10-03-2022 дата публикации
Номер: US20220076988A1
Автор:
AMOS James M.,
AMOS Philip Michael,
BONHAM Shawn Joseph,
Chen Hui,
CHEN Shaofeng,
CHU Schubert S.,
Cong Zhepeng,
ERHARDT Aimee S.,
FISHER Kirk Allen,
LUAN Xinning,
Newman John
Принадлежит:
A susceptor for use in a processing chamber for supporting a wafer includes a susceptor substrate having a front side and a back side opposite the front side, and a coating layer deposited on the susceptor substrate. The front side has a pocket configured to hold a wafer to be processed in a processing chamber, the pocket being textured with a first pattern. The back side is textured with a second pattern. 1. A susceptor for use in a processing chamber for supporting a wafer , the susceptor comprising:a susceptor substrate having a front side and a back side opposite the front side; anda coating layer deposited on the susceptor substrate, whereinthe front side has a pocket configured to hold a wafer to be processed in a processing chamber, the pocket being textured with a first pattern, andthe back side is textured with a second pattern.2. The susceptor of claim 1 , wherein the first pattern is a grid pattern having a width of between 0.20 mm and 3.00 mm claim 1 , a pitch of between 0.80 mm and 3.00 mm claim 1 , and a depth of between 0.10 mm and 5.00 mm.3. The susceptor of claim 2 , wherein the second pattern is the same as the first pattern.4. The susceptor of claim 2 , wherein the second pattern is a stripe pattern having a width of between 0.50 mm and 30.00 mm claim 2 , a pitch of between 0.50 mm and 3.00 mm claim 2 , and a depth of between 0.10 mm and 5.00 mm.5. The susceptor of claim 2 , wherein the second pattern comprises a ledge formed on an outer edge of a surface of the back side.6. The susceptor of claim 1 , wherein the susceptor substrate comprises graphite.7. The susceptor of claim 1 , wherein the susceptor substrate is a disc-shaped plate having a diameter of between 150 mm and 400 mm and a thickness of between 1 mm and 15 mm.8. The susceptor of claim 1 , wherein the pocket is a cylindrical recess having a diameter of between 150 mm and 300 mm claim 1 , and a depth of between 0.30 mm and 1.00 mm.9. The susceptor of claim 1 , wherein the coating layer ...
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