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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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27-01-2011 дата публикации

MULTI-SELECTIVE POLISHING SLURRY COMPOSITION AND A SEMICONDUCTOR ELEMENT PRODUCTION METHOD USING THE SAME

Номер: KR2011010819A2
Автор: PARK, Jea-Gun, PAIK, Un-Gyu, PARK, Jin-Hyung, CUI, Hao, CHO, Jong-Young, HWANG, Hee-Sub, LIM, Jae-Hyung, KIM, Ye-Hwan
Принадлежит:

Provided are a multi-selective polishing slurry composition and a semiconductor element production method using the same. A silicon film provided with element patterns is formed on the uppermost part of a substrate having a first region and a second region. The element pattern density on the first region is higher than the element pattern density on the second region. Formed in sequence on top of the element patterns are a first silicon oxide film, a silicon nitride film and a second silicon oxide film. The substrate is subjected to chemical-mechanical polishing until the silicon film is exposed, by using a polishing slurry composition containing a polishing agent, a silicon nitride film passivation agent and a silicon film passivation agent. The polishing slurry composition may be a mixture of 100 parts by weight of a polishing agent suspension, containing a polishing agent, and from 40 to 120 parts by weight of an additive solution, and the additive solution can contain 100 parts by weight ...

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Номер записи: 1
07-03-2023 дата публикации

폴리비닐아세탈 브러쉬의 제조방법

Номер: KR102506522B1
Автор: 홍영배, 김덕중, 이창수, 김예환
Принадлежит: 주식회사 브러쉬텍

... 본 발명은 폴리비닐아세탈 브러쉬의 제조방법에 관한 것이다. 본 발명의 실시 예를 따르는 폴리비닐아세탈 브러쉬의 제조방법은, 폴리비닐알코올(PVA) 혼합물에 기공형성제를 첨가하여 혼합물을 생성하는 단계; 상기 혼합물을 몰드에 주입하고 숙성하여 중공이 형성된 성형물을 생성하는 단계; 상기 성형물을 상기 몰드에서 탈형하는 단계; 상기 탈형한 성형물을 제1세정액으로 세척하여 상기 기공형성제를 제거하는 단계; 상기 성형물을 일정한 크기로 절단하는 단계; 상기 절단한 성형물을 제2세정액으로 세척하여 잔류 기공형성제를 제거하는 단계; 상기 절단한 성형물의 중공에 코어(core)를 삽입하는 단계; 상기 코어가 삽입된 성형물을 고속회전 시켜 탈수하여 잔류 기공형성제를 제거하는 단계; 및 상기 코어가 삽입된 성형물을 방부처리하는 단계;를 포함한다.

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Номер записи: 2
04-06-2018 дата публикации

METHOD OF FORMING PATTERN OF SEMICONDUCTOR DEVICE

Номер: KR1020180058993A
Автор: KANG, YOOL, PARK, KYOUNG SIL, CHOI, YUN SEOK, KIM, BOO DEUK, KIM, YE HWAN
Принадлежит:

According to a technical idea of the present invention, a method of forming a pattern of a semiconductor device, capable of forming a micro pattern using a hardmask composition having high etch resistance, comprises the following steps: preparing a hardmask composition including a carbon allotrope, a spin-on hardmask (SOH) material, a polymer containing aromatic ring, and a solvent; applying the hardmask composition on a film to be etched; forming a hardmask by treating the applied hardmask composition by heating; forming a photoresist pattern on the hardmask; etching the hardmask using the photoresist pattern as an etching mask to form a hardmask pattern; and etching the film to be etched using the hardmask pattern as the etching mask to form a pattern to be etched. COPYRIGHT KIPO 2018 (AA) Start (BB) End (S11) Preparing a hardmask composition including a carbon allotrope, a spin-on hardmask (SOH) material, a polymer containing aromatic ring, and a solvent (S21) Applying the hardmask composition ...

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Номер записи: 3
28-02-2023 дата публикации

웨이퍼 베벨 영역 세정용 브러쉬

Номер: KR20230028012A
Автор: 홍영배, 김덕중, 이창수, 김예환
Принадлежит:

... 본 발명은 웨이퍼 베벨 영역 세정용 브러쉬에 관한 것이다. 본 발명의 실시 예를 따르는 웨이퍼 베벨 영역 세정용 브러쉬는, 제1몸체 및 상기 제1몸체 상에 배치된 복수의 제1돌기를 포함하고, 웨이퍼의 패턴 형성 영역을 세정하는 제1부; 및 상기 제1부의 일단 및 타단에 각각 배치되고, 제2몸체 및 상기 제2몸체 상에 배치된 복수의 제2돌기를 포함하고, 상기 웨이퍼의 베벨 영역을 세정하는 제2부;를 포함한다.

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Номер записи: 4
27-01-2011 дата публикации

MULTI-SELECTIVE POLISHING SLURRY COMPOSITION AND A SEMICONDUCTOR ELEMENT PRODUCTION METHOD USING THE SAME

Номер: WO2011010819A3
Автор: PARK, Jea-Gun, PAIK, Un-Gyu, PARK, Jin-Hyung, CUI, Hao, CHO, Jong-Young, HWANG, Hee-Sub, LIM, Jae-Hyung, KIM, Ye-Hwan
Принадлежит:

Provided are a multi-selective polishing slurry composition and a semiconductor element production method using the same. A silicon film provided with element patterns is formed on the uppermost part of a substrate having a first region and a second region. The element pattern density on the first region is higher than the element pattern density on the second region. Formed in sequence on top of the element patterns are a first silicon oxide film, a silicon nitride film and a second silicon oxide film. The substrate is subjected to chemical-mechanical polishing until the silicon film is exposed, by using a polishing slurry composition containing a polishing agent, a silicon nitride film passivation agent and a silicon film passivation agent. The polishing slurry composition may be a mixture of 100 parts by weight of a polishing agent suspension, containing a polishing agent, and from 40 to 120 parts by weight of an additive solution, and the additive solution can contain 100 parts by weight ...

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Номер записи: 5
15-05-2018 дата публикации

METHOD FOR MANUFACTURING SEMICONDUCTOR ELEMENT

Номер: KR1020180050465A
Автор: KIM, HYO JUNG, KIM, YE HWAN, JANG, KI HOON, KWON, BYOUNG HO, YOON, BOO UN
Принадлежит:

The present invention relates to a method for manufacturing a semiconductor element, which reduces defects due to a CMP process. The method for manufacturing a semiconductor element according to an embodiment of the present invention comprises the steps of: providing a film to be polished on a substrate; polishing the film to be polished with a first slurry including a first abrasive having a zeta potential of a first polarity; cleaning the surface of the film to be polished by using a cleaning liquid containing a chemical substance of a second polarity opposite to the first polarity; and polishing the film to be polished with a second slurry including a second abrasive having a zeta potential of the second polarity opposite to the first polarity. COPYRIGHT KIPO 2018 (AA) Start (BB) End (S0) Providing a substrate including a film to be polished (S1) Polishing the film to be polished using first slurry (S2) Chemical cleaning (S3) Polishing the film to be polished using second slurry ...

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Номер записи: 6
28-03-2018 дата публикации

AUTOROTATION MAGAZINE FOR AIR GUN AND AIR GUN INCLUDING SAME

Номер: KR1020180031129A
Автор: KIM, YE HWAN
Принадлежит:

The present invention relates to an autorotation magazine for an air gun, which is inserted into a magazine insertion part (11) of the air gun (1) comprising a magazine insertion part (11) formed on a lower side thereof and a slide groove (12) or a slide protrusion, and an air gun including the autorotation magazine. The autorotation magazine for an air gun comprises a magazine insertion wheel (30), a rotary shaft member (40), a rotary elastic member (50) and a latch (60). The magazine wheel (30) comprises: a rotary shaft hole (31); a plurality of bullet holes (32) formed in a peripheral part of the rotary shaft hole (31); and a plurality of locking grooves (33) formed on a side surface thereof and spaced apart in a circumferential direction. The rotary shaft member (40) allows the magazine insertion wheel (30) to be rotationally inserted into a rotary shaft hole (31) and has a slide protrusion (41) or a slide groove formed on one end thereof to a slide groove (12) or a slide protrusion ...

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Номер записи: 7
11-08-2011 дата публикации

SLURRY FOR POLISHING PHASE-CHANGE MATERIALS AND METHOD FOR PRODUCING A PHASE-CHANGE DEVICE USING SAME

Номер: KR2011096745A2
Автор: PARK, Jea Gun, PAIK, Un Gyu, PARK, Jin Hyung, CUI, Hao, CHO, Jong Young, HWANG, Hee Sub, LIM, Jae Hyung, KIM, Ye Hwan
Принадлежит:

The present invention relates to slurry for polishing crystalline phase-change materials and to a method for producing a phase-change device using the same. The slurry for polishing crystalline phase-change materials according to one embodiment of the present invention comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water. In addition, the method for producing a phase-change device according to one embodiment of the present invention comprises the following steps: preparing a substrate; forming a crystalline phase-change material film on the substrate; and removing the phase-change material film through a chemical-mechanical polishing process using slurry for polishing phase-change materials, which comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water.

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Номер записи: 8
13-05-2015 дата публикации

MAKE-UP COSMETIC COMPOSITION OF LOW VISCOSITY WATER-IN-OIL TYPE HAVING EXCELLENT FORMULATION STABILITY AND DURABILITY

Номер: KR1020150051675A
Автор: SEO, YU MI, KIM, YE HWAN, CHOI, EUN HO, CHO, JIN HUN
Принадлежит:

The present invention relates to a make-up cosmetic composition of low viscosity and water-in-oil type, which has excellent formulation stability and durability. More specifically, according to the present invention, the make-up cosmetic composition of water-in-oil type has excellent formulation stability while maintaining low viscosity due to the use of an emulsifier containing a polyether-modified dimethicone and a polyether-modified dimethicone crosspolymer; and has excellent make-up durability by containing a silicone resin. COPYRIGHT KIPO 2015 ...

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Номер записи: 9
25-04-2017 дата публикации

SLURRY COMPOSITION FOR CHEMICAL MECHANICAL POLISHING, METHOD FOR PREPARING SAME, AND POLISHING METHOD USING SAME

Номер: KR1020170044522A
Автор: KIM, YE HWAN, PAIK, UN GYU, SEO, JI HOON
Принадлежит:

The present invention relates to a slurry composition for chemical mechanical polishing, a method for preparing the same, and a polishing method using the same, and more specifically, to a slurry composition for chemical mechanical polishing containing ceria particles with NO_3 functional groups attached on the surface thereof and a disperse medium. The content of the ceria particles can be 0.1 to 15 parts by weight with respect to 100 parts by weight of the disperse medium. The slurry composition for chemical mechanical polishing of the present invention does not decrease the polishing speed even with a small polishing particle size, thereby allowing rapid manufacture of semiconductor products with a high yield. COPYRIGHT KIPO 2017 (AA) Start (BB) End (S100) Preparing a first mixture where ceramic particles are mixed with a modifying agent (S200) Heating the first mixture to obtain the modified ceramic particles (S300) Separating the ceramic particles, and dispersing the same into a disperse ...

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Номер записи: 10
25-04-2023 дата публикации

반도체 소자의 제조 방법

Номер: KR102524807B1
Автор: 김효정, 김예환, 장기훈, 권병호, 윤보언
Принадлежит: 삼성전자주식회사

... 본 발명의 실시예에 따른 반도체 소자의 제조 방법은, 기판 상에 연마 대상막을 마련하는 단계, 상기 연마 대상막을 제1 극성의 제타 전위를 갖는 제1 연마제를 포함하는 제1 슬러리로 연마하는 단계, 상기 제1 극성과 반대되는 제2 극성의 화학 물질을 포함하는 세정액을 이용하여 상기 연마 대상막의 표면을 세정하는 단계 및 상기 연마 대상막을 상기 제1 극성과 반대되는 제2 극성의 제타 전위를 갖는 제2 연마제를 포함하는 제2 슬러리로 연마하는 단계를 포함할 수 있다.

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Номер записи: 11
11-12-2018 дата публикации

TRANSFER SYSTEM FOR LAVER AND TRANSFER METHOD THEREOF

Номер: KR1020180131883A
Автор: KIM, YE HWAN, LIM, MIN SOO
Принадлежит:

Disclosed are a transfer system for laver and a transfer method thereof to regularly transfer laver in a laver transfer process. The transfer system for laver comprises: a first conveyor continuously transferring first loaded laver; a second conveyor continuously transferring second loaded laver, and receiving the first loaded laver from the first conveyor to be transferred; a pushing module arranged at one side of the first conveyor to transmit the first loaded laver in the first conveyor in a gap of the second loaded laver transferred on the second conveyor; and a first-in first-out module temporarily storing the first laver that is not transmitted to the second conveyor of the first loaded laver transferred on the first conveyor, and selecting the first loaded laver inserted in the stored first loaded laver to be transmitted to the second conveyor. COPYRIGHT KIPO 2019 ...

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Номер записи: 12
18-05-2016 дата публикации

OIL-IN-WATER EMULSIFIED SEMISOLID-TYPE SUN BLOCK COMPOSITION

Номер: KR1020160055411A
Автор: SEO, YU MI, KIM, YE HWAN, HONG, WOO JIN, CHO, JIN HUN
Принадлежит:

The present invention relates to an oil-in-water emulsified semisolid-type sun block composition. More specifically, the present invention relates to an oil-in-water emulsified semisolid-type sun block composition which includes a water phase part and an oil phase part, wherein the water phase part contains agar and a hexamethylene disocyanate polymeric thickener. COPYRIGHT KIPO 2016 ...

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Номер записи: 13
01-06-2016 дата публикации

WATER IN OIL EMULSION TYPE MAKE-UP COSMETIC COMPOSITION WITH LOW VISCOSITY

Номер: KR1020160061476A
Автор: KIM, YE HWAN, SEO, YU MI, HONG, WOO JIN, CHO, JIN HUN
Принадлежит:

The present invention relates to a water in oil emulsion type make-up cosmetic composition with low viscosity and, more specifically, to a water in oil emulsion type make-up cosmetic composition comprising a water phase unit and an oil phase unit, wherein the oil phase unit comprises distearyldimonium hectorite, silica dimethyl silylate and polyhydroxystearic acid. The cosmetic composition of the present invention has excellent emulsification stability, and has light feeling during use and excellent spreadability, adhesion and durability, while having low viscosity. COPYRIGHT KIPO 2016 ...

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Номер записи: 14
01-04-2016 дата публикации

METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

Номер: KR1020160035858A
Автор: KIM, YE HWAN, SEO, JI HOON, KIM, SANG KYUN, KIM, JONG WOO, PAIK, UN GYU, LEE, DONG JUN
Принадлежит:

According to a technical concept of the present invention, a method for manufacturing a semiconductor device comprises the following steps of: forming an active region in a semiconductor substrate; forming a plurality of dummy gates on the active region wherein a gate mask exists in an upper portion of the plurality of dummy gates; forming an interlayer insulating layer on the gate mask; and performing polishing on upper surfaces of the dummy gates by a one-time chemical mechanical polishing process by using a common slurry composition capable of polishing the interlayer insulating layer and the gate mask. COPYRIGHT KIPO 2016 (AA) Ceria slurry (BB) Ceria slurry+threonine+polyethylene glycol + 4-hydroxyethyl - 2-pyrrolidone (CC) Polishing selection ratio ...

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Номер записи: 15
11-08-2011 дата публикации

SLURRY FOR POLISHING PHASE-CHANGE MATERIALS AND METHOD FOR PRODUCING A PHASE-CHANGE DEVICE USING SAME

Номер: WO2011096745A3
Автор: PARK, Jea Gun, PAIK, Un Gyu, PARK, Jin Hyung, CUI, Hao, CHO, Jong Young, HWANG, Hee Sub, LIM, Jae Hyung, KIM, Ye Hwan
Принадлежит:

The present invention relates to slurry for polishing crystalline phase-change materials and to a method for producing a phase-change device using the same. The slurry for polishing crystalline phase-change materials according to one embodiment of the present invention comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water. In addition, the method for producing a phase-change device according to one embodiment of the present invention comprises the following steps: preparing a substrate; forming a crystalline phase-change material film on the substrate; and removing the phase-change material film through a chemical-mechanical polishing process using slurry for polishing phase-change materials, which comprises an abrasive, an alkaline abrasive enhancer, an oxidizing agent having a standard reduction potential higher than that of perchlorates, and ultrapure water.

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Номер записи: 16
04-04-2016 дата публикации

ULTRAVIOLET BLOCKING COSMETIC COMPOSITION CONTAINING CORNCOB EXTRACT AS ACTIVE INGREDIENT

Номер: KR1020160036202A
Автор: KIM, MYOUNG RAE, KIM, YE HWAN, KIM, SUNG WOO
Принадлежит:

The present invention relates to an ultraviolet blocking cosmetic composition containing a corncob extract as an active ingredient. According to the present invention, the cosmetic composition exhibits ultraviolet blocking effects, antioxidant effects, anti-inflammatory effects, and skin improving effects, thereby securing the high value as a cosmetic ingredient. COPYRIGHT KIPO 2016 ...

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Номер записи: 17
12-03-2018 дата публикации

NANOEMULSION CONTAINING EFFECTIVE COMPONENTS, PRODUCTION METHOD THEREOF, AND COSMETIC COMPOSITION CONTAINING SAME

Номер: KR101837433B1
Автор: KIM, SEONG RAE, KIM, YE HWAN
Принадлежит: STARFRIENDS COSMETICS CO., LTD.

The present invention relates to a nanoemulsion containing an effective component, a production method thereof, and a cosmetic composition containing the same. More specifically, the present invention relates to an ivory white oil-in-water nanoemulsion which ensures excellent water dispersibility, high stability, and uniform particle distribution. In addition, by using inulin lauryl carbamate as a main surfactant, sodium surfactin as a stabilizer, sodium dextran sulfate, or a mixture thereof, the nanoemulsion contains high amounts of liquid and solid effective components and effective dermally and physiologically active components. The present invention further relates to a cosmetic composition containing the same. COPYRIGHT KIPO 2018 (AA) Sodium surfactin or sodium dextran sulfate (BB) Inulin lauryl carbamate ...

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Номер записи: 18
11-12-2018 дата публикации

FIFO APPARATUS FOR LAVER

Номер: KR1020180131882A
Автор: KIM, YE HWAN, LIM, MIN SOO
Принадлежит:

Disclosed is a fifo apparatus for laver for sequentially loading, storing, and discharging the laver between transporting processes of the laver. The fifo apparatus for the laver comprises: an input unit in which the loaded laver is horizontally seated; a first conveying unit which receives the loaded laver from the input unit and feeds the same downward along the vertical direction; a second conveying unit arranged parallel to the conveying direction of the first conveying unit and conveying the loaded laver conveyed from the first conveying unit upward along the vertical direction; a pushing unit provided at a lowermost stage along the conveying direction of the first conveying unit and conveying the loaded laver from the first conveying unit to the second conveying unit at the lowermost stage; and a discharge unit provided at an uppermost portion along the conveying direction of the second conveying unit to grasp the loaded laver in the second conveying unit and discharge the laver to ...

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Номер записи: 19
04-04-2016 дата публикации

ULTRAVIOLET BLOCKING COSMETIC COMPOSITION CONTAINING ZANTHOXYLUM PIPERITUM (L.) DC. EXTRACT AS ACTIVE INGREDIENT

Номер: KR1020160036198A
Автор: KIM, MYOUNG RAE, KIM, YE HWAN, KIM, SUNG WOO
Принадлежит:

The present invention relates to an ultraviolet blocking cosmetic composition containing a Zanthoxylum piperitum (L.) DC. extract as an active ingredient. According to the present invention, the cosmetic composition exhibits ultraviolet blocking effects, antioxidant effects, anti-inflammatory effects, and skin improving effects, thereby securing the high value as a cosmetic ingredient. COPYRIGHT KIPO 2016 ...

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Номер записи: 20