27-10-2016 дата публикации
Номер: WO2016171397A1
Принадлежит:
The present invention relates to a method for measuring thin film thickness, and comprises a reflectivity acquisition step, a refractive index assumption step, a conversion step, an error checking step, a phase extraction step, a phase restoration step, and a thickness calculation step. The reflectivity acquisition step acquires a light intensity signal of a thin film, and acquires a reflectivity of the thin film through the light intensity signal. The refractive index assumption step assumes the refractive index of air and the refractive index of the thin film to be a real number, and the refractive index of a substrate on which the thin film is formed to be a complex number. The conversion step converts the reflectivity into a normal reflectivity. The error checking step checks whether a first difference value, which is a difference between the maximum value of the normal reflectivity converted in the conversion step and a first reference value, or a second difference value, which is ...
Подробнее