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Небесная энциклопедия

Космические корабли и станции, автоматические КА и методы их проектирования, бортовые комплексы управления, системы и средства жизнеобеспечения, особенности технологии производства ракетно-космических систем

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Мониторинг СМИ

Мониторинг СМИ и социальных сетей. Сканирование интернета, новостных сайтов, специализированных контентных площадок на базе мессенджеров. Гибкие настройки фильтров и первоначальных источников.

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Поддерживает ввод нескольких поисковых фраз (по одной на строку). При поиске обеспечивает поддержку морфологии русского и английского языка
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Применить Всего найдено 15. Отображено 15.
29-09-2010 дата публикации

Method and system for manufacturing self-cleaning surface structure by adopting laser interference photolithography technology

Номер: CN0101844272A
Автор: GUOQIANG LIU, ZHENGXUN SONG, ZUOBIN WANG, ZHANKUN WENG, JIA XU, JIN ZHANG, LIU GUOQIANG, SONG ZHENGXUN, WANG ZUOBIN, WENG ZHANKUN, XU JIA, ZHANG JIN
Принадлежит:

The invention relates to method and system for manufacturing a self-cleaning surface structure by adopting a laser interference photolithography technology. The method is characterized in that a plurality of coherent laser beams are combined by using a laser interference photolithography system, weakness modulation is carried out on light intensity distribution in an interference field, redistributed laser energy after modulation is used for ablating the surface of optics materials, and a micron-size or nanoscale dense cylindrical or conical anaglyph structure is generated within a large area range, thereby obtaining a super-hydrophobic film, greatly lowering the viscous phenomenon, benefiting to attachments including dusts, liquid and the like on the surface of the materials detaching from the surface of the materials and fulfilling a self-cleaning function. Without external materials, the self-cleaning fine structure generated on the surface of the materials is more stable and durable ...

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Номер записи: 1
13-04-2011 дата публикации

Method and system for realizing phase shift in laser interference lithography

Номер: CN0102012561A
Автор: Hou Yu, Hu Zhen, Liu Lanjiao, Liu Yang, Pan Haiyan, Song Hao, Song Zhengxun, Wang Zuobin, Weng Zhankun, Xu Jia, Zhang Wei
Принадлежит:

The invention discloses a method for shifting a phase in laser interference nano lithography. The method is characterized in that in two-beam or multi-beam laser interference lithography, two or more coherent laser beams are combined for interference, and one or more phase-shift locating systems are controlled to change the optical distance of an optical path and shift and locate the phase of interference graphics. In the method, the phase-shift locating system comprises a voltage source, a displacement driver and a reflector, and different voltages are applied to the displacement driver so that the reflector also moves along the axial direction thereof to shift and locate the phase. The phase-shift locating system can also push an optical wedge in a plane direction perpendicular to incoming light by changing the voltage of the voltage source or control an LCD (Liquid Crystal Display) in the plane direction perpendicular to the incoming light by changing the voltage of the voltage source ...

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Номер записи: 2
11-06-2014 дата публикации

Method for preparing dual-period nanostructure through laser interference nanolithography

Номер: CN103852975A
Автор: ZUOBIN WANG, DAPENG WANG, ZIANG ZHANG, YANG LIU, MIAO YU, ZHENGXUN SONG, ZHANKUN WENG, ZHEN HU, HONGMEI XU
Принадлежит:

The invention provides a method for preparing dual-period nanostructure through laser interference nanolithography. An interference light field is subjected to periodic modulation by utilizing a specified combination mode of incident beams and modulated beams, the dual-period nanostructure in an interference period and a modulation period is formed, the lithography features of different materials are combined, and the dual-period nanostructure is directly manufactured on the material surface. The limitation of manufacturing a two-dimensional single periodic structure through the laser interference nanolithography is broken.

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Номер записи: 3
27-07-2011 дата публикации

Method for electrochemically preparing nano-array structure materials on basis of nano-mask preparation technique

Номер: CN0101560663B
Автор: WENG ZHANKUN, SHAO JINSHAN, CHEN GUANG, ZHAO XINLE, SONG ZHENGXUN, WANG ZUOBIN, ZHANKUN WENG, JINSHAN SHAO, GUANG CHEN, XINLE ZHAO, ZHENGXUN SONG, ZUOBIN WANG
Принадлежит:

The invention provides a method for electrochemically preparing nano-array structure materials on the basis of a nano-mask preparation technique, which is applied in the field of manufacturing nano-optoelectronic devices, particularly photonic crystal materials and devices. The method comprises the following steps: a) uniformly distributing monodispersed organic/inorganic nano-spheres on the surface of a substrate to form nano-arrays or graphic arrangement; b) taking the nano-arrays or graphs as a mask, adopting an electrochemical etching process to etch the nano-arrays or the graphs and forming the nano-arrays or graphic structures on the surface of the substrate; and c) removing organic/inorganic nano-materials on the surface and obtaining the nano-arrays or the graphic structures. The method is suitable for preparing the nano-array structures of metal or semiconductor materials, and can reach the minimum size of below 10 nanometers. The adopted electrochemical etching process has the ...

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Номер записи: 4
15-12-2010 дата публикации

Multi-beam semiconductor laser interference nanoimprinting technology and system

Номер: CN0101916042A
Автор: JIA XU, ZUOBIN WANG, ZHANKUN WENG, ZHENGXUN SONG, ZHEN HU, LANJIAO LIU, YU HOU, HAIYAN PAN, XU JIA, WANG ZUOBIN, WENG ZHANKUN, SONG ZHENGXUN, HU ZHEN, LIU LANJIAO, HOU YU, PAN HAIYAN
Принадлежит:

The invention discloses multi-beam semiconductor laser interference nanoimprinting technology and system which adopt the following principle that the required two or more bundles of coherent lights can be obtained by using semiconductor pulse laser through beam splitting, the coherent lights are subjected to coupling, beam expansion and reshaping and redistributed on the surface of material by using the light intensity in an interference field to form a periodical interference pattern. When the system is used for imprinting, a photosensing material can be directly subjected to the interference exposure and then etching without masking. By using an optical fiber beam splitting device as a light splitter, the complicity of a light path is greatly reduced, and the system is more stable and reliable; in addition, the selection from two light beams to a plurality of light beams is more flexible and convenient.

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Номер записи: 5
31-08-2011 дата публикации

Preparation technology for increasing effective photosensitive area of photoelectric material

Номер: CN0102169921A
Автор: JIA XU, ZUOBIN WANG, ZHANKUN WENG, ZHENGXUN SONG, ZHEN HU, LE ZHAO, ANGANG YUAN, XU JIA, WANG ZUOBIN, WENG ZHANKUN, SONG ZHENGXUN, HU ZHEN, ZHAO LE, YUAN ANGANG
Принадлежит:

The invention discloses a preparation technology for increasing the effective photosensitive area of a photoelectric material or a photoelectric element. The principle of the preparation technology comprises the following steps of: controlling the quantity of exposed light beams, light beam polarization and an incident angle to obtain a micro-nano structure with different periods and characteristic sizes by laser interference photoetching; and increasing the real effective area of a P-N junction within unit area on the structure by semiconductor doping. Because the photoelectric material or the photoelectric element is manufactured by using the technology and a method, the effective photosensitive area can be increased on a large scale within the unit area, and then light absorption rate is improved; the application prospect of the technology is wider due to the properties of self cleaning and anti-reflection of the micro-nano structure; the technology is particularly applied to the field ...

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Номер записи: 6
04-05-2011 дата публикации

Method and system for detecting and calibrating incident postures of light beams in laser interference nano-lithography

Номер: CN0102043347A
Автор: HAO SONG, ZUOBIN WANG, JIA XU, ZHANKUN WENG, ZHENGXUN SONG, ZHEN HU, LANJIAO LIU, SONG HAO, WANG ZUOBIN, XU JIA, WENG ZHANKUN, SONG ZHENGXUN, HU ZHEN, LIU LANJIAO
Принадлежит:

The invention discloses a method for detecting and calibrating incident postures of light beams in laser interference nano-lithography. The invention is characterized in that in the laser interference nano-lithography, a CCD (charge-coupled device) is used for detecting a light spot formed by each laser beam on the surface of a lithography sample and carrying out computer image processing, the incident posture, including the incident position, the incident angle and the space angle, of each laser beam relative to the surface of the lithography sample is determined through the shape, position and other parameters of the light spot, and the error of each incident posture is further determined through the contrast with the ideal incident posture. A regulating device of the system is used for carrying out corresponding calibration on the incident posture of each light beam. In the method, the CCD is used for detecting the light spots, and a computer is used for processing and determining the ...

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Номер записи: 7
23-02-2011 дата публикации

Method and system for preparing filter membrane mesh structure by laser interference photoetching technology

Номер: CN0101980083A
Автор: YANG LIU, ZUOBIN WANG, LE ZHAO, LANJIAO LIU, JIA XU, YU HOU, ZHANKUN WENG, ZHENGXUN SONG, ZHEN HU, LIU YANG, WANG ZUOBIN, ZHAO LE, LIU LANJIAO, XU JIA, HOU YU, WENG ZHANKUN, SONG ZHENGXUN, HU ZHEN
Принадлежит:

The invention discloses a method and a system for preparing a filter membrane mesh structure by laser interference photo-etching technology. The system can generate images with different intervals by different exposure methods of the laser interference photo-etching technology. A photoetched image is generated by regulating and controlling light intensity distribution in an interference field by a specified light beam combination method, and ablating the surface of a processed material by using modulated redistributed laser energy. The system consists of a laser, a beam expander, a beam splitter, a reflecting mirror, a polaroid and a mechanism for clamping and regulating the optical elements and devices. By changing the relative arrangement position of the optical devices, an incident angle of a related light beam which is irradiated on the surface of a substrate material is changed so as to regulate parameters of a micro-mesh structure of the surface of the processed material. The system ...

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Номер записи: 8
21-10-2009 дата публикации

Method for electrochemically preparing nano-array structure materials on basis of nano-mask preparation technique

Номер: CN0101560663A
Автор: WENG ZHANKUN, SHAO JINSHAN, CHEN GUANG, ZHAO XINLE, SONG ZHENGXUN, WANG ZUOBIN, ZHANKUN WENG, JINSHAN SHAO, GUANG CHEN, XINLE ZHAO, ZHENGXUN SONG, ZUOBIN WANG
Принадлежит:

The invention provides a method for electrochemically preparing nano-array structure materials on the basis of a nano-mask preparation technique, which is applied in the field of manufacturing nano-optoelectronic devices, particularly photonic crystal materials and devices. The method comprises the following steps: a) uniformly distributing monodispersed organic/inorganic nano-spheres on the surface of a substrate to form nano-arrays or graphic arrangement; b) taking the nano-arrays or graphs as a mask, adopting an electrochemical etching process to etch the nano-arrays or the graphs and forming the nano-arrays or graphic structures on the surface of the substrate; and c) removing organic/inorganic nano-materials on the surface and obtaining the nano-arrays or the graphic structures. The method is suitable for preparing the nano-array structures of metal or semiconductor materials, and can reach the minimum size of below 10 nanometers. The adopted electrochemical etching process has the ...

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Номер записи: 9
22-12-2010 дата публикации

Manufacture system of anti-reflection structure on surface of solar cell and manufacture method thereof

Номер: CN0101924166A
Автор: JIN ZHANG, ZUOBIN WANG, SHUIQING LIU, ZHENGXUN SONG, ZHANKUN WENG, GUOQIANG LIU, ZHANG JIN, WANG ZUOBIN, LIU SHUIQING, SONG ZHENGXUN, WENG ZHANKUN, LIU GUOQIANG
Принадлежит:

The invention relates to a manufacture system of an anti-reflection structure on the surface of a solar cell and a manufacture method thereof, which is characterized in that a plurality of coherent laser beams are combined by a laser interference lithography system to modulate the light intensity distribution in an interference field; the material surface of a photovoltaic cell device is ablated with redistributed laser energy after modulation; and micro or nano-stage dense hole and column relief structures are generated in a large-area range so as to reduce the reflectivity, enhance the light absorption and improve the photovoltaic conversion efficiency. Lacking of external materials, the anti-reflection fine structure generated on the substrate surface by using the method is more stableand durable, and the cycle and the size of the structure can be adjusted by adjusting the incidence angle of the interference lithography system so that the received wavelength has better pertinence and ...

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Номер записи: 10
15-04-2009 дата публикации

Surface regulated concave-convex fluctuant sample platform and manufacturing method thereof

Номер: CN0101408513A
Автор: TIAN JIAN, JIN LIHONG, WENG ZHANKUN, SHEN BINGJUN, WANG YILANG, JIAN TIAN, LIHONG JIN, ZHANKUN WENG, BINGJUN SHEN, YILANG WANG
Принадлежит:

The invention relates to a specimen platform with a regular concave-convex surface, and a fabricating method thereof, belonging to the technical field of SERS (Surface-Enhanced Raman Spectroscopy) detection. The prior part adopts that regularly distributed probes are formed on the substrate of the specimen platform by adopting a vacuum metal sputtering method, the expensive equipment is required to be adopted, and the operating process is required to be accurately controlled. The specimen platform with the regular concave-convex surface is characterized in that globular materials with particle size ranged form 150 to 250nm are distributed on a planar substrate in grid shapes, metal coatings are coated on the surfaces of the globular materials, and the surfaces of all the globular materials deviated from the substrate form the regular concave-convex surface of the specimen platform. The fabricating method comprises the following steps: the substrate of the specimen platform is horizontally ...

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Номер записи: 11
11-06-2014 дата публикации

Method for manufacturing large-area black silicon with controllable microstructure period

Номер: CN103848392A
Автор: ZUOBIN WANG, ZIANG ZHANG, DAPENG WANG, MIAO YU, ZHENGXUN SONG, ZHANKUN WENG, ZHEN HU, HONGMEI XU
Принадлежит:

The invention provides a method for quickly manufacturing large-area black silicon by using a laser interference technology. By using a specific multi-beam interference combination, lattice period light field distribution is formed; under a sulfur-containing compound atmosphere, a large-area black silicon surface structure is quickly formed on the surface of a silicon material by using large interference light field distribution, controlling the two-dimensional plane displacement of a silicon material sample and combining with a laser etching threshold value of the silicon material. By controlling an interference light field, the black silicon surface structure with a variable structure period can be obtained. Meanwhile, according to the method, the defects of a conventional femtosecond laser scanning method that the large-area black silicon surface structure is difficult to quickly obtain and the structure period is uncontrollable are overcome. In addition, the method has the advantages ...

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Номер записи: 12
24-12-2014 дата публикации

Method and system for carrying out magnetic micromanipulation on cell in physiological environment

Номер: CN104232614A
Автор: YU HOU, HONGMEI XU, YINGMIN QU, ZUOBIN WANG, LANJIAO LIU, WENJUN LI, JINYUN LIU, YANG LIU, JINGMEI LI, MIAO YU, GUOLIANG WANG, ZHANKUN WENG, ZHEN HU, ZHENGXUN SONG
Принадлежит:

The invention discloses a method and a system for carrying out magnetic micromanipulation on a cell in a physiological environment. The system for carrying out the magnetic micromanipulation on the cell in the physiological environment comprises a magnetic probe, a probe nanometer offset detection module, a three-dimensional displacement platform, an inverted/upright optical microscope, a magnetic probe control module and a displacement control module and realizes the in-vitro operation and real-time tracking observation of a biological cell by being placed into a fine controlled culture environment suitable for the in-vitro growth of the cell. The method for carrying out the magnetic micromanipulation on the cell is characterized by measuring a single cell which contains magnetic nanometer particles point by point according to a selected area by utilizing the magnetic probe on the basis that the magnetic micromanipulation on the cell is combined with the magnetic nanometer particles, recording ...

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Номер записи: 13
29-09-2010 дата публикации

Method of using laser interference technology enhanced electrochemical technology for preparing nanometer gate

Номер: CN0101847670A
Автор: TAIQUAN GONG, ZHEN HU, SHUIQING LIU, ZHENGXUN SONG, ZUOBIN WANG, ZHANKUN WENG, JIA XU, JIN ZHANG, GONG TAIQUAN, HU ZHEN, LIU SHUIQING, SONG ZHENGXUN, WANG ZUOBIN, WENG ZHANKUN, XU JIA, ZHANG JIN
Принадлежит:

The invention discloses a method for preparing a nanometer gate based on laser interference technology enhanced electrochemical technology and the method is used in the fields such as solar cells and micron/nanometer photoelectronic devices. The method comprises the following steps: 1) performing spin coating of photoresist on the surface of a p-n junction substrate slice and a semiconductor substrate slice, drying; 2) then adopting double beam laser interference technology for exposure; 3) using a selective solution to remove exposed photoresist, adopting electrochemical technology to deposit a metal gate; and 4) finally using the selective solution to remove unexposed photoresist, and performing heat treatment to obtain the submicron/nanometer metal gate. By using the method, the submicron/nanometer gate can be realized; and the method has the advantages of large area, high efficiency, cheap price, simpleness, controllability and capability of performing under atmospheric environment ...

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Номер записи: 14
02-03-2011 дата публикации

Technique and system for real-time detecting, controlling and diagnosing cells of robot micro nanometer mixed living body

Номер: CN0101982780A
Автор: YANG LIU, ZUOBIN WANG, GUANG YANG, ZHENGXUN SONG, ZHEN HU, ZHANKUN WENG, JINGMEI LI, YINGMIN QU, LANJIAO LIU, JIA XU, LIU YANG, WANG ZUOBIN, YANG GUANG, SONG ZHENGXUN, HU ZHEN, WENG ZHANKUN, LI JINGMEI, QU YINGMIN, LIU LANJIAO, XU JIA
Принадлежит:

The invention discloses a technique and a system for real-time detecting, controlling and diagnosing cells of a robot micro nanometer mixed living body. The system realizes the precisely positioning, local selective scanning detecting, controlling and diagnosing the individual cell by combining with a scanning probe microscope and a convert/positive optical microscope with a light capturing system. Due to the working condition accordant with the cell living environment, the operation and the real-time tracking observation for the cells of the living body can be also realized. By combining with the light capturing system, the system can more accurately and easily position and assemble the micro nanometer objects.

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Номер записи: 15