11-05-2017 дата публикации
Номер: US20170133286A1
Принадлежит:
A semiconductor structure includes a device region and a test region. In the device region, first fin spacers cover sidewalls of a first fin structure and have a first height, and a first epitaxy structure is disposed in the first fin structure, which a portion of the first epitaxy structure is above the first fin spacers and having a first width. In the test region, second fin spacers cover sidewalls of the second fin structure and have a second height, and the second height is greater than the first height. A second epitaxy structure is disposed in the second fin structure, and a portion of the second epitaxy structure is above the second fin spacers and having a second width, which the second width is less than the first width. 1. A semiconductor structure , comprising: a first fin structure;', 'first fin spacers covering sidewalls of the first fin structure and having a first height; and', 'a first epitaxy structure disposed in the first fin structure, and a portion of the first epitaxy structure being above the first fin spacers and having a first width; and, 'a device region, comprising a second fin structure, wherein a height of the second fin structure is greater than a height of the first fin structure;', 'second fin spacers covering sidewalls of the second fin structure and having a second height, and the second height of the second fin spacers being greater than the first height of the first fin spacers; and', 'a second epitaxy structure disposed in the second fin structure, a portion of the second epitaxy structure being above the second fin spacers and having a second width, and the second width being less than the first width., 'a test region, comprising2. The semiconductor structure of claim 1 , wherein a top of the first epitaxy structure and a top of the second epitaxy structure are on the same level.3. The semiconductor structure of claim 1 , further comprising cap layers respectively covering the first epitaxy structure and the second epitaxy ...
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