19-09-2013 дата публикации
Номер: US20130243021A1
A method of fabricating epitaxial structures including applying an etch stop to one side of a substrate and then growing at least one epitaxial layer on a first side of said substrate, flipping the substrate, growing a second etch stop and at least one epitaxial layer on a second side of the substrate, applying a carrier medium to the ultimate epitaxial layer on each side, dividing the substrate into two parts generally along an epitaxial plane to create separate epitaxial structures, removing any residual substrate and removing the etch stop. 112-. (canceled)13. A semiconductor device comprising a substrate , the substrate comprising a first epitaxial structure on a first side of the substrate and a second epitaxial structure on a second side of the substrate , each of the first and second epitaxial structures comprising an etch stop , an epitaxial layer , and a carrier medium , the first side being on an opposite side of the substrate from the second side.14. The semiconductor device of claim 13 , wherein the first epitaxial structure comprises one or more laser cells.15. The semiconductor device of claim 13 , wherein the first epitaxial structure comprises one or more light emitting diode cells.16. The semiconductor device of claim 13 , wherein the first epitaxial structure comprises one or more infrared sensor cells.17. The semiconductor device of claim 13 , wherein the first epitaxial structure comprises one or more inverted metamorphic structures.18. The semiconductor device of claim 13 , wherein the first epitaxial structure comprises one or more solar cells.19. The semiconductor device of claim 13 , wherein the carrier mediums comprise at least one of silicon claim 13 , metal claim 13 , glass claim 13 , gold claim 13 , silver claim 13 , copper claim 13 , nickel claim 13 , titanium claim 13 , and platinum.20. The semiconductor device of claim 13 , wherein the first epitaxial structure comprises an array of individual cells.21. A method of fabricating ...
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