Composite plating process and equipment for magnetron sputtering-laser heating
Technical field: The present invention relates to plasma surface metallurgy, in particular to a surface of the conductive material to form the alloy-layer for magnetron sputtering-laser heating of composite plating process and apparatus. Background technology: At present, by gas discharge plasma surface modification of various apparatus and process of the method is mainly composed of a: double layer glow ion metal equipment and technology, multi-arc ion diffusion coating equipment and technology, magnetron sputtering ion plating apparatus and technology, DC two-pole sputtering, DC three-pole or four-pole sputtering plating apparatus and technology, and the like. Equipment and process for the above method, in addition to the double-layer glow ion metal equipment and technology, the remaining apparatus and technology are deposited coating formed on the surface of the material, there is no diffusion layer. Therefore poor bonding strength of the film, is very easy to peel off. Double-layer glow ion metal equipment and technology, the glow discharge sputtering the provision of the lug to be diffusion alloy element, due to the low ionization rate, and providing a unit time to the limited number of metallic elements of the alloy, the surface of the affected metal process. Furthermore, double layer glow ion metal, is to heat the workpiece, by the ion bombardment, the heating rate is slow, a long time, the crystal grow serious. The proliferation of infiltrating alloy atoms to, spread of mainly cementite, diffusion speed is very low. The content of the invention is: The purpose of this invention is to provide a kind of by utilizing the magnetron sputtering and laser heating, formed on the surface of the conductive material comprises a metal element, and non-metallic elements of the diffusion layer, the diffusion layer deposition layer or deposit + single or composite diffusion plating layer process. Another purpose of this invention is to provide the composite plating process equipment. Magnetron sputtering-laser of the present invention composite plating process according to the degree of the heating comprises the following steps: 1. The pieces are placed on the vacuum container is within the reciprocating mechanism and the longitudinal direction of the transverse reciprocating mechanism, the work piece is, the reciprocating mechanism, the vacuum container is an anode, the material of the workpiece and of the, material which is electrically conductive; 2. The magnetron sputtering target is the upper part of the work piece, to provide for the source material sputtering alloy elements, or non-conductive material which is electrically conductive; 3. Up to the extreme vacuum is vacuum 3 × 10-3 Pa the above; 4. Is filled with a gas medium to the working vacuum, gas medium as ammonia gas or methane or argon; 5. Magnetron sputtering target to the high-voltage DC power supply or a high-voltage pulse power supply or a radio frequency power supply, the adjustable range of the voltage 0-2000V, magnetron sputtering power supply radio-frequency power supply, its frequency range is 13.56MHZ, 27 . 12MHZ; 6. Laser scanning is the surface of the workpiece, the laser heating device, can be Nd: YAG laser or CO2 laser, the output laser power range from 100-10000W, laser wavelength: the 10.6 m, beam diameter: φ 1 mm -30 mm, after the completion of the laser heating infiltrates expands process, can be formed on the surface of the conductive material comprises a metal element, and non-metallic elements of the diffusion layer, the diffusion layer deposition layer or deposit + single or composite diffusion plating layer. When working, the magnetron sputtering target and provide sufficient large amount of active metal ion, atom or employed, these active substances adsorbed or deposited on the surface of the workpiece. Laser heating device, periodic of providing high power high-density heat energy, can be used in zero within a few seconds to a few seconds, will be repeatedly local workpiece is heated to the high temperature of more than the phase change points, adsorbed and deposited on the surface of the work piece is fast diffusion of active substances into the workpiece, to form a diffusion layer or sedimentary deposit. At this time the working medium contains ammonia gas, the reactive gas such as methane, is formed on the surface of the work piece will be nitrogen, carburization or the carbon-nitrogen co-diffusion layer. Used for realizing the process of the invention the apparatus includes: The vacuum container, the vacuum container in the reciprocating mechanism and the reciprocating travel of the workpiece is, pumping system, an air supply system, a magnetron sputtering, magnetron sputtering power source, a laser heating device. The advantage of this invention lies in: (1) by utilizing the magnetron sputtering target, to provide adequate penetration of the alloy elements. Within a short period of time, to provide a large number of active ionic alloy element, the matrix material is fully met the need of and deposited on the surface. (2) using laser heating device, providing high power high-density heat energy, in zero within a few seconds to a few seconds the material is repeatedly heated to a high temperature, rapidly permeate process implementation; (3) in a rapid heating, under short-time high-temperature condition of the material of the workpiece, with the energy conditions of rapid diffusion, into the speed is improved greatly, diffusion layer and enhance the bonding force of the deposited film. (4) when the vacuum degree of the work of metal infiltration, than the general alloying method to improve by at least 1 order of magnitude, thereby greatly improving the surface quality of the workpiece. (5) can be continuously running, can realize the large area mass production. The Figure illustrates: Figure 1 is the invention for magnetron sputtering-laser heating composite plating equipment block diagram. In the Figure the label is: magnetron sputtering target 1, magnetron sputtering power supply 2, the workpiece 3, the vacuum container 4, a laser heating device 5, the longitudinal reciprocating walking mechanism 6, the transverse reciprocating walking mechanism 7, the vacuum pumping system 8, the gas supply system 9 and the like. Specific embodiment: Combined with the Figure below the further detailed description of this invention. The size is 100 mm × 100 mm × 5 mm, the material is 20 steel of the workpiece 3, the reciprocating mechanism is placed in the longitudinal direction 6 and transverse reciprocating walking mechanism 7 on the bracket, for selecting a size φ 100 mm × 5 mm (diameter × high) magnetron sputtering target 1, is arranged in the upper part of the work piece is, magnetron sputtering target material is metallic pure Mo, up to the extreme vacuum is vacuum 3 × 10-3 Pa above, argon gas is filled with a gas medium to the working vacuum degree of 10 Pa, magnetron sputtering target first 1 into high-pressure direct-current voltage -500V, ion sputtering target material 20 minutes, stop sputtering, opening transverse reciprocating mechanism 7, at the same time, a laser heating device 5, scanning heating the workpiece 3 surface, transverse reciprocating speed 100 mm/min, to the end of a horizontal scanning shape regulation , actuating longitudinal reciprocating walking mechanism 6, forward 1 mm. The scanning of the next shape regulation. Laser heating after the completion of process infiltrates expands implementation, the sample. Can be obtained the 20 m Mo diffusion layer and of 1 the Mo deposited layer of m. The invention discloses the magnetron sputtering-laser heating composite diffusion coating technology and the equipment, by utilizing the magnetron sputtering and a laser heating device, a single diffusion coating layer or a composite diffusion coating layer with a diffusion layer and a sedimentary layer or the diffusion layer plus the sedimentary layer which comprises metal element and nonmetal element is formed on the surface of a conducting workpiece. The invention has the advantages that by utility a magnetron sputtering target, sufficient pre-diffusing alloy element can be provided; by utilizing the laser heating, the diffused material can heated to high temperature in a short time and the diffusing speed is greatly increased; the DEG Cree of vacuum of the metal for diffusing is increased at least one order of magnitude compared with the common alloying method, and the surface quality of the diffused workpiece can be greatly improved; the diffusion coating can be performed continuously, and the production in large area and large scale can be realized. 1. Magnetron sputtering-laser heating composite plating process, which is characterized in that: the method comprises the following steps in order: (1) placing the workpiece (3) of vacuum in the container for the longitudinal reciprocating walking mechanism (6) and transverse reciprocating walking mechanism (7) the upper; (2) the magnetron sputtering target (1) of the workpiece (3) above; (3) up to the extreme vacuum is vacuum 3 × 10-3 Pa; (4) is filled with a gas medium to the working vacuum degree; (5) to the magnetron sputtering target (1) adding magnetron sputtering power supply (2); (6) laser scanning heating the workpiece (3) surface, in the workpiece can be (3) comprises a metal element is formed on the surface, and the diffusion layer of the non-metallic element, the diffusion layer deposition layer or deposit + single or composite diffusion plating layer. 2. Process according to Claim 1, which is characterized in that: the work piece (3), longitudinal walking reciprocating mechanism (6) and transverse reciprocating walking mechanism (7) and the vacuum container (4) with belonging to the anode. 3. Process according to Claim 1, which is characterized in that: the elements of the alloy to the sputtering source material is conductive or non-conductive material. 4. Process according to Claim 1, which is characterized in that: the of the workpiece (3) material is a conductive material. 5. Process according to Claim 1, which is characterized in that: the magnetron sputtering power supply (2) can be: the high-voltage DC power supply, high-voltage pulse power supply and the radio frequency power supply, the adjustable range of the voltage 0-2000V. 6. Process according to Claim 1, which is characterized in that: the power of magnetron sputtering (2) radio-frequency power supply, its frequency range is 13.56MHZ, 27 . 12MHZ. 7. Process according to Claim 1, which is characterized in that: the laser heating device (5), can be Nd: YAG laser or a CO2 laser. Output laser power range from 100-10000W, laser wavelength: the 10.6 m, beam diameter: φ 1 mm -30 mm. 8. Process according to Claim 1, which is characterized in that: of the charge gas medium as ammonia gas or methane or argon. 9. Used for realizing the claim 1 of the process apparatus, comprising: a vacuum container (4), the vacuum container (4) in the longitudinal direction of the reciprocating mechanism (6) and transverse reciprocating walking mechanism (7) and the reciprocating mechanism of the workpiece (3), the vacuum pumping system (8), an air supply system (9), magnetron sputtering target (1), magnetron sputtering power supply (2), a laser heating device (5).