NOZZLE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

The invention relates to a nozzle, a substrate processing apparatus, and a substrate processing method. A fluid and a processing liquid can be efficiently mixed in liquid processing using a mixed fluid of the fluid and the processing liquid. The nozzle mixes a fluid containing vapor or entrainment of pressurized pure water with a treatment liquid containing at least sulfuric acid and discharges the mixture. The nozzle includes a first discharge port, a second discharge port, and a lead-out path. The first discharge port discharges a fluid. The second discharge port discharges the processing liquid. The lead-out path communicates with the first discharge port and the second discharge port, and leads out a mixed fluid of the fluid discharged from the first discharge port and the processing liquid discharged from the second discharge port. The first discharge port or the second discharge port is disposed so as to be offset from the central axis of the lead-out path in a planar view.