08-11-2018 дата публикации
Номер: US20180318758A1
Принадлежит:
A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH, HO, H, NF, SF, F, HCl, HF, Cl, and HBr. Representative condensing abating reagents include, for example, H, HO, O, N, O, CO, CO, NH, NO, CH, and combinations thereof. 1. An apparatus for abating effluent from a processing chamber , comprising:a plasma source coupled to a foreline of the processing chamber; anda reagent source positioned upstream of the plasma source and downstream of the processing chamber, wherein the reagent source is coupled with the plasma source, and wherein the reagent source is configured to deliver an abating reagent to the plasma source.2. The apparatus of claim 1 , wherein the abating reagent comprises one or more of BCl claim 1 , CCl claim 1 , SiCl claim 1 , NF claim 1 , SF claim 1 , SF claim 1 , SF claim 1 , a reducing compound claim 1 , a halogenated etching compound claim 1 , CH claim 1 , H claim 1 , F claim 1 , HCl claim 1 , HF claim 1 , Cl claim 1 , HBr claim 1 , O claim 1 , N claim 1 , O claim 1 , CO claim 1 , CO claim 1 , NH claim 1 , NO claim 1 , CH claim 1 , and combinations thereof.3. The apparatus of claim 1 , further comprising:a foreline gas injection kit positioned downstream of the plasma source and coupled to the plasma source, the foreline gas injection kit configured to deliver a gas to the foreline to control a pressure in the foreline.4. The apparatus of claim 3 , wherein the gas comprises one or more of N ...
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