Semiconductor integrated circuit device, method of estimating failure ratio of such devices on the market, and method of manufacturing the devices

In a method for setting appropriate initial-failure screening conditions when mass-producing semiconductor devices of multiple types, devices of each type being manufactured in a small number, the step of subjecting products of every type to an acceleration test is excluded, and instead, the failure ratio on the market of semiconductor devices of each type is estimated using a testing semiconductor device. Specifically, {circle around (1)} first, all types of semiconductor devices to be developed and mass-produced are classified into several groups. {circle around (2)} A test semiconductor device is developed which has the same number of elements, the same gate area, the same multi-layer wiring length and the same number of contact holes as the average number of elements, the average gate area, the average wiring length and the average number of contact holes of the semiconductor devices included in one of the type groups, respectively. The testing semiconductor device has main features ...

EXHAUST GAS PURIFICATION SYSTEM IN UPLAND AREA

When a diesel particulate diffuser (“DPD”) of a vehicle traveling in a normal drive mode in the upland area is to be automatically regenerated by raising a temperature of exhaust gas from an engine, an exhaust gas purification system determines an upland full-load injection quantity from the atmospheric pressure in the upland area and an engine speed while the vehicle is in motion and drives the vehicle with the injection quantity determined. The system determines, during the regeneration mode, an upland drive regeneration injection quantity obtained by decreasing the upland full-load injection quantity on the basis of a quantity required for the post-injection. The injection quantity is gradually decreased from the upland full-load injection quantity to the upland regeneration drive injection quantity when the vehicle shifts from the normal drive mode in the upland area to the upland regeneration mode, so that the decreased quantity is used for the post-injection.

EXHAUST GAS PURIFICATION SYSTEM

A diesel particulate defuser (DPD) for collecting particulate matter (PM) in exhaust gas is connected to an exhaust pipe of a diesel engine, and when the amount of PM in the DPD becomes equal to or greater than a predetermined amount, the exhaust gas temperature of the diesel engine is increased by performing exhaust pipe injection and DPD is automatically regenerated. In such an exhaust gas purification system, an exhaust gas temperature during DPD regeneration in automatic regeneration is detected, a difference between the detected exhaust gas temperature and a target regeneration temperature is determined, and in a case where an exhaust pipe injection amount is PID controlled based on the difference, when a transition is made from the traveling automatic regeneration to the idle automatic regeneration conducted during a stop, an integral control term in the PID control is reset to zero to control the exhaust pipe injection amount.

Exhaust gas purification system

A diesel particulate defuser (DPD) for collecting particulate matter (PM) in exhaust gas is connected to an exhaust pipe of a diesel engine, and when the amount of PM in the DPD becomes equal to or greater than a predetermined amount, the exhaust gas temperature of the diesel engine is increased by performing exhaust pipe injection and DPD is automatically regenerated. In such an exhaust gas purification system, an exhaust gas temperature during DPD regeneration in automatic regeneration is detected, a difference between the detected exhaust gas temperature and a target regeneration temperature is determined, and in a case where an exhaust pipe injection amount is PID controlled based on the difference, when a transition is made from the traveling automatic regeneration to the idle automatic regeneration conducted during a stop, an integral control term in the PID control is reset to zero to control the exhaust pipe injection amount.

Exhaust gas purification system for high altitude use

When a diesel particulate diffuser (DPD) of a vehicle traveling in a normal drive mode in the upland area is to be automatically regenerated by raising a temperature of exhaust gas from an engine, an exhaust gas purification system determines an upland full-load injection quantity from the atmospheric pressure in the upland area and an engine speed while the vehicle is in motion and drives the vehicle with the injection quantity determined. The system determines, during the regeneration mode, an upland drive regeneration injection quantity obtained by decreasing the upland full-load injection quantity on the basis of a quantity required for the post-injection. The injection quantity is gradually decreased from the upland full-load injection quantity to the upland regeneration drive injection quantity when the vehicle shifts from the normal drive mode in the upland area to the upland regeneration mode, so that the decreased quantity is used for the post-injection.

SRAM-based semiconductor integrated circuit testing element

In a method for setting appropriate initial-failure screening conditions when mass-producing semiconductor devices of multiple types, devices of each type being manufactured in a small number, the step of subjecting products of every type to an acceleration test is excluded, and instead, the failure ratio on the market of semiconductor devices of each type is estimated using a testing semiconductor device. Specifically, {circle around (1)} first, all types of semiconductor devices to be developed and mass-produced are classified into several groups. {circle around (2)} A test semiconductor device is developed which has the same number of elements, the same gate area, the same multi-layer wiring length and the same number of contact holes as the average number of elements, the average gate area, the average wiring length and the average number of contact holes of the semiconductor devices included in one of the type groups, respectively. The testing semiconductor device has main features ...

CYLINDRICAL ROLLER BEARING AND TRANSMISSION BEARING DEVICE

A cylindrical roller bearing includes an outer ring having, on an inner circumferential surface, an outer ring raceway and a pair of outer ring ribs which are provided on both sides of the outer ring raceway in an axial direction, an inner ring having, on an outer circumferential surface, an inner ring raceway and an inner ring rib which is provided on one side of the inner ring raceway in the axial direction, and a plurality of cylindrical rollers disposed between the outer ring raceway and the inner ring raceway. A radial height of the outer ring rib is greater than a radial height of the inner ring rib, and a radial clearance between the outer ring rib and the inner ring rib is set to be equal to or less than 2 mm. 1. A cylindrical roller bearing comprising:an outer ring having, on an inner circumferential surface, an outer ring raceway and a pair of outer ring ribs which are provided on both sides of the outer ring raceway in an axial direction;an inner ring having, on an outer circumferential surface, an inner ring raceway and an inner ring rib which is provided on one side of the inner ring raceway in the axial direction; anda plurality of cylindrical rollers disposed between the outer ring raceway and the inner ring raceway,wherein a radial clearance between the outer ring rib and the inner ring rib is set to be equal to or less than 2 mm, anda radial height of the outer ring rib is greater than a radial height of the inner ring rib.2. The cylindrical roller bearing according to claim 1 ,wherein when W represents a bearing width and D represents a bearing outside diameter, D/W is equal to or greater than 3.0, andwhen Da represents a roller diameter of the cylindrical roller and L represents a roller length of the cylindrical roller, L/Da ranges from 1.2 to 1.8.3. The cylindrical roller bearing according to claim 1 ,wherein a rolling contact surface of the cylindrical roller is subjected to crowning to be formed in a single circular arc having a curvature ...

Semiconductor device

(57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。

Mos type semiconductor device

(57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。

Exhaust gas purification system

System for purifying exhaust gas in upland area

Side effect reliever of anticancer medicine of radiotherapy

(57)【要約】 【課題】新規な抗癌剤または放射線療法の副作用軽減剤 の提供。 【解決手段】Ｆａｓアンタゴニストを有効成分とする抗 癌剤または放射線療法の副作用予防・軽減剤。

Semiconductor memory

(57)【要約】本公報は電子出願前の出願データであるた め要約のデータは記録されません。

半導体装置の製造方法

【課題】従来技術は、Ｃｕ配線及びＣｕコンタクトホールのパターニング毎に、それぞれレジスト膜を形成、露光して、パターニングの工程を２回に分けて行っているたが、多層配線化が進んでいくと配線が増えるたびに、工程数が増えるという問題があった。また、パターニングの工程を２回に分けて行っているので配線及びコンタクトホールの位置を合わせこむためのアライメントエラーが発生しやすくなりプロセス精度が低下していた。 【解決手段】本発明は、Ｃｕ配線及びＣｕコンタクトホールのパターニングを１回のレジスト膜の形成、露光で行うため、多層配線化が進む場合でも、増加するパターニング工程数を半分に減らすことができる。また、連続的に配線及びコンタクトホールのレジストパターンを形成できるため、位置を合わせこむためのアライメントエラーも削減でき、プロセス精度の低下を抑えることができる。 【選択図】　図２

排気ガス浄化システム

【課題】ＤＰＦ再生時の排気ガスの悪化を抑制し、かつ、ＤＰＦ再生時に車両を加速させた場合でも、白煙及び黒煙が発生せず、十分な加速性能が得られる排気ガス浄化システムを提供する。 【解決手段】排気ガス中の粒子状物質を捕集するディーゼルパティキュレートフィルタ１１５と、排気マニホールド１０２から吸気マニホールド１０４に還流させる排気ガスの量を調整するＥＧＲバルブ１０７と、エンジン回転数と燃料噴射量とに基づき、ＥＧＲバルブ１０７の開度を制御するＥＧＲ制御部１７３と、ＤＰＦ再生中に車両を急加速させたときに、ＥＧＲバルブ１０７を所定時間全閉に制御する加速時ＥＧＲバルブ制御部１７６とを備えた。 【選択図】図１

軸受装置

【課題】軸受内部へのグリースの浸入を防止可能な軸受装置を提供する。 【解決手段】外周面に内輪軌道面３１ａが形成された内輪３１と、内周面に外輪軌道面３２ａが形成された外輪３２と、内輪軌道面３１ａと外輪軌道面３２ａの間を周方向に転動可能な複数の円錐ころ３３と、円錐ころ３３を所定の間隔で保持する保持器３４と、を備え、ハウジング１に軸体２を回転自在に支持する円錐ころ軸受３と、軸体２と螺合して円錐ころ軸受３に予圧を付与する予圧ナット４と、円錐ころ軸受３の内輪３１と予圧ナット４間に配設されたスペーサ５と、スペーサ５の外径側に設けられ、ハウジング１とスペーサ５との間を封止する封止部材６と、を備えた軸受装置において、内輪３１とスペーサ５との接触部には、円錐ころ軸受３に予圧を付与する作業中、あるいは作業前に円錐ころ軸受３内部へグリースが浸入することを防止するためのグリース浸入防止部７１が設けられている。 【選択図】図１

ディファレンシャルユニット

【課題】所謂低トルク仕様を採用した場合であっても、フレッチング等の問題の発生を効果的に抑制することのできるディファレンシャルユニットを提供することを課題とする。 【解決手段】前端部をプロペラシャフトの後端部に連結自在とし、後端部に減速大歯車と噛合う減速小歯車を固定したピニオン軸の中間部前後２箇所位置をケーシングに対して回転自在に支持する円錐ころ軸受を有するディファレンシャルユニットにおいて、前記円錐ころ軸受は、少なくとも内輪、外輪、転動体である円錐ころを備えており、前記内輪は大つば側端面と小つば側端面を有するものであり、２個の円錐ころ軸受の前記小つば側端面同士はスペーサにより押圧されているものであって、前記スペーサは、少なくとも３箇所の円筒状部分を備えるコラプシブルスペーサであることを特徴とする。 【選択図】図３

還元剤解凍装置

【課題】アイドリング中に還元剤を解凍又は保温する際にアイドルアップ制御とアイドルダウン制御とが繰り返し実施されない還元剤解凍装置を提供する。【解決手段】選択触媒還元システム１０１の還元剤１０３を解凍する際にエンジン冷却水が利用される還元剤解凍装置１００に於いて、還元剤１０３を解凍している時のエンジン冷却水温が解凍閾温度未満の場合にアイドル回転数を本来のアイドル回転数と比較し高回転数とし、還元剤１０３を解凍している時のエンジン冷却水温が解凍閾温度以上の場合に現在のアイドル回転数を維持するアイドル回転数変更部１１３を備える事によって課題を解決する事が出来る。【選択図】図１