Apparatus and method for electro chemical deposition

A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electrochemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.

Hot edge ring with sloped upper surface

A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.

HOT EDGE RING WITH SLOPED UPPER SURFACE

A hot edge ring with extended lifetime comprises an annular body having a sloped upper surface. The hot edge ring includes a step underlying an outer edge of a semiconductor substrate supported in a plasma processing chamber wherein plasma is used to process the substrate. The step includes a vertical surface which surrounds the outer edge of the substrate and the sloped upper surface extends upwardly and outwardly from the upper periphery of the vertical surface.

Gasket with positioning feature for clamped monolithic showerhead electrode

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.

Methods and apparatus for providing fluid to a semiconductor device processing apparatus

In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.

GASKET WITH POSITIONING FEATURE FOR CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.

Methods and apparatus for providing fluid to a semiconductor device processing apparatus

In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.

GASKET WITH POSITIONING FEATURE FOR CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.

Gasket with positioning feature for clamped monolithic showerhead electrode

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A thermally and electrically conductive gasket with projections thereon is compressed between the showerhead electrode and the backing plate at a location three to four inches from the center of the showerhead electrode. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the electrode.

CLAMPED MONOLITHIC SHOWERHEAD ELECTRODE

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.

Carrier head with a vibration reduction feature for a chemical mechanical polishing system

Embodiments of the present invention are directed to a carrier head for positioning a substrate on a polishing surface. The carrier head includes a housing connectable to a drive shaft to rotate therewith; a base; a detachable plate removably mounted on top of the housing; a gimbal mechanism connecting the housing to the base to permit the base to move with respect to the housing such that the base remains substantially parallel to the polishing surface; and a flexible membrane defining a mounting surface for the substrate.

Clamped monolithic showerhead electrode

An electrode assembly for a plasma reaction chamber used in semiconductor substrate processing. The assembly includes an upper showerhead electrode which is mechanically attached to a backing plate by a series of spaced apart cam locks. A guard ring surrounds the backing plate and is movable to positions at which openings in the guard ring align with openings in the backing plate so that the cam locks can be rotated with a tool to release locking pins extending from the upper face of the showerhead electrode.

Methods and apparatus for providing fluid to a semiconductor device processing apparatus

In a first aspect, a valve assembly is provided that includes a valve assembly output adapted to output at least one of DI water and a chemical. A first valve of the valve assembly includes (1) a first input adapted to receive the chemical; (2) a first output adapted to circulate the chemical to a chemical return; and (3) a second output adapted to output the chemical to the valve assembly output. The valve assembly also includes a second valve positioned downstream from the first valve. The second valve includes (1) an input adapted to receive deionized (DI) water; and (2) an output adapted to output DI water to the valve assembly output. A check valve is coupled between the second output of the first valve and the output of the second valve, and the first valve, second valve and check valve are included in a single manifold.

MONOLITHIC SHOWER APPLE ELECTRODE BLOCKED

Ensemble à électrode (500) pour chambre à plasma servant au traitement de substrats semiconducteurs. L'ensemble (500) comporte une électrode en pomme de douche supérieure (502) qui est mécaniquement fixé à une contre-plaque (506) par des verrous à came 514 mutuellement espacés. Un anneau de garde (508) entoure la contre-plaque (506) et est mobile vers des positions auxquelles des ouvertures de l'anneau de garde (508) s'alignent avec des ouvertures de la contre-plaque (506) pour pouvoir faire tourner les verrous à came (514) au moyen d'un outil et libérer des goupilles de verrouillage (562) partant de la face supérieure de l'électrode (502). An electrode assembly (500) for a plasma chamber for processing semiconductor substrates. The assembly (500) includes an upper showerhead electrode (502) that is mechanically secured to a backplate (506) by cam locks 514 spaced apart. A guard ring (508) surrounds the counterplate (506) and is movable to positions at which openings in the guard ring (508) align with openings in the counterplate (506) to enable turning the cam locks (514) with a tool and releasing locking pins (562) from the top face of the electrode (502).

ELECTRODE IN BLOCKED MONOLITHIC SHOWER APPLE.

顯示螢幕之圖形化使用者介面之部分

【物品用途】;本設計係用以支援半導體工具中之服務維護及追蹤活動的行動裝置圖形化使用者介面。;【設計說明】;圖式中以鏈線揭露之顯示螢幕或顯示裝置，為本案不主張設計之部份。;具有顯現用以支援半導體工具中之服務維護及追蹤活動之圖形化使用者介面之顯示螢幕的行動裝置，例如在圖中所顯現者，可用以支援與改善半導體維護或處理操作。本設計構成在圖式中所顯示的特徵。該圖形化使用者介面可用以將半導體維護或處理操作分成組成步驟、協助該等組成步驟的執行、追蹤在半導體維護或處理操作上所花費的時間、以及促進報表產生。;該圖形化使用者介面可顯示用於半導體維護或處理操作的任何類型資料。因此，雖然所描繪之該圖形化使用者介面的實施例係顯示主要針對半導體維護操作的資料，但吾人應瞭解該圖形化使用者介面可用以顯示針對半導體處理操作的資料。如同顯示與說明，本設計係主張具有顯示螢幕之行動裝置的裝飾性設計，該顯示螢幕顯現用以支援半導體工具中之服務維護及追蹤活動的圖形化使用者介面。

顯示螢幕之圖形化使用者介面之部分

【物品用途】;本設計係用以支援半導體工具中之服務維護及追蹤活動的行動裝置圖形化使用者介面。;【設計說明】;圖式中以鏈線揭露之顯示螢幕或顯示裝置，為本案不主張設計之部份。;具有顯現用以支援半導體工具中之服務維護及追蹤活動之圖形化使用者介面之顯示螢幕的行動裝置，例如在圖中所顯現者，可用以支援與改善半導體維護或處理操作。本設計構成在圖式中所顯示的特徵。該圖形化使用者介面可用以將半導體維護或處理操作分成組成步驟、協助該等組成步驟的執行、追蹤在半導體維護或處理操作上所花費的時間、以及促進報表產生。;該圖形化使用者介面可顯示用於半導體維護或處理操作的任何類型資料。因此，雖然所描繪之該圖形化使用者介面的實施例係顯示主要針對半導體維護操作的資料，但吾人應瞭解該圖形化使用者介面可用以顯示針對半導體處理操作的資料。如同顯示與說明，本設計係主張具有顯示螢幕之行動裝置的裝飾性設計，該顯示螢幕顯現用以支援半導體工具中之服務維護及追蹤活動的圖形化使用者介面。

電気化学堆積の装置および方法

【課題】電気化学堆積ツール用プラットフォーム上を流れる堆積用液のより大きな流れから堆積用液のより小さな流れを迂回させるシステムを提供する。【解決手段】より小さな流れは迂回して別のプラットフォーム上にあってもよい投与装置２６２へ向かう。一実施例において投与装置２６２は加圧されたフローラインを含む。【選択図】図４

Apparatus and method for electro chemical deposition

A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electro-chemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.

顯示螢幕之圖形化使用者介面之部分

【物品用途】;本設計係用以支援半導體工具中之服務維護及追蹤活動的行動裝置圖形化使用者介面。;【設計說明】;圖式中以虛線所揭露之介面中的文字、數字及圖形為本案不主張設計之部分，且圖式中以鏈線揭露之顯示螢幕或顯示裝置，為本案不主張設計之部分。;具有顯現用以支援半導體工具中之服務維護及追蹤活動之圖形化使用者介面之顯示螢幕的行動裝置，例如在圖中所顯現者，可用以支援與改善半導體維護或處理操作。本設計構成在圖式中所顯示的特徵。該圖形化使用者介面可用以將半導體維護或處理操作分成組成步驟、協助該等組成步驟的執行、追蹤在半導體維護或處理操作上所花費的時間、以及促進報表產生。;該圖形化使用者介面可顯示用於半導體維護或處理操作的任何類型資料。因此，雖然所描繪之該圖形化使用者介面的實施例係顯示主要針對半導體維護操作的資料，但吾人應瞭解該圖形化使用者介面可用以顯示針對半導體處理操作的資料。如同顯示與說明，本設計係主張具有顯示螢幕之行動裝置的裝飾性設計，該顯示螢幕顯現用以支援半導體工具中之服務維護及追蹤活動的圖形化使用者介面。

顯示螢幕之圖形化使用者介面之部分

【物品用途】;本設計係用以支援半導體工具中之服務維護及追蹤活動的行動裝置圖形化使用者介面。;【設計說明】;圖式中以虛線所揭露之介面中的文字、數字及圖形為本案不主張設計之部分，且圖式中以鏈線揭露之顯示螢幕或顯示裝置，為本案不主張設計之部分。;具有顯現用以支援半導體工具中之服務維護及追蹤活動之圖形化使用者介面之顯示螢幕的行動裝置，例如在圖中所顯現者，可用以支援與改善半導體維護或處理操作。本設計構成在圖式中所顯示的特徵。該圖形化使用者介面可用以將半導體維護或處理操作分成組成步驟、協助該等組成步驟的執行、追蹤在半導體維護或處理操作上所花費的時間、以及促進報表產生。;該圖形化使用者介面可顯示用於半導體維護或處理操作的任何類型資料。因此，雖然所描繪之該圖形化使用者介面的實施例係顯示主要針對半導體維護操作的資料，但吾人應瞭解該圖形化使用者介面可用以顯示針對半導體處理操作的資料。如同顯示與說明，本設計係主張具有顯示螢幕之行動裝置的裝飾性設計，該顯示螢幕顯現用以支援半導體工具中之服務維護及追蹤活動的圖形化使用者介面。

Apparatus for electro chemical deposition

A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electrochemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.

Carrier head with a vibration reduction feature for a chemical mechanical polishing system

Double pressure vessel chemical dispenser unit