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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Форма поиска

Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 2338. Отображено 100.
08-11-2012 дата публикации

Immersion upper layer film forming composition and method of forming photoresist pattern

Номер: US20120282553A1
Принадлежит: JSR Corp

An immersion upper layer film composition includes a resin and a solvent. The resin forms a water-stable film during irradiation and is dissolved in a subsequent developer. The solvent contains a monovalent alcohol having 6 or less carbon atoms. The composition is to be applied to form a coat on a photoresist film in an immersion exposure process in which the photoresist film is irradiated through water provided between a lens and the photoresist film.

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22-11-2012 дата публикации

Methods of making and using polymers and compositions

Номер: US20120295353A1
Принадлежит: Corning Inc

Disclosed are methods of making and using polymers compositions. The polymer compositions may have monomer/oligomer mixtures that may have at least one silicone monomer or oligomer and at least one non-silicone monomer or oligomer, at least one crosslinker, and/or at least one polymerization initiator. The polymer compositions are cured, after which they may be useful in bioapplications, such as for use as freestanding films or coatings on a substrate, such as a mold, for cell culture.

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06-12-2012 дата публикации

Resin precursor composition and resin obtained by photocuring the same

Номер: US20120309863A1
Автор: Akiko Miyakawa
Принадлежит: Nikon Corp

Disclosed is a resin precursor composition including a bifunctional (meth)acrylate containing a fluorine atom, a bifunctional (meth)acrylate having a fluorene structure, and a photopolymerization initiator, the resin precursor composition in which the formation of precipitates during its storage is suppressed; and a resin obtained from the same. Specifically disclosed is a resin precursor composition that contains a bifunctional fluorine-containing (meth)acrylate (component A); a (meth)acrylate having a fluorene structure (component B); and a photopolymerization initiator (component C), wherein the component B includes a bifunctional (meth)acrylate having a fluorene structure (b-1) and a monofunctional (meth)acrylate having a fluorene structure (b-2) at a molar ratio (b-1):(b-2) of 90:10 to 70:30.

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27-12-2012 дата публикации

Water and oil resistant agent for paper and paper treatment process

Номер: US20120325419A1
Принадлежит: Daikin Industries Ltd

Disclosed is a water and oil resistant agent comprising a fluorine-containing copolymer obtained by copolymerizing a (meth)acrylate monomer having a polyfluoroalkyl group having 1 to 6 carbon atoms, the agent being able to afford a superior water and oil resistance to a paper. The invention also discloses a composition comprising the water and oil resistant agent, a process for treating a paper thereby and a treated paper thereby.

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03-01-2013 дата публикации

Fluorinated compound and fluorinated polymer

Номер: US20130005924A1
Автор: Taiki Hoshino
Принадлежит: Asahi Glass Co Ltd

To provide a fluorinated compound having an R F group with at most 6 carbon atoms, whereby a fluorinated polymer having a highly durable water/oil repellency can be produced, and an environmental load is little, and a fluorinated polymer having a highly durable water/oil repellency and presenting little environmental load, obtainable by polymerizing such a fluorinated compound. A fluorinated compound represented by the following formula (I) and its polymer: CH 2 ═C(M)COOXPhCOO(CH 2 ) m C r F 2r+1   (I) (in the formula (I), M is a hydrogen atom, a methyl group or a halogen atom, X is CHR 1 CH 2 O or CH 2 CHR 1 O, R 1 is a C 1-4 linear or branched alkyl group or CH 2 OR 2 , R 2 is a C 1-4 linear or branched alkyl group, Ph is a phenylene group, m is an integer of from 1 to 4, and r is an integer of from 1 to 6).

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15-08-2013 дата публикации

ACTIVE ENERGY RAY-CURABLE RESIN COMPOSITION, NANO RIDGE/GROOVE STRUCTURE USING SAME AND PRODUCTION METHOD FOR SAID STRUCTURE, AND WATER REPELLENT ARTICLE PROVIDED WITH NANO RIDGE/GROOVE STRUCTURE

Номер: US20130210957A1
Принадлежит: MITSUBISHI RAYON CO., LTD

Disclosed is an activation energy ray-curable resin composition comprising 70 to 95 parts by mass of a multifunctional monomer (A) which has a surface free energy of 37 mJ/mor more when cured and 5 to 30 parts by mass of a fluorine (meth)acrylate (B) which is compatible with the multifunctional monomer (A) (a total content of all monomers in the composition shall be 100 parts by mass), wherein the multifunctional monomer (A) has three or more radical polymerizable functional groups in a molecule and a value of a molecular weight thereof divided by the number of the radical polymerizable functional group (molecular weight/number of radical polymerizable functional group) is 110 to 200, and wherein the fluorine (meth)acrylate (B) has one or more radical polymerizable functional groups in a molecule. 2. The activation energy ray-curable resin composition according to claim 1 , wherein the fluorine (meth)acrylate (B) is a compound havinga fluorine atom-containing site selected from perfluoroalkyl chains and perfluoropolyether chains which have a carbon number of 4 or more,a (meth)acryloyl group that is a radical polymerizable functional group, anda segment which is introduced between the fluorine atom-containing site and the polymerizable functional group for compatibility with the multifunctional monomer (A).3. The activation energy ray-curable resin composition according to claim 2 , wherein the segment introduced for compatibility with the multifunctional monomer (A) comprises any one of an alkylene oxide unit claim 2 , an alkyl unit and an urethane bond.4. The activation energy ray-curable resin composition according to claim 1 , further comprising 20 parts by mass or less of a fluorine (meth)acrylate (C) which is incompatible with the multifunctional monomer (A).5. The activation energy ray-curable resin composition according to claim 4 , wherein the multifunctional monomer (A) claim 4 , the fluorine (meth)acrylate (B) and the fluorine (meth)acrylate (C) are mixed ...

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02-01-2014 дата публикации

SITE SPECIFICALLY INCORPORATED INITIATOR FOR GROWTH OF POLYMERS FROM PROTEINS

Номер: US20140004591A1
Принадлежит: FRANKLIN AND MARSHALL COLLEGE

The present invention is directed towards a protein-polymer composition having a protein with a site-specifically incorporated unnatural amino acid initiator and a covalently attached polymer. 1. A protein-polymer composition comprising:a first protein with a site-specifically incorporated unnatural amino acid having a covalently attached polymer.2. The protein-polymer composition of claim 1 , wherein the unnatural amino acid is site specifically incorporated into the protein one to five times.3. The protein-polymer composition of claim 1 , wherein the incorporated unnatural amino acid is an initiator for a controlled radical polymerization reaction.4. The protein-polymer composition of claim 3 , wherein the incorporated unnatural amino acid is an initiator for atom transfer radical polymerization.7. The protein-polymer composition of claim 6 , wherein X is —N claim 6 , or a salt thereof.8. The protein-polymer composition of claim 6 , wherein X is Br or Cl claim 6 , or a salt thereof.9. The protein-polymer composition of claim 1 , wherein the polymer comprises an incorporated cross-linking moiety.10. The protein-polymer composition of claim 9 , wherein the cross-linking moiety comprises a polymerizable group.11. The protein-polymer composition of claim 1 , wherein the polymer is degradable.12. The protein-polymer composition of claim 1 , wherein the polymer comprises repeating units.13. The protein-polymer composition of claim 12 , wherein the repeating units are selected from the group comprising methacrylates claim 12 , acrylates claim 12 , acrylamides claim 12 , styrenics claim 12 , and acrylamide-styrenics claim 12 , or combinations thereof.14. The protein-polymer composition of claim 1 , wherein the polymer comprises a copolymer.15. The protein-polymer composition of claim 14 , wherein the copolymer comprises repeating units.16. The protein-polymer composition of claim 15 , wherein the repeating units are selected from the group comprising methacrylates claim ...

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06-02-2014 дата публикации

Cloth and textile product

Номер: US20140038483A1
Автор: Ryo Yasumitsu
Принадлежит: Teijin Frontier Co Ltd

An object is to provide a cloth containing an organic fiber, which is excellent in the oil repellency, dirt-removal property by washing and water-absorbing property, and a textile product produced using the cloth. A means for solution is attaching a specific fluorine-containing polymer to a cloth containing an organic fiber, with a quaternary ammonium salt if desired, and thus making the water-absorbing property in accordance with JIS L1018A method (the instillation method) 60 seconds or less and the oil repellency in accordance with AATCC118-1992 grade 4 or higher.

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06-01-2022 дата публикации

CROSSLINKED CATION EXCHANGE POLYMERS, COMPOSITIONS AND USE IN TREATING HYPERKALEMIA

Номер: US20220000906A1
Принадлежит:

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group, pharmaceutical compositions of these polymers, compositions of a linear polyol and a salt of such polymer. Crosslinked cation exchange polymers having beneficial physical properties, including combinations of particle size, particle shape, particle size distribution, viscosity, yield stress, compressibility, surface morphology, and/or swelling ratio are also described. These polymers and compositions are useful to bind potassium in the gastrointestinal tract. 1193-. (canceled)196. The pharmaceutical composition of claim 194 , wherein the cation of the crosslinked cation exchange polymer comprises calcium claim 194 , sodium claim 194 , or a combination thereof.197. The pharmaceutical composition of claim 194 , wherein the cation of the crosslinked cation exchange polymer comprises calcium.198. The pharmaceutical composition of claim 197 , wherein m is in the range of from about 87 to about 94 mol % and the ratio of n:p is from about 0.2:1 to about 7:1.199. The pharmaceutical composition of claim 197 , wherein m is in the range of from about 85 to 93 mol % claim 197 , n is in the range of from about 1 to about 10 mol % claim 197 , and p is in the range of from about 1 to about 10 mol %.200. The pharmaceutical composition of claim 194 , wherein the linear sugar alcohol is selected from the group consisting of arabitol claim 194 , erythritol claim 194 , glycerol claim 194 , maltitol claim 194 , mannitol claim 194 , ribitol claim 194 , sorbitol claim 194 , xylitol claim 194 , threitol claim 194 , galactitol claim 194 , isomalt claim 194 , iditol claim 194 , lactitol and combinations thereof.201. The pharmaceutical composition of claim 200 , wherein the linear sugar alcohol is selected from the group consisting of arabitol claim 200 , erythritol claim 200 , glycerol claim 200 , maltitol claim 200 , mannitol claim 200 , ribitol claim 200 , sorbitol claim ...

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07-01-2016 дата публикации

WATER-REPELLENT AND OIL-REPELLENT AGENT

Номер: US20160002516A1
Принадлежит: TAIWAN FLUORO TECHNOLOGY CO., LTD.

A water-repellent and oil-repellent agent is polymerized with a fluorine-containing monomer, a non-fluorinated branched monomer, a non-fluorinated crosslinking monomer, and an olefin monomer. Whereby, the agent provides good water-repellent and oil-repellent effect, and enhances adhesion problem on a roller. 1. A water-repellent and oil-repellent agent , comprising:a fluorine-containing monomer;a non-fluorinated branched monomer;a non-fluorinated crosslinking monomer; andan olefin monomer.3. The water-repellent and oil-repellent agent of claim 1 , wherein the non-fluorinated branched monomer is of the formula HC═CACOOA′ claim 1 , whereA is hydrogen atom or methyl;{'sub': n', 'm, 'sup': ˜', '˜, 'A′ is branched primary to tertiary alkyl, and is of the formula CH, where n=310, m=730.'}4. The water-repellent and oil-repellent agent of claim 3 , wherein the non-fluorinated branched monomer is selected from of the group consisting of tert-Butyl methacrylate claim 3 , iso-butyl methacrylate claim 3 , 2-ethylhexyl methacrylate claim 3 , n-nonyl acrylate claim 3 , isobornyl acrylate claim 3 , isobornyl methacrylate claim 3 , cyclohexyl methacrylate claim 3 , benzyl methacrylate claim 3 , and benzyl acrylate.5. The water-repellent and oil-repellent agent of claim 1 , wherein the non-fluorinated crosslinking monomer has two or more reactive functional groups.6. The water-repellent and oil-repellent agent of claim 5 , wherein the non-fluorinated crosslinking monomer is selected from the group consisting of 3-chloro-2-hydroxypropyl methacrylate claim 5 , 2-hydroxyethyl methacrylate claim 5 , 2-hydroxypropyl methacrylate claim 5 , epoxypropyl methacrylate claim 5 , 2 claim 5 ,3-dihydroxypropyl methacrylate claim 5 , ethylene glycol methyl ether methacrylat claim 5 , ethyl methacrylate claim 5 , diacetone acrylamide claim 5 , 4-hydroxybutyl acrylate claim 5 , 1 claim 5 ,4-cyclohexane dimethanol monoacrylate claim 5 , and 4-hydroxybutyl acrylate glycidyl ether.7. The water- ...

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02-01-2020 дата публикации

ULTRA-HIGH DK MATERIAL

Номер: US20200002452A1
Автор: Bonafini, JR. James A.
Принадлежит: Acuity Polymers, Inc.

A method of producing an ultra-high Dk material includes contacting and reacting a fluoroalkyl methacrylate; an alkyl glycol dimethacrylate; a hydrophilic agent, such as methacrylic acid; a hydroxyalkyl tris(trimethylsiloxy)silane; a hydroxyalkyl terminated polydimethylsiloxane; and styrylethyltris(trimethylsiloxy)silane. The reaction is conducted within an inert atmosphere at a pressure of at least 25 pounds per square inch (PSI) and for a period of time and at a temperature sufficient to produce the ultra-high Dk material. 2. The method of wherein the fluoroalkly methacrylate is hexafluoroisopropyl methacrylate; the alkyl glycol dimethacrylate is neopentyl glycol dimethacrylate; the hydroxyalkyl tris(trimethylsiloxy)silane is 3-methacryloyloxypropyl tris(trimethylsiloxy)silane; the hydroxyalkyl terminated polydimethylsiloxane is 4-methacryloxybutyl terminated polydimethylsiloxane; the hydrophilic agent is methacrylic acid.3. The method of wherein the styrylethyltris(trimethylsiloxy)silane comprises 14% of the material claim 2 , by weight.4. The method of wherein the styrylethyltris(trimethylsiloxy)silane comprises between 7% and 20% of the material claim 1 , by weight.5. The method of wherein the styrylethyltris(trimethylsiloxy)silane comprises 14% of the material claim 4 , by weight.6. The method of wherein the material has a Dk value greater than 175.7. The method of wherein the reaction is conducted under a nitrogen claim 1 , argon or helium atmosphere.8. The method of wherein the reaction is conducted between 25 psi and 1 claim 1 ,000 psi.9. The method of wherein the reaction is conducted within a vessel wherein the ultra-high Dk material is formed in the shape of the vessel.10. The method of wherein vessel is selected whereby the high Dk material is formed as a lens claim 9 , blank or rod.11. The method of wherein the vessel is constructed of a vessel material that is permeable to the inert gas comprising the inert atmosphere.12. The method of wherein the ...

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27-01-2022 дата публикации

Acrylic Copolymer, Method for Manufacturing Same, and Acrylic Copolymer Composition Comprising Same

Номер: US20220025086A1
Принадлежит: LG CHEM, LTD.

Provided is an acryl-based copolymer, and more particularly, an acryl-based copolymer including a main monomer-derived repeating unit and a polyfunctional monomer-derived moiety, wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit, the polyfunctional monomer includes a vinyl group or an allyl group, and the polyfunctional monomer-derived moiety is included in an amount of 0.0005 to 1 part by weight based on 100 parts by weight of the total main monomer-derived repeating unit. 1. An acryl-based copolymer , comprising a main monomer-derived repeating unit and a polyfunctional monomer-derived moiety ,wherein the main monomer-derived repeating unit includes a (meth)acrylic acid alkyl ester monomer-derived repeating unit, a (meth)acrylic acid alkoxy alkyl ester monomer-derived repeating unit, and a crosslinkable monomer-derived repeating unit,the polyfunctional monomer of the polyfunctional monomer-derived moiety, includes a vinyl group or an allyl group, andthe polyfunctional monomer-derived moiety is included in an amount of 0.0005 to 1 part by weight based on 100 parts by weight of the total main monomer-derived repeating unit.2. The acryl-based copolymer of claim 1 , wherein the polyfunctional monomer is at least one selected from the group consisting of divinylbenzene claim 1 , 1 claim 1 ,4-divinyloxybutane claim 1 , divinyl sulfone claim 1 , diallylphthalate claim 1 , diallyl acrylamide claim 1 , triallyl(iso)cyanurate claim 1 , triallyl trimellitate claim 1 , hexanediol diacrylate claim 1 , ethylene glycol dimethacrylate claim 1 , diethylene glycol methacrylate claim 1 , triethylene glycol dimethacrylate claim 1 , trimethylene propane trimethacrylate claim 1 , 1 claim 1 ,3-butanediol methacrylate claim 1 , 1 claim 1 ,6-hexanediol dimethacrylate claim 1 , pentaerythritol ...

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10-01-2019 дата публикации

Pressure-sensitive adhesive tape, pressure-sensitive adhesive tape for affixing component for electronic appliance, and transparent pressure-sensitive adhesive tape for optical use

Номер: US20190010366A1
Принадлежит: Sekisui Chemical Co Ltd

The present invention aims to provide an adhesive tape excellent in resistance against sebum to be able to maintain its adhesive force even when applied to a part frequently touched with human hands, and an adhesive tape for fixing electronic device component and a transparent adhesive tape for optical use each provided with the adhesive tape. The present invention relates to an adhesive tape including an adhesive layer containing an acrylic adhesive, the adhesive layer having a swelling ratio of 100% or more and 130% or less after immersion in oleic acid under the conditions of a temperature of 60° C. and a humidity of 90% for 24 hours.

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14-01-2016 дата публикации

Photoresist Layer and Method

Номер: US20160013041A1

A system and method for middle layers is provided. In an embodiment the middle layer comprises a floating component in order to form a floating region along a top surface of the middle layer after the middle layer has dispersed. The floating component may be a polymer with a floating group incorporated into the polymer. The floating group may comprise a fluorine atom.

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21-01-2016 дата публикации

Fluorine-containing oligomer, nano-silica composite particles using the same, and methods for producing both

Номер: US20160017072A1
Принадлежит: Hirosaki University NUC, Unimatec Co Ltd

Disclosed is a fluorine-containing oligomer comprising a copolymer of a fluoroalkyl alcohol (meth)acrylic acid derivative of the formula: C n F 2n+1 (CH 2 ) d OCOCR═CH 2 [I], wherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 10, and d is an integer of 1 to 6; and a (meth)acrylic acid derivative of the formula: (CH 2 ═CRCO) m R′ [II], wherein R is a hydrogen atom or a methyl group, m is 1, 2, or 3; and when m is 1, R′ is —OH group, NH 2 group that is unsubstituted or mono- or di-substituted with an alkyl group having 1 to 6 carbon atoms, or a monovalent group derived from an alkylene glycol or polyalkylene glycol group containing an alkylene group having 2 or 3 carbon atoms; when m is 2 or 3, R′ is a divalent or trivalent organic group derived from a diol or triol. The copolymerization reaction is performed using a hydrocarbon-based peroxide or azo compound polymerization initiator. Also disclosed are nano-silica composite particles formed as a condensate of the fluorine-containing oligomer and an alkoxysilane with nano-silica particles.

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17-01-2019 дата публикации

LIQUID REPELLENT COMPOSITION, METHOD FOR ITS PRODUCTION, AND METHOD FOR PRODUCING OIL RESISTANT PAPER

Номер: US20190016840A1
Принадлежит: AGC Inc.

To provide a liquid repellent composition whereby a treated article excellent in liquid repellency is obtainable, which is excellent in stability and does not have such a problem as an odor attributable to ammonia or an organic amine; a method for its production; and a method for producing oil resistant paper. The liquid repellent composition comprises a copolymer (A) having structural units derived from a monomer (a) represented by the formula R-Q-X—C(O)C(R)═CH(Ris a Cperfluoroalkyl group, Q is a divalent hydrocarbon group that does not contain a fluorine atom; X is —O— or NH—, and R is a hydrogen atom, a methyl group or a chlorine atom) and structural units derived from a monomer (b) having an anionic group, alkali metal ions and an aqueous medium; wherein the mass average molecular weight of the copolymer (A) is at most 84,000; at least some of counterions to the anionic groups are alkali metal ions; and the molar ratio of alkali metal ions to anionic groups in the liquid repellent composition is from 0.6 to 1.29. 2. The liquid repellent composition according to claim 1 , wherein the copolymer (A) is particles having an average particle size of from 40 to 250 nm.3. The liquid repellent composition according to claim 1 , wherein in 100 mass % of all structural units in the copolymer (A) claim 1 , the proportion of structural units based on the monomer (a) is from 30 to 99 mass % claim 1 , and the proportion of structural units based on the monomer (b) is from 1 to 50 mass %.4. The liquid repellent composition according to claim 1 , wherein R in the formula (I) is a methyl group.5. The liquid repellent composition according to claim 1 , wherein the anionic group which the monomer (b) has claim 1 , is a carboxy group.6. The liquid repellent composition according to claim 5 , wherein the monomer (b) is (meth)acrylic acid.8. The liquid repellent composition according to claim 7 , wherein the copolymer (A) is composed solely of structural units based on the monomer (a) ...

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28-01-2016 дата публикации

POLYMER COMPOSITIONS WITH ENHANCED RADIOPACITY

Номер: US20160024239A1
Принадлежит:

Radiopaque polymer compositions and methods for making the compositions are provided. These radiopaque polymer compositions include polymer compositions comprising a crosslinked polymer network, the network comprising a first repeating unit derived from a monofunctional monomer and a second repeating unit derived from a crosslinker monomer or oligomer having more than two polymerizable groups. Devices formed from radiopaque polymer compositions are also provided. 2. The polymer composition of claim 1 , wherein the branched monomer or oligomer of the second reagent comprises at least three (meth)acrylate claim 1 , (meth)acrylamide or styryl groups.3. The polymer composition of claim 2 , wherein the branched monomer or oligomer of the second reagent comprises from 3 to 20 terminal acrylate groups.43. The polymer composition of any of - claims 1 , wherein the branched monomer or oligomer of the second reagent comprises a central portion Rlinked to at least two end portions claims 1 , Yand Y claims 1 , at least one of the end portions being branched.6. The polymer composition of wherein one of Yand Yis according to Formula 20 or 21 and the other of Yand Yis selected from the group consisting of —COCl —COH claim 4 , —COR claim 4 , —CONRR claim 4 , Ris a C-Calkyl group and each of R-Ris independently hydrogen or a C-Calkyl group.76. The polymer composition of any of - claims 4 , wherein the central portion Ris linked to the end portions Yand Ythrough linker L claims 4 , wherein Lis a single bond claims 4 , —(CH)— claims 4 , —(HCCH)— claims 4 , —O— claims 4 , —S— claims 4 , —SO— claims 4 , —SO— claims 4 , —SO— claims 4 , —OSO— claims 4 , —NR— claims 4 , —CO— claims 4 , —COO— claims 4 , —OCO— claims 4 , —OCOO— claims 4 , —CONR— claims 4 , —NRCO— claims 4 , —OCONR— claims 4 , —NRCOO— claims 4 , or —NRCONR{'sup': 3', '9, 'sub': 1', '10, 'and each of R-Ris independently hydrogen or C-Calkyl.'}87. The polymer composition of any of - wherein Ris C-Calkylene.10. The polymer ...

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25-01-2018 дата публикации

FLUORINE-CONTAINING COPOLYMER AND SURFACE-MODIFYING AGENT COMPRISING THE SAME AS ACTIVE INGREDIENT

Номер: US20180022934A1
Принадлежит:

A fluorine-containing copolymer that is a copolymer of: a polyfluoroalkyl alcohol (meth)acrylate represented by the general formula: 1: A fluorine-containing copolymer that is a copolymer of: {'br': None, 'sub': n', '2n+1', '2', '2', 'a', '2', '2', 'b', '2', '2', 'c', '2, 'CF(CHCF)(CFCF)(CHCH)OCOCR═CH\u2003\u2003[I]'}, 'a polyfluoroalkyl alcohol (meth)acrylate represented by the general formulawherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 6, a is an integer of 1 to 4, b is an integer of 1 to 3, and c is an integer of 1 to 3;benzyl (meth)acrylate or styrene; and {'br': None, 'sub': 2', '2', 'd', 'e', '3-e, 'sup': 1', '2, 'CH═CRCOO(CH)Si(OR)R\u2003\u2003[II]'}, 'a Si group-containing crosslinkable (meth)acrylate represented by the general formula{'sup': '2', 'wherein R is a hydrogen atom or a methyl group, R1 and Rare each an alkyl group having 1 to 10 carbon atoms, d is an integer of 1 to 3, and e is an integer of 1 to 3.'}2: The fluorine-containing copolymer according to claim 1 , which has a weight average molecular weight Mw of 10 claim 1 ,000 to 1 claim 1 ,000 claim 1 ,000.3: The fluorine-containing copolymer according to claim 1 , wherein the fluorine-containing monomer [I] and the benzyl (meth)acrylate or styrene are copolymerized at a weight ratio of 1 to 99:99 to 1.4: The fluorine-containing copolymer according to claim 1 , wherein the fluorine-containing monomer [I] and the benzyl (meth)acrylate or styrene are copolymerized at a weight ratio of 50 to 95:50 to 5.5: The fluorine-containing copolymer according to claim 1 , wherein Si group-containing crosslinkable monomer [II] is copolymerized at a ratio of 0.01 to 30 wt. % in the fluorine-containing copolymer6: A surface-modifying agent comprising the fluorine-containing polymer according to as an active ingredient.7: The surface-modifying agent according to claim 6 , wherein the agent is prepared as an organic solvent solution.8: The surface-modifying agent according to claim 7 , ...

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25-01-2018 дата публикации

POLYMER AND POSITIVE RESIST COMPOSITION

Номер: US20180024430A1
Автор: Hoshino Manabu
Принадлежит: ZEON CORPORATION

Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate in a state of low irradiation with ionizing radiation or the like and a positive resist composition that can favorably form a high-resolution pattern. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and the proportion of components having a molecular weight of less than 6,000 in the polymer is no greater than 0.5%. The positive resist composition contains the aforementioned polymer and a solvent. 1. A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit , whereina proportion of components having a molecular weight of less than 6,000 is no greater than 0.5%.2. The polymer according to claim 1 , whereina proportion of components having a molecular weight of less than 10,000 is no greater than 0.5%.3. The polymer according to claim 1 , whereina proportion of components having a molecular weight of greater than 80,000 is at least 15%.4. The polymer according to claim 1 , having a weight average molecular weight (Mw) of at least 55 claim 1 ,000.5. A positive resist composition comprising the polymer according to and a solvent. The present disclosure relates to a polymer and a positive resist composition, and in particular relates to a polymer that is suitable for use as a positive resist and a positive resist composition that contains this polymer.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam, or short-wavelength light, such as ultraviolet light, are conventionally used as main chain scission-type positive resists in fields such as semiconductor production. (Hereinafter, the term “ionizing radiation or the like” is used to refer collectively to ionizing radiation and short-wavelength light.)PTL 1 discloses one example of a main chain scission-type positive resist having high sensitivity. The ...

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25-01-2018 дата публикации

POLYMER AND POSITIVE RESIST COMPOSITION

Номер: US20180024431A1
Автор: Hoshino Manabu
Принадлежит: ZEON CORPORATION

Provided are a polymer that can be favorably used as a positive resist having high sensitivity and a positive resist composition that can favorably form a resist film having excellent sensitivity. The polymer includes an α-methylstyrene unit and a methyl α-chloroacrylate unit, and the proportion of components having a molecular weight of greater than 80,000 in the polymer is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent. 1. A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit , whereina proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%.2. The polymer according to claim 1 , having a molecular weight distribution (Mw/Mn) of at least 1.25.3. A positive resist composition comprising the polymer according to and a solvent.4. A positive resist composition comprising the polymer according to and a solvent. The present disclosure relates to a polymer and a positive resist composition, and in particular relates to a polymer that is suitable for use as a positive resist and a positive resist composition that contains this polymer.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam, or short-wavelength light, such as ultraviolet light, are conventionally used as main chain scission-type positive resists in fields such as semiconductor production. (Hereinafter, the term “ionizing radiation or the like” is used to refer collectively to ionizing radiation and short-wavelength light.)PTL 1 discloses one example of a main chain scission-type positive resist having high sensitivity. The disclosed positive resist is formed from an α-methylstyrene-methyl α-chloroacrylate copolymer including an α-methylstyrene unit and a methyl α-chloroacrylate unit.PTL 1: JP H8-3636 BIn order to refine and increase the resolution of a pattern obtained using a ...

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25-01-2018 дата публикации

POLYMER AND POSITIVE RESIST COMPOSITION

Номер: US20180024432A1
Автор: Hoshino Manabu
Принадлежит: ZEON CORPORATION

Provided are a polymer that can be favorably used as a positive resist having a low film reduction rate under low irradiation, a high y value, and high sensitivity, and a positive resist composition that can efficiently form a high-resolution pattern. The polymer includes an a-methylstyrene unit and a methyl α-chloroacrylate unit, and has a molecular weight distribution (Mw/Mn) of less than 1.48. In the polymer, the proportion of components having a molecular weight of less than 6,000 is no greater than 0.5% and the proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%. The positive resist composition contains the aforementioned polymer and a solvent. 1. A polymer comprising an α-methylstyrene unit and a methyl α-chloroacrylate unit , whereinthe polymer has a molecular weight distribution (Mw/Mn) of less than 1.48,a proportion of components having a molecular weight of less than 6,000 is no greater than 0.5%, anda proportion of components having a molecular weight of greater than 80,000 is no greater than 6.0%.2. The polymer according to claim 1 , whereina proportion of components having a molecular weight of less than 10,000 is no greater than 0.8%.3. The polymer according to claim claim 1 , having a weight average molecular weight (Mw) of at least 30 claim 1 ,000.4. The polymer according to claim 1 , whereina proportion of components having a molecular weight of greater than 100,000 is at least 0.5%.5. A positive resist composition comprising the polymer according to and a solvent. The present disclosure relates to a polymer and a positive resist composition, and in particular relates to a polymer that is suitable for use as a positive resist and a positive resist composition that contains this polymer.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam, or short-wavelength light, such as ultraviolet light, ...

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28-01-2021 дата публикации

POLYMER COMPOUND, COMPOSITION, INSULATING LAYER, AND ORGANIC THIN FILM TRANSISTOR

Номер: US20210024674A1
Автор: Yahagi Isao, YOKOI Yuki
Принадлежит: Sumitomo Chemical Company, Limited

Provided is an organic thin film transistor having a high carrier mobility. Provided is a polymer compound, including: a repeating unit represented by the following formula (1); and at least two repeating units, the repeating units being at least one selected from the group consisting of a repeating unit having a blocked isocyanato group and a repeating unit having a blocked isothiocyanato group, 4. A composition claim 1 , comprising the polymer compound according to .5. The composition according to claim 4 , further comprising at least one compound selected from the group consisting of a low molecular compound comprising at least two active hydrogens and a polymer compound comprising at least two active hydrogens.6. A cured film of the composition according to .7. An electronic device claim 6 , comprising the film according to .8. The electronic device according to claim 7 , wherein the electronic device is an organic thin film transistor.9. An organic thin film transistor claim 6 , comprising the film according to as a gate insulating layer. The present invention relates to a polymer compound to be used for insulating layers such as a gate insulating layer of an organic thin film transistor, a composition comprising the polymer compound, and an insulating layer and an organic thin film transistor using the polymer compound or the composition.Organic thin film field effect transistors (organic thin film transistors) using an organic material ran he manufactured by a manufacturing process at lower temperatures than inorganic field effect transistors using an inorganic material. Therefore, a plastic substrate or a plastic film can be used as a substrate of an organic thin film transistor, and this allows the manufacturing of a transistor that is lighter in weight and more resistant to breakage.In some cases, an organic thin film transistor can be manufactured by applying and printing of a liquid (a solution, a dispersion liquid) comprising an organic material. In ...

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28-01-2021 дата публикации

POSITIVE RESIST COMPOSITION FOR EUV LITHOGRAPHY AND METHOD OF FORMING RESIST PATTERN

Номер: US20210026244A1
Автор: Hoshino Manabu
Принадлежит: ZEON CORPORATION

Provided is a positive resist composition for EUV lithography that can form a resist film having high sensitivity to extreme ultraviolet light. The positive resist composition contains a solvent and a copolymer that includes a monomer unit (A) represented by general formula (I) and a monomer unit (B) represented by general formula (II). In the formulae, Rindicates an organic group including 5 or more fluorine atoms, le indicates a hydrogen atom, a fluorine atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, Rindicates a hydrogen atom, an unsubstituted alkyl group, or a fluorine atom-substituted alkyl group, p and q are each an integer of 0 to 5, and p+q=5. 2. The positive resist composition for EUV lithography according to claim 1 , wherein Ris a fluoroalkyl group.3. The positive resist composition for EUV lithography according to claim 1 , wherein a total number of fluorine atoms included in the monomer unit (A) and the monomer unit (B) is 5 or 6.4. A method of forming a resist pattern comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist film using the positive resist composition for EUV lithography according to ;'}exposing the resist film using extreme ultraviolet light;developing the resist film that has been exposed; andrinsing the resist film that has been developed, wherein the rinsing is performed using a rinsing liquid having a surface tension of 20.0 mN/m or less.5. The method of forming a resist pattern according to claim 4 , wherein the rinsing liquid has a solubility parameter of less than 6.8 (cal/cm).6. The method of forming a resist pattern according to claim 4 , wherein the developing is performed using a developer having a surface tension of 17.0 mN/m or less.7. The method of forming a resist pattern according to claim 4 , wherein the developer and the rinsing liquid each comprise a different fluorine-containing solvent relative to one another. The present disclosure relates to a positive resist ...

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24-02-2022 дата публикации

HOLLOW FINE PARTICLE PRODUCTION METHOD AND HOLLOW FINE PARTICLES

Номер: US20220056178A1
Принадлежит: DAIKIN INDUSTRIES, LTD.

A method for producing hollow fine particles containing a fluorine-containing resin and having a large average particle size. The method includes a step A of providing hollow fine particles by dispersing a solution containing a fluorine-containing monomer, an oil-soluble initiator, and a non-polymerizable solvent in water containing a fluorine-containing surfactant and thereby polymerizing the fluorine-containing monomer. Also disclosed are hollow fine particles including a fluorine-containing resin and having an average particle size of 70 nm or greater and 10 μm or smaller. The hollow fine particles each have a porosity of 5% by volume or higher, and the fluorine-containing resin contains a polymerized unit based on a fluorine-containing monomer and a polymerized unit based on a crosslinkable monomer. 1. A method for producing hollow fine particles containing a fluorine-containing resin , the method comprisinga step A of providing hollow fine particles by dispersing a solution containing a fluorine-containing monomer, an oil-soluble initiator, and a non-polymerizable solvent in water containing a fluorine-containing surfactant and thereby polymerizing the fluorine-containing monomer.2. The production method according to claim 1 , further comprising a step B of removing the non-polymerizable solvent from the hollow fine particles obtained in the step A.3. The production method according to claim 1 ,wherein the solution further contains a crosslinkable monomer, andthe step A includes polymerizing the fluorine-containing monomer and the crosslinkable monomer.4. The production method according to claim 1 ,wherein the crosslinkable monomer comprises a multifunctional monomer containing two or more polymerizable double bonds.5. The production method according to claim 1 ,wherein the fluorine-containing monomer comprises at least one selected from the group consisting of a fluorine-containing acrylic monomer and a fluorine-containing styrene monomer.6. The production ...

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25-02-2016 дата публикации

COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20160052859A1
Принадлежит: Sumitomo Chemical Company, Limited

A compound having a group represented by formula (Ia): 2. The compound according to claim 1 , wherein{'sup': '5', 'sub': '18', 'the ring W represents an unsubstitued Cto Calicyclic hydrocarbon group.'}3. The compound according to claim 1 , whereinthe alicyclic hydrocarbon group is a cyclopentanetriyl group, a cyclohexanetriyl group, an adamantanetriyl group or a norbornantriyl group.5. A resin comprising a structural unit derived from the compound according to .6. The resin according to claim 5 ,{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'which comprises 50% by mole or more of the structural unit derived from the compound according to with respect to the total structural units of the resin.'}7. The resin according to claim 5 ,{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'which consists of the structural unit derived from the compound according to with respect to a total structural units of the resin.'}8. A resist composition comprising{'claim-ref': {'@idref': 'CLM-00005', 'claim 5'}, 'the resin of ,'}a resin including a structural unit having an acid-labile group, andan acid generator.9. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00008', 'claim 8'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer. This application claims priority to Japanese Application No. 2014-170798 filed on Aug. 25, 2014. The entire disclosures of Japanese Application No. 2014-170798 is incorporated hereinto by reference.1. Field of the InventionThe present invention relates to a compound, a resin, a resist composition and a method for producing resist pattern.2. Related ArtA method of producing the compound below is described in Patent document of JP2008-214604A.As a material for resist protection film, a resin that has a ...

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25-02-2021 дата публикации

FREESTANDING ION GEL AND METHOD FOR PREPARING THE SAME

Номер: US20210054127A1
Принадлежит:

Disclosed is preparation of a freestanding ion gel having high stability and high ionic conductivity based on surface-activity ionic liquids. Further, disclosed is a solid electrolyte using the ion gel. A method for preparing the freestanding ion gel include mixing a surface-activity ionic liquid having an alkyl group having 8 or greater carbon atoms, a crosslinking agent, water and oil with each other to form a bicontinuous microemulsion mixture; ii) adding an initiator to the mixture; and iii) curing the mixture using ultraviolet (UV) or thermal energy to form a freestanding ion gel. 1. A method for preparing a freestanding ion gel , the method comprising:i) mixing a surface-activity ionic liquid having an alkyl group having 8 or greater carbon atoms, a crosslinking agent, water and oil with each other to form a bicontinuous microemulsion mixture;ii) adding an initiator to the mixture; andiii) curing the mixture using ultraviolet (UV) or thermal energy to form a freestanding ion gel.2. The method of claim 1 , wherein i) further includes adding a surfactant to the mixture.3. The method of claim 1 , wherein the double continuity microemulsion mixture forms a percolation structure in which all of ion conductive domains are connected to each other.4. The method of claim 1 , wherein the surface-activity ionic liquid includes a combination of a cation and an anion claim 1 ,wherein the cation includes one selected from a group consisting of an imidazolium-based cation; a pyridinium-based cation; a piperidinium-based cation; a pyrrolidinium-based cation; an ammonium-based cation; a phosphonium-based cation; and a sulfonium-based cation,wherein the anion includes one selected from a group consisting of chloride; bromide; iodide; hexafluorophosphate; tetrafluoroborate; hexafluoroantimonate; trifluoromethanesulfonate; methyl sulfate; ethyl sulfate; acetate; thiocyanate; dicyanamide; and bis(trifluoromethylsulfonyl)amide.5. The method of claim 1 , wherein the crosslinking ...

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25-02-2021 дата публикации

RESIST COMPOSITION AND RESIST FILM

Номер: US20210055654A1
Автор: Hoshino Manabu
Принадлежит: ZEON CORPORATION

Provided are a resist composition that can improve coatability (coating film formability) with respect to a substrate in spin coating and close adherence of a resist film and that can form a good pattern, and a resist film in which a good pattern is formed. The resist composition contains a polymer, a solvent, and an aromatic vinyl monomer, and has a content of the aromatic vinyl monomer relative to the polymer of not less than 10 mass ppm and not more than 30,000 mass ppm. 1. A resist composition comprising a polymer , a solvent , and an aromatic vinyl monomer , whereincontent of the aromatic vinyl monomer relative to the polymer is not less than 10 mass ppm and less than 30,000 mass ppm.2. The resist composition according to claim 1 , wherein the aromatic vinyl monomer is an α-methylstyrene derivative.3. The resist composition according to claim 1 , further comprising an α-halogeno(meth)acrylic acid ester monomer claim 1 , whereincontent of the α-halogeno(meth)acrylic acid ester monomer relative to the polymer is not less than 5 mass ppm and not more than 2,000 mass ppm.4. The resist composition according to claim 1 , wherein the polymer includes an α-methylstyrene monomer unit and a methyl α-chloroacrylate monomer unit.5. A resist film formed on a substrate using the resist composition according to . The present disclosure relates to a resist composition and a resist film.Polymers that display increased solubility in a developer after undergoing main chain scission through irradiation with ionizing radiation, such as an electron beam or extreme ultraviolet light (EUV), or short-wavelength light, such as ultraviolet light, are conventionally used as main chain scission-type positive resists in fields such as semiconductor production. (Hereinafter, the term “ionizing radiation or the like” is used to refer collectively to ionizing radiation and short-wavelength light.)PTL (Patent Literature) 1 discloses one example of a main chain scission-type positive resist ...

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12-03-2015 дата публикации

FLOURINE-CONTAINING HIGHLY BRANCHED POLYMER AND POLYCARBONATE RESIN COMPOSITION CONTAINING THE SAME

Номер: US20150072128A1
Принадлежит:

There is provided a novel fluorine-containing highly branched polymer which imparts water repellency and oil repellency to the polycarbonate resin, further is excellent in miscibility and dispersibility in the resin, and can maintain luxurious feeling of the resin, such as transparency and gloss feeling. A fluorine-containing highly branched polymer obtained by polymerizing a monomer A having in a molecule a bisphenol A structure and two or more radical-polymerizable double bonds, and a monomer B having in a molecule a fluoroalkyl group and at least one radical-polymerizable double bond, in the presence of a polymerization initiator C in an amount of 5 to 200 mol %, based on the number of moles of the monomer A; a resin composition comprising the fluorine-containing highly branched polymer and a polycarbonate resin; and a surface-modified film obtained from the resin composition. 1. A fluorine-containing highly branched polymer obtained by polymerizing a monomer A having in a molecule a bisphenol A structure and two or more radical-polymerizable double bonds , and a monomer B having in a molecule a fluoroalkyl group and at least one radical-polymerizable double bond , in the presence of a polymerization initiator C in an amount of 5 to 200 mol % , based on the number of moles of the monomer A.2. The fluorine-containing highly branched polymer according to claim 1 , whereinthe monomer A is a compound having either a vinyl group or a (meth)acrylic group or both a vinyl group and a (meth)acrylic group.3. The fluorine-containing highly branched polymer according to claim 2 , whereinthe monomer A is a divinyl compound or a di(meth)acrylate compound.5. The fluorine-containing highly branched polymer according to claim 1 , whereinthe monomer B is a compound having at least one of either a vinyl group or a (meth)acrylic group.9. The fluorine-containing highly branched polymer according to claim 1 , whereinthe polymerization initiator C is an azo-based polymerization ...

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17-03-2016 дата публикации

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20160075806A1
Принадлежит: Sumitomo Chemical Company, Limited

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: 3. The resist composition according to claim 2 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}7. The resist composition according to claim 6 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).8. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.11. The resin according to claim 10 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187602 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187602 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2005-239828A.The disclosure provides following inventions of <1> to <13>.<1> A resist composition includes(A1) a resin which includes a structural unit represented by formula (a4):wherein Rrepresents a ...

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15-03-2018 дата публикации

CROSSLINKED POLYFLUOROACRYLIC ACID AND PROCESSES FOR THE PREPARATION THEREOF

Номер: US20180072833A1
Принадлежит:

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group and being a polymerization product of at least three monomers. Pharmaceutical compositions of these polymers are useful to bind potassium in the gastrointestinal tract. 3. The polymer of wherein Ais protected carboxylic claim 1 , phosphonic claim 1 , or phosphoric.4. The polymer of any one of to wherein the polymerization mixture further comprises a polymerization initiator.5. A crosslinked cation exchange polymer in an acid or salt form claim 1 , the cation exchange polymer comprising a reaction product of the crosslinked polymer of any one of to and a hydrolysis agent.6. The polymer of any one of to wherein Ais carboxylic claim 1 , phosphonic claim 1 , or phosphoric.7. The polymer of any one of to wherein the polymerization mixture does not comprise a polymerization initiator.10. The polymer of any one of and to wherein Xof Formulae 3 or 33 is either (a) an ether moiety selected from either —(CH)—O—(CH)— or —(CH)—O—(CH)—O—(CH)wherein d and e are independently an integer of 1 through 5 claim 1 , or (b) an amide moiety of the formula —C(O)—NH—(CH)—NH—C(O)— wherein p is an integer of 1 through 8 claim 1 , or (c) Formulae 3 or 33 is a mixture of structural units having the ether moiety and the amide moiety.11. The polymer of wherein Xis the ether moiety claim 10 , d is an integer from 1 to 2 claim 10 , and e is an integer from 1 to 3.12. The polymer of wherein Xis the amide moiety and p is an integer of 4 to 6.13. The polymer of any one of and to wherein Xis alkylene.14. The polymer of wherein Xis ethylene claim 13 , propylene claim 13 , butylene claim 13 , pentylene claim 13 , or hexylene.15. The polymer of wherein Xis butylene.16. The polymer of any one of claim 13 , to and to wherein Xis phenylene.17. The polymer of any one of claim 13 , to and to wherein Rand Rare hydrogen.18. The polymer of any one of claim 13 , to and to wherein Ais protected ...

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15-03-2018 дата публикации

WATER REPELLENT COMPOSITION, METHOD FOR PRODUCING WATER REPELLENT COMPOSITION, AND ARTICLE

Номер: US20180072932A1
Принадлежит: Asahi Glass Company, Limited

To provide a water repellent composition whereby it is possible to obtain an article having excellent hot water repellency and dry soil resistance, a method for producing the water repellent composition, and an article excellent in hot water repellency and dry soil resistance. The water repellent composition comprises a copolymer having structural units based on monomer (a), structural units based on monomer (b), and structural units based on monomer (c) in specific proportions, and an aqueous medium. Monomer (a): compound represented by R-Q-Z—C(O)C(R)═CH(R: Cperfluoroalkyl group, Q: divalent hydrocarbon group or single bond, Z: —O— or —NH—, R: methyl group or chlorine atom). Monomer (b): (meth)acrylate having cyclic hydrocarbon group, of which the homopolymer has a glass transition temperature of at least 50° C. Monomer (c): vinylidene chloride. 2. The water repellent composition according to claim 1 , wherein the monomer (b) is isobornyl acrylate or isobornyl methacrylate.3. The water repellent composition according to claim 1 , wherein the copolymer further has structural units based on the following monomer (d) claim 1 , wherein based on the total amount of structural units based on all monomers constituting the copolymer claim 1 , the proportion of structural units based on the monomer (d) is from 0.1 to 20 mass % claim 1 ,Monomer (d): a monomer having a crosslinkable functional group.4. The water repellent composition according to claim 1 , which further contains a surfactant.5. The water repellent composition according to claim 1 , which further contains a film-forming assistant.6. The water repellent composition according to claim 1 , wherein the water repellent composition is a water repellent composition for carpets.8. The method for producing a water repellent composition according to claim 7 , wherein the monomer (b) is isobornyl acrylate or isobornyl methacrylate.9. The method for producing a water repellent composition according to claim 7 , wherein ...

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17-03-2016 дата публикации

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20160077429A1
Принадлежит: Sumitomo Chemical Company, Limited

A resist composition include (A1) a resin which includes a structural unit represented by formula (a4), and which resin has neither an acid-labile group nor an aromatic ring, (A2) a resin having an acid-labile group, and an acid generator, 4. The resist composition according to claim 3 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}6. The resist composition according to claim 1 , whereinthe structural unit having a ketone group is a structural unit having a chain keton group.8. The resist composition according to claim 7 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).9. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer. This application claims priority to Japanese Application No. 2014-187411 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187411 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2010-175859A.The disclosure provides following inventions of <1> to <11>.<1> A resist composition comprising(A1) a resin which comprisesa structural unit represented by formula (a4):wherein Rrepresents ...

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17-03-2016 дата публикации

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20160077430A1
Принадлежит: Sumitomo Chemical Company, Limited

1. A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having a sulfonyl group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. 2. The resist composition according to claim 1 , whereinthe structural unit having a sulfonyl group is a structural unit having a sultone ring.5. The resist composition according to claim 4 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}8. The resist composition according to claim 7 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).9. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.11. The resin according to claim 10 , whereinthe structural unit having a sulfonyl group is a structural unit having a sultone ring.14. The resin according to claim 13 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187603 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187603 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having ...

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17-03-2016 дата публикации

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20160077431A1
Принадлежит: Sumitomo Chemical Company, Limited

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic carbonate and a structural unit represented by formula (I), the resin has no acid-labile group; (A2) a resin which has an acid-labile group; and an acid generator: 4. The resist composition according to claim 1 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}7. The resist composition according to claim 6 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).8. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.12. The resin according to claim 9 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187604 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187604 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of WO2011/034176.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid ...

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17-03-2016 дата публикации

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20160077432A1
Принадлежит: Sumitomo Chemical Company, Limited

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), and a structural unit having an adamantane lactone group, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator. 5. The resist composition according to claim 4 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}9. The resist composition according to claim 8 , whereinthe resin (A2) comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).10. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer. This application claims priority to Japanese Application No. 2014-187412 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187412 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.A resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP200888343A.The disclosure provides following inventions of <1> to <13>.<1> A resist composition includes(A1) a resin which includes a structural unit represented by formula (a4):wherein Rrepresents a hydrogen atom or a methyl group, andRrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a ...

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17-03-2016 дата публикации

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Номер: US20160077433A1
Принадлежит: Sumitomo Chemical Company, Limited

A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit represented by formula (II), the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator: 3. The resist composition according to claim 2 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'}6. The resist composition according to claim 5 , whereinthe resin (A2) is comprises a structural unit represented by formula (a1-1) and a structural unit represented by formula (a1-2).7. A method for producing a resist pattern comprising steps (1) to (5);{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, '(1) applying the resist composition according to onto a substrate;'}(2) drying the applied composition to form a composition layer;(3) exposing the composition layer;(4) heating the exposed composition layer, and(5) developing the heated composition layer.10. The resist composition according to claim 9 , wherein{'sup': '2', 'sub': 3', '18, 'Ris an unsubstituted Cto Calicyclic hydrocarbon group.'} This application claims priority to Japanese Application No. 2014-187425 filed on Sep. 16, 2014. The entire disclosures of Japanese Application No. 2014-187425 is incorporated hereinto by reference.1. Field of the InventionThe disclosure relates to a resin, a resist composition and a method for producing resist pattern.2. Related ArtA resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator is described in Patent document of JP2014-41346A.The disclosure provides following inventions of <1> to <10>.<1> A resist composition includes(A1) a resin which includes a structural unit represented by formula (a4):wherein Rrepresents a hydrogen atom or a methyl group, andRrepresents a Cto Csaturated hydrocarbon group having a fluorine atom, and a methylene group contained in the saturated hydrocarbon group may be ...

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12-06-2014 дата публикации

Pressure-sensitive adhesive composition and pressure-sensitive adhesive sheet

Номер: US20140163138A1
Принадлежит: Nitto Denko Corp

A pressure-sensitive adhesive composition, for producing a pressure-sensitive adhesive layer that forms a pressure-sensitive adhesive sheet according to an aspect of the present invention, includes: a pressure-sensitive adhesive composite; a bubble; and a surfactant including a polymer that is formed by both a fluorine monomer and a non-fluorine ethylenically polymerizable monomer that is polymerizable with the fluorine monomer and whose homopolymer, when formed, has a glass transition temperature of 60° C. or higher.

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30-03-2017 дата публикации

SURFACTANT COMPRISING FLUORINE-CONTAINING POLYMER

Номер: US20170088653A1
Принадлежит: DAIKIN INDUSTRIES, LTD.

Provided is a surfactant which has a high surface tension reducing ability and a high solubility in a liquid medium, containing a fluorine-containing copolymer containing, as essential components, a monomer having a fluoroalkyl group having 1 to 7 carbon atoms, a hydrophilic monomer, and a monomer having an ion donor group. Further provided are a coating composition, an ink composition and a photographic emulsion composition, each comprising the surfactant. 1. A liquid modifier , which is a liquid modifier for paint , a liquid modifier for ink or a liquid modifier for photographic emulsion , wherein the liquid modifier comprises a surface active agent comprising a fluorine-containing copolymer comprising repeating units derived from the following monomers (a) , (b) and (c): {'br': None, 'sub': '2', 'CH═C(—X)—C(═O)—Y—Z—Rf\u2003\u2003(1)'}, '(a) a fluorine-containing monomer having a fluoroalkyl group, represented by the general formulawherein X is a hydrogen atom;Y is —O—;{'sub': 1', '10', '6', '10', '2', '2', '2', 'm', '2', '2', 'n', '2', 'm', '2', 'n, 'sup': 1', '1, 'Z is a Cto Caliphatic group, a Cto Caromatic or cyclic aliphatic group, a —CHCH(OZ) CH— group wherein Zis a hydrogen atom or an acetyl group, a —(CH)—SO—(CH)— group or a —(CH)—S—(CH)— group wherein m is an integer from 1 to 10 and n is an integer from 0 to 10, and'}{'sub': 1', '7, 'Rf is a linear or branched Cto Cfluoroalkyl group,'} [{'br': None, 'sub': 2', 'n, 'sup': 1', '2, 'CH═CXC(═O)—O—(RO)—X\u2003\u2003(2a)'}, {'br': None, 'and'}, {'br': None, 'sub': 2', 'n', '2, 'sup': 1', '1, 'CH═CXC(═O)—O—(RO)—C(═O)CX═CH\u2003\u2003(2b)'}], '(b) a hydrophilic monomer which is polyalkyleneglycol (meth)acrylate represented by the general formulas{'sup': '1', 'wherein Xis a hydrogen atom or a methyl group,'}{'sup': '2', 'sub': 1', '22, 'Xis a hydrogen atom or a saturated or unsaturated C-Chydrocarbon group,'}{'sub': 2', '6, 'R is a C-Calkylene group, and'}n is an integer from 1 to 90, and(c) a monomer having an ...

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05-05-2022 дата публикации

POLYMERS OF HALOALKYL AND HALOALKENYL ETHER (METH)ACRYLATES

Номер: US20220135719A1
Принадлежит:

A curable composition containing at least one of a haloalkyl ether (meth)acrylate or a haloalkenyl ether (meth)acrylate and, optionally, one or more different types of co-monomers is cured to provide a polymer having advantageous properties as a result of the incorporation of halogenated functionality derived from the haloalkyl/haloalkenyl ether (meth)acrylate monomer.

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05-05-2022 дата публикации

TONER COMPOSITIONS AND ADDITIVES

Номер: US20220137526A1
Принадлежит:

Disclosed herein is a toner composition, developer and additive for a toner composition. The toner composition includes toner particles including at least one resin, an optional colorant, an optional wax, and a polymeric toner additive on at least a portion of an external surface of the toner particles. The polymeric toner additive includes a polymeric resin including a fluorinated acrylic monomer, a cross-linkable monomer containing two or more vinyl groups at 8 wt % to 40 wt % of the polymeric resin, and optionally a charge control agent comprised of a nitrogen containing group at 0.1 wt % to 1.5 wt % of the polymeric resin.

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01-04-2021 дата публикации

OIL-RESISTANT LENS MATERIAL AND OPHTHALMIC DEVICES

Номер: US20210095063A1
Принадлежит:

Lens materials and ophthalmic devices including lens materials that are oxygen permeable and resistant to oil absorption are described. In an embodiment, the lens material includes a copolymer composed of repeating units including: a fluorinated acrylate repeating unit; and a silicon-containing repeating unit, wherein a mass:mass ratio of the fluorinated acrylate repeating unit to the silicon-containing repeating unit is greater than or equal to 2:1 1. A lens material for use in an electrowetting ophthalmic device , the lens material comprising a copolymer composed of repeating units including:a fluorinated acrylate repeating unit; anda silicon-containing repeating unit,wherein a mass:mass ratio of the fluorinated acrylate repeating unit to the silicon-containing repeating unit is greater than or equal to 2:1.3. The lens material of claim 2 , wherein the fluorinated acrylate repeating unit is derived from a fluorinated methacrylate monomer selected from the group consisting of a hexafluoroisopropyl methacrylate monomer claim 2 , a trifluoroethyl methacrylate monomer claim 2 , and combinations thereof.4. The lens material of claim 1 , wherein the silicon-containing repeating unit is derived from a monomer selected from the group consisting of a silyl methacrylate monomer claim 1 , a silyl styrene monomer claim 1 , and combinations thereof.6. The lens material of claim 1 , wherein the silicon-containing repeating unit is 3-[tris(trimethylsiloxy)silyl]propyl methacrylate.7. The lens material of claim 1 , wherein the mass:mass ratio of the fluorinated acrylate repeating unit to the silicon-containing repeating unit is in a range of about 2:1 to about 100:1.8. The lens material of claim 1 , further comprising a crosslinking agent.9. The lens material of claim 8 , wherein the crosslinking agent is selected from the group consisting of butanediol dimethacrylate claim 8 , ethylene glycol dimethacrylate claim 8 , diethylene glycol dimethacrylate claim 8 , triethylene glycol ...

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26-03-2020 дата публикации

CROSSLINKED POLYFLUOROACRYLIC ACID AND PROCESSES FOR THE PREPARATION THEREOF

Номер: US20200095354A1
Принадлежит:

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group and being a polymerization product of at least three monomers. Pharmaceutical compositions of these polymers are useful to bind potassium in the gastrointestinal tract. 3. The polymer of wherein Ais protected carboxylic claim 1 , phosphonic claim 1 , or phosphoric.4. The polymer of any one of to wherein the polymerization mixture further comprises a polymerization initiator.5. A crosslinked cation exchange polymer in an acid or salt form claim 1 , the cation exchange polymer comprising a reaction product of the crosslinked polymer of any one of to and a hydrolysis agent.6. The polymer of any one of to wherein Ais carboxylic claim 1 , phosphonic claim 1 , or phosphoric.7. The polymer of any one of to wherein the polymerization mixture does not comprise a polymerization initiator.11. The polymer of wherein Xis the ether moiety claim 10 , d is an integer from 1 to 2 claim 10 , and e is an integer from 1 to 3.12. The polymer of wherein Xis the amide moiety and p is an integer of 4 to 6.13. The polymer of any one of and to wherein Xis alkylene.14. The polymer of wherein Xis ethylene claim 13 , propylene claim 13 , butylene claim 13 , pentylene claim 13 , or hexylene.15. The polymer of wherein Xis butylene.16. The polymer of any one of claim 13 , to and to wherein Xis phenylene.17. The polymer of any one of claim 13 , to and to wherein Rand Rare hydrogen.18. The polymer of any one of claim 13 , to and to wherein Ais protected carboxylic.19. The polymer of wherein protected carboxylic is —C(O)O-alkyl.20. The polymer of any one of and to wherein the hydrolysis agent is a strong base.21. The polymer of wherein the strong base is sodium hydroxide claim 20 , potassium hydroxide claim 20 , magnesium hydroxide claim 20 , calcium hydroxide claim 20 , or a combination thereof.22. The polymer of any one of to and to wherein the weight ratio of the monomer of Formula ...

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13-04-2017 дата публикации

PROTEIN ADHESION INHIBITOR

Номер: US20170101497A1
Принадлежит: Asahi Glass Company, Limited

To provide an inhibitor for inhibiting protein adhesion capable of easily forming a coating layer which is excellent in water resistance, from which coating components are less likely to be eluted, on which protein is less likely to be adsorbed and which is excellent in biocompatibility; a coating solution; a medical device having a coating layer employing this inhibitor for inhibiting protein adhesion; a method for producing the same; and a fluoropolymer to be used in this inhibitor for inhibiting protein adhesion. A compound for inhibiting protein adhesion comprising a fluoropolymer that has units having a biocompatible group, a fluorine atom content of from 5 to 60 mass % and a proportion P represented by the following formula of from 0.1 to 4.5%. (Proportion P)=((proportion (mass %) of units having a biocompatible group to all units of the fluoropolymer))/(fluorine atom content (mass %) of the fluoropolymer))×100. 1. A protein adhesion inhibitor comprising a fluoropolymer having units having a biocompatible group , a fluorine atom content of from 5 to 60 mass % and a proportion P represented by the following formula of from 0.1 to 4.5%:{'br': None, 'i': 'P', '(Proportion )=[(proportion (mass %) of units having a biocompatible group to all units of the fluoropolymer)/(fluorine atom content (mass %) of the fluoropolymer)]×100.'}6. Use of a fluoropolymer having units having a biocompatible group , a fluorine atom content of from 5 to 60 mass % and a proportion P represented by the following formula of from 0.1 to 4.5% , for prevention of protein adhesion to a medical device:{'br': None, 'i': 'P', '(Proportion )=[(proportion (mass %) of units having a biocompatible group to all units of the fluoropolymer)/(fluorine atom content (mass %) of the fluoropolymer)]×100.'}7. A coating solution comprising the protein adhesion inhibitor as defined in and a solvent.8. The coating solution according to claim 7 , which further contains a crosslinking agent.9. The coating ...

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23-04-2015 дата публикации

Anti-Reflective Layer and Method

Номер: US20150111384A1

A system and method for anti-reflective layers is provided. In an embodiment the anti-reflective layer comprises a floating component in order to form a floating region along a top surface of the anti-reflective layer after the anti-reflective layer has dispersed. The floating component may be a floating cross-linking agent, a floating polymer resin, or a floating catalyst. The floating cross-linking agent, the floating polymer resin, or the floating catalyst may comprise a fluorine atom. The anti-reflective layers are removed using a fluid.

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23-04-2015 дата публикации

PARTIALLY FLUORINATED POLYMERS

Номер: US20150112036A1
Принадлежит: E I DU PONT DE NEMOURS AND COMPANY

The present invention relates to a polymer comprising the reaction product of: (a) a compound of Formula (3), or a mixture thereof: 3. The polymer of claim 2 , wherein V is —YC(O)CR═CHor —YC(O)NHCHCHOC(O)CR═CH.4. The polymer of claim 3 , wherein the compounds are reacted in the following percentages by weight: from about 30% to about 90% of a compound of Formula (3) claim 3 , from about 9% to about 40% of a monomer of Formula (4) claim 3 , and from about 1% to about 30% of a monomer of Formula (6) claim 3 , wherein the sum of the monomer components equals 100%.5. The polymer of claim 2 , wherein V is —YC(O)RSH.6. The polymer of claim 5 , wherein the compounds are reacted in the following percentages by weight: from about 4% to about 40% of a compound of Formula (3) claim 5 , from about 30% to about 95% of a monomer of Formula (5) claim 5 , and from about 1% to about 30% of a monomer of Formula (6) claim 5 , wherein the sum of the monomer components equals 100%.7. The polymer of where at least one additional monomer is copolymerized claim 2 , selected from the group consisting of ethylenically unsaturated monomers having a functional group selected from a linear or branched hydrocarbon claim 2 , alcohol claim 2 , anhydride claim 2 , ether claim 2 , ester claim 2 , formate claim 2 , carboxylic acid claim 2 , carbamate claim 2 , urea claim 2 , amine claim 2 , amide claim 2 , sulfonate claim 2 , sulfonic acid claim 2 , sulfonamide claim 2 , halide claim 2 , saturated or unsaturated cyclic hydrocarbon claim 2 , morpholine claim 2 , pyrrolidine claim 2 , piperidine claim 2 , or mixtures thereof.9. The polymer of wherein said fluorinated compound reacts with about 5 mol % to about 90 mol % of said isocyanate groups.13. The polymer of wherein said non-fluorinated compound reacts with about 0.1 mol % to about 60 mol % of said isocyanate groups.14. The polymer of wherein the carbamate linkage is formed using a diamine or polyamine.15. The polymer of in the form of an aqueous ...

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20-04-2017 дата публикации

ADDITIVE AND RESIST UNDERLAYER FILM-FORMING COMPOSITION CONTAINING THE SAME

Номер: US20170108777A1
Принадлежит: NISSAN CHEMICAL INDUSTRIES, LTD.

An additive for a resist underlayer film-forming composition containing a copolymer having structural units of Formulae (1) to (4), and a resist underlayer film-forming composition containing the additive: 2. The additive according to claim 1 , wherein the protecting group is acetyl group claim 1 , methoxymethyl group claim 1 , ethoxyethyl group claim 1 , a Ctertiary alkyl group claim 1 , or pivaloyl group.5. The additive according to claim 1 , wherein the copolymer is a compound synthesized by copolymerization of a monomer forming the structural unit of Formula (1) claim 1 , a monomer forming the structural unit of Formula (2) claim 1 , a monomer forming the structural unit of Formula (3) claim 1 , and a monomer forming the structural unit of Formula (4) claim 1 , and the content of the monomer forming the structural unit of Formula (2) is 5% by mole to 40% by mole relative to a total of the four monomers of 100% by mole.6. The additive according to claim 1 , wherein the copolymer has a weight average molecular weight of 3 claim 1 ,000 to 20 claim 1 ,000.7. A resist underlayer film-forming composition containing the additive according to claim 1 , a resin different from the copolymer claim 1 , an organic acid claim 1 , a cross-linking agent claim 1 , and a solvent.8. The resist underlayer film-forming composition according to claim 7 , wherein the resin is polyester.9. The resist underlayer film-forming composition according to claim 7 , wherein the additive is contained in an amount of 5 parts by mass to 20 parts by mass relative to 100 parts by mass of the resin.10. A method for forming a resist pattern comprising the steps of:{'claim-ref': {'@idref': 'CLM-00007', 'claim 7'}, 'forming a resist underlayer film on a substrate using the resist underlayer film-forming composition according to ;'}forming a resist film on the resist underlayer film using a positive resist solution;exposing the resist film through a photomask; anddeveloping the resist film by a solvent ...

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03-05-2018 дата публикации

ETHYLENICALLY CROSSLINKABLE FLUORINATED POLYMER ADDITIVES FOR ARCHITECTURAL COATINGS

Номер: US20180118956A1
Принадлежит:

The present invention comprises a crosslinkable polymer compound comprising a fluorinated Unit A, an optional hydrophilic Unit B, an optional acidic or neutralized acid Unit C, a crosslinkable pendant olefin group-containing Unit D, and an optional hydrophobic alkyl Unit E. Such polymeric compounds are useful as coatings additives such that, when the coating is applied to a substrate, the additive compound is allowed to first migrate to the surface and subsequently crosslink to form a durable oil-, dirt-, and water-repellent surface. 2. The compound of claim 1 , having a number average molecular weight Mof about 1500 to about 30 claim 1 ,000 Daltons.3. The compound of claim 1 , wherein Unit C is in the range of about 1 to about 60 mol %.4. The compound of claim 1 , where Ris a straight or branched-chain perfluoroalkyl group of 2 to 6 carbon atoms.5. The compound of claim 1 , wherein one of Units B claim 1 , C claim 1 , or E is at least about 0.1 mol %.6. The compound of claim 1 , wherein Unit D is in the range of about 2 to about 40 mol %.7. The compound of claim 1 , wherein Unit D results from the polymerization of at least one fatty acid (meth)acrylate monomer having a straight or branched alkyl chain of 2 to 22 carbons and having 1 to 6 olefinic units.10. The composition of claim 9 , further comprising (c) a fatty acid compound in an amount of about 0.001 to 1% by weight claim 9 , based on the total weight sum of (a)+(b)+(c).11. The composition of claim 9 , where the crosslinkable polymer compound (b) has a number average molecular weight Mof about 1500 to about 30 claim 9 ,000 Daltons.12. The composition of claim 9 , where Unit C is in the range of about 1 to about 60 mol %.13. The composition of claim 9 , where Ris a straight or branched-chain perfluoroalkyl group of 2 to 6 carbon atoms.14. The composition of claim 9 , where Unit D results from the polymerization of at least one fatty acid (meth)acrylate monomer having a straight or branched alkyl chain of 2 to ...

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03-05-2018 дата публикации

Topcoat compositions and pattern-forming methods

Номер: US20180118970A1
Принадлежит: Rohm and Haas Electronic Materials LLC

Topcoat compositions comprise: a matrix polymer; a surface active polymer comprising a polymerized unit formed from a monomer of the following general formula (I): wherein: R 1 represents H, F, methyl or fluorinated methyl; R 2 represents optionally substituted C1 to C8 alkylene or optionally substituted C1 to C8 fluoroalkylene, optionally comprising one or more heteroatom; R 3 represents H, F, optionally substituted C1 to C10 alkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; R 4 represents optionally substituted C1 to C8 alkyl, optionally substituted C1 to C8 fluoroalkyl or optionally substituted C5 to C15 aryl, optionally comprising one or more heteroatom; X represents O, S or NR 5 , wherein R 5 is chosen from hydrogen and optionally substituted C1 to C5 alkyl; and a is 0 or 1; and a solvent. Also provided are coated substrates and pattern-forming methods which make use of the topcoat compositions. The invention has particular applicability in photolithographic processes as a photoresist topcoat layer in the manufacture of semiconductor devices.

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03-05-2018 дата публикации

ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE

Номер: US20180120701A1
Автор: HIRANO Shuji
Принадлежит: FUJIFILM Corporation

According to the present invention, an actinic ray-sensitive or radiation-sensitive resin composition including a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid, a hydrophobic resin (B), and a resin (C) having an aromatic ring, as well as a film, a mask blank, a pattern forming method, and a method for manufacturing an electronic device, each using the composition, are provided. 1. An actinic ray-sensitive or radiation-sensitive resin composition comprising:a compound (A) whose dissolution rate in an alkali developer decreases by the action of an acid;a resin (B) including a repeating unit having one or more groups selected from the group consisting of a fluorine atom, a group having a fluorine atom, a group having a silicon atom, an alkyl group having 6 or more carbon atoms, a cycloalkyl group having 5 or more carbon atoms, an aryl group having 6 or more carbon atoms, and an aralkyl group having 7 or more carbon atoms; anda resin (C) having an aromatic ring, different from the resin (B),wherein the resin (B) further includes a repeating unit having a group which decomposes by the action of an acid.2. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,wherein the resin (B) includes a repeating unit having one or more groups selected from the group consisting of a fluorine atom, a group having a fluorine atom, a group having a silicon atom, an alkyl group having 6 or more carbon atoms, and a cycloalkyl group having 5 or more carbon atoms.3. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,wherein the content of the resin (B) with respect to the total solid content in the actinic ray-sensitive or radiation-sensitive resin composition is 0.01% to 30% by mass.5. The actinic ray-sensitive or radiation-sensitive resin composition according to claim 1 ,wherein the compound (A) is a phenol derivative.8. The actinic ray-sensitive or radiation-sensitive ...

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16-04-2020 дата публикации

Composition, optical film, polarizing plate, display device, and method for producing composition

Номер: US20200115480A1
Принадлежит: Fujifilm Corp

A fluorine-containing copolymer composition includes repeating units derived from a fluorine-containing monomer represented by Formula (I) and from a monomer having at least two polymerizable groups, in which the latter is 3% by mass or more with respect to a total mass of the fluorine-containing copolymer, and the former is 15% by mass or more with respect to a total solid content in the composition, in the Formula (I), R1 represents a hydrogen atom or an alkyl group having 1 to 20 carbon atoms; R2 represents a group having at least one fluorine atom; and L1 represents a divalent linking group including at least one selected from the group consisting of —O—, —(C═O)O—, —O(C═O)—, —(C═O)NH—, —NH(C═O)—, a divalent aromatic group which may have a substituent, a divalent aliphatic chain group which may have a substituent, and a divalent aliphatic cyclic group which may have a substituent.

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25-08-2022 дата публикации

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

Номер: US20220269171A1
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A positive resist composition is provided comprising a base polymer comprising repeat units (a) derived from a triple bond-containing maleimide compound and repeat units (b) adapted to increase solubility in an alkaline developer under the action of acid. A pattern of good profile with a high resolution, reduced edge roughness, and reduced size variations is formed therefrom. 1. A positive resist composition comprising a base polymer comprising a repeat unit (a) derived from a triple bond-containing maleimide compound and a repeat unit (b) adapted to increase its solubility in an alkaline developer under the action of acid.3. The positive resist composition of wherein the repeat unit (b) is a repeat unit (b1) having a carboxy group whose hydrogen is substituted by an acid labile group or a repeat unit (b2) having a phenolic hydroxy group whose hydrogen is substituted by an acid labile group.5. The positive resist composition of wherein the base polymer further comprises a repeat unit (c) having an adhesive group which is selected from a hydroxy moiety claim 1 , carboxy moiety claim 1 , lactone ring claim 1 , carbonate moiety claim 1 , thiocarbonate moiety claim 1 , carbonyl moiety claim 1 , cyclic acetal moiety claim 1 , ether bond claim 1 , ester bond claim 1 , sulfonic ester bond claim 1 , cyano moiety claim 1 , amide bond claim 1 , —O—C(═O)—S— claim 1 , and —O—C(═O)—NH—.7. The positive resist composition of claim 1 , further comprising an acid generator.8. The positive resist composition of claim 1 , further comprising an organic solvent.9. The positive resist composition of claim 1 , further comprising a quencher.10. The positive resist composition of claim 1 , further comprising a surfactant.11. A pattern forming process comprising the steps of applying the positive resist composition of onto a substrate to form a resist film thereon claim 1 , exposing the resist film to high-energy radiation claim 1 , and developing the exposed resist film in a developer.12. ...

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27-05-2021 дата публикации

Acrylic rubber and crosslinkable composition thereof

Номер: US20210155729A1
Автор: Daichi TOGE, Iwao Moriyama
Принадлежит: Unimatec Ltd

An acrylic rubber that is a copolymer in which 1 to 4 wt. % of a reactive halogen group-containing vinyl monomer is copolymerized as a crosslinkable comonomer, wherein 45 to 65 wt. % of n-butyl acrylate, 10 to 35 wt. % of 2-methoxyethyl acrylate and 8 to 30 wt. % of ethoxyethoxyethyl acrylate are copolymerized in 100 wt. % of comonomers other than the crosslinkable comonomer. This ethoxyethoxyethyl acrylate-copolymerized acrylic rubber can suppress the reduction of oil resistance while improving cold resistance represented by a TR-10 value, and by compounding it with a vulcanizing agent corresponding to the crosslinkable group thereof, a crosslinkable composition is formed.

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23-04-2020 дата публикации

RESIST UNDERLAYER FILM-FORMING COMPOSITION COMPRISING POLYMER HAVING STRUCTURAL UNIT HAVING UREA LINKAGE

Номер: US20200124965A1
Принадлежит: NISSAN CHEMICAL CORPORATION

A resist underlayer film-forming composition having a dramatically improved crosslinking ability over conventional compositions, and further, a resist underlayer film-forming composition that crosslinks with a component of a resist material, in order to improve the adhesion of a resist underlayer film to a resist pattern. A resist underlayer film-forming composition for lithography including a copolymer having a structural unit of formula (1) and a structural unit of formula (2): 5. The resist underlayer film-forming composition for lithography according to claim 1 , wherein the copolymer has a weight average molecular weight of 1 claim 1 ,500 to 20 claim 1 ,000.6. A method for forming a resist pattern comprising the steps of:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'forming a resist underlayer film having a thickness of 1 to 25 nm by applying the resist underlayer film-forming composition for lithography according to onto a substrate, and baking the composition;'}forming a resist film by applying a resist solution onto the resist underlayer film, and heating the resist solution;exposing the resist film to radiation selected from the group consisting of a KrF excimer laser, an ArF excimer laser, and extreme ultraviolet radiation through a photomask; andafter the exposure, developing the resist film with a developer. The present invention relates to a resist underlayer film-forming composition for lithography, particularly to a composition for forming a resist underlayer film having improved adhesion to a resist pattern, and further to a resist underlayer film-forming composition having excellent coating properties on a substrate even in the case of forming a resist underlayer film having a small film thickness (for example, 25 nm or less).ArF immersion lithography or extreme ultraviolet (EUV) lithography is demanded to achieve a finer processing dimension for a resist pattern line width. In the formation of such a fine resist pattern, the contact area ...

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07-08-2014 дата публикации

Copolymer, and liquid crystal alignment layer including cured product thereof

Номер: US20140221574A1
Принадлежит: DIC Corp

Provided is a liquid crystal alignment layer of which a constituent member is a polymer represented by the general formula (I).

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23-05-2019 дата публикации

POLYMERIZABLE COMPOSITION AND OPTICALLY ANISOTROPIC BODY USING SAME

Номер: US20190153125A1
Принадлежит: DIC CORPORATION

The present invention provides a polymerizable composition containing a specific polymerizable compound and a fluorosurfactant having a specific polyoxyalkylene skeleton and having specific molecular weight. The invention also provides an optically anisotropic body, a retardation film, an antireflective film, and a liquid crystal display device that are produced using the polymerizable composition of the present invention. The present invention is useful because, when an optically anisotropic body is produced by photo-polymerization of the polymerizable composition, three features including the leveling properties of the surface of the optically anisotropic body, offset onto the substrate, and liquid crystal alignment can be improved simultaneously. 2. The method according to claim 1 , wherein the polymer product is an optically anisotropic body.3. The method according to claim 1 , wherein the polymer product is a retardation film.4. The method according to claim 1 , further comprising using the polymer product as an optically anisotropic body to obtain a display device.5. The method according to claim 1 , further comprising using the polymer product as an optically anisotropic body to obtain a light-emitting device.6. The method according to claim 1 , further comprising using the polymer product to obtain a light-emitting diode lighting device.7. The method according to claim 1 , further comprising using the polymer product to obtain a lens sheet.8. The method according to claim 1 , wherein the polymerizable composition further comprises a dichroic pigment.9. The method according to claim 1 , further comprising using the polymer product to obtain a polarizing film.10. The method according to claim 1 , further comprising using the polymer product as a retardation film to obtain a display device.11. The method according to claim 1 , further comprising using the polymer product as a retardation film to obtain a a light-emitting device. This application is a ...

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15-06-2017 дата публикации

CROSSLINKED CATION EXCHANGE POLYMERS, COMPOSITIONS AND USE IN TREATING HYPERKALEMIA

Номер: US20170165292A1
Принадлежит:

The present invention is directed to crosslinked cation exchange polymers comprising a fluoro group and an acid group, pharmaceutical compositions of these polymers, compositions of a linear polyol and a salt of such polymer. Crosslinked cation exchange polymers having beneficial physical properties, including combinations of particle size, particle shape, particle size distribution, viscosity, yield stress, compressibility, surface morphology, and/or swelling ratio are also described. These polymers and compositions are useful to bind potassium in the gastrointestinal tract. 4. The pharmaceutical composition of any one of to wherein the polymer comprises structural units corresponding to Formulae 1 , 2 and 3.5. The pharmaceutical composition of any one of to wherein either:(i) the structural units corresponding to Formula 1 constitute at least about 85 wt. % based on the total weight of structural units of Formulae 1, 2, and 3 in the polymer calculated from the amounts of monomers used in the polymerization reaction, and the weight ratio of the structural unit corresponding to Formula 2 to the structural unit corresponding to Formula 3 is from about 4:1 to about 1:4, or(ii) the mole fraction of the structural unit of Formula 1 in the polymer is at least about 0.87 based on the total number of moles of the structural units of Formulae 1, 2, and 3 calculated from the amounts of monomers used in the polymerization reaction, and the mole ratio of the structural unit of Formula 2 to the structural unit of Formula 3 is from about 0.2:1 to about 7:1.6. The pharmaceutical composition of any one of to wherein the polymer comprises structural units corresponding to Formulae 1 and 2.7. The pharmaceutical composition of any one of to wherein the polymer comprises structural units corresponding to Formulae 1 and 3.10. The pharmaceutical composition of or wherein Ais a protected carboxylic , phosphonic , or phosphoric.12. The pharmaceutical composition of any one of to wherein ...

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24-06-2021 дата публикации

NOVEL FERROELECTRIC MATERIAL

Номер: US20210193905A1
Принадлежит:

A polymer for organic ferroelectric materials and an organic ferroelectric materials are disclosed. The polymer is a (meth)acrylic polymer, wherein the polymer comprises one or more (meth)acrylates as main monomer units and one or more (meth)acrylic monomers other than the main monomer units, wherein the main monomer units are (meth)acrylate monomer units having in the side chain thereof a saturated or unsaturated hydrocarbon skeleton linked to the distal end of the oxycarbonyl group, wherein the hydrocarbon skeleton has a hydrogen atom on the β-carbon atom relative to the oxycarbonyl group, and one or more electron withdrawing groups selected from halogen atom, cyano group, oxo group, and nitro group, that bind to the β-carbon atom and/or to one or more carbon atoms distal thereto, substituting for hydrogen atoms thereon, wherein the proportion of the main monomer units is less than 80 mol % of the total (meth)acrylic monomer units. 1. A polymer for organic ferroelectric material , the polymer being (meth)acrylic polymer ,wherein the polymer comprises, as monomers forming the polymer, one or more (meth)acrylates as main monomer units, and one or more (meth)acrylic monomers other than the main monomer units,wherein the main monomer units are (meth)acrylate monomer units having in the side chain thereof a saturated or unsaturated hydrocarbon skeleton linked to the distal end of the oxycarbonyl group, at least one hydrogen atom on the β-carbon atom relative to the oxycarbonyl group, and', 'one or more electron withdrawing groups selected from the group consisting of halogen atom, cyano group, oxo group, and nitro group, that bind to the β-carbon atom and/or to one or more carbon atoms distal thereto, substituting for hydrogen atoms thereon, wherein the halogen atom is selected from fluorine atom and chlorine atom, and, 'wherein the hydrocarbon skeleton has'}wherein in the monomer units that form the polymer, the proportion of the main monomer units is less than 80 mol ...

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30-05-2019 дата публикации

NOVEL POLYACRYLATE-POLYSILANE BLOCK COPOLYMERS

Номер: US20190161584A1
Принадлежит: CLARIANT PLASTICS & COATINGS LTD

The invention relates a polyacrylate-polysilane block copolymer of general structure (I): wherein m and n independent of one another, are integers ranging from 2 to 4000; p is an integer ranging from 0 to 5; q is an integer ranging from 1 to 5; Rrepresents hydrogen, straight-chain or branched alkyl group having 1 to 4 carbon atoms; Rrepresents hydrogen, straight-chain or branched alkyl group having 1 to 18 carbon atoms; R3 represents hydrogen, hydroxyl group, straight-chain or branched alkyl group having 1 to 4 carbon atoms, or an C-Caryl group; L is a linking moiety representing amine (—NH—) group, amide (—C(O)NH—) group, urea (—NHC(O)NH—) group, urethane (—OC(O)NH—) group or methylene (—CH—) group; R, Rand Rindependent of one another, represents hydrogen, straight-chain or branched, alkyl group having 1 to 8 carbon atoms or polydimethylsiloxane group; and Rrepresents hydrogen or methyl group. 2. The polyacrylate-polysilane block copolymer as claimed in claim 1 , wherein m is an integer ranging from 100 to 1000.3. The polyacrylate-polysilane block copolymer as claimed in claim 1 , wherein n is an integer ranging from 100 to 1000.4. The polyacrylate-polysilane block copolymer as claimed in claim 1 , wherein p is an integer ranging from 0 to 3.5. The polyacrylate-polysilane block copolymer as claimed in claim 1 , wherein q is an integer ranging from 1 to 3.6. The polyacrylate-polysilane block copolymer as claimed in claim 1 , wherein the weight ratio of the polyacrylate block (A) to the polysilane block (B) is in the range of about 1:1.8×10to 6204:1.7. The polyacrylate-polysilane block copolymer as claimed in claim 1 , wherein the number average molecular weight of the polydimethylsiloxane group is in the range of about 500 g/mole to about 300 claim 1 ,000 g/mole.8. The polyacrylate-polysilane block copolymer as claimed in claim 1 , wherein the weight ratio of polydimethylsiloxane (PDMS) to the total weight of the polyacrylate-polysilane block copolymer of general ...

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29-09-2022 дата публикации

TONER COMPOSITIONS AND ADDITIVES

Номер: US20220308487A1
Принадлежит:

Disclosed herein is a toner composition, developer and additive for a toner composition. The toner composition includes toner particles having at least one resin, an optional colorant, an optional wax, and a crosslinked polymer particle on at least a portion of an external surface of the toner particles. The crosslinked polymeric particle on a surface of the toner particles includes at least a hydrophobic monomer comprising a non-fluorinated monomer having a carbon to oxygen (C/O) ratio of 3 or greater or a fluorinated monomer. The crosslinked polymer particle includes a second monomer comprising two or more vinyl groups present in an amount from about 8 wt % to about 40 wt % of the copolymer, a metal oxide and optionally a charge control agent monomer. 1. A toner composition comprising:toner particles comprising at least one resin, an optional colorant, an optional wax, and a polymeric toner additive on at least a portion of an external surface of the toner particles, the polymeric toner additive comprising:a crosslinked polymer particle on a surface of the toner particles, the crosslinked polymer particle comprising at least a hydrophobic monomer comprising a non-fluorinated monomer having a carbon to oxygen (C/O) ratio of 3 or greater or a fluorinated monomer, a second monomer comprising two or more vinyl groups present in an amount from about 8 wt % to about 40 wt % of the copolymer, a metal oxide and optionally a charge control agent monomer.2. The toner composition of claim 1 , wherein the non-fluorinated monomer has a C/O ratio of 4 or greater.3. The toner composition of claim 1 , wherein the fluorinated monomer comprises a fluorinated acrylate monomer or fluorinated methacrylate monomer.4. The toner composition of claim 1 , wherein the fluorinated monomer comprises trifluoroethylmethacrylate.5. The toner composition of claim 1 , wherein the charge control agent comprises a nitrogen containing group at 0.1 wt % to 1.5 wt % of the polymeric resin.6. The toner ...

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30-06-2016 дата публикации

AQUEOUS DISPERSION OF FLUORINE-CONTAINING COPOLYMER

Номер: US20160185948A1
Автор: Kaneumi Yoshiyama
Принадлежит:

An aqueous dispersion of a fluorine-containing copolymer comprising, as copolymerization units, (A) a (meth)acrylate represented by [CH═CHRCOO(NH)RNRRR]Y, (B) a perfluoroalkylalkyl(meth)acrylate represented by CFCH(NR′SO)OCOCR═CHor a polyfluoroalkylalkyl(meth)acrylate thereof, or a polyfluoroalkyl(meth)acrylate represented by CF(CHCF)(CFCF)(CHCH)OCOCR═CH, (C) benzyl(meth)acrylate, (D) a fluorine-free polymerizable monomer other than components (A) and (C), and (E) a crosslinkable group-containing polymerizable monomer. The aqueous dispersion can improve the dispersion stability of an aqueous dispersion of a water- and oil-repellent when used as a water- and oil-repellent comprising the fluorine-containing copolymer as an active component. 1. An aqueous dispersion of a fluorine-containing copolymer comprising , as copolymerization units , {'br': None, 'sub': 2', 'r', '1', '2', '4, 'sup': +', '−, '[CH═CHRCOO(NH)RNRR3R]Y\u2003\u2003[I]'}, '(A) a (meth)acrylate represented by the general formula{'sub': 1', '2', '3', '4, 'sup': '−', 'wherein R is a hydrogen atom or a methyl group; Ris a linear, branched, or alicyclic alkylene group having 1 to 30 carbon atoms or a phenylene group; R, R, and Rare the same or different and each is a linear, branched, or alicyclic alkyl group having 1 to 30 carbon atoms or an aralkyl group; r is 0 or 1; and Y is an anionic group;'} {'br': None, 'sub': m', '2m+1', 'p', '2p', '2', 'q', '2, 'CFCH(NR′SO)OCOCR═CH\u2003\u2003[IIa]'}, '(B) a perfluoroalkylalkyl(meth)acrylate represented by the general formulawherein R is a hydrogen atom or a methyl group, R′ is an alkyl group having 1 to 5 carbon atoms, m is an integer of 4 to 14, p is an integer of 1 to 4, and q is 0 or 1;a polyfluoroalkylalkyl(meth)acrylate which is prepared by replacing some of the fluorine atoms in the perfluoroalkyl group in the above perfluoroalkylalkyl(meth)acrylate with hydrogen atoms; or {'br': None, 'sub': n', '2n+1', '2', '2', 'a', '2', '2', 'b', '2', '2', 'c', '2, 'CF( ...

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15-07-2021 дата публикации

COPOLYMER AND POSITIVE RESIST COMPOSITION

Номер: US20210214481A1
Автор: Hoshino Manabu
Принадлежит: ZEON CORPORATION

Provided is a copolymer that can be favorably used as a main chain scission-type positive resist that has excellent heat resistance and that can form a resist pattern having excellent resolution and clarity. The copolymer includes a monomer unit (A) represented by the following formula (I) and a monomer unit (B) represented by the following formula (II), and has a molecular weight distribution of 1.7 or less. In the formulae, L is a single bond or a divalent linking group, Ar is an optionally substituted aromatic ring group, Ris an alkyl group, Ris an alkyl group, a halogen atom, or a haloalkyl group, p is an integer of not less than 0 and not more than 5, and in a case in which more than one Ris present, each Rmay be the same or different. 2. The copolymer according to claim 1 , wherein L is an optionally substituted alkylene group.3. The copolymer according to claim 1 , wherein L is a divalent linking group that includes an electron withdrawing group.4. The copolymer according to claim 3 , wherein the electron withdrawing group is at least one selected from the group consisting of a fluorine atom claim 3 , a fluoroalkyl group claim 3 , a cyano group claim 3 , and a nitro group.5. The copolymer according to claim 1 , whereinthe monomer unit (A) is a 1-phenyl-1-trifluoromethyl-2,2,2-trifluoroethyl α-chloroacrylate unit or a benzyl α-chloroacrylate unit, andthe monomer unit (B) is an α-methylstyrene unit or a 4-fluoro-α-methylstyrene unit.6. The copolymer according to claim 1 , having a weight-average molecular weight of 80 claim 1 ,000 or less.7. A positive resist composition comprising: the copolymer according to ; and a solvent. The present disclosure relates to a copolymer and a positive resist composition, and, in particular, relates to a copolymer that can be suitably used as a positive resist and a positive resist composition that contains this copolymer.Polymers that undergo main chain scission to lower molecular weight upon irradiation with ionizing ...

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20-06-2019 дата публикации

Anti-biofouling coating material

Номер: US20190185682A1
Принадлежит: Asahi Glass Co Ltd

The present invention has an object to provide an anti-biofouling coating material which is capable of forming a coating film excellent in anti-biofouling properties and adhesiveness. Further, the present invention has another object to provide a ship, etc. and an article to be used in a humid or wetted environment, having, on its surface, a coating film formed by using the above anti-biofouling coating material. Further, the present invention has other objects to provide a method for preventing adhesion of organisms to a ship, etc. and to provide a method for preventing adhesion of fungi or algae to the surface of an article to be used in a humid or wetted environment, by using the above anti-biofouling coating material. The anti-biofouling coating material of the present invention is an anti-biofouling coating material to be applied to the surface of an article in order to prevent adhesion of organisms, which comprises a polymer F being a fluorinated polymer containing units based on a fluoroolefin, and a polymer G being a polymer containing units based on a (meth)acrylate having a polyoxyalkylene chain.

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22-07-2021 дата публикации

FLUORINE-CONTAINING POLYMER AND SURFACE TREATMENT AGENT

Номер: US20210221995A1
Принадлежит: DAIKIN INDUSTRIES, LTD.

A fluorine-containing polymer including a repeat unit derived from a fluorine-containing monomer (A1) and a repeat unit derived from a hydrocarbon group-bearing fluorine-free monomer (A2). The fluorine-free monomer (A2) is preferably at least one monomer selected from (A2-1) R—C(═O)—NH—R—O—R, (A2-2) CH═C(—R)—C(═O)—Y—Z(—Y—R), and (A2-3) XN(H)—R. Also disclosed is a surface treatment agent containing (A) the fluorine-containing polymer and (B) a liquid medium, as well as a method for producing the surface treatment agent and a method for producing a treated substrate. 1. A fluorine-containing polymer , comprising:a first side chain having a fluoroalkyl group having 1 to 20 carbon atoms, anda second side chain having a monovalent hydrocarbon group having 7 to 40 carbon atoms, whereinthe second side chain has a divalent —NH— group or a trivalent —N═ group between the monovalent hydrocarbon group and a backbone chain, andthe backbone chain is a backbone chain derived from an ethylenically unsaturated polymerizable group.2. A fluorine-containing polymer , comprising:(A1) a repeating unit derived from a fluorine-containing monomer which is an ethylenically unsaturated monomer having a fluoroalkyl group having 1 to 20 carbon atoms, and(A2) a repeating unit derived from a fluorine-free monomer which is an ethylenically unsaturated monomer having a monovalent hydrocarbon group having 7 to 40 carbon atoms and a divalent —NH— group or a trivalent —N═ group.3. A fluorine-containing polymer (A) , comprising {'br': None, 'sub': '2', 'sup': 11', '11', '11, 'CH═C(—X)—C(═O)—Y—Z—Rf'}, 'the fluorine-containing monomer (A1) is a compound represented by formula, '(A1) a repeating unit derived from a fluorine-containing monomer, and (A2) a repeating unit derived from a fluorine-free monomer having a hydrocarbon group, wherein'}{'sup': '11', 'wherein Xis a hydrogen atom, a monovalent organic group or a halogen atom,'}{'sup': '11', 'Yis —O— or —NH—,'}{'sup': '11', 'Zis a direct bond or a ...

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12-07-2018 дата публикации

Biomedical electrode composition, biomedical electrode and method for manufacturing the biomedical electrode

Номер: US20180193632A1
Принадлежит: Shin Etsu Chemical Co Ltd

The present invention provides a biomedical electrode composition capable of forming a living body contact layer for a biomedical electrode that is excellent in conductivity and biocompatibility, is light-weight, can be manufactured at low cost, and can control significant reduction in conductivity even though the biomedical electrode is soaked in water or dried. The present invention was accomplished by a biomedical electrode composition including a polymer compound having both the ionic repeating unit “a” and the repeating unit “b” of (meth)acrylate, in which the ionic repeating unit “a” is a repeating unit of sodium salt, potassium salt, or ammonium salt including a partial structure represented by the following general formula (1), and the repeating unit “b” of (meth)acrylate is a repeating unit represented by the following general formula (2).

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25-09-2014 дата публикации

Fluorine-containing copolymer and surface modifier comprising the same as active ingredient

Номер: US20140288231A1
Принадлежит: Unimatec Co Ltd

Disclosed is a fluorine-containing copolymer comprising a copolymer of a polyfluoroalkyl alcohol (meth)acrylic acid derivative represented by the general formula: C n F 2n+1 (CH 2 CF 2 ) a (CF 2 CF 2 ) b (CH 2 CH 2 ) c OCOCR═CH 2 wherein R is a hydrogen atom or a methyl group, n is an integer of 1 to 6, a is an integer of 1 to 4, b is an integer of 1 to 3, and c is an integer of 1 to 3, and styrene or a derivative thereof; and also disclosed is a surface modifier comprising the fluorine-containing copolymer as an active ingredient. When the fluorine-containing copolymer is used as an active ingredient of a surface modifier, the heat resistance of the surface modifier can be further improved.

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25-06-2020 дата публикации

ACETOACETOXY OR ACETOACETAMIDE FUNCTIONAL POLYMERIC BEADS

Номер: US20200197906A1
Принадлежит:

Polymeric beads useful for aldehyde abatement, a process for preparing the polymeric beads, a gas filter device comprising the polymeric beads, and a method of removing aldehydes from air by contacting the air with the polymeric beads. 1. Polymeric beads comprising a polymer , wherein the polymer comprises , based on the weight of the polymer ,from 25% to 75% by weight of structural units of an acetoacetoxy or acetoacetamide functional monomer, andfrom 25% to 75% by weight of structural units of a polyvinyl monomer; and{'sup': '2', 'wherein the polymeric beads contain at least 5,000 μg/g of an alkali metal ion and have a specific surface area in the range of from 80 to 400 m/g.'}2. The polymeric beads of claim 1 , wherein the polymeric beads have a specific surface area in the range of from 85 to 350 m/g.3. The polymeric beads of claim 1 , wherein the polyvinyl monomer comprises a polyvinyl aromatic monomer.4. The polymeric beads of claim 1 , wherein the acetoacetoxy or acetoacetamide functional monomer is selected from the group consisting of acetoacetoxyethyl methacrylate claim 1 , acetoacetoxyethyl acrylate claim 1 , acetoacetoxypropyl methacrylate claim 1 , allyl acetoacetate claim 1 , acetoacetoxybutyl methacrylate claim 1 , and 2 claim 1 ,3-di(acetoacetoxy)propyl methacrylate.5. The polymeric beads of claim 1 , wherein the polyvinyl monomer is selected from the group consisting of divinylbenzene claim 1 , trivinyl benzene claim 1 , and divinylnaphthalene.6. The polymeric beads of claim 1 , wherein the polymer comprises claim 1 , based on the weight of the polymer claim 1 , from 30% to 70% by weight of structural units of the acetoacetoxy or acetoacetamide functional monomer claim 1 , from 30% to 70% by weight of structural units of the polyvinyl monomer claim 1 , and from 0 to 20% by weight of structural units of a monovinyl aliphatic monomer and/or a monovinyl aromatic monomer.7. The polymeric beads of claim 1 , wherein the polymeric beads contain an alkali ...

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09-10-2014 дата публикации

FLOURINATED SILANE-MODIFIED POLYACRYLIC RESIN

Номер: US20140303312A1
Автор: Tomko Richard F.
Принадлежит: THE SHERWIN-WILLIAMS COMPANY

A fluorinated silane-modified polyacrylic resin comprising: (a) 1% to 50% by weight of at least one acrylic ester monomer; (b) 1 to 50% by weight of an ethylenically unsaturated monomer; (c) 1% to 50% by weight of an organofunctional silane monomer; and (d) 0.1% to 50% by weight of a fluorine-containing monomer. 1. A fluorinated silane-modified polyacrylic resin comprising: (a) 1% to 50% by weight of at least one acrylic ester monomer; (b) 1 to 50% by weight of an ethylenically unsaturated monomer; (c) 1% to 50% by weight of an organofunctional silane monomer;and (d) 0.1% to 50% by weight of a fluorine-containing monomer.2. The polyacrylic resin of claim 1 , wherein the acrylic ester monomer is selected from the group consisting of butyl (meth)acrylate claim 1 , methyl (meth)acrylate claim 1 , ethyl (meth)acrylate claim 1 , propyl (meth)acrylate claim 1 , n-hexyl (meth)acrylate claim 1 , isopropyl (meth)acrylate claim 1 , isobutyl (meth)acrylate claim 1 , 2-ethylhexyl (meth)acrylate claim 1 , cyclohexyl (meth)acrylate claim 1 , 2 claim 1 ,2 claim 1 ,5-trimethylcyclohexyl (meth)acrylate claim 1 , isobornyl (meth)acrylate claim 1 , and lauryl (meth)acrylate.3. The polyacrylic resin of claim 1 , wherein the organofunctional silane monomer is an alpha-silane selected from the group consisting of (methacryloxymethyl) methyldimethoxysilane claim 1 , (methacryloxymethyl)trimethoxysilane claim 1 , (methacryloxymethyl)methyldiethoxysilane claim 1 , and (methacryloxymethyl)triethoxysilane4. The polyacrylic resin of claim 1 , wherein the organofunctional silane monomer is a trialkoxysilyl alkyl (meth)acrylate monomer is selected from the group consisting of 3-((meth)acryloyloxy)propyltrimethoxysilane (trimethoxysilyl propyl (meth)acrylate) claim 1 , triethoxysilyl propyl (meth)acrylate claim 1 , methacryloxymethyl trimethoxysilane claim 1 , methacryloxymethyl triethoxysilane claim 1 , (methacryloxymethyl) methyldimethoxysilane claim 1 , (methacryloxymethyl) ...

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11-07-2019 дата публикации

POLYMER COMPOUND, FILM OBTAINED BY HARDENING THIS POLYMER COMPOUND AND ELECTRONIC DEVICE COMPRISING THIS FILM

Номер: US20190211123A1
Автор: YOKOI Yuki
Принадлежит: Sumitomo Chemical Company, Limited

A polymer compound comprising 2. The polymer compound according to claim 1 , wherein the content of said repeating unit represented by the formula (1) is 40% by mol or more when the total content of all repeating units contained in said polymer compound is taken as 100% by mol.6. A composition comprising the polymer compound according to and an organic solvent.7. A film obtained by hardening the polymer compound according to .8. An electronic device comprising the film according to .9. An organic thin film transistor comprising the film according to as a gate insulation layer. The present invention relates to a polymer compound, a film obtained by hardening the polymer compound and an electronic device comprising the film.As a driving device for driving a luminous device such as an organic electroluminescent device (organic EL device), an organic thin film field effect transistor (organic thin film transistor) in which voltage applied to a gate electrode (gate voltage) acts on an organic semiconductor layer via a gate insulating layer to control ON/OFF of a drain current is attracting attention.For example, the following Patent Document 1 describes an organic thin film field effect transistor having a gate insulation layer formed by using a resin composition containing (A) a polymer compound containing a repeating unit containing a fluorine atom and a repeating unit containing a functional group generating a second functional group reacting with active hydrogen by the action of electromagnetic wave or heat, and (B) at least one compound selected from the group consisting of a low molecular compound containing two or more active hydrogen atoms in the molecule and a polymer compound containing two or more active hydrogen atoms in the molecule; a gate electrode and an organic semiconductor layer.Patent Document 1: Japanese Unexamined Patent Application Publication No. 2011-38062In recent years, it has been demanded to further improve the carrier mobility of an organic ...

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12-08-2021 дата публикации

METHOD FOR PRODUCING VINYL-ETHER-GROUP-CONTAINING (METH)ACRYLIC ACID ESTER POLYMER, VINYL-ETHER-GROUP-CONTAINING (METH)ACRYLIC ACID ESTER POLYMER, AND POLYMER COMPOSITION

Номер: US20210246245A1
Автор: HASEGAWA Munehiro
Принадлежит:

The present invention aims to provide a method capable of easily and efficiently producing a vinyl ether group-containing (meth)acrylic acid ester polymer. The present invention relates to a method of producing a vinyl ether group-containing (meth)acrylic acid ester polymer, the method including group-transfer polymerizing a monomer component containing a vinyl ether group-containing (meth)acrylic acid ester represented by the following formula (1), in the presence of a carbon-carbon double bond-containing silane compound and a catalyst, 2. The method of producing a vinyl ether group-containing (meth)acrylic acid ester polymer according to claim 1 ,wherein the catalyst is at least one selected from the group consisting of an organic phosphorus compound, a N-heterocyclic carbene, a fluorine ion-containing compound, a cyclic amine compound, and an ammonium salt compound.3. The method of producing a vinyl ether group-containing (meth)acrylic acid ester polymer according to claim 1 ,wherein a solvent has an oxygen concentration of 1000 ppm or lower at the start of the polymerization.4. The method of producing a vinyl ether group-containing (meth)acrylic acid ester polymer according to claim 1 ,wherein the solvent has a water content of 1000 ppm or lower at the start of the polymerization.7. The vinyl ether group-containing (meth)acrylic acid ester polymer according to claim 5 ,wherein the polymer has a number average molecular weight of 1000 to 1000000.8. A vinyl ether group-containing (meth)acrylic acid ester polymer having a weight average molecular weight of 50000 or greater and a molecular weight distribution represented by a ratio of a weight average molecular weight to a number average molecular weight of 2.5 or less.10. The vinyl ether group-containing (meth)acrylic acid ester polymer according to claim 5 ,wherein an amount of a matter insoluble in ethyl acetate, toluene, or tetrahydrofuran relative to 100% by mass of the polymer is 10% by mass or less.13. A ...

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12-08-2021 дата публикации

POSITIVE RESIST COMPOSITION AND PATTERN FORMING PROCESS

Номер: US20210247694A1
Принадлежит: SHIN-ETSU CHEMICAL CO., LTD.

A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group. 1. A positive resist composition comprising a base polymer comprising recurring units having a carboxyl group whose hydrogen is substituted by a pyridine ring-containing tertiary hydrocarbyl group.3. The positive resist composition of claim 1 , further comprising recurring units of at least one type selected from recurring units having a carboxyl group whose hydrogen is substituted by an acid labile group other than a pyridine ring-containing tertiary hydrocarbyl group claim 1 , or recurring units having a phenolic hydroxyl group whose hydrogen is substituted by an acid labile group.5. The positive resist composition of claim 1 , wherein the base polymer further comprises recurring units having an adhesive group selected from the group consisting of a hydroxyl group claim 1 , a carboxyl group claim 1 , a lactone ring claim 1 , a carbonate group claim 1 , a thiocarbonate group claim 1 , a carbonyl group claim 1 , a cyclic acetal group claim 1 , an ether bond claim 1 , an ester bond claim 1 , a sulfonic acid ester bond claim 1 , a cyano group claim 1 , an amide bond claim 1 , —O—C(═O)—S— claim 1 , and —O—C(═O)—NH—.7. The positive resist composition of claim 1 , further comprising an acid generator.8. The positive resist composition of claim 1 , further comprising an organic solvent.9. The positive resist composition of claim 1 , further comprising a quencher.10. The positive resist composition of claim 1 , further comprising a surfactant.11. A pattern forming process comprising the steps of applying the positive resist composition of onto a substrate to form a resist film thereon claim 1 , exposing the resist film to high-energy radiation claim 1 , and developing the exposed resist film in a developer.12. The pattern forming process of wherein the high-energy radiation is i- ...

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18-07-2019 дата публикации

Polymer compound

Номер: US20190218324A1
Принадлежит: Fujifilm Corp

An object of the present invention is to provide a polymer compound capable of improving adhesiveness between a hydrophobic member and a hydrophilic member. The polymer compound of the present invention is a polymer compound having a repeating unit represented by Formula (I) and a repeating unit represented by Formula (II).

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16-07-2020 дата публикации

COMPOUND, RESIN PRECURSOR, CURED PRODUCT, OPTICAL ELEMENT, OPTICAL SYSTEM, INTERCHANGEABLE LENS FOR CAMERA, OPTICAL DEVICE, CEMENTED LENS, AND PRODUCTION METHOD FOR CEMENTED LENS

Номер: US20200223781A1
Принадлежит: NIKON CORPORATION

A compound expressed in the following formula (1) 2. A resin precursor comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'the compound according to ; and'}a curable composition.3. The resin precursor according to claim 2 , whereinthe curable composition is a photocurable composition.4. The resin precursor according to claim 2 , whereinthe curable composition includes at least one selected from a group consisting of a fluorine-containing acrylate compound, a fluorine-containing methacrylate compound, an acrylate compound having a fluorene structure, a methacrylate compound having a fluorene structure, a diacrylate compound, and a dimethacrylate compound.5. The resin precursor according to claim 2 , whereinthe curable composition includes at least one selected from a group consisting of 1,6-di(meth)acryloyloxy-2,2,3,3,4,4,5,5-octafluorohexane, 9,9-bis[4-(2-acryloyloxyethoxy)phenyl]fluorene, and 1,6-hexanediol diacrylate.6. The resin precursor according to claim 2 , whereina content of the compound is 10 to 50 mass %.7. A cured product obtained by curing the resin precursor according to .8. The cured product according to claim 7 , whereina θgF value is set to 0.5 or greater.9. The cured product according to claim 7 , wherein{'sub': 'd', 'a refractive index (n) for a d-line is set to 1.50 or higher and 1.65 or lower.'}10. The cured product according to claim 7 , wherein{'sub': 'd', 'an Abbe number (ν) is set to 10 or greater and 40 or smaller.'}11. The cured product according to claim 7 , whereinan internal transmittance is 90% or higher over a wavelength range of 440 to 650 nm.12. An optical element obtained by using the cured product according to .13. An optical system comprising the optical element according to .14. An interchangeable lens for camera comprising the optical system according to .15. An optical device comprising the optical system according to .16. A cemented lens comprising a first lens element and a second lens element bonded by interposing ...

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06-11-2014 дата публикации

Process for continuously producing water-absorbing polymer particles

Номер: US20140328723A1
Принадлежит: BASF SE

A process for continuously producing water-absorbing polymer particles by polymerizing a monomer solution comprising acrylic acid and/or salts thereof, wherein the acrylic acid supplied has a dimeric acrylic acid content of at least 0.02% by weight and the dimeric acrylic acid content is kept essentially constant.

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23-08-2018 дата публикации

PHOTOSENSITIVE COMPOSITION, IMPRINT METHOD, AND INTERLAYER LAYER

Номер: US20180237562A1
Принадлежит: Toshiba Memory Corporation

According to an embodiment, a photosensitive composition is provided. The photosensitive composition contains a photosensitive material. The photosensitive composition, when a whole amount of the composition is 100 pts. mass, a sum total of values each obtained by multiplying a SP value, which is a solubility parameter, by a mass percentage of a photopolymerizable monomer contained in the composition is any value within a range of 17 to 20 [(J/cm)]. 119-. (canceled)20. A method of imprinting , the method comprising:forming an interlayer layer on a substrate to which a template pattern formed in a template is to be transferred; anddropping a photosensitive composition on the interlayer layer; andforming a resist pattern corresponding to the template pattern on the substrate by pressing the template against the photosensitive composition, wherein{'sup': 3', '1/2, 'the photosensitive composition contains a photosensitive material, and, when a total amount of monomers in the photosensitive composition is 100 pts. mass, a sum total of values is within a range of 17 to 20 (J/cm), each of the values being obtained by multiplying a SP value, which is a solubility parameter of each component contained in the photosensitive composition, by a mass percentage of each component contained in the photosensitive composition, and,'}{'sup': 3', '1/2, 'when a total amount of a component contained in the interlayer layer is 100 pts. mass, a sum total of values is within a range of 17 to 21 (J/cm), each of the values being obtained by multiplying a SP value, which is a solubility parameter of each component contained in the interlayer layer, by a mass percentage of each component contained in the interlayer layer.'}21. The method of imprinting according to claim 20 , whereinthe photosensitive composition is dropped on the substrate by an inkjet method.22. The method of imprinting according to claim 20 , whereinthe photosensitive composition is a substance capable of dissolving a ...

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01-08-2019 дата публикации

FLUORINE-CONTAINING POLYMER AND RUST INHIBITOR CONTAINING THE SAME AS ACTIVE INGREDIENT

Номер: US20190233564A1
Автор: KIJIMA Tetsushi
Принадлежит: UNIMATEC CO., LTD.

A fluorine-containing copolymer comprises, as copolymer units, 2. A rust inhibitor comprising the fluorine-containing copolymer as an active ingredient according to claim 1 , which is further copolymerized with a fluorine-containing polymerizable monomer represented by the general formula:{'br': None, 'sub': 2', '2', 'm, 'sup': 1', '2, 'CH═CRCOOR(NRSO)Rf \u2003\u2003[II]'}{'sup': 1', '2, 'wherein R is a hydrogen atom or a methyl group, Ris a linear or branched alkylene group having 1 to 6 carbon atoms, Ris a lower alkyl group having 1 to 4 carbon atoms, Rf is a perfluoroalkyl group having 1 to 6 carbon atoms, and m is 0 or 1.'}3. The rust inhibitor comprising the fluorine-containing copolymer as an active ingredient according to claim 1 , wherein the polyfluoroalkyl alcohol (meth)acrylic acid derivative [I] or a combination thereof with the other fluorine-containing polymerizable monomer [II] claim 1 , and the (meth)acrylic acids or esters thereof [III] and [IV] are copolymerized at a weight ratio of 1 to 99:99 to 1.4. (canceled)5. The rust inhibitor comprising the fluorine-containing copolymer as an active ingredient according to claim 1 , which has a weight-average molecular weight (Mw) of 2 claim 1 ,000 to 2 claim 1 ,000 claim 1 ,000.6. (canceled)7. The rust inhibitor according to claim 1 , which is prepared as an organic solvent solution8. The rust inhibitor according to claim 7 , which is prepared as a fluorine-containing organic solvent solution.9. The rust inhibitor according to claim 1 , which is used as a water- and oil-repellent.10. The rust inhibitor according to claim 2 , which is used as a water- and oil-repellent.11. The rust inhibitor according to claim 3 , which is used as a water- and oil-repellent. The present invention relates to a fluorine-containing polymer and a rust inhibitor containing the polymer as an active ingredient. More specifically, the present invention relates to a fluorine-containing polymer that is a copolymer of a (meth)acrylic ...

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20-11-2014 дата публикации

FLUORINATED COPOLYMER AND PROCESS FOR ITS PRODUCTION, AND WATER/OIL REPELLENT COMPOSITION

Номер: US20140343206A1
Принадлежит: Asahi Glass Company, Limited

To provide a fluorinated copolymer and a water/oil repellent composition, whereby adequate water/oil repellency and excellent dynamic water repellency are obtainable and environmental impact is low. A fluorinated copolymer comprising units (A1) derived from a macromonomer wherein the average polymerization degree of e.g. 2-perfluorohexylethyl acrylate is from 20 to 30, and units (B) derived from a monomer (b) which has no fluoroalkyl group and no cross-linkable functional group and of which the glass transition temperature, when formed into a homopolymer, is from 50 to 150° C., wherein the average polymerization degree of the macromonomer per one molecule of the fluorinated copolymer is at least 1, and a water/oil repellent composition containing such a fluorinated copolymer. 2. The fluorinated copolymer according to claim 1 , wherein Ris a hydrogen atom claim 1 , Y is a Cpolymethylene group claim 1 , and Ris a Clinear or branched perfluoroalkyl group.3. The fluorinated copolymer according to claim 1 , wherein the monomer (z) is at least one member selected from the group consisting of 2-perfluorohexylethyl acrylate and 2-perfluorohexylyethyl methacrylate.4. The fluorinated copolymer according to claim 1 , wherein the monomer (b) is an alkyl (meth)acrylate wherein the alkyl group has from 1 to 4 carbon atoms.5. The fluorinated copolymer according to claim 4 , wherein the monomer (b) is at least one member selected from the group consisting of methyl methacrylate claim 4 , isobutyl methacrylate and t-butyl methacrylate.6. The fluorinated copolymer according to claim 1 , wherein the fluorinated copolymer further has units (C) derived from a monomer (c) which has a cross-linkable functional group and no fluoroalkyl group.7. The fluorinated copolymer according to claim 6 , wherein the monomer (c) is a monomer having a cross-linkable functional group selected from a hydroxy group claim 6 , a blocked isocyanate group claim 6 , an amino group and an epoxy group.8. The ...

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20-11-2014 дата публикации

Fluorinated copolymer and process for its production, and water/oil repellent composition

Номер: US20140343207A1
Принадлежит: Asahi Glass Co Ltd

To provide a fluorinated copolymer and a water/oil repellent composition having adequate water/oil repellency, excellent washing durability and low environmental impact. A fluorinated copolymer comprising units (A) derived from a macromonomer (a) which has, on average, at least two units (X) derived from 2-perfluorohexylethyl (meta)acrylate or the like, units (B) derived from a monomer (b) which has no fluoroalkyl group and no cross-linkable functional group and of which the glass transition temperature, when formed into a homopolymer, is from 50 to 150° C., and units (C) derived from a monomer (c) which has a cross-linkable functional group and no fluoroalkyl group, and a water/oil repellent composition containing such a fluorinated copolymer.

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15-08-2019 дата публикации

METHOD FOR PRODUCING COPOLYMER

Номер: US20190248940A1
Автор: ABE Nobunori, OZAWA Kakuei
Принадлежит: ZEON CORPORATION

The present disclosure provides a method for efficiently producing an α-alkylstyrene α-chloroacrylate copolymer having a high monomer conversion rate. According to the present disclosure, the method for producing a copolymer containing 30 mol % to 70 mol % of an α-alkylstyrene unit and 30 mol % to 70 mol % of an α-chloroacrylate unit includes a step of performing solution polymerization of a monomer composition containing α-alkylstyrene and α-chloroacrylate, and uses ketone as a polymerization solvent for the solution polymerization. 1. A method for producing a copolymer containing 30 mol % to 70 mol % of an α-alkylstyrene unit and 30 mol % to 70 mol % of an α-chloroacrylate unit , the method for producing a copolymer includes:a step of performing solution polymerization of a monomer composition containing α-alkylstyrene and α-chloroacrylate,wherein ketone is used as a polymerization solvent for the solution polymerization.2. The method for producing a copolymer according to claim 1 ,wherein cycloketone is used as the polymerization solvent.3. The method for producing a copolymer according to claim 1 ,wherein cyclopentanone or cyclohexanone is used as the polymerization solvent.4. The method for producing a copolymer according to claim 1 ,wherein α-methylstyrene is used as α-alkylstyrene, and methyl α-chloroacrylate is used as α-chloroacrylate.5. The method for producing a copolymer according to claim 1 ,wherein a total content of the α-alkylstyrene unit and the α-chloroacrylate unit in the copolymer accounts for 100 mol %.6. The method for producing a copolymer according to claim 1 ,wherein a weight-average molecular weight of the copolymer is 30000 to 100000.7. The method for producing a copolymer according to claim 1 ,wherein a weight-average molecular weight of the copolymer is 50000 to 70000.8. The method for producing a copolymer according to claim 1 ,wherein a molecular weight distribution of the copolymer obtained by dividing weight-average molecular weight ...

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22-09-2016 дата публикации

SUBSTRATE COMPRISING A SURFACE COATED WITH AN EPILAMIZATION AGENT AND METHOD FOR EPILAMIZATION OF SUCH A SUBSTRATE

Номер: US20160272842A1

A substrate including a surface, at least one part of which is coated with an epilamization agent including at least one compound in the form of a statistical copolymer comprising M units, N units and optionally at least one P unit, linked by covalent bonds by their main chains and randomly distributed, where 2. The statistical copolymer according to claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , which may be identical or different claim 1 , are H or a CHgroup.3. The statistical copolymer according to claim 1 , wherein Y claim 1 , X claim 1 , which may be identical or different claim 1 , are selected from the group comprising C-Cester groups claim 1 , amide groups claim 1 , and styrene derivative groups.4. The statistical copolymer according to claim 3 , wherein Y claim 3 , X claim 3 , which may be identical or different claim 3 , are C-Cester groups.5. The statistical copolymer according to claim 1 , wherein the copolymer comprises at least two different A anchoring moieties.6. The statistical copolymer according to claim 1 , wherein L is a C-Ccarbon moiety.7. The statistical copolymer according to claim 6 , wherein L is a C-Ccarbon moiety.8. The statistical copolymer according to claim 1 , wherein L is an at least partially fluorinated moiety.9. The statistical copolymer according to claim 1 , wherein L is a completely fluorinated moiety.10. The statistical copolymer according to claim 1 , wherein the copolymer comprises between 0.1% and 50% of M units claim 1 , between 1% and 99.9% of N units claim 1 , and between 0% and 50% of P units.11. The statistical copolymer according to claim 10 , wherein the copolymer comprises between 5% and 30% of M units claim 10 , between 50% and 99.9% of N units claim 10 , and between 0% and 30% of P units.12. The statistical copolymer according to claim 1 , wherein the copolymer comprises between 10 and 350 units.14. The substrate according to claim 13 , wherein R claim 13 , R claim 13 , R claim 13 , which may be identical ...

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09-12-2021 дата публикации

FLUORINATED POLYMERS FOR CORROSION PROTECTION OF METAL

Номер: US20210379621A1
Принадлежит: University of North Texas

The hydrophobic and corrosion resistive film of cross-linked poly(hexafluoroisopropyl methacrylate) was prepared by photopolymerization. The starting materials were a monomer of 1,1,1,3,3,3-hexafluoroisopropyl methacrylate, a photoinitiator of hydroxycyclohexyl phenyl ketone, and a cross-linker of poly(ethyleneglycol diacrylate). Photopolymerization was used to start polymerization and to cure the polymer film on an aluminum surface. Drop-casting was used to deposit the fluoropolymer onto an aluminum substrate (AA 3003). The fluoropolymer film has high corrosion protection when measured by potentiodynamic polarization and open circuit potential techniques in an aqueous solution of 3.5% NaCl. Fourier-transform infrared spectroscopy was used to monitor the polymerization process. The dynamic contact angle technique was used to measure the hydrophobicity for the fluorinated polymer coating. Thermal stability of the fluorinated polymer was measured using thermogravimetric analysis. Treatment with strong acid followed by contact angle measurements before and after the treatment confirmed the chemical resistance for the coated aluminum. 2. The composition of wherein Rand Rare branch or unbranched —(C-C)fluoroalkyl wherein —(C-C)fluoroalkyl has at least three fluoro substituents.3. The composition of wherein Rand Rare methyl.4. The composition of wherein m and p are each independently about 100 to about 100 claim 1 ,000.5. The composition of wherein the haloalkyl-monomer moiety is 1 claim 1 ,1 claim 1 ,1 claim 1 ,3 claim 1 ,3 claim 1 ,3-hexafluoroisopropyl methacrylate (HFiPMA) or 2 claim 1 ,2 claim 1 ,3 claim 1 ,4 claim 1 ,4 claim 1 ,4-hexafluorobutyl methacrylate (HFBMA).6. The composition of wherein the PEG-monomer moiety is poly(ethyleneglycol diacrylate) wherein n is about 100 to about 100 claim 1 ,000.7. The composition of wherein the etched metal is aluminum alloy or steel.8. The composition of wherein the etched metal is aluminum alloy 3003 having a weight percent ...

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05-10-2017 дата публикации

POLYMER, COMPOSITION, OPTICAL FILM, AND LIQUID CRYSTAL DISPLAY DEVICE

Номер: US20170283701A1
Автор: IIJIMA Koji, TAMURA Akio
Принадлежит: FUJIFILM Corporation

A polymer is obtained by polymerizing a monomer having two or more radical polymerizable double bonds and one or more hydroxyl groups. A composition including the polymer, an optical film including a cholesteric liquid crystal layer containing the polymer on a support, and a liquid crystal display device including at least a backlight unit including the optical film and a liquid crystal cell are provided. 1. A polymer obtained by polymerizing a monomer having two or more radical polymerizable double bonds and one or more hydroxyl groups.2. The polymer according to claim 1 , wherein the monomer is represented by the following Formula X claim 1 ,{'br': None, 'sup': X1', 'X1', 'X2', 'X3', 'X4', 'X2, 'sub': 'n', 'Z-L-L-M\ue8a0L-L-Z)\u2003\u2003Formula X'}{'sup': X1', 'X2', 'X1', 'X4', 'X2', 'X3, 'in Formula X, Zand Zeach independently represent a group having a radical polymerizable double bond, Land Leach independently represent a single bond or an alkylene group having a hydroxyl group, Land Leach independently represent a single bond or a divalent linking group including at least one selected from the group consisting of —O—, —(C═O)O—, —O(C═O)—, a divalent chained group, an alkylene group having a hydroxyl group, and a divalent cyclic aliphatic group, M represents a single bond or a divalent to tetravalent linking group, and n represents an integer of 1 to 3.'}4. The polymer according to having a partial structure formed by polymerizing a compound having a fluorine atom.6. The polymer according to claim 1 , wherein a weight-average molecular weight is 1 claim 1 ,000 to 300 claim 1 ,000 in terms of polystyrene by gel permeation chromatography.7. The polymer according to claim 6 , wherein the weight-average molecular weight is 1 claim 6 ,000 to 10 claim 6 ,000 in terms of polystyrene by gel permeation chromatography.8. The polymer according to having a highly branched structure.9. A composition comprising the polymer according to .10. The composition according to claim ...

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20-10-2016 дата публикации

ADDITIVES FOR ORIENTATION CONTROL OF BLOCK COPOLYMERS

Номер: US20160304740A1
Принадлежит:

A film layer comprising a high-chi (χ) block copolymer for self-assembly and a surface active polymer (SAP) was prepared on a substrate surface that was neutral wetting to the domains of the self-assembled block copolymer. The block copolymer comprises at least one polycarbonate block and at least one other block (e.g., a styrene-based block). The SAP comprises a hydrophobic fluorinated first repeat unit and a non-fluorinated second repeat unit bearing at least one pendent OH group present as an alcohol or acid (e.g., carboxylic acid). The film layer, whose top surface has contact with an atmosphere, self-assembles to form a lamellar or cylindrical domain pattern having perpendicular orientation with respect to the underlying surface. Other morphologies (e.g., islands and holes of height 1.0Lo) were obtained with films lacking the SAP. The SAP is preferentially miscible with, and lowers the surface energy of, the domain comprising the polycarbonate block. 2. The composition of claim 1 , wherein the composition is suitable for forming a layer for self-assembly (SA layer) disposed on an underlayer of a substrate claim 1 , the SA layer comprises the block copolymer and the SAP in non-covalent association,', 'the SA layer has a top surface in contact with an atmosphere,', 'the underlayer is neutral wetting to the block copolymer,', 'the block copolymer of the SA layer is capable of self-assembly to form a phase separated domain pattern having a characteristic pitch Lo,', 'the domain pattern comprises alternating domains comprising respective chemically distinct blocks of the block copolymer,', 'each of the domains has contact with the underlayer and the atmosphere, and', 'a domain comprising the polycarbonate block (polycarbonate domain) has a higher concentration of the SAP compared to a domain comprising the first block of the block copolymer., 'wherein'}3. The composition of claim 2 , wherein the polycarbonate domain has lower surface energy compared to an otherwise ...

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26-09-2019 дата публикации

Polymer Composition

Номер: US20190292286A1
Принадлежит: LG CHEM, LTD.

A polymer composition, methods and a use thereof are disclosed herein. The polymer composition having excellent self-assembly properties and capable of forming a vertical orientation structure even on a surface that no neutral treatment is performed, where the vertically oriented self-assembled structure can be effectively formed in a short time. 1. A polymer composition comprising:a first block copolymer having a polymer segment A and a polymer segment B; anda second block copolymer having a polymer segment C and a polymer segment D,wherein the second block copolymer having a number average molecular weight (M2) lower than a number average molecular weight (M1) of the first block copolymer.2. The polymer composition according to claim 1 , wherein a ratio to M2 is in a range of 1.05 to 10.3. The polymer composition according to claim 2 , wherein M1 is in a range of 30 to 150 Kg/mol.4. The polymer composition according to claim 2 , wherein M2 is in a range of 10 to 80 Kg/mol.5. The polymer composition according to claim 1 , wherein a difference between M1 and M2 is less than 100 kg/mol.6. The polymer composition according to claim 1 , wherein the second block copolymer in the polymer composition has the lowest number average molecular weight and the second block copolymer has a weight ratio in a range of 25% to 90% claim 1 , based on the total weight of all the block copolymers in the polymer composition.7. The polymer composition according to claim 1 , wherein the second block copolymer in the polymer composition has the lowest number average molecular weight claim 1 , and the second block copolymer has a molar ratio in a range of 40% to 90% claim 1 , based on the total mole number of all the block copolymers in the polymer composition.8. The polymer composition according to claim 1 , wherein the polymer segments A and C each have a side chain and exhibit an X-ray diffraction peak having a half-height width in a range of 0.2 to 1.5 nmin a scattering vector range of ...

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25-10-2018 дата публикации

FLUORINATED POLYMERS COMPRISING PHOSPHONIC MOIETIES

Номер: US20180305482A1
Принадлежит:

Described herein is a polymer derived from (a) a fluorinated monomer selected from (i) CF(CH)zOC(═O)CR═CHwherein n is an integer selected from 1 to 8, z is an integer selected from 1 to 20, and R is H or CH; and (ii) CFSO(NR′)(CH)OC(═O)CR═CHwherein n is an integer selected from 1 to 8; z is an integer selected from 2 to 20, and R is H or CHand R′ is H or C1-C8 alkyl group; and (b) a monomer comprising a phosphonic moiety, along methods thereof and articles comprising such polymer. 1. A polymer derived from [{'sub': n', '(2n+1)', '2', 'z', '2', '3, '(i) CF(CH)OC(═O)CR═CHwherein n is an integer selected from 1 to 8, z is an integer selected from 1 to 20, and R is H or CH; and'}, {'sub': n', '(2n+1)', '2', '2', 'z', '2', '3, '(ii) CFSO(NR′)(CH)OC(═O)CR═CHwherein n is an integer selected from 1 to 8; z is an integer selected from 3 to 20, and R is H or CHand R′ is H or C1-C8 alkyl group; and'}], '(a) a fluorinated monomer comprising at least one of'}(b) a monomer comprising a phosphonic moiety.2. The polymer of claim 1 , wherein the polymer is substantially free of a fluoropolyether segment.3. The polymer of claim 1 , wherein the monomer comprising a phosphonic moiety comprises at least one of a vinyl phosphonic acid claim 1 , an allyl phosphonic acid claim 1 , and a (meth)acryloylphosphonic acid.4. The polymer of claim 3 , wherein the monomer comprising a phosphonic moiety comprises at least one of CH═CHPOH claim 3 , CH═CHCHPOH claim 3 , CH═CHC(═O)O(CH)POH claim 3 , and salts thereof.5. The polymer of claim 1 , wherein the fluorinated monomer is selected from: CFCFCFCH—O—C(═O)C(CH)═CH; and CFCHCHOC(═O)CH═CH.6. An article comprising a metallic substrate and a coating layer thereon claim 1 , wherein the coating layer comprises the polymer of .7. The article of claim 6 , wherein the metallic substrate comprises a metal claim 6 , wherein the metal comprises at least one of aluminum claim 6 , steel claim 6 , silver claim 6 , copper claim 6 , chrome claim 6 , and nickel.8. ...

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24-09-2020 дата публикации

COPOLYMERS OF HALOGENATED OLEFINS AND HALOGENATED CO-MONOMERS

Номер: US20200299433A1
Принадлежит:

Copolymers of one or more halogenated olefins and one or more halogenated co-monomers selected from the group consisting of halogenated alkenyl ethers, halogenated alkenyl esters, and halogenated (meth)acrylates are useful in various end-use applications wherein the presence of halogen (e.g., fluorine) in the copolymer imparts one or more desirable properties, as compared to analogous copolymers not containing halogen. 1. A copolymer of a) at least one halogenated olefin and b) at least one halogenated co-monomer selected from the group consisting of halogenated vinyl ethers , halogenated vinyl esters , and halogenated (meth)acrylates.3. The copolymer of claim 2 , wherein the halogenated olefin comprises at least one fluorine atom.4. The copolymer of claim 2 , wherein the halogenated olefin comprises at least one halogen atom which is selected from the group consisting of a fluorine atom and a chlorine atom and which is bonded to at least one carbon atom participating in a carbon-carbon double bond in the halogenated olefin.5. The copolymer of claim 1 , wherein the at least one halogenated olefin comprises a halogenated olefin selected from the group consisting of CClF═CF claim 1 , CH═CF claim 1 , CFH═CH claim 1 , CF═CHF claim 1 , CF═CF claim 1 , CHF═CHF claim 1 , CFCF═CH claim 1 , CF═CHCl claim 1 , CFCH═CHF claim 1 , CClF═CH claim 1 , CF═CF claim 1 , CFCCl═CH claim 1 , CFCH═CHCl claim 1 , CFCF═CFH claim 1 , CFCH═CF claim 1 , CFCF═CFCF claim 1 , CFCFCF═CF claim 1 , CFCH═CHCF claim 1 , CFHCHCF═CH claim 1 , CFHCHCF═CClH claim 1 , CFHCH═CFCHCl and CF—CF═CF.6. The copolymer of claim 1 , wherein the at least one co-monomer comprises at least one halogenated vinyl ether comprised of at least one fluorine atom.9. The copolymer of claim 8 , wherein at least one of c or d is an integer of from 1 to 2a+1.10. The copolymer of claim 1 , wherein the at least one co-monomer comprises a halogenated vinyl ether selected from the group consisting of CF—C(OR)═CH claim 1 , CFC(OR)═CFH ...

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24-09-2020 дата публикации

POLYMERS OF HALOALKYL AND HALOALKENYL ETHER (METH)ACRYLATES

Номер: US20200299442A1
Принадлежит:

A curable composition containing at least one of a haloalkyl ether (meth)acrylate or a haloalkenyl ether (meth)acrylate and, optionally, one or more different types of co-monomers is cured to provide a polymer having advantageous properties as a result of the incorporation of halogenated functionality derived from the haloalkyl/haloalkenyl ether (meth)acrylate monomer. 1. A polymer comprising , in polymerized form , at least one haloalkyl/haloalkenyl ether (meth)acrylate comprising a haloalkyl or haloalkenyl moiety bonded through an ether linkage and an organic spacer moiety to a (meth)acrylate functional group.3. The polymer of claim 2 , wherein the polymer comprises claim 2 , in polymerized form claim 2 , at least one haloalkyl ether (meth)acrylate corresponding to general structure (I) wherein at least two of X claim 2 , X claim 2 , Xor Xare selected from the group consisting of halogens and haloalkyl groups.4. The polymer of claim 2 , wherein the polymer comprises claim 2 , in polymerized form claim 2 , at least one haloalkyl ether (meth)acrylate corresponding to general structure (I) wherein at least two of X claim 2 , X claim 2 , Xor Xare selected from the group consisting of fluorine and fluoroalkyl groups.5. The polymer of claim 2 , wherein the polymer comprises claim 2 , in polymerized form claim 2 , at least one haloalkyl ether (meth)acrylate corresponding to general structure (I) wherein at least one of X claim 2 , X claim 2 , Xor Xis fluorine or a fluoroalkyl group.6. The polymer of claim 2 , wherein the polymer comprises claim 2 , in polymerized form claim 2 , at least one haloalkyl ether (meth)acrylate corresponding to general structure (I) wherein each of X claim 2 , X claim 2 , Xand Xis halogen or a haloalkyl group.7. The polymer of claim 2 , wherein the polymer comprises claim 2 , in polymerized form claim 2 , at least one haloalkyl ether (meth)acrylate corresponding to general structure (I) wherein one of X claim 2 , X claim 2 , Xor Xis a C1-C8 ...

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09-11-2017 дата публикации

Optical Fiber, Method for Manufacturing Optical Fiber, Optical Fiber Cable, and Sensor

Номер: US20170322372A1
Принадлежит: Mitsubishi Chemical Corp

The present invention provides a plastic optical fiber comprising a core and a sheath consisting of at least one layer, the plastic optical fiber having a transmission loss of 120 dB/km or less as measured by a 25 m-1 m cutback method under conditions of a wavelength of 525 nm and an excitation of NA=0.45, and satisfying either one of the following conditions when a thickness of the innermost sheath layer is 0.5 μm to 4.5 μm, an amount of foreign matter having a size of 2 μm or greater contained in the innermost sheath layer is 2000/cm 3 or less, or a size X (μm) of foreign matter contained in the innermost sheath layer and an amount Y of the foreign matter (number/cm 3 ) satisfy formula (1) below: Y≦1200 X e (−0.067×X) (1). Such optical fibers have a low transmission loss of green light (in particular, light having a wavelength of 525 nm), enabling longer distance communication.

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09-11-2017 дата публикации

PHOTOSENSITIVE RESIN COMPOSITION, PRODUCTION METHOD FOR RESIN FILM, PRODUCTION METHOD FOR ORGANIC SEMICONDUCTOR ELEMENT, AND FLUORINE-CONTAINING POLYMER

Номер: US20170322488A1
Принадлежит: Asahi Glass Company, Limited

To provide a photosensitive resin composition containing a crosslinkable fluororesin which hardly damages a substrate of e.g. an organic semiconductor when a resin film is formed, and a resin film using it, an organic semiconductor device and its production process, and a fluororesin suitable for the photosensitive resin composition. 1. A photosensitive resin composition comprising the following fluororesin (A) , the following crosslinking agent (B) , a photoinitiator and the following solvent (D):fluororesin (A): a fluororesin having a polymerizable carbon-carbon double bond and having a fluorine atom content of at least 47 mass %;crosslinking agent (B): a crosslinking agent having a polymerizable carbon-carbon double bond (excluding the fluororesin (A)); andsolvent (D): a solvent composed of a fluorinated compound having no aromatic ring, which is liquid at 25° C.3. The photosensitive resin composition according to claim 1 , wherein the crosslinking agent (B) is a crosslinking agent having fluorine atoms claim 1 , having a fluorine atom content of at least 20 mass %.4. The photosensitive resin composition according to claim 1 , which has a solid content concentration of from 3 to 40 mass %.5. The photosensitive resin composition according to claim 1 , wherein based on the total amount (100 mass %) of the fluororesin (A) and the crosslinking agent (B) claim 1 , the proportion of the fluororesin (A) is from 60 to 90 mass % claim 1 , and the proportion of the crosslinking agent (B) is from 10 to 40 mass %.6. The photosensitive resin composition according to claim 1 , wherein the solvent (D) is a fluorinated aliphatic hydrocarbon compound claim 1 , a fluorinated alkylamine compound claim 1 , a fluorinated alcohol compound claim 1 , a fluorinated aliphatic ether compound or a fluorinated cyclic ether compound.7. The photosensitive resin composition according to claim 1 , wherein the boiling point of the solvent (D) is at least 80° C.8. The photosensitive resin ...

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08-10-2020 дата публикации

SOFT HYDROPHOBIC ACRYLIC MATERIALS

Номер: US20200316251A1
Принадлежит:

Soft hydrophobic acrylic materials with improved resistance to fluid diffusion and suitable mechanical properties that allow deformation upon application of force are disclosed. The acrylic materials are particularly suitable for use in fluid-based accommodating intraocular lenses and comprises combination of a perfluoro-substituted alkyl (meth)acrylate and an alkyl (meth)acrylate, and a cross-linking agent. 118-. (canceled)19. An accommodating intraocular lens , comprising a soft hydrophobic acrylic material which has a storage modulus of from about 0.5 MPa to about 3.0 MPa as measured by dynamic mechanical analysis under compression mode at about 35° C. and a silicone uptake of less than about 2.0% by weight after accelerated aging in a silicone fluid for 32 days at 70° C. , wherein the acrylic material is obtained from a polymerizable composition comprising: a) from about 65% to about 80% by weight of at least one perfluoro-substitued-C-Calkyl (meth)acrylate: b) from about 200% to about 35% by weight of at least one C-Calkyl (meth)acrylate; and c) at least one cross-linking agent , provided that the polymerizable composition is substantially free of any aryl acrylic monomer.20. The accommodating intraocular lens of claim 19 , wherein the polymerizable composition comprises less than about 2% by weight of any aryl acrylic monomer.21. The accommodating intraocular lens of claim 20 , wherein the acrylic material is characterized by having a storage modulus of from about 0.75 MPa to about 2.5 MPa measured by dynamic mechanical analysis under compression mode at about 35° C. and a silicone uptake of less than about 1.5% by weight after accelerated aging in a silicone fluid for 32 days at 70° C.22. The accommodating intraocular lens of claim 20 , wherein the acrylic material is characterized by having a storage modulus of from about 1.0 MPa to about 2.0 MPa measured by dynamic mechanical analysis under compression mode at about 35° C. and a silicone uptake of less than ...

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24-10-2019 дата публикации

MATERIAL FOR CELL PATTERNING USE

Номер: US20190322784A1
Принадлежит:

Disclosed are a cell culture substrate that can be modified from its cell-inadhesibleness to make it cell-adhesible, by a convenient and low-cost treatment, and particularly, a substrate that allows position-specific culture of one or more kinds of cells. The substrate has on its surface a layer made of a photomodifiable polymer that comprises a monomer, as component (A), represented by Formula (1): 2. The photomodifiable polymer according to claim 1 , wherein each of the alkoxyl groups of the trialkoxysilyl group in component (B) is claim 1 , independently claim 1 , an alkoxyl group having 1-4 carbon atoms.3. The photomodifiable polymer according to claim 1 , wherein the trialkoxysilyl group of component (B) is located at the end of the polymer chain that comprises a portion composed of polymerized multiple components (A).5. The photomodifiable polymer according to comprising the component (A) represented by Formula (1) and the component (B) represented by Formula (2) claim 4 , wherein the molar ratio of component (A):component (B) is 75:25 to 98:2.7. A cell culture substrate comprising a base material and a polymer layer formed on the surface thereof claim 1 , wherein the polymer layer consists of the photomodifiable polymer according to claim 1 , and is held on the base material with a bond produced by a reaction between the trialkoxysilyl group of the component (B) and the base material.8. The cell culture substrate according to claim 7 , wherein the base material consists of glass claim 7 , ceramic claim 7 , metal claim 7 , or of a resin treated with a glass-based primer.9. A method for producing a cell culture substrate claim 1 , wherein the method comprises applying the photomodifiable polymer according to to the surface of a base material.11. The method according to claim 10 , wherein the base material consists of glass claim 10 , ceramic claim 10 , metal claim 10 , or of a resin treated with a glass-based primer.12. A method for coculturing different kinds ...

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24-10-2019 дата публикации

(meth)acrylate compound, additive for optical resin, optical element, and optical device

Номер: US20190322857A1
Принадлежит: Nikon Corp

[in general formula (1), each X independently represents a fluorine atom or a methyl group in which at least one hydrogen atom is substituted with a fluorine atom; m represents an integer of 0 to 5; R1 represents an alkylene group or an oxyalkylene group having a carbon number of 1 to 8; and R2 represents a hydrogen atom or a methyl group].

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10-12-2015 дата публикации

Multivalent Polymers for Clay Aggregation

Номер: US20150353664A1
Автор: Sortwell Edwin T.
Принадлежит:

The disclosure relates generally to the use of polymers to assist in aggregating mineral components in aqueous mineral slurries to release and separate individual components of the slurry, which may then be recovered from the slurry. 1. A polymer comprising a water-soluble multivalent cation-containing acrylate copolymer wherein the polymer has an intrinsic viscosity of at least 3 dl/gm and a molecular weight of at least four million.2. The polymer of wherein the polymer is substantially free of monovalent cations.3. The polymer of wherein the multivalent cations are selected from the group consisting of calcium claim 1 , magnesium claim 1 , iron claim 1 , and aluminum.4. The polymer of wherein only a single species of multivalent cation is present in the polymer.5. The polymer of wherein the polymer is a calcium- or magnesium-containing diacrylate copolymer with acrylamide.6. The polymer of wherein the polymer is a diacrylate/acrylamide copolymer.7. The polymer of wherein the polymer is a diacrylate/acrylamide/2-acrylamido-2-methylpropane sulfonic acid (AMPS) terpolymer.8. The polymer of wherein the polymer is branched.9. The polymer of wherein the polymer is prepared by solution polymerization or emulsion polymerization. This is a division of U.S. patent application Ser. No. 13/704,215, which is the U.S national phase of PCT/JP2011/044437 filed Jul. 19, 2011, which claims the priority of U.S. 61/367,834 filed Jul. 26, 2010, U.S. 61/367,812 filed Jul. 26, 2010, U.S. 61/382,862 filed Sep. 14, 2010, U.S. 61/420,100 filed Dec. 6, 2010, U.S. 61/447,539 filed Feb. 28, 2011, and U.S. 61/491,058 filed May 27, 2011, the respective entire disclosures of which are incorporated herein by reference.1. Field of the InventionThe invention relates generally to polymers and the use of thereof to assist in aggregating mineral components in aqueous mineral slurries to release and separate individual components of the slurry, which may then be recovered from the slurry.2. Related ...

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29-10-2020 дата публикации

PRESSURE-SENSITIVE ADHESIVE TAPE, PRESSURE-SENSITIVE ADHESIVE TAPE FOR AFFIXING COMPONENT FOR ELECTRONIC APPLIANCE, AND TRANSPARENT PRESSURE-SENSITIVE ADHESIVE TAPE FOR OPTICAL USE

Номер: US20200339843A1
Принадлежит: Sekisui Chemical Co., Ltd.

The present invention aims to provide an adhesive tape excellent in resistance against sebum to be able to maintain its adhesive force even when applied to a part frequently touched with human hands, and an adhesive tape for fixing electronic device component and a transparent adhesive tape for optical use each provided with the adhesive tape. The present invention relates to an adhesive tape including an adhesive layer containing an acrylic adhesive, the adhesive layer having a swelling ratio of 100% or more and 130% or less after immersion in oleic acid under the conditions of a temperature of 60° C. and a humidity of 90% for 24 hours. 1. An adhesive tape comprisingan adhesive layer comprising an acrylic adhesive comprising a (meth)acrylate copolymer comprising 30% by weight or more and 99% by weight or less of a constitutional unit derived from a fluorine-containing (meth)acrylate and a constitutional unit derived from a (meth)acrylate having an alkyl group with a carbon number of 2 or less,wherein the adhesive layer has a swelling ratio of 100% or more and 130% or less after immersion in oleic acid under the conditions of a temperature of 60° C. and a humidity of 90% for 24 hours.2. (canceled)3. The adhesive tape according to claim 1 ,wherein the amount of the constitutional unit derived from a fluorine-containing (meth)acrylate in the (meth)acrylate copolymer is 40% by weight or more.4. The adhesive tape according to claim 1 ,wherein the amount of the constitutional unit derived from a fluorine-containing (meth)acrylate in the (meth)acrylate copolymer is 40% by weight or more and 80% by weight or less.5. The adhesive tape according to claim 1 ,wherein the (meth)acrylate copolymer has a weight average molecular weight of 250,000 or more.6. The adhesive tape according to claim 1 ,wherein the adhesive layer has a gel fraction of 30% or more.7. (canceled)8. The adhesive tape according to claim 1 ,wherein the acrylic adhesive comprises a (meth)acrylate copolymer ...

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24-12-2015 дата публикации

Fluorine-containing polymer microsphere

Номер: US20150368390A1
Автор: Huiya Yuan, Mingdong Yu

Disclosed in the invention is a fluorine-containing polymer microsphere. A polymerization monomer, a photoinitiator and a stable dispersant are added into a reaction kettle, carbon dioxide gas is introduced for emptying air therein, then liquid carbon dioxide is injected, an initiating light source is used for irradiating in the reaction kettle after the temperature and pressure of the reaction kettle are constant, the reaction is performed under the conditions of −20-30° C. and 20-70 bar, wherein the concentration of the polymerization monomer accounting for the total volume of the reactants is 0.02-2 g/ml, and the weight ratio of the photoinitiator, stable dispersant and polymerization monomer is (0.3-10):(2-20):100; after the reaction is finished, the temperature returns to room temperature, and the precipitate is washed with liquid carbon dioxide, so as to obtain the polymer microspheres. The fluorine-containing polymer which covers the surface of the microspheres in the present invention can reduce the surface energy thereof, and can benefit the timely migration of the microspheres to the coating surface; a tertiary amine group is introduced into the fluorine-containing polymer to firmly bond the microspheres into a cross-linked network, and thus benefits the tight integration of the microspheres and the coating; a RAFT active group is introduced to firmly anchor the microspheres onto the coating film; thus ensuring the stability of the cured coating.

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22-12-2016 дата публикации

LOW REFRACTIVE INDEX COATING FOR OPTICAL FIBERS, METHODS OF MANUFACTURE THEREOF AND ARTICLES COMPRISING THE SAME

Номер: US20160369103A1
Принадлежит:

Disclosed herein is a composition comprising 65 to 95 weight percent of a fluorinated monofunctional monomer; 5 to 35 weight percent of a fluorinated multifunctional monomer; and 0.5 to 3 weight percent of a silane coupling agent; where all weight percents are based on the total weight of the composition; where the fluorinated monofunctional monomer and the fluorinated multifunctional monomer are devoid of any trifunctional fluorocarbon moieties when they have 6 or more fluorocarbon repeat units; where the fluorocarbon repeat units are CFor CF moieties; and where a crosslinked composition has a shore D hardness of 56 to 85 and has a refractive index (RI) that meets the limitation of the equation RI≦1.368+10.8/X, where X denotes wavelength in nanometers. 1. A composition comprising:65 to 95 weight percent of a fluorinated monofunctional monomer;5 to 35 weight percent of a fluorinated multifunctional monomer; and{'sub': '2', 'claim-text': {'br': None, 'i': '/X', 'RI≦1.368+10.8, where X denotes wavelength in nanometers.'}, '0.5 to 3 weight percent of a silane coupling agent; where all weight percents are based on the total weight of the composition; where the fluorinated monofunctional monomer and the fluorinated multifunctional monomer are devoid of any trifunctional fluorocarbon moieties when they have 6 or more fluorocarbon repeat units; where the fluorocarbon repeat units are CFor CF moieties; and where a crosslinked composition has a shore D hardness of 56 to 85 and has a refractive index (RI) that meets the limitation of the equation2. The composition of claim 1 , further comprising an initiator.3. The composition of claim 1 , where the fluorinated monofunctional monomer is a linear fluorinated monofunctional monomer represented by the chemical formula (2A){'br': None, 'sub': 1', '2', 'n', '2', 'm', '2, 'R—(CF)—(CH)—R'}{'sub': 1', '2', '2', '3', '1', '2', '2', '3', '2, '(2A), where Ris a non-reactive end group that includes CHF or CHFbut not CFwhen n is greater ...

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22-12-2016 дата публикации

TEMPERATURE-RESPONSIVE BASE MATERIAL, METHOD FOR PRODUCING SAME, AND METHOD FOR EVALUATING SAME

Номер: US20160369228A1
Принадлежит: DAIKIN INDUSTRIES, LTD.

A temperature-responsive substrate having on its surface a layer containing at least one polymer, the at least one polymer being responsive to temperature and containing a fluorine-containing monomer-derived unit. Also disclosed is a polymer and composition for use in producing the substrate, as well as methods for producing, using and evaluating the substrate. 1. A temperature-responsive substrate having on its surface a layer comprising at least one polymer , said at least one polymer being responsive to temperature and comprising a fluorine-containing monomer-derived unit.2. The temperature-responsive substrate according to claim 1 , wherein the temperature-responsive polymer has a lower critical solution temperature (LCST) of 0 to 15° C.3. The temperature-responsive substrate according to claim 1 , wherein the temperature-responsive polymer contains fluorine in an amount of 2 to 40 wt. % claim 1 , based on the weight of the polymer.4. The temperature-responsive substrate according to claim 1 , wherein the fluorine-containing monomer contains a fluoroalkyl group.5. The temperature-responsive substrate according to claim 1 , wherein the fluorine-containing monomer is represented by formula (1):{'br': None, 'sub': '2', 'CH═C(—X)—C(═O)—Y—Z—Rf\u2003\u2003(1)'}{'sub': 1-21', '1-21, 'sup': 1', '2', '1', '2, 'wherein X is hydrogen, a Clinear or branched alkyl group, fluorine, chlorine, bromine, iodine, CFXX— (wherein Xand Xare hydrogen, fluorine, chlorine, bromine, or iodine), cyano, a Clinear or branched fluoroalkyl group, a substituted or unsubstituted benzyl group, or a substituted or unsubstituted phenyl group;'}Y is —O— or —NH—;{'sub': 1-10', '6-10', '6-10', '2', '2', '2', '1-4', '2', '2, 'sup': 1', '1', '1', '1, 'Z is a Caliphatic group, a Caromatic group, or a Ccyclic aliphatic group, —CHCHN(R)SO— wherein Ris a Calkyl group, —CHCH(OZ))CH— wherein Zis hydrogen or acetyl,'}{'sub': 2', 'm', '2', '2', 'n', '2', 'm', '2', 'n', '2', 'm, '—(CH)—SO—(CH)—, —(CH)—S—(CH)— ...

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22-12-2016 дата публикации

ORGANIC THIN-FILM TRANSISTOR AND METHOD FOR MANUFACTURING SAME

Номер: US20160372662A1
Принадлежит: FUJIFILM Corporation

An organic thin-film transistor including: a gate electrode, an organic semiconductor layer, a gate insulating layer, a source electrode, and a drain electrode on a substrate, in which the organic semiconductor layer includes an organic semiconductor and a resin (C) having one or more groups selected from the group consisting of a group having fluorine atoms, a group having silicon atoms, an alkyl group having one or more carbon atoms or having two or more carbon atoms in a case of forming an alkoxycarbonyl group, a cycloalkyl group, an aralkyl group, an aryloxycarbonyl group, an aromatic ring group substituted with at least one alkyl group, and an aromatic ring group substituted with at least one cycloalkyl group; and a method for manufacturing an organic thin-film transistor including: applying a coating solution which contains the organic semiconductor and the resin (C) and causing the resin (C) to be unevenly distributed. 1. An organic thin-film transistor comprising , on a substrate:a gate electrode;an organic semiconductor layer;a gate insulating layer provided between the gate electrode and the organic semiconductor layer; anda source electrode and a drain electrode provided in contact with the organic semiconductor layer and connected to each other through the organic semiconductor layer,wherein the organic semiconductor layer includes an organic semiconductor and a resin (C) having one or more groups selected from the group consisting of a group having fluorine atoms, a group having silicon atoms, an alkyl group having one or more carbon atoms or having two or more carbon atoms in a case of forming an alkoxycarbonyl group, a cycloalkyl group, an aralkyl group, an aryloxycarbonyl group, an aromatic ring group substituted with at least one alkyl group, and an aromatic ring group substituted with at least one cycloalkyl group.3. The organic thin-film transistor according to claim 1 , wherein the resin (C) has at least one of a group having fluorine atoms or a ...

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21-11-2019 дата публикации

Process for Preparation of Patiromer

Номер: US20190352442A1
Принадлежит:

The present application relates to a commercially viable process for the preparation of Patiromer, a crosslinked polymer. More particularly the present application relates to a commercially viable process for the preparation of Patiromer sorbitex calcium, an active ingredient useful in the treatment of hyperkalemia. 2. The process as claimed in claim 1 , wherein said base is selected from the group comprising lithium hydroxide claim 1 , sodium hydroxide claim 1 , potassium hydroxide claim 1 , rubidium hydroxide claim 1 , caesium hydroxide claim 1 , calcium hydroxide claim 1 , magnesium hydroxide claim 1 , strontium hydroxide claim 1 , barium hydroxide claim 1 , or a combination thereof.3. The process as claimed in claim 1 , wherein said ether solvent is selected from the group comprising diethyl ether claim 1 , diisopropyl ether claim 1 , methyl tertiary-butyl ether claim 1 , tetrahydrofuran claim 1 , 2-methyltetrahydrofuran claim 1 , dioxane claim 1 , or mixtures thereof.4. The process as claimed in claim 1 , wherein said ether solvent is tetrahydrofuran.5. The process as claimed in claim 1 , wherein the reaction mixture may further comprise an additional solvent selected from the group comprising water claim 1 , methanol claim 1 , ethanol claim 1 , isopropyl alcohol claim 1 , methyl acetate claim 1 , ethyl acetate claim 1 , or mixtures thereof.7. The process as claimed in claim 6 , wherein Calkyl is selected from the group comprising methyl claim 6 , ethyl claim 6 , propyl claim 6 , isopropyl claim 6 , n-butyl claim 6 , tert-butyl claim 6 , neopentyl or hexyl.8. The process as claimed in claim 6 , wherein said free radical initiator is selected from the group comprising 2 claim 6 ,2′-azobis(2 claim 6 ,4-dimethylvaleronitrile) claim 6 , 2 claim 6 ,2′-azobis[2-(2-imidazolin-2-yl)propane]dihydrochloride claim 6 , 2 claim 6 ,2′-azobis(2-methyl-N-(2-hydroxyethyl)propionamide) claim 6 , 2 claim 6 ,2′-azobis(2-methylpropionitrile) claim 6 , 2 claim 6 ,2′-azobis(2- ...

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28-12-2017 дата публикации

ELECTRICALLY CONTROLLED INTERFERENCE COLOR FILTER AND THE USE THEREOF

Номер: US20170371224A1

The invention relates to an electrically controlled interference colour filter comprising at least two transparent electrodes, at least one nematic liquid crystal layer and alignment layers for alignment of the liquid crystals. When an electrical field is applied the liquid crystals can be realigned and thus the transmission wavelength range of the interference colour filter can be shifted. 114-. (canceled)15. An electrically controllable interference colour filter , comprising at least two transparent electrodes , at least one orientation layer and a nematic liquid crystal layer , the nematic liquid crystal layer and the at least one orientation layer are in direct contact for orientation of the liquid crystals wherein , the transmission wavelength range of the interference colour filter is displaceable by applying an electrical field or by reorientation of the liquid crystals.16. The interference colour filter according to claim 15 ,wherein the nematic liquid crystal layer has a layer thickness in the range of 100 nm to 1,000 nm.17. The interference colour filter according to claim 15 ,wherein the nematic liquid crystal layer comprises liquid crystals selected from the group consisting of biphenyls, terphenyls, quaterphenyls, and tolanes.18. The interference colour filter according to claim 15 ,wherein the nematic liquid crystal layer is in direct contact at both surfaces with respectively one orientation layer.19. The interference colour filter according to claim 15 ,wherein the at least one orientation layer is selected from the group consisting of photoreactive ethene groups, coumar-, phenylacryl-, 2-(2-furyl)acryl-3-(2-thienyl)acryl- and trans-stilbene derivatives.20. The interference colour filter according to claim 15 ,wherein the at least one orientation layer is monomolecular and bonded chemically covalently to the at least one dielectric reflective layer.21. The interference colour filter according to claim 15 ,wherein the interface tension of the at ...

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28-11-2019 дата публикации

Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming process

Номер: US20190361347A1
Принадлежит: Shin Etsu Chemical Co Ltd

A negative resist composition comprising a polymer comprising recurring units having at least two acid-eliminatable hydroxyl or alkoxy groups in the molecule is effective for forming a resist pattern having a high resolution and minimal LER while minimizing defects.

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