from the substrate film and laminating the laminate to the surface of a transparent substrate so that the interlayer (A) faces the transparent substrate side. Further, a process for producing a wire-grid polarizer employing the production process.

Methods of fabricating nanoimprint stamp

A method of fabricating a nanoimprint stamp includes forming a resist pattern having a nano size width on a stamp substrate by performing imprint processes repeatedly. In the imprint processes, resist layers that are selectively etched are sequentially used. The stamp substrate is etched using the resist pattern as an etch mask.

Multiple Patterning Method

An integrated circuit memory comprises a set of lines each line having parallel X direction line portions in a first region and Y direction line portions in a second region. The second region is offset from the first region. The lengths of the X direction line portions are substantially longer than the lengths of the Y direction line portions. The X direction and Y direction line portions have respective first and second pitches with the second pitch being at least 3 times larger than the first pitch. Contact pickup areas are at the Y direction line portions. In some examples, the lines comprise word lines or bit lines. The memory can be created using multiple patterning methods to create lines of material and then the parallel X direction line portions and parallel Y direction line portions.

Structure with self aligned resist layer on an interconnect surface and method of making same

A structure is provided with a self-aligned resist layer on a surface of metal interconnects for use in forming air gaps in an insulator material and method of fabricating the same. The non-lithographic method includes applying a resist on a structure comprising at least one metal interconnect formed in an insulator material. The method further includes blanket-exposing the resist to energy and developing the resist to expose surfaces of the insulator material while protecting the metal interconnects. The method further includes forming air gaps in the insulator material by an etching process, while the metal interconnects remain protected by the resist.

Polymerizable composition, color filter, and method of producing the same, solid-state imaging device, and planographic printing plate precursor, and novel compound

Disclosed is a photopolymerizable composition which contains a photopolymerization initiator (A) that has a partial structure represented by the following Formula (1) and a polymerizable compound (B). In General formula (1), R 3 and R 4 each independently represents a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, an aryl group, a heteroaryl group or an alkoxy group; R 3 and R 4 may form a ring with each other; and X represents OR 5 , SR 6 , or NR 17 R 18 . The photopolymerizable composition is capable of forming a cured film that has high sensitivity, excellent intra-membrane curability and excellent adhesion to a support. The cured film is able to maintain a patterned shape even during post-heating after development and has good pattern formability, while coloring due to heating with passage of time being suppressed.

Colored curable composition, color filter, and method for producing color filter

A colored curable composition for a solid-state image sensor comprises a polyhalogenated zinc phthalocyanine pigment, and a compound having at least a structure represented by the following Formula (A). In Formula (A), X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 each independently represent a substituent selected from —OH, —OR, or —NHCOCH═CH 2 , R represents a monovalent organic group. When the compound is an oligomer, the oligomer has a configuration in which at least one of X 1 , X 2 , X 3 , X 4 , X 5 , and X 6 in a structure represented by Formula (A) is eliminated to form a single bond, which is then linked, via —O—, to another structure represented by Formula (A).

Chemically amplified positive resist composition and patterning process

A chemically amplified positive resist composition comprising (A) a substantially alkali insoluble polymer having an acidic functional group protected with an acid labile group, (B) an acid generator, and (C) a perfluoroalkyl ethylene oxide adduct or a nonionic fluorinated organosiloxane compound is coated, exposed to UV radiation having a wavelength of at least 150 nm, and developed. The composition has advantages of uniformity and minimized edge crown upon coating, and no scum formation after development.

Methods for self-aligned self-assembled patterning enhancement

Methods for producing self-aligned, self-assembled sub-ground-rule features without the need to use additional lithographic patterning. Specifically, the present disclosure allows for the creation of assist features that are localized and self-aligned to a given structure. These assist features can either have the same tone or different tone to the given feature.

Resist pattern forming process

A resist pattern is formed by coating a chemically amplified positive resist composition onto a substrate and prebaking to form a resist film, exposing to high-energy radiation, baking and developing with a developer to form a resist pattern, and heating the pattern for profile correction to such an extent that the line width may not undergo a change of at least 10%. An amount of a softening accelerator having a molecular weight of up to 800 is added to the resist composition comprising (A) a base resin, (B) an acid generator, (C) a nitrogen-containing compound, and (D) an organic solvent.

Chemically amplified positive resist composition, patterning process, and acid-decomposable keto ester compound

A chemically amplified positive resist composition comprises an acid-decomposable keto ester compound of steroid skeleton which is insoluble in alkaline developer, but turns soluble in alkaline developer under the action of acid. The composition is exposed to EB, deep-UV or EUV and developed to form a pattern with a high resolution and improved LER.

Imprint apparatus and article manufacturing method

An imprint apparatus that includes a holding unit, and performs an imprint process, including molding of an imprint material on a substrate held by the holding unit using a mold, curing of the molded imprint material, and releasing of the cured imprint material from the mold, to form a pattern on the substrate. The apparatus includes a first cure device configured to perform a first cure process for the imprint material molded by the mold prior to the releasing; and a second cure device configured to perform a second cure process for the imprint material on the substrate conveyed out from the holding unit after the releasing.

Radiation-sensitive resin composition

A radiation-sensitive resin composition includes an acid-labile group-containing polymer and photoacid generator. The radiation-sensitive resin composition is used to form a resist pattern using a developer that includes an organic solvent in an amount of 80 mass % or more. The radiation-sensitive resin composition has a contrast value γ of 5.0 to 30.0. The contrast value γ is calculated from a resist dissolution contrast curve obtained when developing the radiation-sensitive resin composition using the organic solvent.

Self-aligned permanent on-chip interconnect structure formed by pitch splitting

A hybrid photo-patternable dielectric material is provided that has dual-tone properties with a parabola like dissolution response to radiation. In one embodiment, the hybrid photo-patternable dielectric material includes a composition of at least one positive-tone component including a positive-tone polymer, positive-tone copolymer, or blends of positive-tone polymers and/or positive-tone copolymers having one or more acid sensitive positive-tone functional groups; at least one negative-tone component including a negative-tone polymer, negative-tone copolymer, or blends of negative-tone polymers and/or negative-tone copolymers having one or more acid sensitive negative-tone functional groups; at least one photoacid generator; and at least one solvent that is compatible with the positive-tone and negative-tone components.

Imprinting apparatus, imprinting method, and manufacturing method of uneven plate

According to one embodiment, an imprinting apparatus includes an ejecting unit, a stage, a moving unit, and an observation unit. The ejecting unit ejects and drips a hardening resin material onto a substrate to be processed. The substrate to be processed is placed onto the stage. The moving unit relatively moves the ejecting unit and the stage. The observation unit observes the dripped hardening resin material and the pattern with the state in which the dripped hardening resin material and the pattern are overlaid on a plane, before the template is brought into contact with the hardening resin material.

Resist film, resist coated mask blanks and method of forming resist pattern using the resist film, and chemical amplification type resist composition

A resist film formed by using a chemical amplification type resist composition containing (A) a high molecular compound having a structure wherein a hydrogen atom of a phenolic hydroxyl group is substituted by a group represented by the following general formula (I), (B) a compound generating an acid upon irradiation with actinic rays or radiation, and an organic solvent, and the film thickness is 10 to 200 nm. wherein, R 1 represents a hydrocarbon group, R 2 represents a hydrogen atom or a hydrocarbon group, and Ar represents an aryl group. R 1 may also bind to Ar to form a ring which may also contain a heteroatom. * represents a binding position with an oxygen atom of the phenolic hydroxyl group.

Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method

An immersion lithographic apparatus is disclosed having a projection system configured to direct a patterned beam of radiation onto a substrate and a liquid handling system configured to supply and confine immersion liquid to a space defined between the projection system and a substrate, or a substrate table, or both. A controller is provided to adjust an angle of a lower surface of the liquid handling system relative to the top surface of the substrate during motion of the substrate and/or substrate table relative to the liquid handling system dependent upon a position of the substrate and/or substrate table relative to the liquid handling system and/or a direction of relative movement between the substrate and/or substrate table and the liquid handling system.

Method and device for a spatially resolved introduction of an intensity pattern comprising electro-magnetic radiation into a photosensitive substance as well as applications thereof

A method for the spatially resolved introduction of an intensity pattern of electro-magnetic radiation by at least one optic display system into a photosensitive substance having properties which can be changed by photon exposure. These properties include a first, liquid and at least one second state, with the electro-magnetic radiation being conducted via the optic display system into the photosensitive substance and here being projected on predetermined spatial coordinates, in order to create at or in an area of these spatial coordinates a change of the properties of the substance. A surface of an objective lens of the optic display system, through which the electro-magnetic radiation 4 is emitted, is immersed in the liquid photosensitive substance 2. A corresponding device is provided, and the device and method can be used for the creation of micro or nano-scaled structures.

Chemically amplified negative resist composition and patterning process

A polymer comprising 0.5-10 mol % of recurring units having acid generating capability and 50-99.5 mol % of recurring units providing for dissolution in alkaline developer is used to formulate a chemically amplified negative resist composition. When used in a lithography process, the composition exhibits a high resolution and forms a negative resist pattern of a profile with minimized LER and undercut.

Resist composition and method for producing resist pattern

A resist composition of the invention includes: (A1) a resin having a structural unit represented by the formula (I), (A2) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and (B) an acid generator represented by the formula (II), wherein R 1 , A 1 , R 2 , Q 1 , Q 2 , L 1 , ring W 1 , and Z + are defined in the specification.

Photopolymer formulation having different writing comonomers

The invention relates to a photopolymer formulation comprising matrix polymers, writing monomers, and photo initiators, comprising a combination of at least two different writing monomers. The invention further relates to the use of the photopolymer formulation for producing optical elements, in particular for producing holographic elements and images, to a method for producing the photopolymer formulation and to a method for illuminating holographic media made of the photopolymer formulation.

Salt, resist composition and method for producing resist pattern

A salt represented by the formula (I) and a resist composition containing the salt are provided, wherein Q 1 , Q 2 , L 1 , ring W 1 , R e1 , R e2 , R e3 , R e4 , R e5 , R e6 , R e7 , R e8 , R e9 , R e10 , R e11 , R e12 , R e13 and Z are defined in the specification.

Method of forming a gate pattern and a semiconductor device

This disclosure is directed to a method of forming a gate pattern and a semiconductor device. The method comprises: providing a plurality of stacked structures which are parallel to each other and extend continuously in a first direction, and which are composed of a gate material bar and an etching barrier bar thereon; leaving second resist regions between gaps to be formed adjacent to each other across gate bars by a second photolithography process; selectively removing the etching barrier bars by a second etching process; forming a third resist layer having a plurality of openings parallel to each other and extending continuously in a second direction substantially perpendicular to the first direction by a third photolithography process; and forming the gate pattern by a third etching process. The method is capable of having a larger photolithography process window and better controlling the shape and size of a gate pattern.

Selection method for additives in photopolymers

The invention relates to a method for selecting compounds which can be used as additives in photopolymer formulations for producing light holographic media, and to photopolymer formulations which contain at least one softener which are selected according to the claimed method. The invention also relates to the use of photopolymer formulations for producing holographic media.

Template, surface processing method of template, surface processing apparatus of template, and pattern formation method

A template includes a transfer surface having an unevenness pattern. The template is configured to form a configuration in a surface of a resin to reflect the unevenness pattern. The resin is formed by filling a photocurable resin liquid into a recess of the unevenness pattern in a state prior to using light to cure the photocurable resin liquid and by using the light to cure the photocurable resin liquid. The template includes a base member and a surface layer. The base member includes a major surface having an unevenness. The surface layer covers the unevenness of the base member, and is used to form the unevenness pattern to reflect a configuration of the unevenness. A contact angle between the surface layer and the photocurable resin liquid in the state prior to using the light to cure the photocurable resin liquid is not more than 30 degrees.

Photoresist resin composition and method of forming patterns by using the same

A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.

Scanning probe lithography apparatus and method, and material accordingly obtained

A scanning probe lithography (SPL) apparatus, an SPL method, and a material having a surface thickness patterned according to the SPL method. The apparatus includes: two or more probes with respective shapes, where the respective shapes are different and the respective shapes form, in operation, different patterns in a thickness of a surface of a material processed with the apparatus.

Patterning process and photoresist with a photodegradable base

A resist material and methods using the resist material are disclosed herein. An exemplary method includes forming a resist layer over a substrate, wherein the resist layer includes a polymer, a photoacid generator, an electron acceptor, and a photodegradable base; performing an exposure process that exposes portions of the resist layer with radiation, wherein the photodegradable base is depleted in the exposed portions of the resist layer during the exposure process; and performing an developing process on the resist layer.

Resist composition and method for producing resist pattern

A resist composition includes (A) a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid, (B) an acid generator having a structure to be cleaved by the action of an alkaline developer, and (C) a compound represented by the formula (I), wherein R 1 and R 2 in each occurrence independently represent a C 1 to C 12 hydrocarbon group, a C 1 to C 6 alkoxyl group, a C 2 to C 7 acyl group, a C 2 to C 7 acyloxy group, a C 2 to C 7 alkoxycarbonyl group, a nitro group or a halogen atom; m and n independently represent an integer of 0 to 4.

Photosensitive composition and method of manufacturing a substrate for a display device using the same

A photosensitive composition and a method of manufacturing a substrate used for a display device are disclosed. The photosensitive composition includes an acrylic based copolymer, a photo-initiator, a photo-sensitizer and a solvent. Thus, a photosensitivity of the photosensitive composition for ultra violet light of a long wavelength may be improved.

Resin and photoresist composition comprising same

The present invention provides a resin comprising a structural unit derived from a compound represented by the formula (I): wherein R 1 represents a hydrogen atom or a methyl group, A 2 represents a divalent fluorine-containing C1-C12 hydrocarbon group, and A 1 represents a group represented by the formula (a-g1): A 10 -X 10  s A 11 -  (a-g1) wherein A 10 is independently in each occurrence a C1-C5 aliphatic hydrocarbon group, A 11 represents a C1-C5 aliphatic hydrocarbon group, X 10 is independently in each occurrence —O—, —CO—, —CO—O— or —O—CO—, and s represents an integer of 0 to 2, and a photoresist composition comprising the resin and an acid generator.

Thin film patterning method

Provided is a thin film patterning method for patterning a thin film made of one of inorganic, organic, and organic/inorganic materials provided on a first substrate including: forming and patterning a thin film made of a material A on the first substrate; forming a thin film made of a material B, which is one of inorganic, organic, and organic/inorganic materials, on the first substrate and on the thin film; bonding the thin film, which is formed on the thin film, to a second substrate, thereby laminating the first substrate and the second substrate together to produce a laminated substrate; and removing the thin film and the thin film, which is provided on the thin film, from the first substrate.

Self-assembly of block copolymers on topographically patterned polymeric substrates

Highly-ordered block copolymer films are prepared by a method that includes forming a polymeric replica of a topographically patterned crystalline surface, forming a block copolymer film on the topographically patterned surface of the polymeric replica, and annealing the block copolymer film. The resulting structures can be used in a variety of different applications, including the fabrication of high density data storage media. The ability to use flexible polymers to form the polymeric replica facilitates industrial-scale processes utilizing the highly-ordered block copolymer films.

Method of forming resist pattern and negative tone-development resist composition

A method of forming a resist pattern, the method including: forming a resist film on a substrate using a resist composition containing a base component (A) that exhibits reduced solubility in an organic solvent under the action of acid, an acid generator component (B) that generates acid upon exposure and a fluorine-containing polymeric compound (F), exposing the resist film, and patterning the resist film by negative tone development using a developing solution containing the organic solvent, thereby forming a resist pattern, wherein the base component (A) contains a resin component (A1) containing a structural unit (a1) derived from an acrylate ester, the dissolution rates of (A1) and (F) in the developing solution are each at least 10 nm/s, and the absolute value of the difference in the dissolution rates of (A1) and (F) in the developing solution is not more than 80 nm/s.

Radiation curable resin composition and rapid three dimensional imaging process using the same

The invention relates to a radiation curable resin composition comprising a cationically polymerizable component, a cationic photoinitiator, a hydroxy component, and an impact modifier. The resin composition can preferably be used in the preparation of three dimensional objects.

Use of rylene derivatives as photosensitizers in solar cells

Use of rylene derivatives I with the following definition of the variables: X together both —COOM; Y a radical -L-NR 1 R 2   (y1) -L-Z—R 3   (y2) the other radical hydrogen; together both hydrogen; R is optionally substituted (het)aryloxy, (het)arylthio; P is —NR 1 R 2 ; B is alkylene; optionally substituted phenylene; combinations thereof; A is —COOM; —SO 3 M; —PO 3 M 2 ; D is optionally substituted phenylene, naphthylene, pyridylene; M is hydrogen; alkali metal cation; [NR 5 ] 4 + ; L is a chemical bond; optionally indirectly bonded, optionally substituted (het)arylene radical; R 1 , R 2 are optionally substituted (cyclo)alkyl, (het)aryl; together optionally substituted ring comprising the nitrogen atom; Z is —O—; —S—; R 3 is optionally substituted alkyl, (het)aryl; R′ is hydrogen; optionally substituted (cyclo)alkyl, (het)aryl; R 5 is hydrogen; optionally substituted alkyl (het)aryl; m is 0, 1, 2; n, p m=0: 0, 2, 4 where: n+p=2, 4, if appropriate 0; m=1: 0, 2, 4 where: n+p=0, 2, 4; m=2: 0, 4, 6 where: n+p=0, 4, 6, or of mixtures thereof as photosensitizers in solar cells.

Color filter substrate capable of polarizing and manufacturing method thereof

The present disclosure relates to a field of liquid crystal display. A color filter substrate capable of polarizing and a manufacturing method thereof are disclosed. The manufacturing method of a color filter substrate comprises: step 1, forming an intermediate layer containing conductor on a substrate; step 2, forming a photoresist layer on the intermediate layer; step 3, forming the photoresist layer into a photoresist pattern with a grating pattern of nanometer size; and step 4, using this photoresist pattern with a grating pattern of nanometer size to etch the underlying intermediate layer to form the intermediate layer into a black matrix and a polarizing structure having grating patterns.

Method for manufacturing micro-structure and optically patternable sacrificial film-forming composition

A micro-structure is manufactured by patterning a sacrificial film, forming an inorganic material film on the pattern, and etching away the sacrificial film pattern through an aperture to define a space having the contour of the pattern. The patterning stage includes the steps of (A) coating a substrate with a composition comprising a cresol novolac resin, a crosslinker, and a photoacid generator, (B) heating to form a sacrificial film, (C) patternwise exposure, (D) development to form a sacrificial film pattern, and (E) forming crosslinks within the cresol novolac resin.

Process for producing article having fine concave and convex structure on surface

The present invention relates to a method for producing an article having a fine concave and convex structure on a surface thereof, comprising the following steps (i) to (iii): (i) step of sandwiching a photocurable composition between a mold having an inverted structure of the fine concave and convex structure on a surface thereof and a substrate; (ii) step of irradiating the photocurable composition with light; and (iii) step of separating the mold from the cured product to obtain an article comprising the substrate having on a surface thereof the cured product having the fine concave and convex structure on a surface thereof, in which the mold contains TiO 2 -containing quartz glass, and at least the step (i) is conducted in a helium gas atmosphere.

Method and device for nanoimprint lithography

The invention relates to an imprinting device for imprinting nano/micro structures. The imprinting device comprises a second expandable cavity constituted in part by a membrane of the stamp. The membrane is flexible and formed in such a way so that when fluid is pumped into the expandable cavity then the membrane expands towards the imprintable substrate and imprints the substrate. The imprinting device is further provided with a force provider, alternatively a first expandable cavity, for forcing a contact part of the substrate to make contact with a matching contact part of the stamp.

Liquid crystal display panel and color filter

A manufacturing method of a color filter including following steps is provided. First, a partition is formed on a substrate to form a plurality of pixel regions on the substrate. Next, a color pigment is provided along a continuous pigment-providing route, so as to form the color pigment on a sequence of pixel regions among the plurality of pixel regions and the partition. The method mentioned above can prevent the unfilled phenomenon of the pigment around the corners of the pixel region. Besides, a liquid crystal display panel having the color filter is also provided.

Mold for nanoimprint lithography and method for forming the same

A mold for the nanoimprint lithography and a method for forming the mold are disclosed. The mold comprises a base socket, a plug chip and an adhesive. The plug chip provides a fine pattern to be transcribed in a top surface thereof. The base socket provides a pocket within which the plug chip is set such that the top surface thereof is pushed out from the top surface of the base socket.

Sulfonium salt, polymer, chemically amplified resist composition using said polymer, and resist patterning process

There is disclosed a sulfonium salt shown by the following general formula (1). There can be a sulfonium salt capable of introducing an acid-generating unit generating an acid having an appropriate acid strength and not impairing adhesion with a substrate into a base polymer; a polymer using the said sulfonium salt; a chemically amplified resist composition using the said polymer as a base polymer; and a patterning process using the said chemically amplified resist composition.

Wet lamination of photopolymerizable dry films onto substrates and compositions relating thereto

The invention is directed to a lamination fluid useful in processes for wet laminating a photopolymerizable film onto circuit board panels or other substrates. The lamination system comprises 1) a dry film photoresist, 2) a laminate comprising i) copper ii) stainless steel iii) non metal on a surface, 3) a lamination fluid and 4) fluid application device on the laminates. The lamination fluid comprises water and a surface energy modification agent. The surface energy modification agent is present in a range between 0.0001 and 3.0 moles/liter, and the pH of the fluid is between 3 and 11.

Imprint method, imprint apparatus, and article manufacturing method

A method of performing an imprint process on each of a plurality of shot regions of a substrate, wherein each shot region includes at least one of at least one valid chip area and at least one invalid chip area, the invalid chip area including an inhibited area in which resin coating is inhibited, the imprint process for a shot region including both the invalid chip area and the valid chip area includes coating the valid chip area of the shot region with the resin, bringing a pattern surface of a mold into contact with the resin, and curing the resin, and in the step of coating, at least the inhibited area of the invalid chip area is not coated with the resin.

Device, thin film transistor, method for manufacturing the device and method for manufacturing the thin film transistor

A problem of the present invention is to provide a device having good characteristics and long life, wherein a functional thin film is formed in a desired region by a coating method; a thin film transistor; a method for producing the device; and a method for producing the thin film transistor. This problem can be solved by a device comprising: a substrate, a first electrode formed on the substrate, a functional thin film formed above the first electrode, and a second electrode disposed above the functional thin film, characterized by further comprising, in a region surrounding the region where the functional thin film is formed, a film containing a compound in which a group containing fluorine and a π-conjugated system are bound together by a cycloalkene structure or a cycloalkane structure.

Actinic ray-sensitive or radiation-sensitive resin composition, and actinic ray-sensitive or radiation-sensitive film and pattern forming method using the same

An actinic ray-sensitive or radiation-sensitive resin composition of the present invention contains a resin (P) which includes a repeating unit (A) having an ionic structural moiety which generates an acid anion by being decomposed due to irradiation with actinic rays or radiation, a repeating unit (B) having a proton acceptor moiety, and a repeating unit (C) having a group which generates an alkali soluble group by being decomposed by the action of an acid, and the resin (P) has at least one repeating unit which is represented by the general formulae (I) to (III) below as the repeating unit (A) (the reference numerals in the general formulae represent the meaning of the description in the scope of the claims and the specifications).

Holographic storage method and article

A method of recording a holographic record is described. According to this method, a holographic recording medium is exposed to a desired pattern, shape, or image from a coherent light source emitting light at one or more wavelengths to which the holographic recording medium is sensitive. In this method, light having the desired pattern, shape, or image to which the holographic recording medium is exposed is diffracted by a spatially homogeneous optical diffraction element so that the holographic recording medium is exposed to a plurality of interfering light beams, thereby forming a holographic record in the holographic recording medium. Holographic recording articles are described that include a holographic recording medium and a spatially homogeneous optical diffraction element.