Large Area Patterning of Nano-Sized Shapes

Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process. 1. An imprint lithography method of patterning a substrate comprising the steps of:providing a substrate;coating the substrate with an adhesive layer having a thickness of 1 nm or less;depositing polymerizable material on the adhesive layer;positioning an imprint lithography template having a relief pattern with sharp edged features in contact with the deposited polymerizable material at a first height relative to the substrate;moving the imprint lithography template to a second height relative to the substrate to spread the polymerizable material;{'sub': 'R', 'solidifying the polymerizable material to form a patterned layer having sharp edged features and a residual layer thickness tof less than 5 nm;'}separating the imprint lithography template from the formed patterned layer;directly etching the pattern into the substrate without a descum etching step wherein the etched substrate substantially retains the sharp edged features of the patterned layer.2. The method of wherein the adhesive layer is coated onto the substrate by vapor deposition.3. The method of wherein the depositing polymerizable material on the adhesive layer further comprises dispensing the polymerizable material as a plurality of droplets.4. The method of wherein the imprint template relief pattern further comprises dummy fill features.5. An imprint lithography method of patterning a substrate comprising the steps of:providing a substrate;depositing polymerizable material on the substrate;positioning an imprint lithography template having a relief pattern with sharp edged features in contact with the deposited polymerizable material at a first height relative to the substrate;moving the imprint lithography template to a ...

Diffractive optical elements with mitigation of rebounce-induced light loss and related systems and methods

Display devices include waveguides with in-coupling optical elements that mitigate re-bounce of in-coupled light to improve overall in-coupling efficiency and/or uniformity. A waveguide receives light from a light source and/or projection optics and includes an in-coupling optical element that in-couples the received light to propagate by total internal reflection in a propagation direction within the waveguide. Once in-coupled into the waveguide the light may undergo re-bounce, in which the light reflects off a waveguide surface and, after the reflection, strikes the in-coupling optical element. Upon striking the in-coupling optical element, the light may be partially absorbed and/or out-coupled by the optical element, thereby effectively reducing the amount of in-coupled light propagating through the waveguide. The in-coupling optical element can be truncated or have reduced diffraction efficiency along the propagation direction to reduce the occurrence of light loss due to re-bounce of in-coupled light, resulting in less in-coupled light being prematurely out-coupled and/or absorbed during subsequent interactions with the in-coupling optical element.

DISPLAY DEVICE HAVING DIFFRACTION GRATINGS WITH REDUCED POLARIZATION SENSITIVITY

Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate. 1. A head-mounted display system comprising:a head-mountable frame;a light projection system configured to output light to provide image content; and{'b': 1', '9, 'a waveguide supported by the frame, the waveguide comprises a substrate comprising material having an index of refraction of at least ., the substrate configured to guide at least a portion of the light from the light projection system coupled into the waveguide; and'}a blazed diffraction grating formed in the substrate or in a layer disposed over the substrate;wherein the blazed diffraction grating has a first diffraction efficiency for a first polarization over a range of angles of light incident thereon and has a second diffraction efficiency for a second polarization over the range of angles of light incident thereon, the first diffraction efficiency being between 1 and 2 times the second diffraction efficiency.2. The head-mounted display system of claim 1 , wherein the blazed diffraction grating is formed in the substrate and arranged to optically communicate with the substrate.3. The head-mounted display system of claim 1 , wherein the blazed diffraction grating is in a layer disposed over the substrate and arranged to optically communicate with the substrate.4. (canceled)5 ...

NANOGRATING METHOD AND APPARATUS

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region. 1. A method of manufacturing a waveguide having a multi-level binary grating structure , the method comprising:coating a first etch stop layer on a first substrate;adding a second substrate on the first etch stop layer;depositing a first resist layer on the second substrate, wherein the first resist layer includes at least one first opening;depositing a second etch stop layer on the second substrate in the at least one first opening;removing the first resist layer from the second substrate;adding a third substrate on the second substrate and the second etch stop layer;depositing a second resist layer on the third substrate, wherein the second resist layer includes at least one second opening;depositing a third etch stop layer on the third substrate in the at least one second opening;removing the second resist layer from the third substrate;etching the second substrate and the third substrate, leaving the first substrate, the first etch stop layer, the second etch stop layer and the second substrate in the at least one first opening, and the third etch stop layer and the third substrate in the at least one second opening; andetching an exposed portion of the first etch stop layer, an exposed portion of the second etch stop layer, and the third etch stop layer, forming the multi-level binary grating.2. The method of claim 1 , wherein the first ...

AIR POCKET STRUCTURES FOR PROMOTING TOTAL INTERNAL REFLECTION IN A WAVEGUIDE

Recesses are formed on a front side and a rear side of a waveguide. A solid porogen material is spun onto the front side and the rear side and fills the recesses. First front and rear cap layers are then formed on raised formations of the waveguide and on the solid porogen material. The entire structure is then heated and the solid porogen material decomposes to a porogen gas. The first front and rear cap layers are porous to allow the porogen gas to escape and air to enter into the recesses. The air maximizes a difference in refractive indices between the high-index transparent material of the waveguide and the air to promote reflection in the waveguide from interfaces between the waveguide and the air. 1. A method of manufacturing an optical system comprising:securing a cap layer of a select transparent material to a waveguide of a high-index transparent material having front and rear sides, a cavity being defined between the cap layer and the waveguide with an optical gas in the cavity, such that, if a source of ambient light is located on the front side of the waveguide, a beam of the ambient light transmits in the select transparent material of the cap layer, in the cavity holding the optical gas and in the high-index transparent material of the waveguide.2. The method of claim 1 , wherein the cap layer is a front cap layer located between the source of ambient light and the front side of the waveguide and the beam of the ambient light transmits sequentially through the select transparent material of the front cap layer claim 1 , through the cavity holding the optical gas and into the high-index transparent material of the waveguide.3. The method of claim 2 , wherein the select transparent material of the front cap layer is an anti-reflective material that increases absorption of the ambient light by the front surface of the waveguide and reduces reflection of the ambient light by the front surface of the waveguide.4. The method of claim 3 , wherein the high- ...

NANOGRATING METHOD AND APPARATUS

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region. 1. A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure , the method comprising:cutting a substrate off-axis;depositing a first layer on the substrate;depositing a resist layer on the first layer, wherein the resist layer includes a pattern;etching the first layer in the pattern using the resist layer as a mask, wherein the pattern includes a first region and a second region;removing the resist layer;coating a first polymer layer in the first region of the pattern;etching the substrate in the second region of the pattern, creating the binary grating structure in the substrate in the second region;removing the first polymer layer;coating a second polymer layer in the second region of the pattern;etching the substrate in the first region of the pattern, creating the blazed grating structure in the substrate in the first region;removing the second polymer layer; andremoving the first layer from the substrate.2. The method of claim 1 , wherein the substrate comprises silicon.3. The method of claim 1 , wherein the first layer comprises silicon dioxide.4. The method of claim 1 , wherein the resist layer is deposited using lithography.5. The method of claim 1 , wherein etching the substrate in the second region of the pattern includes dry etching the substrate.6. The method of claim 1 , ...

DISPLAY DEVICE WITH DIFFRACTION GRATING HAVING REDUCED POLARIZATION SENSITIVITY

Diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The diffraction gratings and waveguides may include a transmissive layer and a metal layer. The diffraction grating may comprises a blazed grating. 1. A head-mounted display system comprising:a head-mountable frame;a light projection system configured to output light to provide image content;a waveguide supported by the frame, the waveguide comprising a substrate configured to guide at least a portion of the light from said light projection system coupled into said waveguide;a first diffraction grating comprising material different than said substrate over said substrate;a first layer disposed over said first diffraction grating; anda second layer comprising metal disposed over said first diffraction grating such that said diffraction grating has a first diffraction efficiency for a first polarization over a range of angles of light incident thereon and a second diffraction efficiency for a second polarization over the range of angles of light incident thereon, the first diffraction efficiency being from 1 to 2 times the second diffraction efficiency.2. The head-mounted display system of claim 1 , wherein the substrate comprises material having an index of refraction of at least 1.9.3. The head-mounted display system of claim 1 , wherein the first diffraction grating material comprises polymer.4. The head-mounted display of claim 1 , wherein the first diffraction grating material comprises imprintable material.5. The head-mounted display system of claim 1 , wherein the first diffraction grating material has a refractive index of 1.4 to 1.95.6. The head-mounted display system of claim 1 , wherein the first diffraction ...

MICROLITHOGRAPHIC FABRICATION OF STRUCTURES

Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern. 1. A method of fabricating a variable depth pattern , the method comprising:dispensing, on a surface of a substrate, an imprint fluid according to a predetermined pattern;contacting the imprint fluid with a surface of an imprint lithography template such that the imprint fluid fills features in the surface of the imprint lithography template; and structures that correspond to the features of the imprint lithography template, and', 'a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of a structure, wherein a first RLT of a first portion of the patterned layer is different from a second RLT of a second portion of the patterned layer., 'solidifying the imprint fluid into a patterned layer, thereby forming, in the patterned layer2. The method of claim 1 , wherein an RLT in a region between the first portion and the second portion varies gradually from the first RLT to the second RLT.3. The method of claim 1 , wherein a change in RLT from the first RLT to the second RLT is a step change in a region between the first portion and the second portion.4. The method of claim 1 , wherein dispensing the imprint fluid comprises dispensing the imprint fluid in a pattern of drops claim 1 , wherein a volume of drops dispensed across the surface of the substrate varies according to the predetermined pattern.5. The method of claim 4 , wherein the pattern of drops corresponds to a fixed drop density in a predetermine region.6. The method of claim 4 , wherein the pattern of drops corresponds to a varying drop density in a predefined region.7. ...

Method and system for tunable gradient patterning using a shadow mask

A method of depositing a variable thickness material includes providing a substrate and providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent the substrate and performing a plasma deposition process on the substrate to deposit the variable thickness material. A layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.

Configuring optical layers in imprint lithography processes

An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

AUGMENTED REALITY DISPLAY HAVING LIQUID CRYSTAL VARIABLE FOCUS ELEMENT AND ROLL-TO-ROLL METHOD AND APPARATUS FOR FORMING THE SAME

A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller. 1. A display device comprising:a waveguide assembly comprising a waveguide configured to output light to display an image; and a waveplate lens; and', a first non-liquid crystal quarter-wave plate and a second non-liquid crystal quarter-wave plate defining a volume therebetween; and', 'a liquid crystal layer disposed in the volume between the first quarter-wave plate and the second quarter-wave plate, wherein liquid crystal molecules of the liquid crystal layer have selectively switchable orientations., 'a switchable waveplate assembly comprising], 'an adaptive lens assembly having a major surface facing a major surface of the waveguide, the adaptive lens assembly comprising29-. (canceled)10. An adaptive lens assembly comprising:a waveplate lens; and a first non-liquid crystal quarter-wave plate and a second non-liquid crystal quarter-wave plate defining a volume therebetween; and', 'a liquid crystal layer disposed in the volume between the first quarter-wave plate and the second quarter-wave plate, wherein liquid crystal molecules of the liquid crystal ...

METHOD AND SYSTEM FOR VARIABLE OPTICAL THICKNESS WAVEGUIDES FOR AUGMENTED REALITY DEVICES

An augmented reality device includes a projector, projector optics optically coupled to the projector, and an eyepiece optically coupled to the projector optics. The eyepiece includes an eyepiece waveguide characterized by lateral dimensions and an optical path length difference as a function of one or more of the lateral dimensions. 1. An augmented reality device comprising:a projector;projector optics optically coupled to the projector; andan eyepiece optically coupled to the projector optics, wherein the eyepiece comprises an eyepiece waveguide characterized by lateral dimensions and an optical path length difference as a function of one or more of the lateral dimensions.2. The augmented reality device of wherein the eyepiece further comprises:a second eyepiece waveguide characterized by second lateral dimensions and a second optical path length difference as a function of one or more of the second lateral dimensions; anda third eyepiece waveguide characterized by third lateral dimensions and a third optical path length difference as a function of one or more of the third lateral dimensions.3. The augmented reality device of wherein the eyepiece waveguide claim 2 , the second eyepiece waveguide claim 2 , and the third eyepiece waveguide form the eyepiece.4. The augmented reality device of wherein the eyepiece is a laminated structure including the eyepiece waveguide claim 3 , the second eyepiece waveguide claim 3 , and the third eyepiece waveguide.5. The augmented reality device of further comprising:a second projector;second projector optics optically coupled to the projector; anda second eyepiece optically coupled to the second projector optics, wherein the second eyepiece comprises a fourth eyepiece waveguide characterized by fourth lateral dimensions and a fourth optical path length difference as a function of one or more of the fourth lateral dimensions.6. The augmented reality device of wherein the second eyepiece further comprising:a fifth eyepiece ...

METHOD AND SYSTEM FOR TUNABLE GRADIENT PATTERNING USING A SHADOW MASK

A method of fabricating a diffractive structure with varying diffractive element depth includes providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent a substrate. The substrate comprises an etch mask corresponding to the diffractive structure. The method further includes exposing the substrate to an etchant, etching the substrate to form diffractive elements adjacent the first region having a first depth, and etching the substrate to form diffractive elements adjacent the second region having a second depth less than the first depth. 1. A method of fabricating a diffractive structure with varying diffractive element depth , the method comprising:providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio;positioning the shadow mask adjacent a substrate, wherein the substrate comprises an etch mask corresponding to the diffractive structure;exposing the substrate to an etchant;etching the substrate to form diffractive elements adjacent the first region having a first depth; andetching the substrate to form diffractive elements adjacent the second region having a second depth less than the first depth.2. The method of wherein the first aperture dimension to aperture periodicity ratio and the second aperture dimension to aperture periodicity ratio are defined by a first aperture dimension in the first region greater than a second aperture dimension in the second region and a constant center-to-center spacing of apertures.3. The method of wherein the first aperture dimension to aperture periodicity ratio and ...

SUPERIMPOSED DIFFRACTION GRATINGS FOR EYEPIECES

Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns. 1. A method of making a template for applying a grating pattern to a eyepiece , the method comprising:forming a first pattern in a first side of an eyepiece substrate; andforming a second pattern in the first side of the eyepiece substrate to form the template, the second pattern being superimposed onto the first pattern in the eyepiece substrate to form the template that includes, on one side of the template, a combined pattern that is a combination of the first pattern and the second pattern,wherein the first pattern corresponds to one of an orthogonal pupil expander (OPE) grating or an exit pupil expander (EPE) grating, and the second pattern corresponds to a different one of the OPE grating or the EPE grating.2. The method of claim 1 , wherein forming the first pattern in the first side of the eyepiece substrate includes etching the first pattern.3. The method of claim 1 , wherein forming the second pattern in the first side of the eyepiece substrate includes imprinting the second pattern.4. The ...

SUPERIMPOSED DIFFRACTION GRATINGS FOR EYEPIECES

Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns. 1. A method of making a template for applying a grating pattern to a waveguide , the method comprising:forming a first pattern in a first side of a template substrate; andforming a second pattern in the first side of the template substrate to form the template, the second pattern being superimposed onto the first pattern in the template substrate to form the template that includes, on one side of the template, a combined pattern that is a combination of the first pattern and the second pattern,wherein the first pattern corresponds to one of an orthogonal pupil expander (OPE) grating or an exit pupil expander (EPE) grating, and the second pattern corresponds to a different one of the OPE grating or the EPE grating.2. The method of claim 1 , wherein forming the first pattern in the first side of the template substrate includes etching the first pattern.3. The method of claim 1 , wherein forming the second pattern in the first side of the template substrate includes imprinting the second pattern.4. The ...

Configuring optical layers in imprint lithography processes

An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Nanostructured Solar Cell

Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE. 121-. (canceled)22. A method of producing a solar cell , the method comprising:providing a substrate;forming a patterned layer in direct contact with the substrate, the patterned layer including i) a repeating pattern of pyramid nanostructures extending away from the substrate such that there is a distance between bases of directly adjacent pyramid nanostructures and ii) a residual layer positioned between the pyramid nanostructures and the substrate, wherein the intersections between a surface of the residual layer and the bases of the pyramid nanostructures are rounded;depositing a first conducting material in direct contact with the patterned layer and coinciding with the repeating pattern of the pyramid nanostructures;depositing a semiconductor layer on the first conducting material, the semiconductor layer comprising, in an order of deposition, an amorphous silicon p-type layer, an amorphous silicon intrinsic layer, and an amorphous silicon n-type layer; anddepositing a second conducting material in direct contact with the semiconductor layer, wherein the semiconductor layer and the second conducting material coincide with the repeating pattern of the pyramid nano structures.23. The method of claim 22 , further comprising removing the residual layer.24. The method of claim 23 , wherein the residual layer is removed by VUV etching.25. The method of claim 22 , further comprising transferring the patterned layer to the substrate by wet etching.26. The method of claim 25 , wherein the wet etching increases a feature height and aspect ratio of the pyramid nanostructures.27. The method of claim 22 , wherein a feature height and aspect ratio of the pyramid nanostructures is between 0.5 and 10.28. The ...

CONFIGURING OPTICAL LAYERS IN IMPRINT LITHOGRAPHY PROCESSES

An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount. 1. (canceled)2. An imprint lithography method of configuring optical layers , the imprint lithography method comprising:forming a first optical layer comprising a first substrate and a nanolayer imprinted directly on the first substrate;forming a second optical layer comprising a second substrate and a first functional pattern disposed along the second substrate; andforming a third optical layer comprising a third substrate and a second functional pattern disposed along the third substrate,wherein imprinting the nanolayer on the first substrate changes the effective refractive index of the substrate such that a relative amount of light transmittable through the first substrate to the second optical layer is changed by a selected amount.3. The imprint lithography method of claim 2 , wherein the relative amount of light is a first relative amount of light claim 2 , and wherein imprinting the nanolayer on the first substrate to change the effective refractive index of the first substrate comprises changing a second relative amount of light reflected from a surface of the first substrate.4. The imprint lithography method of claim 2 , further comprising selecting one or more of a shape claim 2 , a dimension claim 2 , and a material formulation of the nanolayer.5. The imprint lithography method of claim 2 , further comprising imprinting a flat nanoimprint on the first substrate.6. The imprint lithography method of claim 2 , further comprising imprinting a featured nanoimprint on the first substrate.7. The imprint lithography method of claim 2 , further ...

MICROLITHOGRAPHIC FABRICATION OF STRUCTURES

Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern. 1. A method of fabricating a variable depth pattern , the method comprising:dispensing, on a surface of a substrate, an imprint fluid according to a predetermined pattern;contacting the imprint fluid with a surface of an imprint lithography template such that the imprint fluid fills features in the surface of the imprint lithography template; and structures that correspond to the features of the imprint lithography template, and', 'a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of a structure, wherein a first RLT of a first portion of the patterned layer is different from a second RLT of a second portion of the patterned layer,, 'solidifying the imprint fluid into a patterned layer, thereby forming, in the patterned layerwherein the predetermined pattern is generated from an imprint lithography diffraction pattern having a uniform RLT.2. The method of claim 1 , wherein an RLT in a region between the first portion and the second portion varies gradually from the first RLT to the second RLT.3. The method of claim 1 , wherein a change in RLT from the first RLT to the second RLT is a step change in a region between the first portion and the second portion.4. The method of claim 1 , wherein dispensing the imprint fluid comprises dispensing the imprint fluid in a pattern of drops claim 1 , wherein a volume of drops dispensed across the surface of the substrate varies according to the predetermined pattern.5. The method of claim 4 , wherein the pattern of drops corresponds to a fixed drop density in a predetermined region.6. ...

MICROLITHOGRAPHIC FABRICATION OF STRUCTURES

Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern. 1. A method of fabricating a variable depth pattern , the method comprising:dispensing, on a surface of a substrate, an imprint fluid according to a predetermined pattern;contacting the imprint fluid with a surface of an imprint lithography template such that the imprint fluid fills features in the surface of the imprint lithography template; and structures that correspond to the features of the imprint lithography template, and', 'a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of a structure, wherein a first RLT of a first portion of the patterned layer is different from a second RLT of a second portion of the patterned layer,, 'solidifying the imprint fluid into a patterned layer, thereby forming, in the patterned layerwherein differences between the first RLT and the second RLT compensate for inefficiencies in a diffraction pattern produced from a uniform RLT diffracting pattern.2. The method of claim 1 , wherein an RLT in a region between the first portion and the second portion varies gradually from the first RLT to the second RLT.3. The method of claim 1 , wherein a change in RLT from the first RLT to the second RLT is a step change in a region between the first portion and the second portion.4. The method of claim 1 , wherein dispensing the imprint fluid comprises dispensing the imprint fluid in a pattern of drops claim 1 , wherein a volume of drops dispensed across the surface of the substrate varies according to the predetermined pattern.5. The method of claim 4 , wherein the pattern of drops corresponds to a ...

Optical eyepiece using single-sided patterning of grating couplers

An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

WAVEGUIDES HAVING INTEGRAL SPACERS AND RELATED SYSTEMS AND METHODS

A head-mounted, near-eye display system comprises a stack of waveguides having integral spacers separating the waveguides. The waveguides may each include diffractive optical elements that are formed simultaneously with the spacers by imprinting or casting. The spacers are disposed on one or more major surfaces of the waveguides and define a distance between immediately adjacent waveguides. Adjacent waveguides may be bonded using adhesives on the spacers. The spacers may fit within indentations of overlying waveguides. In some cases, the spacers may form one or more walls of material substantially around a perimeter of an associated waveguide. Vent holes may be provided in the walls to allow gas flow into and out from an interior volume defined by the spacers. Debris trapping structures may be provided between two walls of spacers to trap and prevent debris from entering into the interior volume. 1. A display system comprising: a first waveguide comprising an optically transmissive body, a first major surface, and a spacer integral with the optically transmissive body, the spacer extending vertically from the first major surface;', 'a second waveguide comprising an optically transmissive body and a second major surface, the second major surface facing and spaced apart from the first major surface of the first waveguide by the spacer; and', 'an adhesive provided on a top surface of the spacer, the adhesive attaching the spacer to the second major surface of the second waveguide,', 'wherein the adhesive has an as-deposited viscosity of 10 mPa·s to 100 mPa·s., 'a stack of waveguides, the stack of waveguides comprising2. The display system of claim 1 , wherein the spacer extends along a perimeter of the first waveguide.3. The display system of claim 1 , wherein the spacer defines an edge of the waveguide.4. The display system of claim 1 , wherein the adhesive constitutes a first adhesive claim 1 , and wherein the stack of waveguides further comprises a second adhesive ...

METHOD AND SYSTEM FOR TUNABLE GRADIENT PATTERNING USING A SHADOW MASK

A method of fabricating a shadow mask includes depositing a chrome etch mask layer on a substrate. The substrate includes a silicon handle wafer, a buried oxide layer, a single crystal silicon layer, and a backside oxide layer. The method also includes forming a patterning layer including a pattern on the chrome etch mask layer, etching the chrome etch mask layer using the patterning layer to transfer the pattern in the patterning layer into the chrome etch mask layer, and etching the pattern of the chrome etch mask layer into the single crystal silicon layer. The method further includes patterning the backside oxide layer, etching the silicon handle wafer using the patterned backside oxide layer, removing the buried oxide layer, and removing remaining portions of the patterned chrome etch mask layer and the patterning layer. 1. A method of fabricating a shadow mask , the method comprising:depositing a chrome etch mask layer on a substrate, the substrate including a silicon handle wafer, a buried oxide layer, a single crystal silicon layer, and a backside oxide layer;forming a patterning layer including a pattern on the chrome etch mask layer;etching the chrome etch mask layer using the patterning layer to transfer the pattern in the patterning layer into the chrome etch mask layer;etching the pattern of the chrome etch mask layer into the single crystal silicon layer;patterning the backside oxide layer;etching the silicon handle wafer using the patterned backside oxide layer;removing the buried oxide layer; andremoving remaining portions of the patterned chrome etch mask layer and the patterning layer.2. The method of wherein the shadow mask comprises dielectric materials.3. The method of wherein the shadow mask comprises metallic materials.4. The method of wherein forming the patterning layer comprises patterning the patterning layer to form apertures claim 1 , each of the apertures being characterized by a predetermined aperture size.5. The method of wherein the ...

Nanograting method and apparatus

A method of manufacturing a waveguide having a combination of a binary grating structure and a blazed grating structure includes cutting a substrate off-axis, depositing a first layer on the substrate, and depositing a resist layer on the first layer. The resist layer includes a pattern. The method also includes etching the first layer in the pattern using the resist layer as a mask. The pattern includes a first region and a second region. The method further includes creating the binary grating structure in the substrate in the second region and creating the blazed grating structure in the substrate in the first region.

Configuration of optical layers in imprint lithography process

【課題】インプリントリソグラフィプロセスにおける光学層の構成の提供。【解決手段】光学層を構成するインプリントリソグラフィ方法は、基板の有効屈折率を変化させるために基板に適用されるべきナノ層の１つ以上のパラメータを選択することと、基板を透過可能な相対的な光の量が選択された量だけ変化させられるように基板の有効屈折率を変化させるために、基板上にナノ層をインプリントすることとを含む。一実施形態において、インプリントリソグラフィ方法は、ナノ層の形状、寸法、および材料調合のうちの１つ以上のものを選択することをさらに含む。【選択図】図１１

Augmented reality display having liquid crystal variable focus element and roll-to-roll method and apparatus for forming the same

A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

Solar cell fabrication by nanoimprint lithography

Fabricating a solar cell stack includes forming a nanopattemed polymeric layer on a first surface of a silicon wafer and etching the first surface of the silicon wafer to transfer a pattern of the nanopattemed polymeric layer to the first surface of the silicon wafer. A layer of reflective electrode material is formed on a second surface of the silicon wafer. The nanopattemed first surface of the silicon wafer undergoes a buffered oxide etching. After the buffered oxide etching, the nanopattemed first surface of the silicon wafer is treated to decrease a contact angle of water on the nanopattemed first surface. Electron donor material is deposited on the nanopattemed first surface of the silicon wafer to form an electron donor layer, and a transparent electrode material is deposited on the electron donor layer to form a transparent electrode layer on the electron donor layer.

Method and system for tunable gradient patterning using a shadow mask

A method of fabricating a diffractive structure with varying diffractive element depth includes providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent a substrate. The substrate comprises an etch mask corresponding to the diffractive structure. The method further includes exposing the substrate to an etchant, etching the substrate to form diffractive elements adjacent the first region having a first depth, and etching the substrate to form diffractive elements adjacent the second region having a second depth less than the first depth.

Nanostructured solar cell

Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.

Microlithographic fabrication of structures

Micro- and nano-patterns in imprint layers formed on a substrate and lithographic methods for forming such layers. The layers include a plurality of structures, and a residual layer having a residual layer thickness (RLT) that extends from the surface of the substrate to a base of the structures, where the RLT varies across the surface of the substrate according to a predefined pattern.

Nano-patterned active layers formed by nano-imprint lithography

Patterned active layers formed by nano-imprint lithography for use in devices such as photovoltaic cells and hybrid solar cells. One such photovoltaic cell (400) includes a first electrode (406, 408) and a first electrically conductive layer (402, 404) electrically coupled to the first electrode. The first conductive layer (402, 404) has a multiplicity of protrusions (412, 414) and recesses (416, 422) formed by a nano-imprint lithography process. A second electrically conductive layer (402, 404) substantially fills the recesses (416, 422) and covers the protrusions (412, 414) of the first conductive layer (402, 404), and a second electrode (406, 408) is electrically coupled to the second conductive layer (402, 404). A circuit (410) electrically connects the first electrode (406, 408) and the second electrode (406, 408).

Optical eyepiece using single-sided patterning of grating couplers

An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

Superimposed diffraction gratings for eyepieces

Embodiments of the present disclosure are directed to techniques for manufacturing an eyepiece (or eyepiece layer) by applying multiple, different diffraction gratings to a single side of an eyepiece substrate instead of applying different gratings to different sides (e.g., opposite surfaces) of the substrate. Embodiments are also directed to the eyepiece (or eyepiece layer) that is arranged to have multiple, different diffraction gratings on a single side of the eyepiece substrate. In some embodiments, two or more grating patterns are superimposed to create a combination pattern in a template (e.g., a master), which is then used to apply the combination pattern to a single side of the eyepiece substrate. In some embodiments, multiple layers of patterned material (e.g., with differing refraction indices) are applied to a single side of the substrate. In some examples, the combined grating patterns are orthogonal pupil expander and exit pupil expander grating patterns.

Optical eyepiece using single-sided patterning of grating couplers

An eyepiece includes a substrate and an in-coupling grating patterned on a single side of the substrate. A first grating coupler is patterned on the single side of the substrate and has a first grating pattern. The first grating coupler is optically coupled to the in-coupling grating. A second grating coupler is patterned on the single side of the substrate adjacent to the first grating coupler. The second grating coupler has a second grating pattern different from the first grating pattern. The second grating coupler is optically coupled to the in-coupling grating.

Nanostructured solar cell

Systems and methods for fabrication of nanostructured solar cells having arrays of nanostructures are described, including nanostructured solar cells having a repeating pattern of pyramid nanostructures, providing for low cost thin-film solar cells with improved PCE.

Display device having diffraction gratings with reduced polarization sensitivity

Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Waveguides having integral spacers and related systems and methods

A head-mounted, near-eye display system comprises a stack of waveguides having integral spacers separating the waveguides. The waveguides may each include diffractive optical elements that are formed simultaneously with the spacers by imprinting or casting. The spacers are disposed on one or more major surfaces of the waveguides and define a distance between immediately adjacent waveguides. Adjacent waveguides may be bonded using adhesives on the spacers. The spacers may fit within indentations of overlying waveguides. In some cases, the spacers may form one or more walls of material substantially around a perimeter of an associated waveguide. Vent holes may be provided in the walls to allow gas flow into and out from an interior volume defined by the spacers. Debris trapping structures may be provided between two walls of spacers to trap and prevent debris from entering into the interior volume.

Nanostructured thin film inorganic solar cells

Inorganic solar cells having a nano-patterned p-n or p-i-n junction to reduce electron and hole travel distance to the separation interface to be less than the magnitude of the drift length or diffusion length, and meanwhile to maintain adequate active material to absorb photons. Formation of the inorganic solar cells may include one or more nano-lithography steps.

Display device having diffraction gratings with reduced polarization sensitivity

Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Method and system for tunable gradient patterning using a shadow mask

A method of depositing a variable thickness material includes providing a substrate and providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent the substrate and performing a plasma deposition process on the substrate to deposit the variable thickness material. A layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.

Large Area Patterning of Nano-Sized Shapes

Methods for creating nano-shaped patterns are described. This approach may be used to directly pattern substrates and/or create imprint lithography molds that may be subsequently used to directly replicate nano-shaped patterns into other substrates in a high throughput process.

Method and system for tunable gradient patterning using a shadow mask

A method of fabricating a diffractive structure with varying diffractive element depth includes providing a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio. The method also includes positioning the shadow mask adjacent a substrate. The substrate comprises an etch mask corresponding to the diffractive structure. The method further includes exposing the substrate to an etchant, etching the substrate to form diffractive elements adjacent the first region having a first depth, and etching the substrate to form diffractive elements adjacent the second region having a second depth less than the first depth.

Display device with diffraction grating having reduced polarization sensitivity

Input/output coupling grating and display including the same

A head-mounted display system includes a waveguide configured to guide light from a light projection system coupled into the waveguide; a grating structure optically coupled to the waveguide, the grating structure being configured to couple light from the light projection system into the waveguide. The grating structure includes a grating layer having a grating with multiple ridges having a blaze profile in at least one cross-section, the blaze profile having an anti-blaze angle of 85° or less; and one or more additional layers on the grating layer, the additional layers including a first layer of a material having a refractive index of 1.5 or less at an operative wavelength of the head-mounted display, the first layer being an outermost layer of the grating structure.

Diffractive structures for asymmetric light extraction and augmented reality devices including the same

A head-mounted display system includes a head-mountable frame; a light projection system configured to output light to provide image content; a waveguide supported by the frame, the waveguide configured to guide at least a portion of the light from the light projection system coupled into the waveguide; a diffractive structure optically coupled to the waveguide, the diffractive structure being configured to couple light guided by the waveguide out of the waveguide towards a user side of the head-mounted display, the diffractive structure having a grating layer with multiple ridges each having a side face that is slanted or stepped with respect to a plane of the waveguide. The diffractive structure directs at least 25% more light guided by the waveguide towards the user side than the world side.

Display device having diffraction gratings with reduced polarization sensitivity

Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Method and system for integration of refractive optics with a diffractive eyepiece waveguide display

Augmented reality display having liquid crystal variable focus element and roll-to-roll method and apparatus for forming the same

A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

Method and system for variable optical thickness waveguides for augmented reality devices

An augmented reality device includes a projector, projector optics optically coupled to the projector, and an eyepiece optically coupled to the projector optics. The eyepiece includes an eyepiece waveguide characterized by lateral dimensions and an optical path length difference as a function of one or more of the lateral dimensions.

Method of fabricating diffraction gratings

A method of fabricating a blazed diffraction grating comprises providing a master template substrate and imprinting periodically repeating lines on the master template substrate in a plurality of master template regions. The periodically repeating lines in different ones of the master template regions extend in different directions. The method additionally comprises using at least one of the master template regions as a master template to imprint at least one blazed diffraction grating pattern on a grating substrate.

Method and system for variable optical thickness waveguides for augmented reality devices

An augmented reality device includes a projector, projector optics optically coupled to the projector, and an eyepiece optically coupled to the projector optics. The eyepiece includes an eyepiece waveguide characterized by lateral dimensions and an optical path length difference as a function of one or more of the lateral dimensions.

Imprinting techniques in nanolithography for optical devices

This disclosure generally describes methods and systems for fabrication of high-quality surface relief waveguides for eyepieces. In particular, this disclosure describes techniques for manufacturing waveguides having surface relief features, such as diffractive gratings to achieve various optical effects, using nanolithographic imprinting techniques that reduce or eliminate the presence of gaps in the imprinted features through use of optimized drop patterns for dispensing photoresist. Moreover, the disclosure also describes techniques for manufacturing surface relief waveguides having a gradation, e.g., a substantially continuous grade or slope, between zones that have different residual layer thicknesses of the dispensed photoresist, and/or between zones having surface features of different height (or depth). Such gradation can reduce or eliminate adverse optical effects that may be caused by a more abrupt transition between zones, and increase the optical efficiency of the completed waveguide.

Configuring optical layers in imprint lithography processes

An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Configuring optical layers in imprint lithography processes

Described herein is an optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on and abutting at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a relative amount of light transmittable through the substrate, wherein the one or more anti-reflective nanolayers comprises a first anti reflective nanolayer disposed on and abutting the first side of the substrate, wherein the first anti-reflective nanolayer at least partially surrounds at least some of the one or more functional patterns along the first side of the substrate without overlapping the one or more functional layers. Figure 1 1/14 ooo N~N cco ThC CD _____c6

Configuring optical layers in imprint lithography processes

An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Augmented reality display having liquid crystal variable focus element and roll-to-roll method and apparatus for forming the same

A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

シャドウマスクを使用した調整可能勾配パターン化のための方法およびシステム

【課題】シャドウマスクを使用した調整可能勾配パターン化のための方法およびシステムの提供。 【解決手段】可変回折要素深度を伴う回折構造を製作する方法は、第１の開口周期性に対する開口寸法の比率を伴う第１の領域と、第１の開口周期性に対する開口寸法の比率より小さい第２の開口周期性に対する開口寸法の比率を伴う第２の領域とを有するシャドウマスクを提供することを含む。方法は、シャドウマスクを基板に隣接して位置付けることも含む。基板は、回折構造に対応しているエッチングマスクを備えている。方法は、基板をエッチング液にさらすことと、基板をエッチングし、第１の深度を有する回折要素を第１の領域に隣接して形成することと、基板をエッチングし、第１の深度より小さい第２の深度を有する回折要素を第２の領域に隣接して形成することとをさらに含む。 【選択図】図２

Method and system for tunable gradient patterning using a shadow mask

A method of depositing a variable thickness material, the method comprising providing (1205) a substrate comprising a uniform diffractive structure including a plurality of diffractive elements; providing (1210) a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio; positioning (1215) the shadow mask adjacent the substrate; and performing (1220) a deposition process on the substrate to deposit the variable thickness material, wherein a layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.

Waveguides having integral spacers and related systems and methods

Diffractive optical elements with mitigation of rebounce-induced light loss and related systems and methods

Display devices include waveguides with in-coupling optical elements that mitigate re-bounce of in-coupled light to improve overall in-coupling efficiency and/or uniformity. A waveguide receives light from a light source and/or projection optics and includes an in-coupling optical element that in-couples the received light to propagate by total internal reflection in a propagation direction within the waveguide. Once in-coupled into the waveguide the light may undergo re-bounce, in which the light reflects off a waveguide surface and, after the reflection, strikes the in-coupling optical element. Upon striking the in-coupling optical element, the light may be partially absorbed and/or out-coupled by the optical element, thereby effectively reducing the amount of in-coupled light propagating through the waveguide. The in-coupling optical element can be truncated or have reduced diffraction efficiency along the propagation direction to reduce the occurrence of light loss due to re-bounce of in-coupled light, resulting in less in-coupled light being prematurely out-coupled and/or absorbed during subsequent interactions with the in-coupling optical element.

Diffractive optical elements with mitigation of rebounce-induced light loss and related systems and methods

Display devices include waveguides with in-coupling optical elements that mitigate re-bounce of in-coupled light to improve overall in-coupling efficiency and/or uniformity. A waveguide receives light from a light source and/or projection optics and includes an in-coupling optical element that in-couples the received light to propagate by total internal reflection in a propagation direction within the waveguide. Once in-coupled into the waveguide the light may undergo re-bounce, in which the light reflects off a waveguide surface and, after the reflection, strikes the in-coupling optical element. Upon striking the in-coupling optical element, the light may be partially absorbed and/or out-coupled by the optical element, thereby effectively reducing the amount of in-coupled light propagating through the waveguide. The in-coupling optical element can be truncated or have reduced diffraction efficiency along the propagation direction to reduce the occurrence of light loss due to re-bounce of in-coupled light, resulting in less in-coupled light being prematurely out-coupled and/or absorbed during subsequent interactions with the in-coupling optical element.

再バウンス誘発光損失の軽減を伴う回折光学要素および関連システムおよび方法

【課題】再バウンス誘発光損失の軽減を伴う回折光学要素および関連システムおよび方法の提供。【解決手段】ディスプレイデバイスは、内部結合された光の再バウンスを軽減させ、全体的内部結合効率および／または均一性を改良する、内部結合光学要素を伴う導波管を含む。導波管は、光源および／または投影光学系からの光を受光し、受光された光を内部結合し、全内部反射によって、導波管内を伝搬方向に伝搬する、内部結合光学要素を含む。いったん導波管の中に内部結合されると、光は、光が導波管表面から反射する、再バウンスを受け、反射後、内部結合光学要素に衝打し得る。内部結合光学要素に衝打することに応じて、光は、部分的に、光学要素によって、吸収および／または外部結合され、それによって、導波管を通して伝搬する、内部結合された光の量を事実上低減させ得る。【選択図】図１５

Diffractive optical elements with mitigation of rebounce-induced light loss and related systems and methods

Display devices include waveguides with in-coupling optical elements that mitigate re-bounce of in-coupled light to improve overall in-coupling efficiency and/or uniformity. A waveguide receives light from a light source and/or projection optics and includes an in-coupling optical element that in-couples the received light to propagate by total internal reflection in a propagation direction within the waveguide. Once in-coupled into the waveguide the light may undergo re-bounce, in which the light reflects off a waveguide surface and, after the reflection, strikes the in-coupling optical element. Upon striking the in-coupling optical element, the light may be partially absorbed and/or out-coupled by the optical element, thereby effectively reducing the amount of in-coupled light propagating through the waveguide. The in-coupling optical element can be truncated or have reduced diffraction efficiency along the propagation direction to reduce the occurrence of light loss due to re-bounce of in-coupled light, resulting in less in-coupled light being prematurely out-coupled and/or absorbed during subsequent interactions with the in-coupling optical element.

Optical eyepiece using single-sided patterning of grating couplers

Augmented reality display having liquid crystal variable focus element and roll-to-roll method and apparatus for forming the same

A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly has a major surface facing the output surface and a waveplate lens and a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

Method and system for tunable gradient patterning using a shadow mask

Very high index eyepiece substrate-based viewing optics assembly architectures

Very high refractive index (n>2.2) lightguide substrates enable the production of 70° field of view eyepieces with all three color primaries in a single eyepiece layer. Disclosed herein are viewing optics assembly architectures that make use of such eyepieces to reduce size and cost, simplifying manufacturing and assembly, and better-accommodating novel microdisplay designs.

Method of fabricating diffraction gratings

A method of fabricating a blazed diffraction grating comprises providing a master template substrate and imprinting periodically repeating lines on the master template substrate in a plurality of master template regions. In some embodiments, the periodically repeating lines in different ones of the master template regions extend in different directions. The method additionally comprises using at least one of the master template regions as a master template to imprint at least one blazed diffraction grating pattern on a grating substrate. In some embodiments, the method further comprises coating the periodically repeating lines with a material having a greater hardness than the material that forms the lines.

Slanted grating fabrication

A method includes patterning a plurality of first trenches in a surface of a substrate; and etching the plurality of first trenches with an etchant having an etch rate for a first crystalline plane of the substrate that is greater than for a second crystalline plane of the substrate. The etching forms a slanted grating in the substrate.

Method and system for integration of refractive optics with a diffractive eyepiece waveguide display

A method of fabricating an optical element includes providing a substrate, forming a castable material coupled to the substrate, and casting the castable material using a mold. The method also includes curing the castable material and removing the mold. The optical element comprises a planar region and a clear aperture adjacent the planar region and characterized by an optical power.

Battery pack and thermal runaway protection method

A battery pack and a thermal runaway protection method for a battery pack are provided. The battery pack includes: a housing (1) defining a chamber (141); a cell group (2) located in the chamber (14) and having a pressure relief side (21); and a cooling component (10) integrated into the housing (1) and configured to cool the cell group (2) in case of a temperature of at least part of the cell group (2) higher than a preset temperature. The pressure relief side (21) is spaced apart from an inner wall of the chamber (14) to define an exhaust passage (3) therebetween, and the exhaust passage (3) is adapted to discharge gas generated by the cell group (2) in case of thermal runaway of the cell group (2).

Battery pack and thermal runaway protection method

A thermal runaway protection method reduces thermal runaway for a battery pack. The battery pack includes: a housing defining a chamber; a cell group located in the chamber and having a pressure relief side; and a cooling component integrated into the housing and configured to cool the cell group in case of a temperature of at least part of the cell group higher than a preset temperature. The pressure relief side is spaced apart from an inner wall of the chamber to define an exhaust passage therebetween, and the exhaust passage is adapted to discharge gas generated by the cell group in case of thermal runaway of the cell group.

低減された偏光感度を有する回折格子を伴うディスプレイデバイス

【課題】低減された偏光感度を有する回折格子を伴うディスプレイデバイスの提供。【解決手段】回折格子は、例えば、光を導波管の中に内部結合する、または光をそこから外に外部結合するための光学要素を頭部搭載型ディスプレイシステム内に提供する。これらの回折格子は、低減された偏光感度を有するように構成されてもよい。そのような格子は、例えば、類似レベルの効率性を伴って、異なる偏光の光を内部結合または外部結合し得る。回折格子および導波管は、透過性層と、金属層とを含んでもよい。回折格子は、ブレーズド格子を備えてもよい。【選択図】なし

Display device with diffraction grating having reduced polarization sensitivity

Diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The diffraction gratings and waveguides may include a transmissive layer and a metal layer. The diffraction grating may comprises a blazed grating.

Waveguides having integral spacers and related systems and methods

A head-mounted, near-eye display system comprises a stack of waveguides having integral spacers separating the waveguides. The waveguides may each include diffractive optical elements that are formed simultaneously with the spacers by imprinting or casting. The spacers are disposed on one or more major surfaces of the waveguides and define a distance between immediately adjacent waveguides. Adjacent waveguides may be bonded using adhesives on the spacers. The spacers may fit within indentations of overlying waveguides. In some cases, the spacers may form one or more walls of material substantially around a perimeter of an associated waveguide. Vent holes may be provided in the walls to allow gas flow into and out from an interior volume defined by the spacers. Debris trapping structures may be provided between two walls of spacers to trap and prevent debris from entering into the interior volume.

Method and system for integration of refractive optics with a diffractive eyepiece waveguide display

An eyepiece waveguide includes a set of waveguide layers having a world side and a user side. The eyepiece waveguide also includes a first cover plate having a first optical power and disposed adjacent the world side of the set of waveguide layers and a second cover plate having a second optical power and disposed adjacent the user side of the set of waveguide layers.

Augmented reality display having liquid crystal variable focus element and roll-to-roll method and apparatus for forming the same

A display device includes a waveguide assembly comprising a waveguide configured to outcouple light out of a major surface of the waveguide to form an image in the eyes of a user. An adaptive lens assembly comprises a switchable waveplate assembly. The switchable waveplate assembly includes quarter-wave plates on opposing sides of a switchable liquid crystal layer, and electrodes on the quarter-wave plates in the volume between the quarter-wave plates. The electrodes can selectively establish an electric field and may serve as an alignment structure for molecules of the liquid crystal layer. Portions of the adaptive lens assembly may be manufactured by roll-to-roll processing in which a substrate roll is unwound, and alignment layers and liquid crystal layers are formed on the substrate as it moves towards a second roller, to be wound on that second roller.

一体型スペーサを有する導波管および関連システムおよび方法

【課題】頭部搭載型接眼ディスプレイシステムの提供。【解決手段】頭部搭載型接眼ディスプレイシステムは、導波管を分離する一体型スペーサを有する、導波管のスタックを備える。導波管はそれぞれ、インプリントまたは鋳造によってスペーサと同時に形成される、回折光学要素を含んでもよい。スペーサは、導波管の１つ以上の主要表面上に配置され、直接隣接する導波管間の距離を画定する。隣接する導波管は、スペーサ上の接着剤を使用して接合されてもよい。スペーサは、上層導波管のくぼみ内に嵌合してもよい。ある場合には、スペーサは、材料の１つ以上の壁を関連付けられる導波管の周の実質的にまわりに形成してもよい。通気穴が、壁内に提供され、ガスがスペーサによって画定された内部体積の内外に流動することを可能にしてもよい。残骸捕獲構造が、スペーサの２つの壁間に提供され、残骸を捕獲し、内部体積の中に進入することを防止してもよい。【選択図】なし

Waveguides with high index materials and methods of fabrication thereof

Waveguides comprising materials with refractive index greater than or equal to 1.8 and methods of patterning waveguides are disclosed. Patterned waveguides comprising materials with refractive index greater than or equal to 1.8 can be incorporated in display devices, such as, for example wearable display devices to project virtual images to a viewer.

Method and system for tunable gradient patterning using a shadow mask

A method of depositing a variable thickness material, the method comprising providing (1205) a substrate comprising a uniform diffractive structure including a plurality of diffractive elements; providing (1210) a shadow mask having a first region with a first aperture dimension to aperture periodicity ratio and a second region with a second aperture dimension to aperture periodicity ratio less than the first aperture dimension to aperture periodicity ratio; positioning (1215) the shadow mask adjacent the substrate; and performing (1220) a deposition process on the substrate to deposit the variable thickness material, wherein a layer thickness adjacent the first region is greater than a layer thickness adjacent the second region.

Very high index eyepiece substrate-based viewing optics assembly architectures

Very high refractive index (n>2.2) lightguide substrates enable the production of 70° field of view eyepieces with all three color primaries in a single eyepiece layer. Disclosed herein are viewing optics assembly architectures that make use of such eyepieces to reduce size and cost, simplifying manufacturing and assembly, and better-accommodating novel microdisplay designs.

Waveguides with high index materials and methods of fabrication thereof

Waveguides comprising materials with refractive index greater than or equal to 1.8 and methods of patterning waveguides are disclosed. Patterned waveguides comprising materials with refractive index greater than or equal to 1.8 can be incorporated in display devices, such as, for example wearable display devices to project virtual images to a viewer.

Method and system for improving phase continuity in eyepiece waveguide displays

An eyepiece for an augmented reality headset includes an eyepiece waveguide and an incoupling diffractive optical element coupled to the eyepiece waveguide. The incoupling diffractive optical element is disposed at a first lateral location. The eyepiece also includes an outcoupling diffractive optical element coupled to the eyepiece waveguide. The outcoupling diffractive optical element is disposed at a second lateral location different than the first lateral location. The eyepiece further includes an optical structure coupled to the eyepiece waveguide. The optical structure is disposed at a third lateral location between the first lateral location and the second lateral location.

Method of fabricating molds for forming waveguides and related systems and methods using the waveguides

Methods are disclosed for fabricating molds for forming waveguides with integrated spacers for forming eyepieces. The molds are formed by etching features (e.g., 1µm to 1000µm deep) into a substrate comprising single crystalline material using an anisotropic wet etch. The etch masks for defining the large features may comprise a plurality of holes, wherein the size and shape of each hole at least partially determine the depth of the corresponding large feature. The holes may be aligned along a crystal axis of the substrate and the etching may automatically stop due to the crystal structure of the substrate. The patterned substrate may be utilized as a mold onto which a flowable polymer may be introduced and allowed to harden. Hardened polymer in the holes may form a waveguide with integrated spacers. The mold may be also used to fabricate a platform comprising a plurality of vertically extending microstructures of precise heights, to test the curvature or flatness of a sample, e.g., based on the amount of contact between the microstructures and the sample.

Air pocket structures for promoting total internal reflection in a waveguide

Recesses are formed on a front side and a rear side of a waveguide. A solid porogen material is spun onto the front side and the rear side and fills the recesses. First front and rear cap layers are then formed on raised formations of the waveguide and on the solid porogen material. The entire structure is then heated and the solid porogen material decomposes to a porogen gas. The first front and rear cap layers are porous to allow the porogen gas to escape and air to enter into the recesses. The air maximizes a difference in refractive indices between the high-index transparent material of the waveguide and the air to promote reflection in the waveguide from interfaces between the waveguide and the air.

Waveguides with high index materials and methods of fabrication thereof

Waveguides comprising materials with refractive index greater than or equal to 1.8 and methods of patterning waveguides are disclosed. Patterned waveguides comprising materials with refractive index greater than or equal to 1.8 can be incorporated in display devices, such as, for example wearable display devices to project virtual images to a viewer. A waveguide may be transparent and may comprise a substrate comprising a first material having a first refractive index greater than about 2.0. Diffractive features may be formed, on the substrate, of a second material having a second refractive index that is lower than the first refractive index. A third material may be disposed over the diffractive features and may have a third refractive index that is higher than the second refractive index.

Augmented reality display having liquid crystal variable focus element and roll-to-roll method and apparatus for forming the same

Display device having diffraction gratings with reduced polarization sensitivity

Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Configuring optical layers in imprint lithography processes

Described herein is an optical layer comprising: a substrate having a first side and a second side opposite the first side; one or more functional patterns disposed on the first side of the substrate; one or more anti-reflective nanolayers disposed on and abutting at least one of the first side of the substrate or the second side of the substrate, wherein the one or more nanolayers determine an effective refractive index of the substrate such that the one or more nanolayers effect a relative amount of light transmittable through the substrate, wherein the one or more anti-reflective nanolayers comprises a first anti reflective nanolayer disposed on and abutting the first side of the substrate, wherein the first anti-reflective nanolayer at least partially surrounds at least some of the one or more functional patterns along the first side of the substrate without overlapping the one or more functional layers. Figure 1 1/14 ooo N~N cco ThC CD _____c6

Air pocket structures for promoting total internal reflection in a waveguide

Recesses are formed on a front side and a rear side of a waveguide. A solid porogen material is spun onto the front side and the rear side and fills the recesses. First front and rear cap layers are then formed on raised formations of the waveguide and on the solid porogen material. The entire structure is then heated and the solid porogen material decomposes to a porogen gas. The first front and rear cap layers are porous to allow the porogen gas to escape and air to enter into the recesses. The air maximizes a difference in refractive indices between the high-index transparent material of the waveguide and the air to promote reflection in the waveguide from interfaces between the waveguide and the air.

Method of fabricating molds for forming waveguides and related systems and methods using the waveguides

Methods are disclosed for fabricating molds for forming waveguides with integrated spacers for forming eyepieces. The molds are formed by etching features (e.g., 1 μm to 1000 μm deep) into a substrate comprising single crystalline material using an anisotropic wet etch. The etch masks for defining the large features may comprise a plurality of holes, wherein the size and shape of each hole at least partially determine the depth of the corresponding large feature. The holes may be aligned along a crystal axis of the substrate and the etching may automatically stop due to the crystal structure of the substrate. The patterned substrate may be utilized as a mold onto which a flowable polymer may be introduced and allowed to harden. Hardened polymer in the holes may form a waveguide with integrated spacers. The mold may be also used to fabricate a platform comprising a plurality of vertically extending microstructures of precise heights, to test the curvature or flatness of a sample, e.g., based on the amount of contact between the microstructures and the sample.

Configuring optical layers in imprint lithography processes

An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Display device having diffraction gratings with reduced polarization sensitivity

Blazed diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or out-couple light out of a waveguide. These blazed diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations with similar level of efficiency. The blazed diffraction gratings and waveguides may be formed in a high refractive index substrate such as lithium niobate. In some implementations, the blazed diffraction gratings may include diffractive features having a feature height of 40 nm to 120 nm, for example, 80 nm. The diffractive features may be etched into the high index substrate, e.g., lithium niobate.

Configuring optical layers in imprint lithography processes

An imprint lithography method of configuring an optical layer includes selecting one or more parameters of a nanolayer to be applied to a substrate for changing an effective refractive index of the substrate and imprinting the nanolayer on the substrate to change the effective refractive index of the substrate such that a relative amount of light transmittable through the substrate is changed by a selected amount.

Display device with diffraction grating having reduced polarization sensitivity

Diffraction gratings provide optical elements in head-mounted display systems to, e.g., incouple light into or outcouple light out of a waveguide. These diffraction gratings may be configured to have reduced polarization sensitivity. Such gratings may, for example, incouple or outcouple light of different polarizations, or polarized and unpolarized light, with a similar level of efficiency. The diffraction gratings and waveguides may include a transmissive layer and a metal layer. The diffraction grating may comprise a blazed grating.