Benzopinacol metalloester polymerization initiator

A polymerization initiator based on boroesters of benzopinacol for curing unsaturated polymers is disclosed. Methods of preparing the benzopinacol boroester initiator and using the initiator in polymerization reactions are additionally disclosed.

Injectable Formulation for Treatment and Protection of Patients Having an Inflammatory Reaction or an Ischemia-Reperfusion Event

The present invention relates to compounds according to formula (I) for medical use. The compounds are particularly suitable for the treatment and/or prevention of a medical condition involving hypoxic, anoxic and/or inflamed mammalian tissue. Furthermore, the invention relates to the use of said compounds for preparing a medicament and to pharmaceutical preparations comprising such compounds. The invention also relates to methods of treating or protecting patients having or being prone to develop a medical condition involving hypoxic, anoxic and/or inflamed mammalian tissue, the methods comprising administration of a therapeutically effective amount of such compounds. 2. The method of claim 1 , wherein n is 1 to 3 claim 1 , m is 1 to 3 claim 1 , and Ris independently selected from the group consisting of —OH claim 1 , —NH claim 1 , and —COOH claim 1 , and Ris a Cto Calkyl.3. The method of claim 1 , wherein Ris a linear claim 1 , substituted or non-substituted Calkyl or a Calkyl.4. The method of claim 1 , wherein R2 is substituted with 1 to 3 substituents.5. The method of claim 1 , wherein the compound of formula (I) is selected from the group consisting of:1,1,1,3,3,3-Hexafluoro-2-methyl-2-propanol,2,2,3,4,4,4-Hexafluoro-1-butanol,Perfluoro-tert-butyl alcohol,2,2,3,3,3-Pentafluoro-1-propanol,1,1,1,3,3,4,4,4-Octafluoro-2-butanol,2,2,3,3,4,4,4-Heptafluoro-1-butanol,1,1,1,3,3,3-Hexafluoropropan-2-ol,3,4,4,4-Tetrafluoro-3-(trifluoromethyl)butan-1-ol,3-Amino-4,4,4-trifluorobutyric acid,3,3,3-Trifluoro-2-(hydroxymethyl)propanoic acid, and5,5,5-Trifluorleucine.6. The method of claim 1 , wherein the compound of formula (I) has an octanol-water partition coefficient of less than 20.7. The method of claim 1 , wherein the composition is a pharmaceutical composition formulated for inhalative administration.8. The method of claim 7 , wherein the administration is by inhalation.9. The method of claim 1 , wherein the administration is prior to claim 1 , after or concomitant with ...

Method for Producing a Water Soluble Menthol Compounds having Antibacterial, Anti-Inflammatory, and Bacteriostatic Effects

A method for producing water soluble menthol compound produces a menthol compound that is soluble in alcohol and ether, yet insoluble in water. The menthol compound provides antibacterial, anti-inflammatory, and bacteriostatic effects when combined with other compounds to produce numerous medical and consumable compositions, including, without limitation, eye drops, mouth wash, juices, and noodles. In some embodiments, the produced menthol compound is a menthol water-soluble sodium salt or sylvite. However in other embodiments, the menthol compound may include a menthol crystal configuration. The steps include: adding a metal to a menthol solution. Enabling the reaction; dissolving the solid mixture; applying osmosis membrane dialysis to the dissolved solid mixture; filtering, drying, and washing the solid mixture; decompressing and removing water from the solid mixture; and collecting the water soluble menthol compound. 1. A method for producing water soluble menthol , the method comprising:adding an alkali metal to a menthol solution;enabling a reaction between the metal and the menthol solution;collecting a solid mixture formed by the reaction;dissolving the solid mixture;applying osmosis membrane dialysis to the dissolved mixture;preparing the solid mixture for collection; andcollecting the water soluble menthol compound.2. The method of claim 1 , wherein the water soluble menthol compound is a water soluble sodium salt or sylvite of menthol.3. The method of claim 2 , wherein the step of adding a metal to a menthol solution occurs in a nitrogen atmosphere.4. The method of claim 3 , wherein the step of adding a metal to a menthol solution forms a mole ratio of about 1:1.1 to 1.3.5. (canceled)6. The method of claim 4 , wherein the menthol solution is contains an ethereal solution or alcohol solution.7. The method of claim 6 , wherein the ethereal solution is diethyl ether or diethylene oxide.8. The method of claim 7 , wherein the alcohol solution is ethanol.9. The ...

METHOD FOR PRODUCING MAGNESIUM ALCOHOLATE

The purpose of the present invention is to provide a spherical or ellipsoidal magnesium alcoholate having a narrow particle size distribution even when the particle size is small. 1. A method for producing a magnesium alcoholate comprising:adding in a portionwise manner to a reaction system and reacting, metallic magnesium, an alcohol, and at least one of a halogen or a halogen atom-containing compound in a reaction system under alcohol reflux,wherein a mixture of metallic magnesium, an alcohol, and at least one of a halogen or a halogen atom-containing compound is added to the reaction system at each portionwise addition.2. The method for producing a magnesium alcoholate according to claim 1 , wherein a frequency of portionwise addition of said mixture is less than 10 times.3. The method for producing a magnesium alcoholate according to claim 1 ,wherein a mass ratio of metallic magnesium and alcohol and a mass ratio of metallic magnesium and halogen or halogen atom-containing compound in said mixture that is added in a portionwise manner is set to be substantially constant at each portionwise addition.4. The method for producing a magnesium alcoholate according to claim 1 ,wherein an interval of portionwise addition of said mixture is set to be substantially constant.5. The method for producing a magnesium alcoholate according to claim 1 ,wherein the halogen or the halogen-containing compound is reacted in an amount of 0.0001 gram atom or more, relative to one gram atom of the metallic magnesium.67-. (canceled) The present invention relates to a method for producing a magnesium alcoholate used for preparing a solid catalyst component for olefin polymerization or the like.Priority is claimed on Japanese Patent Application No. 2011-229527, filed Oct. 19, 2011, the content of which is incorporated herein by reference.As a solid catalyst component for olefin polymerization, spherical magnesium alcoholates having an average particle diameter of 60 μm or more, a less ...

THERMAL CONDUCTIVE COMPOSITIONS AND METHODS FOR THEIR PREPARATION AND USE

Thermal conductive compositions, methods for their preparation, and use are provided, which include, for example, as thermal sinks and other uses. 2. (canceled)3. The thermal conductive composition of claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , and Rare each independently H claim 1 , or NH claim 1 , —Si(OR)2CHCH2NH claim 1 , Si(OR) claim 1 , N(CH)OH claim 1 , CHCH(O)CH claim 1 , —CH claim 1 , —CH═CH claim 1 , —CHCH═CH claim 1 , —CHCH(O)CH claim 1 , —CH═CH—CN claim 1 , —OCN claim 1 , —CHOH claim 1 , CHCl claim 1 , CHOCN claim 1 , or —CH(═O).4. The thermal conductive composition of claim 1 , wherein Ris H claim 1 , or NH claim 1 , —Si(OR)CHCHNH claim 1 , Si(OR) claim 1 , —N(CH)OH claim 1 , CHCH(O)CH claim 1 , —CH claim 1 , —CH═CH claim 1 , —CHCH═CH claim 1 , —CHCH(O)CH claim 1 , —CH═CH—CN claim 1 , —OCN claim 1 , —CHOH claim 1 , CHCl claim 1 , CHOCN claim 1 , or —CH(═O).5. The thermal conductive composition of claim 1 , wherein the composition is a siloxane polymer cross linked or cured with a compound of Formula (I) or (II).7. The thermal conductive composition of claim 1 , wherein the composition is a polyurethane cross linked with a compound of Formula (I) or (II).9. The thermal conductive composition of claim 1 , wherein the composition is a polyolefin copolymerized or grafted with a compound of Formula (I) or (II).11. (canceled)1314-. (canceled)15. The heat sink of claim 12 , wherein Ris H claim 12 , —NH claim 12 , —Si(OR)CHCHNH claim 12 , —Si(OR) claim 12 ,{'sup': +', '−, 'sub': 3', '2', '2', '3', '2', '2', '2', '2', '2', '2', '2', '2, '—N(CH3)OH, —CHCH(O)CH, —CH, —CH═CH, —CHCH═CH, —CHCH(O)CH, —CH═CHCN, —OCN, —CHOH, —CHCl, —CHOCN, —CH(═O).'}16. The heat sink of claim 12 , wherein the composition is a siloxane polymer cured or cross linked with a compound of Formula (I) or (II).18. The heat sink of claim 12 , wherein the composition is a polyurethane cross linked with a compound of Formula (I) or (II).20. The heat sink of claim 12 , wherein the ...

METAL ORGANIC FRAMEWORK MATERIALS

An imidazolate framework material comprises a general structure, M-IM-M, wherein IM is an imidazolate or a substituted imidazolate linking moiety, such as a 4,5-dicyanoimidazolate or a hydrolyzed or substituted 4,5 dicyanoimidazolate linking moiety, wherein Mand Mcomprise the same or different metal cations, wherein at least one of Mand Mcomprises a trivalent metal cation and wherein neither Mnor Mcomprises a monovalent cation. 1. An imidazolate framework material comprising a general structure , M-IM-M , wherein IM is an imidazolate or a substituted imidazolate linking moiety , wherein Mand Mcomprise the same or different metal cations , wherein at least one of Mand Mcomprises a trivalent metal cation and wherein neither Mnor Mcomprises a monovalent cation.2. The material of claim 1 , wherein Mand Mare both trivalent metal cations.3. The material of claim 2 , wherein Mand Mare the same trivalent metal cation.4. The material of claim 1 , wherein at least one of Mand Mcomprises a lanthanide cation.5. An imidazolate framework material comprising a general structure claim 1 , M-IM-M claim 1 , wherein IM is a dicyanoimidazolate or a hydrolyzed or substituted dicyanoimidazolate linking moiety claim 1 , wherein Mand Mcomprise the same or different metal cations claim 1 , wherein at least one of Mand Mcomprises a trivalent metal cation and wherein neither Mnor Mcomprises a monovalent cation.6. The material of claim 5 , wherein Mand Mare both trivalent metal cations.7. The material of claim 6 , wherein Mand Mare the same trivalent metal cation.8. The material of claim 5 , wherein at least one of Mand Mcomprises a lanthanide cation.9. An imidazolate framework material comprising a general structure claim 5 , M-IM-M claim 5 , wherein IM is an imidazolate or a substituted imidazolate linking moiety claim 5 , wherein Mand Mcomprise the same or different metal cations claim 5 , wherein at least one of Mand Mcomprises a trivalent metal cation selected from the group consisting of ...

CONDUCTIVE THERMAL COMPOSITIONS, USES THEREOF, AND METHODS FOR THEIR PREPARATION

Thermal conductive compositions, methods for their preparation, and use are provided, which include, for example, as thermal sinks, heat transfer systems, and other uses. 2. The thermal conductive composition of claim 1 , wherein Ris —C(═O)OR claim 1 , —C(═O)OCHCH(O)CH claim 1 , —NH claim 1 , CH═CH— claim 1 , CH═CH—CH— claim 1 , or —Si(OR).3. The thermal conductive composition of claim 1 , wherein Ris hydroxyl claim 1 , —C(═O)OH claim 1 , OCN claim 1 , or —C(═O)OR.4. The thermal conductive composition of claim 1 , wherein Ris —Si(OR).511-. (canceled)12. The thermal conductive composition of claim 1 , wherein:A is N;M is Zn; andX is absent.13. The thermal conductive composition of claim 12 , wherein Ris —Si(OR).14. The thermal conductive composition of claim 12 , wherein Ris —OH claim 12 , —C(═O)OR claim 12 , or —OCN.15. The thermal conductive composition of or claim 12 , wherein the composition comprises a siloxane derivative of a compound of Formula (I).17. The thermal conductive composition of claim 1 , wherein the composition is a polyolefin copolymerized or grafted with a compound of Formula (I).19. (canceled)21. The heat sink of claim 20 , wherein Ris —C(═O)OR claim 20 , —C(═O)OCHCH(O)CH claim 20 , —NH claim 20 , CH═CH— claim 20 , CH═CH—CH— claim 20 , —Si(R) claim 20 , or a siloxane derivative thereof.22. The heat sink of claim 20 , wherein Ris hydroxyl claim 20 , —C(═O)OH claim 20 , —OCN claim 20 , or —C(═O)OR.23. The heat sink of claim 20 , wherein Rwherein Ris —Si(R).2434-. (canceled)36. (canceled)38. (canceled)40. (canceled)41. The electronic device of claim 39 , wherein the electronic device is encapsulated by the composition.42. (canceled)4453-. (canceled) A thermal sink that uses a thermal conductive matrix is one of the common requirements for electronic applications to dissipate the heat generated during operation of the encapsulated microelectronics in the polymer matrix. Metals can act as good thermal conductors, however, because they are also good ...

SYNTHESIS OF METAL COMPLEXES AND USES THEREOF

The present disclosure provides novel methods of making aluminum complexes with utility for promoting epoxide carbonylation reactions. Methods include reacting neutral metal carbonyl compounds with alkylaluminum complexes. 116-. (canceled)23. The method of claim 17 , wherein the neutral metal carbonyl compound is selected from the group consisting of: Ti(CO) claim 17 , V(CO) claim 17 , Cr(CO) claim 17 , Mo(CO) claim 17 , W(CO) claim 17 , Mn(CO) claim 17 , Tc(CO) claim 17 , Re(CO) claim 17 , Fe(CO) claim 17 , Ru(CO) claim 17 , Os(CO) claim 17 , Ru(CO) claim 17 , Os(CO) claim 17 , Fe(CO) claim 17 , Fe(CO) claim 17 , Co(CO) claim 17 , Rh(CO) claim 17 , Rh(CO) claim 17 , Ir(CO) claim 17 , Co(CO) claim 17 , and Ni(CO).24. The method of claim 17 , wherein the neutral carbonyl compound comprises cobalt carbonyl.25. The method of claim 24 , wherein the cobalt carbonyl compound comprises dicobalt octacarbonyl.26. The method of claim 17 , wherein the carbonylation catalyst is produced in a composition having a halide or alkali metal salt content in an amount less than about 200 ppm.27. The method of claim 17 , wherein Ris an optionally substituted Caliphatic group.28. The method of claim 17 , wherein Ris selected from the group consisting of methyl claim 17 , ethyl claim 17 , n-propyl claim 17 , i-propyl claim 17 , n-butyl claim 17 , i-butyl claim 17 , and octyl.29. The method of claim 17 , wherein Ris ethyl.30. The method of claim 17 , wherein the neutral metal carbonyl compound is M(CO).31. The method of claim 17 , wherein the neutral metal carbonyl compound is M(CO). The present invention claims priority to U.S. provisional patent application No. 62/028,993, filed Jul. 25, 2014, the entire contents of which are hereby incorporated by reference.This invention was made with Government support under Grant No. DE-EE0005766, awarded by the Department of Energy. The government has certain rights in the invention.Bimetallic complexes containing a cationic metal-centered Lewis ...

Precursor for polyolefin catalyst

The present invention provides titanium based precursor for polyolefin catalyst with desired morphology and high particle strength. The of preparation of the precursor in accordance with the present invention obviates the use of iodine.

IONIC LIQUID COMPOUND

The present disclosure provides an ionic liquid compound of Formula (I) and its application in reactions such as alkylation, arylation, acylation, diels alder and oligomerization, 2. The ionic liquid compound as claimed in claim 1 , wherein the alkyl group is selected from the group consisting of methyl claim 1 , ethyl claim 1 , propyl claim 1 , butyl and combinations thereof; the aryl group is selected from the group consisting of benzyl claim 1 , phenyl claim 1 , substituted benzenes and combinations thereof; and the halogen is selected from the group consisting of F claim 1 , Cl claim 1 , Br and I.3. The ionic liquid compound as claimed in claim 1 , wherein NRRRis a trialkylamine; Mor Mis a metal selected from the group consisting of Al claim 1 , Fe claim 1 , Zn claim 1 , Mn claim 1 , Mg claim 1 , Ti claim 1 , Sn claim 1 , Pd claim 1 , Pt claim 1 , Rh claim 1 , Cu claim 1 , Cr claim 1 , Co claim 1 , Ce claim 1 , Ni claim 1 , Ga claim 1 , In claim 1 , Sb claim 1 , Zr and combinations thereof; and X or Y is a halogen.5. The process as claimed in claim 4 , wherein the step (i) and/or the step (ii) are carried out at a temperature ranging from −20 to 100° C.6. The process as claimed in claim 4 , wherein the step (i) is carried out in the presence of a solvent selected from the group consisting of ethyl acetate claim 4 , ethanol claim 4 , methanol claim 4 , methyl iso butyl ketone claim 4 , methyl ethyl ketone claim 4 , benzene claim 4 , toluene claim 4 , dichloromethane and combinations thereof and the step (ii) is carried out in the presence of a solvent selected from the group claim 4 , consisting of benzene claim 4 , toluene claim 4 , dichloromethane claim 4 , methyl iso butyl ketone claim 4 , methyl ethyl ketone and combinations thereof.78-. (canceled)9. The process as claimed in claim 4 , wherein the mole ratio of the amine to the metal salt ranges from 1:0.1 to 1:0.5 and the mole ratio of the ionic salt complex precursor to the metal salt ranges from 1:3 and 1: ...

METAL ALKOXIDE AND A PROCESS FOR ITS PREPARATION

The present disclosure relates to microporous magnesium alkoxide and its preparation. The magnesium alkoxide of the present disclosure is characterized by mean particle size ranging from 20 to 70μ; surface area ranging from 1 to 30 m/g; circularity ranging from 0.5 to 0.9; macro pore size distribution ranging from 40 to 80%; meso pore size distribution ranging from 15 to 60%; and micro pore size distribution ranging from 2 to 10%. 1. Magnesium alkoxide comprising:a. mean particle size in the range of 20 to 70μ;{'sup': '2', 'b. surface area in the range of 1 to 30 m/g;'}c. circularity in the range of 0.5 to 0.9;d. macro pore size distribution in the range of 40 to 80%;e. meso pore size distribution in the range of 15 to 60%; andf. micro pore size distribution in the range of 2 to 10%.2. A process for preparing a morphologically modified magnesium alkoxide as claimed in claim 1 , said process comprising the following steps:a. contacting at a temperature in the range of 40 to 65° C. magnesium metal with at least one alcohol and at least one initiator for a time period of 30 min. to 3 hrs. to obtain a first mass;b. heating and maintaining the first mass at a temperature in the range of 65 to 80° C. for a period of 30 min. to 10 hrs to obtain a second mass; andc. drying the second mass under inert atmosphere at a temperature in the range of 60 to 120° C. to obtain a morphologically modified magnesium alkoxide.3. The process as claimed in claim 2 , wherein the alcohol is at least one selected from the group consisting of methanol claim 2 , ethanol claim 2 , propanol claim 2 , isopropanol claim 2 , butanol claim 2 , iso-butanol and a mixture of alcohols.4. The process as claimed in claim 2 , wherein the molar ratio of magnesium metal to alcohol ranges from 1:2 to 1:20.5. The process as claimed in claim 2 , wherein said initiator is at least one selected form the group consisting of titanium tetrachloride and magnesium dichloride.6. The process as claimed in claim 2 , ...

PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS

Described herein is a process for preparing inorganic metal-containing films including bringing a solid substrate in contact with a compound of general formula (I) or (II) in the gaseous state 2. The process according to claim 1 , wherein R is methyl claim 1 , ethyl claim 1 , tert-butyl claim 1 , trimethylsilyl or two R form together a five membered ring and R′ is hydrogen.3. The process according to claim 1 , wherein a metal-containing compound is deposited from the gaseous state onto the solid substrate before bringing it in contact with a compound of general formula (I) or (II).4. The process according to claim 3 , wherein the metal-containing compound contains Ti claim 3 , Ta claim 3 , Mn claim 3 , Mo claim 3 , W claim 3 , Al claim 3 , Co claim 3 , Ga claim 3 , Ge claim 3 , Sb claim 3 , or Te.5. The process according to claim 3 , wherein the metal-containing compound is a metal halide.6. The process according to claim 1 , wherein the adsorbed compound of general formula (I) or (II) is decomposed.7. The process according to claim 1 , wherein the sequence containing bringing a solid substrate in contact with a compound of general formula (I) or (II) and depositing a metal-containing compound or decomposing the adsorbed compound of general formula (I) or (II) is performed at least twice.8. The process according to claim 1 , wherein the compound of general formula (I) has a molecular weight of not more than 600 g/mol.9. The process according to claim 1 , wherein the compound of general formula (I) has a vapor pressure at least 1 mbar at a temperature of 200° C.11. The compound according to claim 10 , wherein R′ is hydrogen and R is R is methyl claim 10 , ethyl claim 10 , tert-butyl or trimethylsilyl claim 10 , or two R form together a five-membered ring. The present invention is in the field of processes for the generation of inorganic metal-containing films on substrates, in particular atomic layer deposition processes.With the ongoing miniaturization, e.g. in the ...

PROCESS FOR PREPARING METAL-CHELATE RETARDER BY SOL-GEL METHOD

The present invention relates to a process for preparing a metal-chelate retarder by a sol-gel method. The method comprises the following steps: weighing calcium nitrate tetrahydrate, aluminum nitrate nonahydrate and ferric nitrate nonahydrate according to a certain mass ratio and adding them into deionized water; placing the mixed solution on a magnetic stirrer and stirring the mixed solution evenly; adding citric acid monohydrate or gluconic acid, ethylene glycol or glycerol, and placing the mixed solution into a water bath to react to obtain the metal-chelate retarder. The process of the present invention has a reliable principle, overcomes the defects of long production period, complex preparation and the like of the existing retarders, has the advantages of simple process operation, cheap and easily available raw materials, and short production period. The prepared retarder has wide temperature adaptation range and adjustable thickening time, is suitable for large-scale industrial production, and has a wide market application prospect. 1. A process for preparing a metal-chelate retarder by a sol-gel method , comprising the following steps: weighing calcium nitrate tetrahydrate , aluminum nitrate nonahydrate and ferric nitrate nonahydrate according to a certain mass ratio and adding them into deionized water; placing the mixed solution on a magnetic stirrer and stirring the mixed solution evenly; adding citric acid monohydrate or gluconic acid , ethylene glycol or glycerol , and placing the mixed solution into a water bath to react to obtain the metal-chelate retarder.2. The process for preparing the metal-chelate retarder by the sol-gel method according to claim 1 , sequentially comprising the following steps:(1) adding 80 to 120 g of calcium nitrate tetrahydrate, 20 to 40 g of aluminum nitrate nonahydrate and 10 to 15 g of ferric nitrate nonahydrate into 50 to 70 ml of deionized water, placing the mixed solution on a magnetic stirrer and stirring for 50 to 60 ...

PROCESS FOR THE GENERATION OF METAL-CONTAINING FILMS

Described herein is a process including bringing a solid substrate in contact with a compound of general formula (I), (II), (III), or (IV) in the gaseous state 2. The process according to claim 1 , wherein R is methyl claim 1 , ethyl claim 1 , tert-butyl claim 1 , trimethylsilyl or two R form together a five membered ring and R′ is hydrogen.3. The process according to claim 1 , wherein if E is NR or A is OR claim 1 , R in NR or OR bears no hydrogen atom in the 1-position.4. The process according to claim 1 , wherein a metal-containing compound is deposited from the gaseous state onto the solid substrate before bringing it in contact with a compound of general formula (I) claim 1 , (II) claim 1 , (III) claim 1 , or (IV).5. The process according to claim 4 , wherein the metal-containing compound contains Ti claim 4 , Ta claim 4 , Mn claim 4 , Mo claim 4 , W claim 4 , Al claim 4 , Co claim 4 , Ga claim 4 , Ge claim 4 , Sb claim 4 , or Te.6. The process according to claim 4 , wherein the metal-containing compound is a metal halide.7. The process according to claim 1 , wherein the adsorbed compound of general formula (I) claim 1 , (II) claim 1 , (III) claim 1 , or (IV) is decomposed.8. The process according to claim 4 , wherein the sequence containing bringing a solid substrate in contact with a compound of general formula (I) claim 4 , (II) claim 4 , (III) claim 4 , or (IV) and depositing a metal-containing compound or decomposing the adsorbed compound of general formula (I) claim 4 , (II) claim 4 , (III) claim 4 , or (IV) is performed at least twice.9. The process according to claim 1 , wherein the compound of general formula (I) has a molecular weight of not more than 600 g/mol.10. The process according to claim 1 , wherein the compound of general formula (I) has a vapor pressure at least 1 mbar at a temperature of 200° C.13. The compound according to claim 10 , wherein R′ is hydrogen and R is R is methyl claim 10 , ethyl claim 10 , tert-butyl or trimethylsilyl claim ...

ALUMINUM CHELATE COMPOUND AND ROOM TEMPERATURE-CURABLE RESIN COMPOSITION CONTAINING SAME

Provided are an aluminum chelate compound useful as, for example, a curing catalyst for a room temperature-curable resin; and a room temperature-curable resin composition containing such aluminum chelate compound. 19.-. (canceled)13. A resin curing catalyst comprising the aluminum chelate compound of .16. A molded product obtained by curing the room temperature-curable resin composition of .17. A molded product obtained by curing the room temperature-curable resin composition of .18. A coating claim 14 , adhesive or sealing agent comprising the room temperature-curable resin composition of .19. A coating claim 15 , adhesive or sealing agent comprising the room temperature-curable resin composition of . The present invention relates to an aluminum chelate compound useful as, for example, a catalyst of a room temperature-curable resin; and a room temperature-curable resin composition containing the same. Particularly, the present invention relates to a room temperature-curable organopolysiloxane composition as well as a molded product obtained by curing such composition.A β-diketo compound enabling keto-enol transformation is capable of forming a complex compound with aluminum in an enol structure. That is, there is produced an aluminum chelate compound as a compound containing a β-diketo group(s). Because an alkyl group(s) bonded to a β-diketo group(s) is usually included in a β-diketo compound, such aluminum chelate compound also has an affinity for many kinds of organic polymeric materials. For this reason, such aluminum chelate compound has been used in compositions containing organic polymeric materials, such as paints, adhesive agents and inks, and has endowed these compositions with various types of properties. For example, such aluminum chelate compound is used as a catalytic composition for a room temperature-curable resin.As such a kind of aluminum chelate compound, there has been known, for example, a monoacetylacetonate aluminum bis (ethylacetoacetate) 76% ...

METAL-ORGANIC FRAMEWORKS CHARACTERIZED BY HAVING A LARGE NUMBER OF ADSORPTION SITES PER UNIT VOLUME

The disclosure provides for metal organic frameworks characterized by having a high number of linking moieties connected to metal clusters and a large number of adsorption sites per unit volume. The disclosure further provides for the use of these frameworks for gas separation, gas storage, catalysis, and drug delivery. 5. The MOF of claim 1 , wherein each SBU of the MOF comprises at least 8 metal or metal ions coordinated to a plurality of organic linking ligands.6. The MOF of claim 5 , wherein each SBU comprises octahedrally coordinated metal or metal ions that are cornered joined by doubly bridging OH groups.7. The MOF of claim 6 , wherein each SBU has a ring-shaped motif.8. The MOF of claim 1 , wherein each SBU comprises 10 to 16 organic linking ligands coordinated to a plurality of metal or the metal ions.9. The MOF of claim 1 , wherein M is a metal or metal ion selected from: Li claim 1 , Na claim 1 , K claim 1 , Rb claim 1 , Cs claim 1 , Be claim 1 , Mg claim 1 , Ca claim 1 , Sr claim 1 , Ba claim 1 , Sc claim 1 , Sc claim 1 , Sc claim 1 , Y claim 1 , Y claim 1 , Y claim 1 , Ti claim 1 , Ti claim 1 , Ti claim 1 , Zr claim 1 , Zr claim 1 , Zr claim 1 , Hf claim 1 , Hf claim 1 , V claim 1 , V claim 1 , V claim 1 , V claim 1 , Nb claim 1 , Nb claim 1 , Nb claim 1 , Nb claim 1 , Ta claim 1 , Ta claim 1 , Ta claim 1 , Ta claim 1 , Cr claim 1 , Cr claim 1 , Cr claim 1 , Cr claim 1 , Cr claim 1 , Cr claim 1 , Cr claim 1 , Mo claim 1 , Mo claim 1 , Mo claim 1 , Mo claim 1 , Mo claim 1 , Mo claim 1 , Mo claim 1 , W claim 1 , W claim 1 , W claim 1 , W claim 1 , W claim 1 , W claim 1 , W claim 1 , Mn claim 1 , Mn claim 1 , Mn claim 1 , Mn claim 1 , Mn claim 1 , Mn claim 1 , Mn claim 1 , Re claim 1 , Re claim 1 , Re claim 1 , Re claim 1 , Re claim 1 , Re claim 1 , Re claim 1 , Re claim 1 , Fe claim 1 , Fe claim 1 , Fe claim 1 , Fe claim 1 , Fe claim 1 , Fe claim 1 , Ru claim 1 , Ru claim 1 , Ru claim 1 , Ru claim 1 , Ru claim 1 , Ru claim 1 , Os claim 1 , Os claim 1 , Os ...

SEPARATION OF METAL-ORGANIC FRAMEWORKS

A method of separating a metal organic framework (MOF) from a solution and associated apparatus. The method comprises: providing a MOF containing solution; contacting the MOF containing solution with an acoustic reflector surface such that, any high frequency ultrasound applied within the MOF containing solution reflects off the acoustic reflector surface; and applying a high frequency ultrasound of at least 20 kHz to the MOF containing solution. The MOF material is substantially separated from solution as aggregated sediment that settles out of solution. 131.-. (canceled)32. An apparatus for separating a metal organic framework (MOF) from a solution , comprising:a housing having a reservoir capable of receiving a MOF containing solution;a high frequency ultrasound transducer operatively connected to the reservoir and capable of applying megasonic frequencies of at least 20 kHz to the MOF containing solution; andan acoustic reflector surface spaced apart from the transducer within the housing, the transducer, in use, being operated to reflect said applied high frequency ultrasound off the acoustic reflector surface, said acoustic reflector surface being spaced away from the high frequency ultrasound transducer such that a standing wave is formed through constructive interference.33. The apparatus according to claim 32 , wherein the applied high frequency ultrasound is 20 kHz to 4 MHz.34. The apparatus according to claim 32 , wherein the housing comprises a container including at least one wall position to contact the MOF containing solution claim 32 , and the transducer is high frequency ultrasound transducer is position within the reservoir or in engagement with the at least one wall.35. The apparatus according to claim 32 , wherein the acoustic reflector surface is generally located in front of the transducer claim 32 , and spaced apart from that transducer.36. The apparatus according to claim 33 , wherein the high frequency ultrasound transducer comprises a plate ...

PROCESS FOR MAKING AXIALLY FLUORINATED-PHTHALOCYANINES AND THEIR USE IN PHOTOVOLTAIC APPLICATIONS

Disclosed is a method of making axially fluorinated metal phthalocyanines and their use in photovoltaic applications. 2. The method of claim 1 , wherein the aprotic fluoride compound has the following structure:{'br': None, 'sub': 'o', 'Z(F),'}wherein Z is a group I or II metal, a tetra alkylated ammonium ion, or a tetra alkylated phosphonium ion, and o is 1 or 2.3. The method of claim 2 , wherein Z is a group I metal selected from Cs claim 2 , Rb claim 2 , K claim 2 , Na claim 2 , or Li claim 2 , or more preferably Cs claim 2 , Rb claim 2 , or K.4. The method of claim 2 , wherein Z is a group II metal selected from Ba claim 2 , Sr claim 2 , Ca claim 2 , Mg claim 2 , or Be claim 2 , or more preferably Ba claim 2 , Sr claim 2 , or Ca.5. The method of claim 1 , wherein X is Cl claim 1 , m is 1 or 2 claim 1 , and n is 0.6. The method of claim 1 , wherein m is 1 and n is 1.7. The method of claim 1 , wherein M is a group III metal selected from the group consisting of Al claim 1 , Ga claim 1 , or In.8. The method of claim 1 , wherein M is a group IV metal selected from the group consisting of Si claim 1 , Ge claim 1 , or Sn.10. The method of claim 9 , wherein Rto Rare each individually a substituted or un-substituted hydrocarbon.11. The method of claim 10 , wherein the hydrocarbon is a methyl claim 10 , ethyl claim 10 , propyl claim 10 , isopropyl claim 10 , n-butyl claim 10 , sec-butyl or tert-butyl group.12. The method of claim 9 , wherein Rto Rare each individually a halogen selected from F claim 9 , Cl claim 9 , Br claim 9 , or I.13. The method of claim 1 , wherein the composition further comprises a chelating agent.14. The method of claim 13 , wherein the chelating agent is a glycol claim 13 , glycol mono ether claim 13 , glycol bis ether claim 13 , polyethylene glycol claim 13 , polyethylene glycol mono ether claim 13 , polyethylene glycol bis ether or a crown ether.15. The method of claim 14 , wherein the crown ether is 18-crown-6 or dicyclohexyl-18-crown-6 claim ...

Low-Viscosity Solutions of Alkaline-Earth Metal Alkoxides In Aprotic Solvents, Method for the Production of Same and Use for the Production of Ziegler-Natta Catalysts

One or more concentrated low-viscosity solutions of alkaline earth alkoxide compounds M(OCHR)(OR)[O(CHR)ORin mixture with a metal alkyl compound M(RR) in an aprotic solvent and related methods are disclosed herein. 1. A method for synthesis of alkaline earth alkoxide compounds M(OCHR)(OR)[O(CHR)OR]in mixture with a metal alkyl compound) the method comprising:{'sub': 2', '2-a-b', 'a', 'n', 'b, 'sup': 6', '7', '8', '9, 'claim-text': wherein:', '(i) M is an alkaline earth metal selected from the group consisting of Mg, Ca, Ba, and Sr;', {'sub': '2', 'sup': '6', '(ii) OCHRis an alkoxide radical having 3 to 40 carbon atoms with a branch in position 2 relative to the O function;'}, {'sup': '7', '(iii) Ris an alkyl radical having 2 to 15 carbon atoms, which is either linear or has a branch in ≥position 3 relative to the O function;'}, {'sup': '8', '(iv) Ris an alkyl radical having 1 to 6 carbon atoms, which is either linear or has a branch at ≥position 3(relative to the O function;'}, {'sup': '9', '(v) Ris an alkyl radical having 2 to 15 carbon atoms, which is either linear or has a branch;'}, {'sup': 10', '11, '(vi) Rand Reach are an alkyl radical having 1 to 15 carbon atoms;'}, '(vii) n is an integer from 1 to 4;', '(viii) a+b≤2 wherein a and b each have a value of 0 to 2; and, '(A) mixing one or more alkaline earth metals, an aprotic solvent, one or more alkyl aluminum compounds, and one or more alcohols under reaction conditions sufficient to produce a mixture comprising the alkaline earth alkoxide compounds M(OCHR)(OR)[O(CHR)OR];'}{'sup': 10', '11', '6', '7', '8', '9', '6', '7', '8', '9', '10', '11, 'sub': 2', '2-a-b', 'a', 'n', 'b', '2', '2-a-b', 'a', 'n', 'b, '(B) adding one or more alkaline metal alkyl compounds M(RR) to the mixture comprising the alkaline earth alkoxide compounds M(OCHR)(OR)[O(CHR)OR], wherein the molar ratio of M(OCHR)(OR)[O(CHR)OR]to M(RR) is from 99.5:0.5 to 60:40.'}2. The method according to wherein the one or more alkyl aluminum compounds are ...

HYDROPHOBIC INORGANIC PARTICLES, RESIN COMPOSITION FOR HEAT DISSIPATION MEMBER, AND ELECTRONIC COMPONENT DEVICE

Disclosed are hydrophobic inorganic particles obtained by surface-modifying inorganic particles with an organic compound, in which with respect to the hydrophobic inorganic particles subjected to a washing step, a weight reduction rate is calculated under measurement conditions described below, and the number of molecules of the organic compound per 1 nmof inorganic particles before a surface treatment, which is calculated by a calculation expression described below, is 1.7 to 20. 1. Hydrophobic inorganic particles obtained by surface-modifying inorganic particles with an organic compound ,{'sup': '2', 'wherein with respect to the hydrophobic inorganic particles subjected to a washing step described below, a weight reduction rate is calculated under measurement conditions described below, and the number of molecules of the organic compound per 1 nmof inorganic particles before a surface treatment, which is calculated by a calculation expression described below, is 1.7 to 20.0washing step:200 parts by mass of ethanol is added to 1 part by mass of the hydrophobic inorganic particles, ultrasonic washing is performed for 10 minutes, solid-liquid separation is performed, and drying is performed; Measurement device: Thermogravimetry-Differential Thermal Analysis (TG-DTA);', 'Environment: Atmospheric environment;', 'Measurement temperature: Temperature increases from 30° C. to 500° C.; and', 'Temperature increasing speed: 10° C./min;, 'measurement conditionscalculation expression:{'sup': '2', 'if the number of molecules of the organic compound per 1 nmof inorganic particles is N,'}a weight reduction rate (%) is R,{'sup': '2', 'a specific surface area of inorganic particles is S (m/g), and'} {'br': None, 'i': N', '×R×', 'W×S', 'R, 'sup': 23', '−18, '=(6.02×10×101)/(×(100−)).'}, 'a molecular weight of organic compound is W (g), then'}2. The hydrophobic inorganic particles according to claim 1 ,wherein the organic compound is hydrophobic inorganic particles including carbon ...

Adsorbents comprising organic-inorganic hybrid nanoporous materials for sorption of water or alcohol and use thereof

Provided are a water and/or alcohol adsorbent including organic-inorganic hybrid nanoporous materials, and use thereof, and more particularly, a water and/or alcohol adsorbent having a high adsorption amount at a low relative humidity or partial pressure, of which desorption/regeneration is possible at a low temperature, the water and/or alcohol adsorbent including organic-inorganic hybrid nanoporous materials having 0.5 to 3 mol of a hydroxyl group (OH) or a hydroxide anion group (OH − ) per 1 mol of a central metal ion, and use thereof.

Sulfonic Esters Of Metal Oxides And Methods Of Their Use

The present invention is directed to sulfonic esters of metal oxides including those of formulas I and II:

Aluminum Metal Organic Framework Materials

The invention relates to monocrystalline single crystals of metal-organic framework materials comprising at least one aluminium metal ion, processes for preparing the same, methods for employing the same, and the use thereof. The invention also relates to monocrystalline aluminium metal-organic frameworks. 1. A single crystal metal-organic framework comprising one or more metal-ligand clusters , each metal-ligand cluster comprising (i) a metal cluster having an AlO cornerstone , and (ii) one or more ligands having two or more carboxylate groups;{'sup': 3', '3, 'wherein the single crystal has a size greater than or equal to 10 μm; the metal-organic framework comprises cavities having a free diameter of about 4 Å to about 40 Å; and the metal-organic framework comprising pores having a pore volume from about 0.1 cm/g to about 4 cm/g.'}2. The single crystal metal-organic framework according to claim 1 , wherein the crystal is monocrystalline.3. The single crystal metal-organic framework according to claim 1 , having a BET specific surface area of at least 200 m/g claim 1 , at least 300 m/g claim 1 , at least 600 m/g claim 1 , or at least 800 m/g.4. The single crystal metal-organic framework according to claim 1 , having a surface area of less than or equal to 8000 m/g claim 1 , less than or equal to 6000 m/g claim 1 , or less than or equal to 4000 m/g.5. The single crystal metal-organic framework according to claim 1 , the metal-organic framework comprising cavities having a free diameter of from about 5 Å to about 25 Å claim 1 , or from about 5 Å to about 15 Å.6. The single crystal metal-organic framework according to claim 1 , the metal-organic framework comprising pores having a pore volume from about 0.2 cm/g to about 3 cm/g.7. The single crystal metal-organic framework according to claim 1 , having a size greater than or equal to 20 μm claim 1 , 30 μm claim 1 , or 50 μm.8. The single crystal metal-organic framework according to claim 1 , having a crystal size from ...

COMPOSITION

A composition is provided which contains a fluorinated alcohol represented by formula (1) and a charge transporting compound: 1. A composition comprising: {'br': None, 'sub': nF', '2nF+1−mF', 'mF, 'CHFOH\u2003\u2003(1)'}, 'a fluorinated alcohol represented by the following formula (1)wherein nF and mF are each independently an integer being 1 or more and satisfying 2nF+1≥mF; anda charge transporting compound,wherein an amount of hydrogen fluoride generated from the fluorinated alcohol under atmospheric pressure at 25° C. is 5.0 ppm by volume or less.2. The composition according to claim 1 , wherein the amount of the hydrogen fluoride is 0.01 ppm by volume or more and 5.0 ppm by volume or less.3. The composition according to claim 1 , wherein the fluorinated alcohol is a primary alcohol.4. The composition according to claim 1 , wherein the charge transporting compound is at least one selected from the group consisting of aromatic hydrocarbon compounds; aromatic heterocyclic compounds; organosilane compounds; alkali metal salts and alkaline earth metals salts thereof; halides claim 1 , oxide salts claim 1 , and carbonates of alkaline metals and alkaline earth metals; and metal complexes.5. The composition according to claim 1 , wherein the charge transporting compound is at least one selected from the group consisting of aromatic hydrocarbon compounds and aromatic heterocyclic compounds.6. The composition according to claim 1 , wherein the charge transporting compound is at least one selected from the group consisting of alkali metal salts and alkaline earth metal salts of aromatic hydrocarbon compounds; and alkali metal salts and alkaline earth metal salts of aromatic heterocyclic compounds.7. A method for manufacturing a light emitting device comprising an anode 1 , a cathode 1 , and at least one layer selected from the group consisting of a hole injecting layer 1 , a hole transporting layer 1 , an electron injecting layer and an electron transporting layer 1 ,the ...

PROCESS FOR THE GENERATION OF METAL- OR SEMIMETAL-CONTAINING FILMS

The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), or (III) in the gaseous state (I) (II) (III) wherein A is NR, NR, PR, PR, O, OR, S, or SR, E is N, NR, P, PR, O or S, n is 1, 2, or 3, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R′ is hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group, and A, E, and n are chosen such that the compound of general formula (I), (II), or (III) is electronically neutral. 115.-. (canceled)17. The process according to claim 16 , wherein R is methyl claim 16 , ethyl claim 16 , iso-propyl claim 16 , sec-butyl claim 16 , tert-butyl claim 16 , trimethylsilyl.18. The process according to claim 16 , wherein R bears no hydrogen atom in the 1-position.19. The process according to claim 16 , wherein n is 1 or 2.20. The process according to claim 16 , wherein the compound of general formula (I) claim 16 , (II) claim 16 , or (III) has a melting point of −80 to 125° C.21. The process according to claim 16 , wherein the metal- or semimetal-containing compound contains Ti claim 16 , Ta claim 16 , Mn claim 16 , Mo claim 16 , W claim 16 , Ge claim 16 , Ga claim 16 , As claim 16 , In claim 16 , Sb claim 16 , Te claim 16 , Al or Si.22. The process according to claim 16 , wherein the metal- or semimetal-containing compound is a metal or semimetal halide.23. The process according to claim 16 , wherein the inorganic metal- or semimetal-containing films contains a metal claim 16 , a metal nitride claim 16 , a metal carbide claim 16 , a metal carbonitride claim 16 , a metal alloy claim 16 , an intermetallic compound or mixtures thereof.24. The process according to claim 16 , wherein the sequence comprising (a) and (b) is ...

PROCESS FOR THE GENERATION OF METAL- OR SEMIMETAL-CONTAINING FILMS

The present invention is in the field of processes for preparing inorganic metal- or semimetal-containing films. The process comprising (a) depositing a metal- or semimetal-containing compound from the gaseous state onto a solid substrate and (b) bringing the solid substrate in contact with a compound of general formula (I), (II), (III), (IV), (V), (VI), or (VII) in the gaseous state (I) (II) (III) (IV) . . . (V) (VI) (VII) wherein A is NR or O, E is CR″, CNR″, N, PR″, or SOR″, G is CR′ or N, R is an alkyl group, an alkenyl group, an aryl group, or a silyl group and R′ and R″ are hydrogen, an alkyl group, an alkenyl group, an aryl group, or a silyl group. 115.-. (canceled)17. The process according to claim 16 , wherein R is methyl claim 16 , ethyl claim 16 , iso-propyl claim 16 , sec-butyl claim 16 , tert-butyl claim 16 , trimethylsilyl.18. The process according to claim 16 , wherein R bears no hydrogen atom in the 1-position.19. The process according to claim 16 , wherein R′ in the 3 position of the ligand in the compound of general formula (I) or (II) is H.20. The process according to claim 16 , wherein the metal- or semimetal-containing compound contains Ti claim 16 , Ta claim 16 , Mn claim 16 , Mo claim 16 , W claim 16 , Ge claim 16 , Ga claim 16 , As claim 16 , In claim 16 , Sb claim 16 , Te claim 16 , Al or Si.21. The process according to claim 16 , wherein the metal- or semimetal-containing compound is a metal or semimetal halide.22. The process according to claim 16 , wherein the sequence containing (a) and (b) is performed at least twice.23. The process according to claim 16 , wherein the process is an atomic layer deposition process.24. The process according to claim 16 , wherein the compound of general formula (I) claim 16 , (II) claim 16 , (III) claim 16 , (IV) claim 16 , (V) claim 16 , (VI) claim 16 , or (VII) has a molecular weight of not more than 600 g/mol.25. The process according to claim 16 , wherein the compound of general formula (I) claim 16 , ...

COMPOSITION FOR FORMING PASSIVATION LAYER, SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, METHOD OF PRODUCING SEMICONDUCTOR SUBSTRATE HAVING PASSIVATION LAYER, PHOTOVOLTAIC CELL ELEMENT, METHOD OF PRODUCING PHOTOVOLTAIC CELL ELEMENT AND PHOTOVOLTAIC CELL

A composition for forming a passivation layer, comprising a compound represented by Formula (I): M(OR). In Formula (I), M comprises at least one metal element selected from the group consisting of Nb, Ta, V, Y and Hf, each Rindependently represents an alkyl group having from 1 to 8 carbon atoms or an aryl group having from 6 to 14 carbon atoms, and m represents an integer from 1 to 5. 1. A composition for forming a passivation layer , comprising a compound represented by the following Formula (I):{'br': None, 'sup': '1', 'sub': 'm', 'M(OR)\u2003\u2003(I)'}{'sup': '1', 'wherein, in Formula (I), M comprises at least one metal element selected from the group consisting of Nb, Ta, V, Y and Hf, each Rindependently represents an alkyl group having from 1 to 8 carbon atoms or an aryl group having from 6 to 14 carbon atoms, and m represents an integer from 1 to 5.'}3. The composition for forming a passivation layer according to claim 1 , further comprising a liquid medium.4. The composition for forming a passivation layer according to claim 1 , further comprising a resin.5. The composition for forming a passivation layer according to claim 4 , the composition comprising the liquid medium and the resin claim 4 , and a total content of the liquid medium and the resin being from 5% by mass to 98% by mass.6. The composition for forming a passivation layer according to claim 1 , the composition comprising the compound represented by Formula (II) claim 1 , and a total content of the compound represented by Formula (I) and the compound represented by Formula (II) being from 0.1% by mass to 80% by mass.7. A semiconductor substrate having a passivation layer claim 1 , comprising:a semiconductor substrate; and{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'a passivation layer that is a thermally-treated product of the composition for forming a passivation layer according to that is provided at an entire or partial surface of the semiconductor substrate.'}8. A method of producing a ...

Area selective deposition of metal containing films

Processes of selectively depositing a metal-containing film comprise: providing a surface having a plurality of materials exposed thereon simultaneously, and exposing the surface to a vapor of a metal-containing film-forming composition that contains a precursor having the formula: 1. A process of selectively depositing a metal-containing film , the process comprising the steps of:a) providing a surface having a plurality of materials exposed thereon simultaneously; and [{'br': None, 'sub': x', '2', 'n', '2, 'LM(—N(R)—(CR′)—NR″)'}, {'sub': 1', '10', '1', '10, 'wherein M is a Group 12, Group 13, Group 14, Group 15, Group IV or Group V element; x+1 is the oxidation state of the M; L is an anionic ligand; R, R″ each are independently a C-Clinear, branched or cyclic alkyl, alkenyl, or trialkylsilyl group; R′ is H or a C-Clinear, branched or cyclic alkyl, alkenyl or trialkylsilyl group; n=1-4; and'}], 'b) exposing the surface to a vapor of a metal-containing film-forming composition that contains a precursor having the formula 'wherein at least one of the materials on the surface is at least partially blocked by a blocking agent thereby reducing or preventing a deposition of the metal-containing film on said blocked material.', 'c) preferentially or selectively depositing a film on one or more of, but less than all of, the plurality of materials on the surface in a vapor deposition process,'}2. The process of claim 1 , wherein the vapor deposition process is an ALD process.3. The process of claim 1 , further comprisingexposing the surface to a co-reactant selected from an oxidizer agent or a nitrigen agent.4. The process of claim 3 , further comprising the steps ofrepeating the exposing to the vapor of the metal-containing film-forming composition and the exposing to the co-reactant until a desired thickness of the metal-containing film is formed; and{'sub': '2', 'purging excess vapor of the metal-containing film-forming composition and excess co-reactant using an inert ...

METAL-ORGANIC FRAMEWORKS

The present invention relates to metal-organic frameworks and, in particular, a continuous flow process for synthesising a metal-organic framework comprising the steps of: providing a ligand and a metal salt which are suitable for forming a metal-organic framework, mixing the ligand and metal salt with a solvent to form a mixture, and providing the mixture at a temperature sufficient to cause the ligand and the metal salt to react to form a metal-organic framework. The invention also relates to a method for the treatment of a metal-organic framework to extract unreacted ligand from the metal organic framework, a method for synthesising a metal-organic framework using recycled unreacted ligand, and uses for metal-organic frameworks. 1. A continuous flow process for synthesising a metal-organic framework comprising the steps of:a. providing a ligand and a metal salt which are suitable for forming a metal-organic framework,b. mixing the ligand, metal salt and, optionally, other reagents with a solvent to form a mixture, andc. providing the mixture at a temperature sufficient to cause the ligand and the metal salt to react to form a metal-organic framework.2. The continuous flow process according to wherein the solvent is preheated to a temperature sufficient to cause the ligand to react with the metal salt to form a metal-organic framework.3. The continuous flow process according to wherein the preheated solvent is a supercritical fluid or near critical fluid.4. The continuous flow process according to wherein the preheated solvent is at a temperature of at least about 200° C.5. The continuous flow process according to wherein the preheated solvent is at a pressure of at least about 1.55 MPa.6. The continuous flow process according to wherein the mixture is at a temperature of at least about 150° C. claim 1 , preferably at least 200° C.7. The continuous flow process according to wherein mixture comprises supercritical or near critical solvent.8. The continuous flow ...

Aryloxy-Phthalocyanines of Group III Metals

The present disclosure relates to a compound comprising an aryloxy-phthalocyanine compound of group III metals, a method for preparing said compound and an article of manufacture made therefrom.

PROCESS FOR THE PREPARATION OF A METAL-ORGANIC COMPOUND

A process for the preparation of a metal-organic compound, said metal-organic compound comprising at least one metal ion and at least one organic ligand, wherein said organic ligand is capable of associating with said metal ion, comprising at least the steps of; providing a first reactant comprising at least one metal in ionic form; providing a second reactant comprising at least one organic ligand capable of associating with said metal in ionic form; and admixing said first and second reactants under conditions of prolonged and sustained pressure and shear sufficient to synthesise said metal-organic compound. 1. A process for the preparation of a metal-organic compound , said metal-organic compound comprising at least one metal ion and at least one organic ligand , wherein said organic ligand is capable of associating with said metal ion , the process comprising:a. providing a first reactant comprising at least one metal in ionic form;b. providing a second reactant comprising at least one organic ligand capable of associating with said metal in ionic form; andc. admixing said first and second reactants under conditions of prolonged and sustained pressure and shear sufficient to synthesise said metal-organic compound.2. The process as claimed in claim 1 , wherein said pressure and shear are applied by an extrusion process.3. The process of claim 2 , wherein the extrusion process is a screw-based extrusion process.4. The process of claim 3 , wherein the screw-based process is a multiple screw-based extrusion process.5. The process of claim 4 , wherein the screw-based extrusion process is a twin-screw extrusion process.6. The process of claim 5 , wherein the twin-screw extrusion process is a co-rotating twin-screw extrusion process.7. The process of claim 3 , wherein the screws are at least partially intermeshing.8. The process as claimed in claim 1 , wherein at least one of the first reactant and the second reactant in steps (a) and (b) is dry.9. The process as ...

Coordinative alignment of molecules in chiral metal-organic frameworks

Coordinative alignment uses x-ray diffraction to precisely and unambiguously determine the structure of molecules bound or crystallized within chiral metal organic frameworks. 1. A method for use in diffraction analysis , such as x-ray , neutron , electron diffraction , to determine the structure and/or absolute configuration of target molecules , comprising: (a) coordinative aligning the molecules through covalent or ionic bonds within a metal organic framework (MOF) , and/or (b) crystalizing the molecules within a chiral metal organic framework.2. The method of for use in diffraction analysis claim 1 , such as x-ray claim 1 , neutron claim 1 , electron diffraction claim 1 , to determine the absolute configuration of target molecules claim 1 , comprising crystalizing the molecules within a chiral metal organic framework.3. The method of for use in diffraction analysis claim 1 , such as x-ray claim 1 , neutron claim 1 , electron diffraction claim 1 , to determine the structure and absolute configuration of target molecules claim 1 , comprising crystalizing and coordinative aligning the molecules through covalent or ionic bonds within a chiral metal organic framework.4. The method of comprising coordinative (strong covalent or ionic bond) aligning molecules in s single crystalline chiral metal organic framework (MOF) for precise structure determination claim 1 , with restricted motional degree of freedom of the strongly bound molecules claim 1 , wherein the bound molecules are oriented and aligned in long range order in pores of the MOF claim 1 , such that diffraction techniques such as X-ray claim 1 , electron claim 1 , and neutron diffraction are may be used for the structure determination of the bound molecules.5. The method of wherein the molecule strongly binds to the interior of the metal organic framework (MOF) through covalent and/or ionic bonds claim 1 , and are oriented (a) in each pore of the frameworks claim 1 , such that structure of the oriented ...

METALPORPHYRIN COMPLEX, PREPARATION METHOD THEREFOR AND METHOD FOR PREPARING POLYCARBONATE

The present invention provides a metalporphyrin complex having structure represented by formula (I), wherein R, R, R, R, R, R, R, R, Rand Rare independently selected from one of hydrogen, halogen, aliphatic group, substituted heteroaliphatic group, aryl and substituted heteroaryl; n is 1-6; L is quaternary ammonium functional group or quaternary phosphonium functional group; M is a metal element; and X is one of halogen, —NO, BF—, —CN, p-methyl benzoate, o-nitrophenol oxygen anion, 2,4-dinitrophenol oxygen anion, 2,4,6-trinitrophenol oxygen anion, 3,5-dichlorophenol oxygen anion and pentafluorophenol oxygen anion. The metalporphyrin complex provided in the present invention has two quaternary ammonium functional groups or two quaternary phosphonium functional groups, and compared with the prior art, the metalporphyrin complex shows higher catalytic activity in catalyzing polymerization reaction of carbon dioxide and an epoxide. 3. The metalporphyrin complex according to claim 2 , wherein Y in Formula (II) and Y in Formula (III) are independently one selected from the group consisting of halogen anion claim 2 , NO claim 2 , CHCOO claim 2 , BF claim 2 , p-methyl benzoate claim 2 , o-nitrophenolate anion claim 2 , 2 claim 2 ,4-dinitrophenolate anion claim 2 , 2 claim 2 ,4 claim 2 ,6-trinitrophenolate anion claim 2 , 3 claim 2 ,5-dichlorophenolate anion and pentafluorophenolate anion.4. The metalporphyrin complex according to claim 1 , wherein R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , R claim 1 , Rand Rare independently one selected from the group consisting of hydrogen claim 1 , halogen claim 1 , an aliphatic group having a number of carbon atoms from 1 to 5 claim 1 , a substituted heteroaliphatic group having a number of carbon atoms from 1 to 5 with oxygen as the heteroatom claim 1 , an aryl group having a number of benzene rings from 1 to 3 claim 1 , and a halogen-substituted heteroaryl group having a number of benzene rings ...

SEPARATION OF METAL-ORGANIC FRAMEWORKS

A method of separating a metal organic framework (MOF) from a solution and associated apparatus. The method comprises: providing a MOF containing solution; contacting the MOF containing solution with an acoustic reflector surface such that, any high frequency ultrasound applied within the MOF containing solution reflects off the acoustic reflector surface; and applying a high frequency ultrasound of at least 20 kHz to the MOF containing solution. The MOF material is substantially separated from solution as aggregated sediment that settles out of solution. 1. A method of separating a metal organic framework (MOF) from a solution , comprising:providing a MOF containing solution which includes a MOF;contacting the MOF containing solution with an acoustic reflector surface such that, any high frequency ultrasound applied within the MOF containing solution reflects off the acoustic reflector surface such that a standing wave is formed through constructive interference; andapplying a high frequency ultrasound of at least 20 kHz to the MOF containing solution,thereby substantially separating the MOF from solution as an aggregated sediment which settles out of solution.2. The method according to claim 1 , wherein the applied high frequency ultrasound is 20 kHz to 4 MHz.3. The method according to claim 1 , wherein the applied high frequency ultrasound is moved between a high frequency and a low frequency.4. The method according to claim 3 , wherein the high frequency is 400 kHz to 10 MHz and the low frequency is 20 kHz to 400 kHz.5. The method according to claim 1 , wherein the energy density of the applied high frequency ultrasound is at least 25 kJ/kg.6. The method according to claim 1 , wherein at least one of frequency or energy density of the applied high frequency ultrasound is tuned to selectively separate MOF and any contaminants in the MOF containing solution based on a specific particle size.7. The method according to claim 1 , wherein a metal organic framework ( ...

TRIS(DIALKYLAMIDE)ALUMINUM COMPOUND, AND METHOD FOR PRODUCING ALUMINUM-CONTAINING THIN FILM USING SAME

The present invention relates to a tris(dialkylamide)aluminum compound, and a method for producing an aluminum-containing thin film using the aluminum compound, the tris(dialkylamide)aluminum compound being represented by the formula (1): 3. A method of producing an aluminum-containing thin film by a chemical vapor deposition method claim 1 , wherein a tris(dialkylamide)aluminum compound as claimed in is used as an aluminum source. The present invention relates to a novel tris(dialkylamide)aluminum compound, and a method of producing an aluminum-containing thin film on an object by a chemical vapor deposition method (hereinafter, referred to as CVD method) using the aluminum compound.Conventionally, various aluminum compounds such as alkyl aluminums, aluminum hydride, aluminum amide, aluminum alkoxide and aluminum diketonato, for example, have been studied as aluminum compounds to be used for the formation of aluminum-containing thin films (See, for example, Patent Literatures 1 to 3). Among them, trimethyl aluminum, aluminum hydride, and analogs thereof are mostly employed.Patent Literature 1: JP-A-2006-526705Patent Literature 2: JP-B-4716193Patent Literature 3: JP-A-2007-138296However, the conventional aluminum compounds do not necessarily have optimal properties such as vapor pressure, heat stability and reactivity for the formation of aluminum-containing thin film, and it may not be said that these compounds are adequate aluminum compounds for the formation of aluminum-containing thin film. In addition, trimethyl aluminum, which is most commonly employed, is pyrophoric, and therefore is very dangerous and difficult to handle. Accordingly, there is a need for aluminum compound having all properties such as vapor pressure, heat stability, reactivity and safety satisfying the requirements.An object of the present invention is to solve the above-mentioned problems, and to provide an aluminum compound which is suitable for industrial use and from which an aluminum- ...

MOLECULAR PRECURSOR COMPOUNDS FOR ZINC-GROUP 13 MIXED OXIDE MATERIALS

Molecular precursor compounds, processes and compositions for making Zn-Group 13 mixed oxide materials including IZO, GZO, AZO and BZO, by providing inks comprising a molecular precursor compound having the formula MZn(OROR), and printing or depositing the inks on a substrate. The printed or deposited ink films can be treated to convert the molecular precursor compounds to a material. 1. A molecular precursor compound having the empirical formula MZn(OROR) , wherein Mis selected from B , Al , In and Ga , a is from 0.01 to 1.9 , and each R is independently alkyl or aryl.2. The molecular precursor compound of claim 1 , wherein the R groups are independently selected claim 1 , for each occurrence claim 1 , from C(1-6)alkyl groups.3. The molecular precursor compound of claim 1 , wherein the R groups are independently selected claim 1 , for each occurrence claim 1 , from C(2-4)alkyl groups.4. An ink comprising the molecular precursor compound of claim 1 , and one or more solvents.5. A process for making a material claim 1 , the process comprising:{'claim-ref': {'@idref': 'CLM-00001', 'claim 1'}, 'providing an ink comprising one or more molecular precursor compound according to ;'}depositing the ink on a substrate; andheating the substrate.6. The process of claim 5 , wherein the ratio of Mto Zn in the ink is from 0.01 to 10.7. The process of claim 5 , wherein the heating is at a temperature of from 50° C. to 500° C.8. The process of claim 5 , wherein the depositing is done with an ink by printing claim 5 , inkjet printing claim 5 , aerosol jet printing claim 5 , gravure printing claim 5 , reverse gravure printing claim 5 , reverse offset gravure printing claim 5 , stamp printing claim 5 , transfer printing claim 5 , pad printing claim 5 , spray pattern printing claim 5 , flexographic printing claim 5 , contact printing claim 5 , reverse printing claim 5 , thermal printing claim 5 , lithography claim 5 , electrophotographic printing claim 5 , screen printing claim 5 , ...

COMPLEX COMPOUND, DRYING AGENT, SEALING STRUCTURE AND ORGANIC EL ELEMENT

A complex compound obtained by reacting a compound represented by the following formula (1) and a polyol having an ether bond in a molecule and having 4 to 12 carbon atoms or a branch polyol having 5 to 7 carbon atoms: 1. A complex compound obtained by reacting a compound represented by the following formula (1) and a polyol having an ether bond in a molecule and having 4 to 12 carbon atoms or a branch polyol having 5 to 7 carbon atoms:{'br': None, 'sub': 'n', 'M(OR)\u2003\u2003(1)'}wherein R respectively represents an alkyl group having 4 to 12 carbon atoms or an acyl group having 2 to 12 carbon atoms, M represents an aluminum atom, a titanium atom or a silicon atom, and n represents 3 or 4.2. The complex compound according to claim 1 , wherein R is an alkyl group having 4 to 12 carbon atoms.3. The complex compound according to claim 1 , wherein R is an alkyl group having 4 to 8 carbon atoms.4. The complex compound according to claim 1 , wherein R is an alkyl group having 4 to 6 carbon atoms.5. The complex compound according to claim 1 , wherein M is an aluminum atom.6. The complex compound according to claim 1 , wherein the number of carbon atoms in the polyol having an ether bond in the molecule and having 4 to 12 carbon atoms is in a range of 4 to 10.7. The complex compound according to claim 1 , wherein the number of carbon atoms in the polyol having an ether bond in the molecule and having 4 to 12 carbon atoms is in a range of 4 to 8.8. The complex compound according to claim 1 , wherein the number of carbon atoms in the polyol having an ether bond in the molecule and having 4 to 12 carbon atoms is in a range of 4 to 6.9. The complex compound according to claim 1 , wherein the number of the ether bonds in the polyol having an ether bond in the molecule and having 4 to 12 carbon atoms is in a range of 1 to 3.10. The complex compound according to claim 1 , wherein the number of the ether bonds in the polyol having an ether bond in the molecule and having 4 to 12 ...

METHOD FOR PRODUCING A THIN FILM

The present invention relates to an aluminum compound represented by general formula (I). The present invention also relates to a thin film-forming raw material that contains this aluminum compound. In general formula (I), Rand Reach independently denote a straight chain or branched alkyl group having 2-5 carbon atoms, and Rdenotes a methyl group or ethyl group. It is preferable for Rand Rto be ethyl groups. This compound has a low melting point, exhibits satisfactory volatility, has high thermal stability, and is suitable for use as a raw material used to form a thin film by a CVD method. 1. (canceled)3. The method according to claim 2 , wherein Rand Rare each an ethyl group.4. The method according to claim 2 , wherein Ris a methyl group. This invention relates to a novel aluminum compound having a specific structure, a material for thin film formation containing the aluminum compound, and a process for forming an aluminum-containing thin film using the material.An aluminum-containing thin film material exhibits specific electric and optical characteristics and has found wide applications. For example, an aluminum or aluminum alloy thin film has been used as an LSI wiring material for its high conductivity and electromigration resistance. An aluminum oxide based thin film has been used as a hardcoat of machine parts and tools; an insulator film, a gate insulator, and a dielectric film of semiconductor memories; electronic components, such as a hard disk MR head; and optical glass for optical communication circuits.Processes for forming the above-described thin film include sputtering, ion plating, MOD techniques such as a dipping-pyrolysis process and a sol-gel process, and chemical vapor deposition techniques. Chemical vapor deposition techniques (hereinafter abbreviated as CVD) including atomic layer deposition (ALD) is the most suitable for many advantages, such as compositional controllability, excellent step coverage, suitability to large volume production, ...

Rechargeable Aluminum Organic Batteries

Disclosed herein are rechargeable aluminum organic batteries and active materials used therein. The cathodic materials used herein comprise a macrocycle comprising a substituted or unsubstituted phenanthrenequinone unit and a graphite flake. 1. A cathodic material comprising a macrocycle comprising a substituted or unsubstituted phenanthrenequinone unit and a graphite flake.2. The cathodic material of claim 1 , wherein the macrocycle comprises three substituted or unsubstituted phenanthrenequinone units in a triangular arrangement.5. The cathodic material of claim 1 , wherein macrocycle comprises a cationic aluminum complex.6. The cathodic material of claim 5 , wherein the macrocycle comprises three substituted or unsubstituted phenanthrenequinone units in a triangular arrangement and each of the phenathrenequinone units chelate a cationic aluminum center.9. The cathodic material of claim 1 , wherein the macrocycle is planar.10. The cathodic material of claim 1 , wherein the cathodic material comprises between about 2.0:1.0 and about 1.0:2.0 of the macrocycle to the graphite flake by weight.11. The cathodic material of claim 1 , wherein the cathodic material further comprises an electron-conducting additive.12. The cathodic material of claim 11 , wherein the electron-conducting additive is denka black.13. The cathodic material of claim 1 , wherein the cathodic material comprises a binder material.14. (canceled)15. An electrode comprising the cathodic material of and a substrate.16. A battery comprising a cathode claim 1 , the cathode comprising the cathodic material of and an electrolyte.17. The battery of claim 16 , wherein the electrolyte comprises an aluminum halide.18. The battery of claim 17 , wherein the electrolyte comprises tetrachloraluminate.19. The battery of claim 16 , wherein the electrolyte comprises an imidazolium.20. The battery of claim 19 , wherein the electrolyte comprises ethyl-3-methylimidazolium.21. The battery of further comprising an anode ...

AUXILIARIES FOR OLEFIN POLYMERIZATION PROCESS

A method of forming polymerization auxiliaries for a polymerization process may include combining an antifouling agent with a killer agent to form an auxiliary composition; and contacting the auxiliary composition with an alkylaluminum. An antifouling complex may be produced by combining an antifouling agent with a killer agent to form an auxiliary composition; and contacting the auxiliary composition with an alkylaluminum. 1. A method of forming polymerization auxiliaries for a polymerization process , comprising:combining an antifouling agent with a killer agent to form an auxiliary composition; andcontacting the auxiliary composition with an alkylaluminum.2. The method of claim 1 , wherein the contacting occurs prior to introduction into the polymerization process.3. The method of claim 1 , wherein the contacting occurs during introduction of the auxiliary composition into the polymerization process.4. The method of claim 1 , wherein the auxiliary composition comprises killer agent and antifouling agent at a mass ratio ranging from 90:10 to 55:45.5. The method of claim 1 , wherein upon the contacting claim 1 , the alkylaluminum and antifouling agent have a molar ratio ranging from 200:1 to 4:1.6. The method of claim 1 , wherein the antifouling agent comprises a polyglycerol ester.7. The method of claim 1 , wherein the killer agent comprises an alcohol having 1 to 4 carbon atoms.8. The method of claim 7 , wherein the killer agent comprises ethanol.9. The method of claim 1 , wherein the alkylluminium is triethylaluminum.10. The method of claim 1 , wherein the auxiliary composition is a homogenous single-phase solution.11. The method of claim 1 , wherein the auxiliary composition is formed at a temperature ranging from 20 to 25° C.12. The method of claim 1 , wherein the auxiliary composition is stable for at least 1 week at a temperature ranging of 5° C. to 40° C.13. The method of claim 1 , wherein the auxiliary composition is injected into a degassing system.14. ...

Method to synthesize lanthanide fluoride materials from lanthanide fluorinated alkoxides

Lanthanide fluorinated alkoxide derivatives can be synthesized from the alcoholysis reaction of the lanthanide bis-trimethylsilyl amide and an excess amount of hexafluoro iso-propanol. Nanoparticles can be formed from the lanthanide fluorinated alkoxide derivatives by a solvothermal or solution precipitation process. 1. A method to synthesize a lanthanide hexafluoro iso-propoxide derivative , comprising reacting hexafluoro iso-propanol with [Ln(NR)] , where R═Si(CH)and Ln=La , Ce , Pr , Nd , Sm , Eu , Gd , Tb , Dy , Ho , Er , Tm , Yb , Lu , Y , or Sc , in an organic solvent to form the lanthanide hexafluoro iso-propoxide derivative.2. The method of claim 1 , wherein the organic solvent comprises a non-polar solvent.3. The method of claim 1 , wherein the organic solvent comprises toluene.4. The method of claim 1 , wherein the organic solvent comprises hexane.5. The method of claim 1 , further comprising adding the lanthanide hexafluoro iso-propoxide derivative to a solvent and solvothermal processing the solution at a sufficiently high temperature and pressure to produce lanthanide fluoride nanoparticles.6. The method of claim 5 , wherein the solvent comprises a high boiling point amine.7. The method of claim 6 , wherein the solvent comprises trioctylamine.8. The method of claim 6 , wherein the solvent comprises pyridine.9. The method of claim 5 , wherein the temperature is greater than 150° C.10. The method of claim 1 , further comprising adding the lanthanide hexafluoro iso-propoxide derivative to a solvent and heating the solution at a sufficiently high temperature to precipitate lanthanide fluoride nanoparticles.11. The method of claim 10 , wherein the solvent comprises oleylamine or hexadecylamine.12. The method of claim 10 , wherein the temperature is greater than 280° C. This application claims the benefit of U.S. Provisional Application No. 62/112,286, filed Feb. 5, 2015, which is incorporated herein by reference.This invention was made with Government ...

SYNTHESIS OF METAL COMPLEXES AND USES THEREOF

The present disclosure provides novel methods of making aluminum complexes with utility for promoting epoxide carbonylation reactions. Methods include reacting neutral metal carbonyl compounds with alkylaluminum complexes. 13. The method of claim 1 , wherein the neutral metal carbonyl compound is selected from the group consisting of: Ti(CO) claim 1 , V(CO) claim 1 , Cr(CO) claim 1 , Mo(CO) claim 1 , W(CO) claim 1 , Mn(CO) claim 1 , Tc(CO) claim 1 , Re(CO) claim 1 , Fe(CO) claim 1 , Ru(CO) claim 1 , Os(CO) claim 1 , Ru(CO) claim 1 , Os(CO) claim 1 , Fe(CO) claim 1 , Fe(CO) claim 1 , Co(CO) claim 1 , Rh(CO) claim 1 , Rh(CO) claim 1 , Ir(CO) claim 1 , Co(CO) claim 1 , and Ni(CO).14. The method of claim 1 ,wherein the neutral carbonyl compound comprises a cobalt carbonyl compound.15. The method of claim 14 , wherein the cobalt carbonyl compound comprises dicobalt octacarbonyl.16. The method of claim 1 , wherein the composition of catalysts thus formed have halide or alkali metal salts in an amount less than about 200 ppm claim 1 , less than about 150 ppm claim 1 , less than about 100 ppm claim 1 , less than about 50 ppm claim 1 , less than about 40 ppm claim 1 , less than about 30 ppm claim 1 , less than about 20 ppm claim 1 , less than about 10 ppm claim 1 , less than about 5 ppm claim 1 , less than about 2 ppm claim 1 , or less than about 1 ppm. The present invention claims priority to U.S. provisional patent application No. 62/028,993, filed Jul. 25, 2014, the entire contents of which are hereby incorporated by reference.This invention was made with Government support under Grant No. DE-EE0005766, awarded by the Department of Energy. The government has certain rights in the invention.Bimetallic complexes containing a cationic metal-centered Lewis acid in combination with an anionic metal carbonyl are highly active catalysts for the ring-expanding carbonylation of strained heterocycles, including epoxides, aziridines, oxetanes and lactones. In particular, such ...

FORMATION AND MODIFICATIONS OF CERAMIC NANOWIRES AND THEIR USE IN FUNCTIONAL MATERIALS

A catalyst-free synthesis method for the formation of a metalorganic compound comprising a desired (first) metal may include, for example, selecting another (second) metal and an organic solvent, with the second metal being selected to (i) be more reactive with respect to the organic solvent than the first metal and (ii) form, upon exposure of the second metal to the organic solvent, a reaction by-product that is more soluble in the organic solvent than the metalorganic compound. An alloy comprising the first metal and the second metal may be first produced (e.g., formed or otherwise obtained) and then treated with the organic solvent in a liquid phase or a vapor phase to form a mixture comprising (i) the reaction by-product comprising the second metal and (ii) the metalorganic compound comprising the first metal. The metalorganic compound may then be separated from the mixture in the form of a solid. 1. A catalyst-free synthesis method for the formation of a metalorganic compound comprising a first metal , the method comprising:selecting a second metal and an organic solvent, wherein the second metal is selected to (i) be more reactive with respect to the organic solvent than the first metal and (ii) form, upon exposure of the second metal to the organic solvent, a reaction by-product comprising the second metal that is more soluble in the organic solvent than the metalorganic compound comprising the first metal;producing an alloy comprising the first metal and the second metal;treating the alloy with the organic solvent in a liquid phase or a vapor phase to form a mixture comprising (i) the reaction by-product comprising the second metal and (ii) the metalorganic compound comprising the first metal; andseparating the metalorganic compound from the mixture in the form of a solid.2. The method of claim 1 , wherein the second metal has a reactivity with respect to the organic solvent that is at least five times higher than that of the first metal.3. The method of ...

METAL ORGANIC FRAMEWORKS FOR GAS SEPARATION APPLICATIONS

Embodiments of the present disclosure describe a method of sorbing one or more compounds from a HS-containing fluid comprising contacting a M-soc-MOF composition with a fluid containing at least HS and one or more C compounds; and sorbing at least one of the one or more C compounds from the fluid. Embodiments of the present disclosure further describe a method of sorbing one or more compounds from a fluid comprising contacting a M-soc-MOF composition with a fluid containing at least HS and one or more of COand CH; and sorbing at least HS from the fluid. 1. A method of sorbing one or more compounds from a HS-containing fluid , comprising:{'sub': 2', '2+, 'contacting a M-soc-MOF composition with a fluid containing at least HS and one or more C compounds; and'}{'sub': '2+', 'sorbing at least one of the one or more C compounds from the fluid.'}2. The method of claim 1 , wherein the metal of the M-soc-MOF is one or more of In claim 1 , Fe claim 1 , Ga claim 1 , and Al.3. The method of claim 1 , wherein a ligand of the M-soc-MOF is 3 claim 1 ,3′ claim 1 ,5 claim 1 ,5′-azobenzenetetracarboxylate.4. The method of claim 1 , wherein an extra-framework counter-ion of the M-soc-MOF is one or more of NO claim 1 , Cl claim 1 , Br claim 1 , and OH.5. The method of claim 1 , wherein the M-soc-MOF is one or more of Fe-soc-MOF claim 1 , Ga-soc-MOF claim 1 , and Al-soc-MOF.6. The method of claim 1 , wherein the C compounds include one or more of CH claim 1 , CH claim 1 , CH claim 1 , CH claim 1 , and n-CH.7. The method of claim 1 , wherein the fluid further comprises one or more of CH claim 1 , H claim 1 , and N.8. The method of claim 1 , wherein the M-soc-MOF exhibits a selectivity for C over CH claim 1 , H claim 1 , and N.9. The method of claim 1 , wherein the M-soc-MOF composition is a continuous thin film on a support.10. The method of claim 9 , wherein the support is a porous alumina support.11. The method of claim 1 , wherein the fluid is one or more of refinery-off gases and ...

APPARATUS FOR PURIFYING ORGANIC COMPOUND AND METHOD OF PURIFYING ORGANIC COMPOUND

An apparatus for purifying an organic compound and a method of purifying an organic compound, the apparatus including an inner tube that receives a purification target material therein; a heater that heats the purification target material received in the inner tube; an evacuator that evacuates the inner tube into a vacuum; and a driving device that drives the inner tube. 1. An apparatus for purifying an organic compound , the apparatus comprising:an inner tube that receives a purification target material therein;a heater that heats the purification target material received in the inner tube;an evacuator that evacuates the inner tube into a vacuum; anda driving device that drives the inner tube.2. The apparatus as claimed in claim 1 , wherein the inner tube includes:a supply unit to which the purification target material is supplied; anda collecting unit in which the purification target material is sublimated or liquefied as it moves toward the evacuator.3. The apparatus as claimed in claim 2 , wherein at least one collecting unit is between the supply unit and the evacuator.4. The apparatus as claimed in claim 2 , further comprising a buffer between the supply unit and the collecting unit claim 2 , the buffer collecting foreign matter from the purification target material that is sublimated or evaporated in the supply unit.5. The apparatus as claimed in claim 2 , wherein the supply unit includes:a deposition portion that stores the purification target material, the deposition portion having an inner wall on which the purification target material is deposited as a thin film, anda discharge port open toward the collecting unit, the discharge port being configured to discharge the sublimated or evaporated purification target material from the deposition portion toward the collecting unit;wherein the discharge port is concentric with the deposition portion, the discharge port having a diameter smaller than a diameter of the deposition portion.6. The apparatus as claimed ...

METAL-ORGANIC FRAMEWORK CATALYSTS, AND USES THEREOF

Provided herein are metal-organic frameworks having a repeating core structure that generally includes a linker coordinated to a secondary building unit through O-metal-O bonds. The linkers create a framework with a plurality of pores, where a cobalt carbonyl moiety occupies at least a portion of the plurality of pores. Provided are also methods of making such metal-organic frameworks via a solvothermal reaction. The metal-organic frameworks are suitable for use in carbonylation reactions, such as carbonylation of epoxides. The metal-organic frameworks may be used for producing acrylic acid from ethylene oxide and carbon monoxide on an industrial scale. The production may involve various unit operations, including for example a beta-propiolactone production system configured to produce beta-propiolactone from ethylene oxide and carbon monoxide; a polypropiolactone production system configured to produce polypropiolactone from beta-propiolactone; and an acrylic acid production system configured to produce acrylic acid with a high purity by thermolysis of polypropiolactone. 1. A method to produce a metal-organic framework , comprising:solvothermally reacting a porphyrin linker with a metal salt in an amine-based solvent to produce a metal-organic framework, wherein{'sup': '2', 'the metal-organic framework comprises repeating cores, wherein the cores comprise the porphyrin linker coordinated to a secondary building unit through O-M-O bonds; and'}soaking the metal-organic framework in a cobalt solution to incorporate a cobalt carbonyl moiety in at least a portion of the pores in the metal-organic framework.2. The method of claim 1 , wherein solvothermally reacting the porphyrin linker with the metal salt in the amine-based solvent to produce the metal-organic framework claim 1 , comprises:mixing the porphyrin linker with the metal salt in the amine-based solvent to produce a reaction mixture; andheating the reaction mixture to a temperature between 80° C. and 140° C. to ...

Low-Viscosity Solutions of Alkaline-Earth Metal Alkoxides In Aprotic Solvents, Method for the Production of Same and Use for the Production of Ziegler-Natta Catalysts

One or more concentrated low-viscosity solutions of alkaline earth alkoxide compounds M(OCHR)(OR)[O(CHR)OR]in mixture with a metal alkyl compound M(RR) in an aprotic solvent and related methods are disclosed herein. 115-. (canceled)16. A solution of alkaline earth alkoxide compounds M(OCHR)(OR)[O(CHR)OR]in mixture with a metal alkyl compound M(RR) with an alkaline earth metal concentration in the range of 0.2 to 1.8 mmol/g in an aprotic solvent , whereinM is an alkaline earth metal selected from the group consisting of Mg, Ca, Ba, and Sr;{'sub': '2', 'sup': '6', 'OCHRis an alkoxide radical consisting of at least 3 and at most 40 carbon atoms with a branch in position 2 relative to the O function;'}{'sup': '7', 'Ris an alkyl radical with 2-15 carbon atoms, which is either linear or has a branch in ≧position 3 relative to the O function;'}{'sup': '8', 'Ris an alkyl radical with 1 to 6 carbon atoms, which is either linear or has a branch at ≧position 3 (relative to the O function;'}{'sup': '9', 'Ris an alkyl radical with 2 to 15 carbon atoms, which is either linear or has a branch;'}{'sup': 10', '11, 'Rand Rare any alkyl radicals with 1 to 15 carbon atoms;'}n is an integer from 1 to 4;a+b≦2 wherein a and b each have a value of 0 to 2; and{'sub': 2', '2-a-b', 'a', 'n', 'b, 'sup': 6', '7', '8', '9', '10', '11, 'the solution has a molar ratio of M(OCHR)(OR)[O(CHR)OR]to M(RR) that is from 99.5:0.5 to 60:40.'}17. The solution according to claim 16 , characterized in that the alkaline earth metal concentration is in the range of 0.4 to 1.6 mmol/g.18. The solution according to claim 16 , characterized in that the solution claim 16 , at Mg concentrations of ≧1 mmol/g to ≦1.6 mmol/g claim 16 , has a viscosity claim 16 , measured at room temperature claim 16 , of ≦300 cP.19. The solution according to claim 16 , characterized in that the molar ratio of M(OCHR)(OR)[O(CHR)OR]to M(RR) is from 99:1 to 70:30.20. The solution according to claim 16 , characterized in that an aluminum ...

ALUMINUM COMPOUND, THIN-FIRM FORMING RAW MATERIAL, AND METHOD FOR PRODUCING THIN FILM

Disclosed is an aluminum compound of general formula (I) and a thin film forming material containing the aluminum compound. In formula (I), Rand Reach represent straight or branched C2-C5 alkyl, and Rrepresent methyl or ethyl. Rand Rare each preferably ethyl. The compound has a low melting temperature, sufficient volatility, and high thermal stability and is therefore suited for use as a material for thin film formation by CVD. 2. The aluminum compound according to claim 1 , wherein Rand Rare each an ethyl group.3. The aluminum compound according to claim 1 , wherein Ris a methyl group.4. A material for thin film formation comprising the aluminum compound according to .5. A method for producing a thin film claim 1 , the method comprising:{'claim-ref': {'@idref': 'CLM-00004', 'claim 4'}, 'introducing, into a deposition chamber in which a substrate is placed, a vapor that has been obtained by vaporizing the material for thin film formation according to and that includes the aluminum compound; and'}forming an aluminum-containing thin film on a surface of the substrate by decomposing and/or chemically reacting the aluminum compound.6. The aluminum compound according to claim 2 , wherein Ris a methyl group.7. A material for thin film formation comprising the aluminum compound according to .8. A material for thin film formation comprising the aluminum compound according to .9. A material for thin film formation comprising the aluminum compound according to . This invention relates to a novel aluminum compound having a specific structure, a material for thin film formation containing the aluminum compound, and a process for forming an aluminum-containing thin film using the material.An aluminum-containing thin film material exhibits specific electric and optical characteristics and has found wide applications. For example, an aluminum or aluminum alloy thin film has been used as an LSI wiring material for its high conductivity and electromigration resistance. An aluminum ...

DERIVITIZATION OF VAPOROUS CHLORINE BY PROPYLENE OXIDE

Disclosed is a method of: providing a fiber having propylene oxide adsorbed thereon; exposing the fiber to a gaseous sample; allowing the propylene oxide to react with any chlorine in the sample to form chloro-2-propanol. The method can be used to detect potassium chlorate. 1. A method comprising:providing a fiber having propylene oxide adsorbed thereon;exposing the fiber to a gaseous sample;allowing the propylene oxide to react with any chlorine and water vapor in the sample to form chloro-2-propanol.2. The method of claim 1 , wherein the fiber is a polydimethylsiloxane/divinylbenzene/carboxen solid phase microextraction fiber.3. The method of claim 1 , wherein providing the fiber comprises:placing the fiber in the headspace of a vessel containing propylene oxide; andallowing the propylene oxide to adsorb to the fiber.4. The method of claim 1 , wherein the gaseous sample is suspected of containing volatile products of potassium chlorate.5. The method of claim 1 , further comprising;injecting the fiber into a gas chromatograph; anddetecting any chloro-2-propanol by gas chromatography.6. A method comprising:providing a fiber having ethylene oxide adsorbed thereon;exposing the fiber to a gaseous sample;allowing the ethylene oxide to react with any chlorine and water vapor in the sample to form chloro-2-ethanol.7. The method of claim 1 , wherein the fiber is a polydimethylsiloxane/divinylbenzene/carboxen solid phase microextraction fiber.8. The method of claim 1 , wherein providing the fiber comprises:placing the fiber in the headspace of a vessel containing ethylene oxide; andallowing the ethylene oxide to adsorb to the fiber.9. The method of claim 1 , wherein the gaseous sample is suspected of containing volatile products of potassium chlorate.10. The method of claim 1 , further comprising;injecting the fiber into a gas chromatograph; anddetecting any chloro-2-ethanol by gas chromatography. This application claims the benefit of U.S. Provisional Application No. 62/ ...

Conjugated Side-Strapped Phthalocyanines and Methods For Producing and Using The Same

The present invention provides conjugated side-strapped phthalocyanines and methods for producing and using the same. In one particular embodiment, the conjugated side-strapped phthalocyanine is of the formula: 4. The conjugated side-strapped phthalocyanine compound of claim 3 , wherein M comprises an element selected from the group consisting of vanadium claim 3 , indium claim 3 , gallium claim 3 , aluminum claim 3 , titanium claim 3 , tin claim 3 , lead claim 3 , bismuth claim 3 , manganese claim 3 , and phosphorus.5. An electronic device comprising a thin film of a compound of .6. The electronic device of claim 5 , wherein said electronic device comprises an optoelectronic device claim 5 , a photovoltaic claim 5 , a semi-conductor claim 5 , a solar cell claim 5 , a field-effect transistor claim 5 , organic light emitting diode claim 5 , or a combination thereof.7. A composition comprising a conjugated side-strapped phthalocyanine compound having a 2-fold symmetry and a solubility in tetrahydrofuran (THF) of at least about 0.5 mole/L.8. The composition according to claim 7 , wherein said conjugated side-strapped phthalocyanine compound has a solubility in chloroform of at least about 0.5 mole/L.9. The composition according to claim 7 , wherein said conjugated side-strapped phthalocyanine compound has a solubility in pyridine of at least about 0.5 mole/L.10. The composition according to claim 7 , wherein said composition comprises a thin film of said conjugated side-strapped phthalocyanine compound.11. The composition according to claim 10 , wherein the hole mobility within said thin film is at least about 0.10 cmVs.12. The composition according to claim 10 , wherein the hole mobility within said thin film is at least about 0.90 cmVs.13. The composition according to claim 10 , wherein said thin film comprises ABAB stacking of said conjugated side-strapped phthalocyanine compound. This application claims the priority benefit of U.S. Provisional Application No. 61/ ...

METHOD FOR PRODUCING METAL-ORGANIC FRAMEWORKS

The present invention relates to a method for the preparation of a metal-organic framework structure compound, the metal-organic framework structure compound being prepared such as well as the use of the metal-organic framework structure compound being prepared such as adsorbent. 1. A method for the preparation of a metal-organic framework structure compound comprising the steps of:reacting at least one metal salt comprising a metal cation which is selected from the group consisting of the transition metals and Al as well as combinations thereof, with a linker compound, wherein the reaction is conducted at a pressure of less than 1.5 bar in aqueous solution, and wherein the linker compound is an isophthalate or a derivate thereof.2. The method according to claim 1 , wherein the aqueous solution comprises less than 10% by volume of organic solvents.3. The method according to claim 1 , wherein the reaction is conducted at a temperature of 80 to 120° C. or higher.4. The method according to claim 1 , wherein the reaction is conducted over a period of time of 10 hours or less.6. (canceled)7. The method according to claim 1 , wherein the metal salt is selected from the group consisting of iron and aluminum salts.8. (canceled)9. The method according to claim 1 , wherein to the aqueous solution a base is added.1014-. (canceled)15. The method according to claim 1 , wherein the reaction is conducted at the boiling point of the reaction medium. The present invention relates to a method for the preparation of a metal-organic framework structure compound, the metal-organic framework structure compound being prepared such as well as the use of the metal-organic framework structure compound being prepared such as adsorbent.Heat of adsorption reservoirs provide the possibility of a nearly lossless storage of heat, particularly in the temperature range of up to 250° C., over long periods of time. In particular in connection with the solar thermal heating of buildings in regions of ...

MAGNESIUM ALKOXIDE PARTICLE AND APPLICATION THEREOF

The magnesium alkoxide particle contains the reaction product of the following components: 1) a magnesium powder; 2) a mixed alcohol; 3) a halogenating agent; and 4) a titanate compound. The magnesium alkoxide particle is used for preparing a catalyst for olefin polymerization. 1. An alkoxymagnesium particle , comprising a reaction product of following components: 1) magnesium powder; 2) a mixed alcohol; 3) a halogenating agent; and 4) a titanate compound.2. The alkoxymagnesium particle according to claim 1 , wherein the titanate compound has a structure as shown in Formula I:{'br': None, 'sup': 1', '2', '3, 'sub': a', 'b', 'c', 'd, '(RO)Ti(OR)(OR)X\u2003\u2003Formula I,'}{'sup': 1', '2', '3, 'sub': 1', '10', '1', '10, 'wherein in Formula I, R, Rand Rare identical to or different from each other, and are independently selected from a group consisting of H and alkyl; X is selected from a group consisting of alkoxy, carboxyl, halogen, sulfonic acid group, phosphoric acid group and sulfuric acid group; and each of a, b, c and d independently represents an integer number in a range of 0 to 4, and a+b+c+d=4; and wherein said alkyl preferably includes C-Clinear or branched alkyl; said alkoxy preferably includes C-Calkoxy; said halogen preferably includes chlorine; and more preferably, the titanate is at least one selected from a group consisting of tetramethyl titanate, tetraethyl titanate, tetra-n-propyl titanate, tetra-n-butyl titanate, tetra-n-pentyl titanate, tetra-n-hexyl titanate, tetra-n-heptyl titanate, tetra-isooctyl titanate, tetra-n-nonyl titanate, tetra-n-decyl titanate, and isomers thereof.'}3. The alkoxymagnesium particle according to claim 1 , wherein a weight ratio of the titanate compound to the magnesium powder is (0.01-5):1 claim 1 , preferably (0.05-4):1 claim 1 , more preferably (0.05-3):1 claim 1 , and further preferably (0.05-2):1.4. The alkoxymagnesium particle according to claim 1 , wherein the halogenating agent is an elementary halogen and/or an ...

Methods of Making Porous Molecular Structures

Disclosed herein is a method of making a porous molecular structure from a solution comprising an insoluble metal containing material and a ligand-providing material. In some embodiments, the porous molecular structure can be a Metal-Organic Framework (MOF). Ionic metal salts are the most common type of metal source for MOF production, but dissolution of metal salts complicates solvent recycling and creates corrosion and oxidation issues through evolved nitrate and chloride anions. Elucidating information that leads toward more efficient production of these versatile nanomaterials, while extending the knowledge base of how MOFs form during reaction, is critical to advancing MOF materials into large-scale use. Disclosed herein are improved methods for controlled synthesis of porous molecular structures such as MOFs comprising a solution-based synthesis with insoluble metallic precursor. 1. A method of making a porous molecular structure , the method comprising:mixing a metal-containing material, a ligand-providing material, and a solvent to create a mixture, wherein the metal-containing material is insoluble in the solvent; andreacting, in the mixture, the metal-containing material with the ligand-providing material to form a porous molecular structure.2. The method of claim 1 , the method further comprising removing claim 1 , from the mixture claim 1 , the porous molecular structure.3. The method of claim 1 , wherein the metal-containing material is an insoluble solid metallic material.4. The method of claim 3 , wherein the insoluble solid metallic material is a metal carbide.5. The method of claim 1 , wherein the ligand-providing material comprises an organic ligand.6. The method of claim 1 , wherein the porous molecular structure is a Metal Organic Framework (MOF).7. The method of claim 1 , wherein the porous molecular structure comprises all of the metal-containing material from mixture.8. The method of claim 1 , the method further comprising recovering at least ...

Methods and Compositions for Improved F-18 Labeling of Proteins, Peptides and Other Molecules

The present application discloses compositions and methods of synthesis and use of F- or F-labeled molecules of use in PET, SPECT and/or MR imaging. Preferably, the F or F is conjugated to a targeting molecule by formation of a complex with a group IIIA metal and binding of the complex to a bifunctional chelating agent, which may then be directly or indirectly attached to the targeting molecule. In other embodiments, the F or F labeled moiety may comprise a targetable construct used in combination with a bispecific antibody to target a disease-associated antigen. The disclosed methods and compositions allow the simple and reproducible labeling of molecules at very high efficiency and specific activity in 30 minutes or less. In preferred embodiments, the bifunctional chelating agent bound to F- or F-metal complex may be conjugated to the molecule to be labeled at a reduced temperature, e.g. room temperature. 2. The chelating moiety of claim 1 , wherein the chelating moiety is attached to a metal.3. The chelating moiety of claim 2 , wherein the metal is selected from the group consisting of Al claim 2 , Ba claim 2 , Bi claim 2 , Ca claim 2 , Cr claim 2 , Co claim 2 , Cu claim 2 , Fe claim 2 , Gd claim 2 , Ga claim 2 , In claim 2 , Pb claim 2 , La claim 2 , Mg claim 2 , Mn claim 2 , Hg claim 2 , Ni claim 2 , Os claim 2 , Pt claim 2 , Ra claim 2 , Ag claim 2 , Sr claim 2 , Sn claim 2 , Sc claim 2 , Tc claim 2 , Th claim 2 , Ti claim 2 , V claim 2 , Zn claim 2 , Zr and Y.4. The chelating moiety of claim 3 , wherein the metal is selected from the group consisting of Cu claim 3 , Ga claim 3 , Ga claim 3 , Tc claim 3 , Y claim 3 , Y claim 3 , and Th.5. The chelating moiety of claim 1 , wherein the chelating moiety is attached to a complex of aluminum and fluoride.6. The chelating moiety of claim 5 , wherein the fluoride is F or F.8. The chelating moiety of claim 7 , wherein the chelating moiety is attached to a metal.9. The chelating moiety of claim 8 , wherein the metal is ...

CURABLE AND HYGROSCOPIC RESIN COMPOSITION FOR SEALING ELECTRONIC DEVICES, SEALING RESIN, AND ELECTRONIC DEVICE

A curable and hygroscopic resin composition for sealing electronic devices, having at least a (meth)acrylate oligomer (a) having the number-average molecular weight of 1,500 to 5,000, a low molecular weight (meth)acrylate (b) having an average molecular weight of 170 to 500, a moisture-reactive organometallic compound (c), and a polymerization initiator (d), wherein the (meth)acrylate oligomer (a) and the low molecular weight (meth)acrylate (b) are multifunctional (meth)acrylates in which the number of (meth)acryloyl groups is from 1.5 to 3 in one molecule of each of the (meth)acrylate oligomer (a) and the low molecular weight (meth)acrylate (b); a sealing resin; and an electronic device. 1. A curable and hygroscopic resin composition for sealing electronic devices , comprising at least a (meth)acrylate oligomer (a) having the number-average molecular weight of 1 ,500 to 5 ,000 , a low molecular weight (meth)acrylate (b) having an average molecular weight of 170 to 500 , a moisture-reactive organometallic compound (c) , and a polymerization initiator (d) ,wherein the (meth)acrylate oligomer (a) and the low molecular weight (meth)acrylate (b) are multifunctional (meth)acrylates in which the number of (meth)acryloyl groups is from 1.5 to 3 in one molecule of each of the (meth)acrylate oligomer (a) and the low molecular weight (meth)acrylate (b).2. The curable and hygroscopic resin composition for sealing electronic devices as claimed in claim 1 , wherein a moisture permeability of a cured film having a thickness of 100 μm claim 1 , which has been formed by curing a composition in which the moisture-reactive organometallic compound (c) is removed from the curable and hygroscopic resin composition for sealing electronic devices claim 1 , is 10 g/m/24-hr or less under the condition of 40° C. and 90% relative humidity.3. The curable and hygroscopic resin composition for sealing electronic devices as claimed in claim 1 , wherein from 5 to 30 mass % of the (meth)acrylate ...

ULTRAFAST HIGH SPACE-TIME-YIELD SYNTHESIS OF METAL-ORGANIC FRAMEWORKS

The invention relates to a process for the preparation of metal-organic frameworks (MOFs) in form of a homogenous powder, and a process wherein the metal-organic framework is molded into shaped bodies. 115.-. (canceled)16. A process for the preparation of a metal-organic framework , wherein the metal-organic framework comprises at least one at least bidentate organic compound coordinated to at least one metal ion , comprising the stepsa) preparing a dry composition by mixing at least one metal salt corresponding to the at least one metal ion and the at least one at least bidentate organic compound or a salt thereof, wherein the molar ratio of the at least one metal ion and the at least one at least bidentate organic compound is in the range from 10:1 to 1:10;b) adding a solvent to the dry composition of step a), wherein the solvent comprises 25 to 75% by volume of at least one alcohol and 25 to 75% by volume of water, wherein the given amounts are based on the total volume of the solvent; andc) mixing the solvent-containing composition of step b) to obtain the metal-organic framework in the form of a homogenous powder, wherein the solvent-containing composition has a solid content in the range from 30 to 80%.17. The process according to claim 16 , wherein the mixing in step c) is carried out pressureless.18. The process according to claim 16 , wherein the solvent comprises 45 to 55% by volume of the at least one alcohol and 45 to 55% by volume of water claim 16 , wherein the given amounts are based on the total volume of the solvent.19. The process according to claim 16 , wherein the at least one alcohol is methanol claim 16 , ethanol claim 16 , isopropanol claim 16 , n-propanol or a mixture of two or more thereof.20. The process according to claim 16 , wherein the at least one alcohol is ethanol.21. The process according to claim 16 , wherein the solvent-containing composition of step b) comprises 30 to 80% by weight of the dry composition and 20 to 70% by weight ...

COMPOUND, DRYING AGENT, SEALING STRUCTURE, AND ORGANIC EL ELEMENT

A compound represented by formula (1) is provided: 2. The compound according to claim 1 , wherein M is an aluminum atom.3. The compound according to claim 1 , wherein R claim 1 , Rand Rare a C2-8 alkyl group substituted with one or more fluorine atoms.4. A drying agent comprising the compound according to .5. The drying agent according to claim 4 , further comprising a viscosity modifier.6. A sealing structure claim 4 , wherein a pair of substrates is sealed with a sealing agent claim 4 , and{'claim-ref': {'@idref': 'CLM-00004', 'claim 4'}, 'the sealing structure comprises the drying agent according to therein.'}7. An organic EL element comprising:an element substrate;a sealing substrate disposed opposite to the element substrate;a laminate being provided on the element substrate and including an organic layer interposed between a pair of electrodes; anda sealing agent sealing outer peripheral parts of the element substrate and the sealing substrate;{'claim-ref': {'@idref': 'CLM-00004', 'claim 4'}, 'wherein a sealed space is filled with the drying agent according to .'} The present invention relates to a compound as well as a drying agent, a sealing structure and an organic EL element using the same.In recent years, research and development have been actively carried out regarding organic EL displays or organic EL lights that are light-emitting devices using an organic electroluminescence (EL) element. The organic EL element has a structure in which an organic layer, which is a thin film including an organic light-emitting material, is interposed between a pair of electrodes. The organic EL element is a self light-emitting element that uses light emission (fluorescence or phosphorescence) at the time of deactivation of excitons, which have been generated by recombination of holes and electrons injected into the thin film.The most critical issue with the organic EL element is an improvement in the durability, and particularly, preventing non-light-emitting portions ...

Coordinative alignment of molecules in chiral metal-organic frameworks

Coordinative alignment uses x-ray diffraction to precisely and unambiguously determine the structure of molecules bound or crystallized within chiral metal organic frameworks. 1. A method of coordinative alignment (CAL) to determine the structure and absolute configuration of target molecules , comprising coordinative aligning and crystallizing the target molecules within a chiral metal organic framework (MOF) , wherein:(i) the target molecules bind to the interior of the MOF through covalent and/or ionic bonds, and are oriented in pores of the MOF such that reduced vibrations and restricted orientations by the bonds enable structural determination of the oriented target molecules by diffraction analysis like single crystal x-ray diffraction;(ii) chiral symmetry of the MOF serves as a reference for determining the absolute configuration of the bound target molecules, such that the chiral environment of the pore enables enantioselective crystallization of the target molecules in the pores, which can be applied to crystallize one enantiomer from a recemic mixture;(iii) the MOF provides sufficiently large single crystals so that the crystals diffract enough for the structure determination, and functionalities that can interact with target molecules, including open metal sites and organic functional groups, sufficient to make the covalent and/or ionic bonds with the target molecules; and(iv) the target molecules are chiral, are of size to be bound within the pores of the MOF, and comprise organic functional groups sufficient to make the covalent and/or ionic bonds with the MOF.2. The method of wherein the functional groups of the target molecules are selected from carboxylic acid claim 1 , primary alcohol claim 1 , vicinal diol claim 1 , and phenol.3. The method of wherein the target molecules are selected from: benzoic acid claim 1 , methanol claim 1 , ethylene glycol claim 1 , 3-nitrophenol claim 1 , heptanoic acid claim 1 , 3-hydroxybenzoic acid claim 1 , 3 claim 1 , ...

ATMOSPHERIC MOISTURE HARVESTER

Provided herein are atmospheric moisture harvester systems, as well as methods using such systems, for capturing water from surrounding air. The systems and methods use adsorbents to adsorb water from the air. For example, the adsorbents may be metal-organic frameworks. The systems and methods desorb this water in the form of water vapor, and the water vapor is condensed into liquid water and collected. The liquid water is suitable for use as drinking water. 138-. (canceled)39. An atmospheric moisture harvester system , comprising:(a) a moisture sorption unit comprising:an insulation compartment containing insulation material, anda tray positioned at the top of the moisture sorption unit, above the insulation compartment,wherein the tray contains water capture material,wherein the water capture material adsorbs moisture from surrounding air during an adsorption phase, and desorbs water vapor during a desorption phase, andwherein the bottom surface of the tray in contact with the water capture material is covered with or made from solar absorptive material, andwherein the side surfaces of the moisture sorption unit are covered with or made from solar reflective material; and(b) a moisture harvesting enclosure with a lid,wherein the moisture sorption unit is positioned inside the moisture harvesting enclosure, and wherein space exists between the moisture sorption unit and the moisture harvesting enclosure,wherein the moisture harvesting enclosure is transparent,wherein the lid, when opened, exposes the water capture material to cold humid surrounding air to adsorb moisture during the adsorption phase, and when closed, heats the water capture material using solar radiation to release water vapor during the desorption phase, andwherein the moisture harvesting enclosure is configured to hold the released water vapor upon desorption; and(c) a condenser comprising one or more side walls of the moisture harvesting enclosure, or positioned at the bottom of the moisture ...

PROCESS TO CONTINUOUSLY PREPARE A CYCLIC CARBONATE

Process to continuously prepare a cyclic carbonate product by reacting an epoxide compound with carbon dioxide in the presence of a supported dimeric aluminium salen complex which complex is activated by a halide compound comprising the following steps, (a) contacting carbon dioxide with the epoxide compound in a suspension of liquid cyclic carbonate and the supported dimeric aluminium salen complex which complex is activated by a halide compound, (b) separating part of the cyclic carbonate product from the supported dimeric aluminium salen complex, (c) separating the halide compound from the cyclic carbonate product to obtain purified cyclic carbonate product, (d) use all or part of the halide compound as obtained in step (c) to activate deactivated supported dimeric salen complex. 1. A process to continuously prepare a cyclic carbonate product by reacting an epoxide compound with carbon dioxide in the presence of a supported dimeric aluminium salen complex which complex is activated by a halide compound comprising the following steps ,(a) contacting carbon dioxide with the epoxide compound in a suspension of liquid cyclic carbonate and the supported dimeric aluminium salen complex which complex is activated by a halide compound, wherein the epoxide compound reacts with the carbon dioxide to the cyclic carbonate product and part of the supported dimeric salen complex deactivates,(b) separating part of the cyclic carbonate product from the supported dimeric aluminium salen complex, to obtain a mixture comprising of the cyclic carbonate product, carbon dioxide, epoxide compound and halide compound,(c) separating the halide compound from the cyclic carbonate product to obtain purified cyclic carbonate product, and(d) use all or part of the halide compound as obtained in step (c) to activate deactivated supported dimeric salen complex.2. The process according to claim 1 , wherein the temperature in step (a) is between 20 and 150° C. and the pressure is between 0.1 and ...

Auxiliaries for olefin polymerization process

A method of forming polymerization auxiliaries for a polymerization process may include combining an antifouling agent with a killer agent to form an auxiliary composition; and contacting the auxiliary composition with an alkylaluminum. An antifouling complex may be produced by combining an antifouling agent with a killer agent to form an auxiliary composition; and contacting the auxiliary composition with an alkylaluminum.

Process for producing dichloropropanol from glycerol, the glycerol coming eventually from the conversion of animal fats in the manufacture of biodiesel

Use of glycerol obtained from renewable raw materials, as starting product for producing organic compounds. Process for producing dichloropropanol, according to which glycerol is subjected to a reaction with a chlorinating agent, with the exception of a batch reaction carried out in the presence of acetic acid or its derivatives.

Organic aluminium compounds

Preparation of aluminum monohydride diethoxide

Method for preparation of alkyl vanadates

Alkyl vanadates are prepared by the reaction of vanadium pentoxide and an alkyl alcohol while heating in the presence of an alkane azeotroping agent to assist in the removal of water by-product.

Organometallic single source precursors for inorganic films coatings and powders

The invention is directed to making inorganic materials consisting of a metal and a group 16 element in the stoichiometric ratio of 2:3 from single source precursors having the same 2:3 metal to heteroatom stoichiometric ratio. In particular, the invention discloses a process for making aluminum oxide from single source precursors that have an aluminum to oxygen ratio of 2:3. The precursors are organoaluminum tetrametallic compounds containing organooxy bridging groups and organo terminal groups. As these compounds tend to be viscous liquids or oils, they can be applied to a substrate surface then pyrolyzed to eliminate the organic ligands and produce aluminum oxide in situ, without using gas phase deposition techniques.

Solutions of organic magnesium compounds containing oxygen in hydrocarbons

A novel process is described for the preparation of novel organic solutions of organooxy magnesium compounds of low viscosity, which solutions are formed in the presence of at least 5 mol % based on the magnesium compound of an organooxy compound of a transition metal of Groups IV through VI of the Periodic Table.

Deactivation of reactive organometallic contaminated equipment

Equipment which is contaminated with an organometallic residue is treated with gaseous carbon dioxide to react with the organometallic compounds contained in the equipment.

PROCESS TO CONTINUOUSLY PREPARE A CYCLIC CARBONATE

The invention is directed to a process to continuously prepare a cyclic carbonate product by reacting an epoxide compound with carbon dioxide in the presence of a supported dimeric aluminium salen complex. The process is performed in a reactor comprising a slurry of the supported dimeric aluminium salen complex and liquid cyclic carbonate product. The produced cyclic carbonate is discharged from the reactor while the supported dimeric aluminium salen complex remains in the reactor. The liquid carbonate product is purified by means of distillation. Between the reactor and the distillation one or more buffer vessels are present having a volume of between 5 and 50 mper kmol of dimeric aluminium salen complex as present in the reactor. 1. A process to continuously prepare a cyclic carbonate product by reacting an epoxide compound with carbon dioxide in the presence of a supported dimeric aluminium salen complex which catalyst is activated by a halide compound ,wherein the process is performed in a reactor comprising a slurry of the supported dimeric aluminium salen complex and the cyclic carbonate product as present as a liquid and wherein to the reactor carbon dioxide and the epoxide compound is continuously supplied and a liquid cyclic carbonate product stream comprising part of the halide compound and dissolved epoxide compound is discharged while substantially all of the supported dimeric aluminium salen complex remains in the reactor,wherein the cyclic carbonate product as present in the liquid cyclic carbonate product stream is separated from the halide compound in a distillation step wherein a purified cyclic carbonate product is obtained as a bottom product of the distillation step and wherein between the reactor and the distillation step the liquid cyclic carbonate product stream passes one or more buffer vessels,{'sup': 3', '3, 'wherein the total volume of the one or more buffer vessels expressed in mrelative to the amount of dimeric aluminium salen complex as ...

Process for preparing a polyfluoro alkanol

Organometallic single source precursors for inorganic films coatings and powders

The invention is directed to making inorganic materials consisting of a metal and a group 16 element in the stoichiometric ratio of 2:3 from single source precursors having the same 2:3 metal to heteroatom stoichiometric ratio. In particular, the invention discloses a process for making aluminum oxide from single source precursors that have an aluminum to oxygen ratio of 2:3. The precursors are organoaluminum tetrametallic compounds containing organooxy bridging groups and organo terminal groups. As these compounds tend to be viscous liquids or oils, they can be applied to a substrate surface then pyrolyzed to eliminate the organic ligands and produce aluminum oxide in situ, without using gas phase deposition techniques.

PROCEDURE FOR THE RECONDITIONING BY DISTILLATION OF A METHANOL / WATER MIXTURE AND PROCEDURE FOR PREPARING METOXIDES OF ALKALIN METALS

Un procedimiento para el reacondicionamiento por destilacion de una mezcla de metanol/agua, en el que se anade una mezcla de metanol/agua a una columna de destilacion (1), se extrae una corriente de vapor que esencialmente comprende metanol en la cabeza de la columna de destilacion (1) y una corriente de fondo que esencialmente comprende agua en el fondo de la columna de destilacion (1), por lo menos una porcion de la corriente de vapor que esencialmente comprende metanol se comprime y se anade la corriente de vapor comprimido como vapor para calefaccion a un evaporador (11) en el que se evapora por lo menos una porcion de la mezcla de metanol/agua que se ha de separar. Además, un procedimiento para preparar metoxidos de metales alcalinos en una columna de reaccion (31) anadiendo metanol y solucion de hidroxido de metal alcalino a la columna de reaccion (31), extrayendo metoxido de metal alcalino disuelto en metanol en el extremo inferior de la columna de reaccion (31) y extrayendo una mezcla de metanol/agua en el extremo superior de la columna de reaccion (31) y reacondicionando la mezcla de metanol/agua mediante el procedimiento para el reacondicionamiento por destilacion. A process for the reconditioning by distillation of a methanol / water mixture, in which a mixture of methanol / water is added to a distillation column (1), a vapor stream is drawn which essentially comprises methanol in the head of the distillation column (1) and a bottom stream that essentially comprises water at the bottom of the distillation column (1), at least a portion of the vapor stream that essentially comprises methanol is compressed and the steam stream is added compressed as steam for heating to an evaporator (11) in which at least a portion of the methanol / water mixture to be separated is evaporated. In addition, a process for preparing alkali metal methoxides in a reaction column (31) by adding methanol and alkali metal hydroxide solution to the reaction column (31), extracting ...

New compounds having an element of group 13 linked to a mono- or di-anionic tridentate ligand, their preparation process and their use as polymerization catalysts

New compounds having one group 13 element, bound with one mono- or di-anionic trident ligand, a method of preparation and application thereof as polymerisation catalysts

The invention discloses new compounds having one group 13 element, bound with one mono- or di-anionic tridentate ligand, a method of preparation thereof, particularly as a (co)polymerisation catalyst.

Aluminum complex derivatives for chemical vacuum evaporation and the method of producing the same

Organometallic compounds useful for forming aluminum films by chemical vapor deposition are disclosed. Also disclosed are methods of preparing the organimetallic compounds and methods of forming aluminum films.

Aluminum complex derivative for chemical vapor deposition and production of the same derivative

본 발명은 반도체 소자의 배선재료로 쓰이는 알루미늄 금속 박막을 화학 증착법에 의해 실리콘 기판상에 증착시키는데 사용되는 전구체 화합물과 그 화합물의 제조 방법 및 그 화합물을 이용하여 실리콘 기판에 알루미늄 박막을 증착시키는 방법에 관한 것으로, 본 발명은 하기의 화학식 1로 정의되는 유기 금속 착물 및 그 제조 방법을 제공한다. The present invention relates to a precursor compound used to deposit an aluminum metal thin film, which is used as a wiring material of a semiconductor device, on a silicon substrate by chemical vapor deposition, a method for preparing the compound, and a method of depositing an aluminum thin film on a silicon substrate using the compound. The present invention provides an organometallic complex defined by the following Chemical Formula 1 and a method for producing the same. H 3 Al : L n H 3 Al: L n 상기 화학식 1에서 L은 헤테로 사이클릭 아민 중 알킬 아지리딘(aziridine), 알킬 아제티딘(azetidine), 알킬 피롤리딘(pyrrolidine), 알킬 피페리딘(piperidine), 알킬 핵사메칠렌이민(hexamethyleneimeine), 알킬 헵타메칠렌이민(heptamethyleneimine), 알킬 모폴린(morpholine), 1,4-디알킬피페라진(piperazine)과 싸이오펜(thiophene), 싸이오피란(thiopyran)중에서 선택되며, n은 1 또는 2의 정수이다. In Formula 1, L is an alkyl aziridine, alkyl azetidine, alkyl pyrrolidine, alkyl piperidine, alkyl hexamethyleneimine in heterocyclic amine, Alkyl heptamethyleneimine, alkyl morpholine, 1,4-dialkylpiperazine, thiophene, thiopyran, n is 1 or 2 Is an integer.

A process for the preparation of polymeric basic aluminum salts

Cyclic aluminum oxide acylates, alkoxides, and phenoxides

Cyclic alkoxy- and phenoxy-aluminum oxide trimers and process for making same

Preparation of a foamed resin from alkoxyaryloxyaluminum compounds

Precursor for polyolefin catalyst

The present invention provides titanium based precursor for polyolefin catalyst with desired morphology and high particle strength. The of preparation of the precursor in accordance with the present invention obviates the use of iodine.

Pseudoazeotropic composition containing dichloropropanol, and the method of its production

Псевдоазеотропная композиция, состоящая, по существу, из дихлорпропанола, хлористого водорода и воды. A pseudo-azeotropic composition consisting essentially of dichloropropanol, hydrogen chloride and water.

Aluminum phenate

Auxiliaries for olefin polymerization process

A method of forming polymerization auxiliaries for a polymerization process may include combining an antifouling agent with a killer agent to form an auxiliary composition; and contacting the auxiliary composition with an aikylaluminum. An anti fouling complex may be produced by combining an antifouling agent with a killer agent to form an auxiliary composition; and contacting the auxiliary composition with an aikylaluminum.

Polymeric materials

아연으로 이루어진 2가 금속화합물, 다수산기 화합물 및 촉매를 제공하는 단계, 상호반응을 일으키기에 충분한 온도에서 촉매의 존재하에서 실질적으로 화학양론적 양으로 2가 금속화합물과 다수산기 화합물을 혼합하는 단계, 그리고 그렇게 형성된 중합체물질을 유리시키는 단계로 이루어진 아연함유 중합체 물질의 제조방법. Providing a divalent metal compound, a multi-acid compound and a catalyst consisting of zinc, mixing the divalent metal compound and a multi-acid compound in a substantially stoichiometric amount in the presence of the catalyst at a temperature sufficient to cause an interaction, And releasing the polymer material so formed.

Novel aluminum-based metal-organic framework having a 3-dimensinal porous structure comprising 2 or more ligands, and preparation method therefor and uses thereof

본 발명은 [Al 8 (OH) a (BTC) b (IPA) c (L) d ]의 화학식으로 표시되는, 3차원 다공성 구조를 갖는 금속-유기 골격체(metal-organic framework; MOF); 이의 제조방법; 및 이의 흡착제 및 촉매로서의 용도에 관한 것이다. The present invention relates to a metal-organic framework (MOF) having a three-dimensional porous structure, represented by the formula of [Al 8 (OH) a (BTC) b (IPA) c (L) d ]; its manufacturing method; and to their use as adsorbents and catalysts.

用于生产环氧树脂的方法

本发明公开了用于生产环氧树脂的方法，其中将相对于全部二氯丙醇含有至少50重量％的1，3-二氯丙-2-醇的二氯丙醇用作起始材料。

Compound containing element of group iii of mendeleev's periodic system binding with mono- or dianionic tridentate ligand, method of their synthesis and use as catalysts of polymerization

FIELD: organic chemistry, polymers, catalysts. SUBSTANCE: invention relates to novel compounds containing element of group III of periodic system and binding with mono or dianionic tridentate ligand, to method of their synthesis and their use, in part, as a catalyst of (co)polymerization. Invention describes compounds of the formula (I): and the formula (2): where M means boron, aluminum or gallium atom; R M means hydrogen atom, halogen atom, preferably chlorine atom or methyl radical; A and B mean independently carbon chain with 2-4 carbon atoms, preferably carbon chain with 2 carbon atoms; L 1 ,L 2 mean independently the group of the formula E 5 (R 5 )- where E 5 means nitrogen or phosphorus atom; R 5 means radical of the formula RR′R″E 4 where E 4 means carbon or silicon atom and R, R' and R'' mean independently hydrogen atom or alkyl radical; X 1 means no coordinating anion relative to element M; L 3 means the group of the formula -E 5 (R 5 )-, where E 5 means nitrogen or phosphorus atom; R 5 means alkyl radical or radical of the formula RR′R″E 4 - where E 4 means silicon atom and R, R' and R'' mean independently alkyl radical; R 1 means hydrogen atom. Invention describes also method of synthesis of compound (1) and (2) and their use as catalysts of polymerization. EFFECT: new compounds indicated above, improved method of synthesis, enhanced catalytically polymerization activity. 11 cl, 6 dwg, 1 tbl (19) (13) ВИ `” 2 180 664” С2 5) МК’ С 07Е 5/00, 5/06, 7/10, С 08 Е 16/00, 10/00 У9э90зЗЬс ПЧ с» РОССИЙСКОЕ АГЕНТСТВО ПО ПАТЕНТАМ И ТОВАРНЫМ ЗНАКАМ (12) ОПИСАНИЕ ИЗОБРЕТЕНИЯ К ПАТЕНТУ РОССИЙСКОЙ ФЕДЕРАЦИИ (21), (22) Заявка: 98121685/04, 30.04.1997 (24) Дата начала действия патента: 30.04.1997 (30) Приоритет: 02.05.1996 ЕР 96400938.5 (43) Дата публикации заявки: 20.11.2000 (46) Дата публикации: 20.03.2002 (56) Ссылки: МЕНКОТКА В.С. МЕНКОТКА В.К. Пепуавуе$ ог Аитшит м Мопо-, 01-, апа Тпефапо! Атте$. - доуг. паап Свет, Зос. у. 39, №10, 1982. (85) ...

Method for preparation of oligomeric iminic derivatives of aluminum

There are disclosed oligomeric aluminum hydride iminic derivatives, to be employed as catalysts in polymerization processes and which are prepared by causing alkali-metal or alkaline-earth-metal alanates to react with a primary amine which contains a group of the type --X--R" m , wherein X is a nitrogen atom or an oxygen atom and m is equal to the valence of X minus one. The compounds have a trimeric or a tetrameric "open cage" spatial configuration.

Weakly coordinating anions containing polyfluoroalkoxide ligands

A compound comprising a polyfluorinated anion and the use thereof is provided. Specifically, the present invention provides a compound comprising an anion which comprises a polyfluorinated alkoxide coordinated to a transition metal, or a Group III, IV or V element.

Verfahren zum Herstellen organischer Aluminiumverbindungen

Aluminium precursor for cvd and its preparation method thereof

An aluminum precursor for CVD(Chemical Vapor Deposition) and a preparation method thereof are provided to improve the deposition rate, resistance, purity, adhesive ability and reflectivity of aluminum thin film deposited to a silicon substrate by improving thermal stability of the aluminum precursor. An aluminum precursor for depositing high purity aluminum thin film on a substrate through chemical vapor deposition has the structure represented by the formula(1) of H3Al:Ln, wherein L is a Lewis base and an amine-based organic compounds represented by the formula(3), formula(4), formula(5) or formula(6) capable of supplying a noncovalent electron pair to the center of aluminum metal; n is 1; R^15 and R^16 are each independently C1-C5 alkyl group or perfluoroalkyl group; R^3, R^4, R^17 and R^18 are each independently hydrogen, C1-C5 alkyl group or perfluoroalkyl group; l is an integer from 1 to 4; k is an integer from 2 to 8; R^5, R^6, R^19, R^20, R^21 and R^22 are each independently hydrogen or C1-C5 alkyl group or perfluoroalkyl group; o is an integer from 1 to 4, i and j are each independently an integer from 2 to 8; R^23 and R^24 are each independently C1-C5 alkyl group or perfluoroalkyl group; R^7, R^8, R^25, R^26, R^27 and R^28 are each independently hydrogen or C1-C5 alkyl group or perfluoroalkyl group; X is oxygen, sulfur or nitrogen containing alkyl group or perfluoroalkyl group; p is an integer from 1 to 4; q and r are each independently an integer from 1 to 8; R^9, R^10, R^29, R^30, R^31, R^32, R^33, R^34, R^35 and R^36 are each independently hydrogen or C1-C5 alkyl group or perfluoroalkyl group; X' or X" are each independently oxygen, sulfur or nitrogen containing alkyl group or perfluoroalkyl group; s is an integer from 1 to 4; and t, u, v and w are each independently an integer from 1 to 8.

Process for the production of dichloropropanol from glycerol, wherein the glycerol ultimately results from the conversion of animal fats in the production of biodiesel

Method of rendering substrates resistant to fungi and bacteria and resulting product

Multifunctional amino zirconium aluminum metallo organic complexes useful as adhesion promoter

This invention relates to novel compositions of matter which are multifunctional amino zirconium aluminum metallo organic complexes which are comprised of a chemically united complex aluminum moiety, a tetravalent zirconium moiety, and a multifunctional amino acid wherein the acid is chemically bound to both the aluminum and zirconium centers. Such compositions are useful in promoting adhesion of adhesives, sealants, and coatings to metal, rubber, glass, plastic, coatings, and wood thereby enhancing strength properties and prolonging useful service life when such products are exposed to aggressive environments. Futher described is the specific process for the preparing of such compositions in organic media with desirable stability of the metal centers toward polymerization and related hydrolysis.

Aluminium, titanium and zirconium chelate compounds of perfluoralkylcarboxylic acids and process for making same

Metal alkyl,or alkoxy metal alkyl,ester tetrapropenylsuccinates

Concentrated solutions of alkaline-earth metal oxides in aprotic solvents and method for the production thereof

The invention relates to concentrated solutions of mixed alkaline-earth alkoxide compounds M(OCH 2 R 6 ) 2-x (OR 7 ) x and an aluminum compound AI(OCH 2 R 6 ) 3-y (OR 7 ) y in aprotic solvents, wherein: M is an alkaline-earth metal selected from among Mg, Ca, Ba, Sr; OCH 2 R 6 is an alkoxide group comprising at least 3 and at most 40 C atoms and having a branch at the 2-position relative to the O- function, in other words R 6 = -CHR 8 R 9 , wherein R 8 , R 9 = alkyl groups C 1 - C 18 independently of each other; R 7 is an alkyl group having 2-15 C atoms that is either linear or has a branch ≥ the 3-position; and the sum of x and y is a number between 0.01 and 0.8, preferably 0.02 and 0.3, and especially preferably 0.03 and 0.2.

Low-viscosity solutions of alkaline-earth metal alkoxides in aprotic solvents, method for the production of same and use for the production of ziegler-natta catalysts

The invention relates to concentrated low-viscosity solutions of alkaline earth alkoxide compounds M(OCH 2 R 6 ) 2-a-b (OR 7 ) a [O(CHR 8 ) n OR 9 ] b in a mixture of a metal alkyl compound M(R 10 R 11 ) in aprotic solvents, where M is an alkaline-earth metal chosen from Mg, Ca, Ba, Sr; OCH 2 R 6 is an alkoxide radical comprising at least 3 and at most 40 carbon atoms having a branch in position 2 in relation to the O function, thus R 6 = -CHR 12 R 13 with R 12 , R 13 = mutually independent alkyl radicals C 1 -C 18 ; R 7 is an alkyl radical having 2-15 carbon atoms, which is either linear or has a branch in a position ≥ 3 (in relation to the O function); R 8 is an alkyl radical comprising 1 -6 carbon atoms, which is either linear or has a branch in a position ≥ 3 (in relation to the O function); R 9 has an alkyl radical with 2-15 carbon atoms, which is either linear or has a branch; R 10 and R 11 are any alkyl radicals comprising 1-15 carbon atoms, n = an integer from 1 to 4, a + b ≤ 2, wherein a and b can assume values from 0 to 2 and the molar ratio of M(OCH 2 R 6 ) 2-a-b (OR 7 ) a [O(CHR 8 ) n OR 9 ] b to M(R 10 R 11 ) lies from 99.5:0.5 to 60:40.

Concentrated solutions of alkaline earth metal alkoxides in aprotic solvents and process for their preparation

Die Erfindung betrifft konzentrierte Lösungen von gemischten Erdalkalialkoxidverbindungen M(OCH 2 R 6 ) 2-x (OR 7 ) x und einer Aluminiumverbindung Al(OCH 2 R 6 ) 3-y (OR 7 ) y in aprotischen Lösungsmitteln wobei • M ein Erdalkalimetall ausgewählt aus Mg, Ca, Ba, Sr; • OCH 2 R 6 ein Alkoxidrest bestehend aus mindestens 3 und höchstens 40 C-Atomen mit einer Verzweigung in 2-Position bezogen auf die O-Funktion, also R 6 = -CHR 8 R 9 mit R 8 , R 9 = unabhängig voneinander Alkylreste C 1 -C 18 ; • R 7 ist ein Alkylrest mit 2–15 C-Atomen, der entweder linear ist oder eine Verzweigung ≥ der 3-Position aufweist • und die Summe von x und y eine Zahl zwischen 0,01 und 0,8, bevorzugt 0,02 und 0,3 und besonders bevorzugt 0,03 und 0,2 ist. The invention relates to concentrated solutions of mixed Erdalkalialkoxidverbindungen M (OCH 2 R 6 ) 2-x (OR 7 ) x and an aluminum compound Al (OCH 2 R 6 ) 3-y (OR 7 ) y in aprotic solvents M is an alkaline earth metal selected from Mg, Ca, Ba, Sr; • OCH 2 R 6 an alkoxide radical consisting of at least 3 and at most 40 C atoms with a branching in the 2-position based on the O function, ie R 6 = -CHR 8 R 9 with R 8 , R 9 = independently of one another alkyl radicals C 1 -C 18 ; • R 7 is an alkyl radical with 2-15 C atoms, which is either linear or has a branch ≥ the 3-position • and the sum of x and y is a number between 0.01 and 0.8, preferably 0.02 and 0.3 and particularly preferably 0.03 and 0.2.