Method and antenna arrangement for improving plasma processing uniformity

21-07-2010 дата публикации

Номер:

TWI327875B

Автор: Arthur M Howald, Andras Kuthi, Mark H Wilcoxson, Bailey, Iii, HOWALD ARTHUR M, KUTHI ANDRAS, WILCOXSON MARK H, BAILEY III, HOWALD, ARTHUR M., KUTHI, ANDRAS, WILCOXSON, MARK H., BAILEY, III

Принадлежит: Lam Res Corp, LAM RES CORP, LAM RESEARCH CORPORATION

Контакты:

Номер заявки: 08-00-9212

Дата заявки: 22-07-2003

CPC - классификация

H H0 H01 H01J H01J3 H01J37 H01J37/H01J37/3 H01J37/32 H01J37/321 H01J37/329 H01J37/3299 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/306 H01L21/3065 H01Q H01Q2 H01Q21 H01Q21/H01Q21/2 H01Q21/29 H01Q7 H01Q7/H01Q7/0 H01Q7/00 H05 H05H H05H1 H05H1/H05H1/4 H05H1/46

IPC - классификация

H H0 H01 H01J H01J3 H01J37 H01J37/H01J37/3 H01J37/32 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/306 H01L21/3065 H01Q H01Q1 H01Q1/H01Q1/2 H01Q1/26 H01Q11 H01Q11/H01Q11/1 H01Q11/12 H01Q2 H01Q21 H01Q21/H01Q21/2 H01Q21/29 H01Q7 H01Q7/H01Q7/0 H01Q7/00 H05 H05H H05H1 H05H1/H05H1/0 H05H1/00 H05H1/4 H05H1/46

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