Display device and manufacturing method thereof

19-03-2024 дата публикации

Номер:

US0011937472B2

Автор: Sang Gab KIM, Hyun Min Cho, TAE SUNG KIM, Yu-Gwang Jeong, Su Bin Bae, Jin Seock Kim, Sang Gyun KIM, Hyo Min Ko, Kil Won Cho, Hansol Lee

Принадлежит: Samsung Display Co., Ltd., POSTECH ACADEMY-INDUSTRY FOUNDATION

Контакты:

Номер заявки: 71-54-1744

Дата заявки: 19-08-2021

CPC - классификация

H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/306 H01L21/3065 H1 H10 H10K H10K2 H10K21 H10K210 H10K2102 H10K2102/H10K2102/3 H10K2102/34 H10K2102/341 H10K5 H10K59 H10K59/H10K59/0 H10K59/00 H10K59/1 H10K59/12 H10K59/120 H10K59/1201 H10K59/13 H10K59/131 H10K59/8 H10K59/80 H10K59/805 H10K59/8051 H10K7 H10K71 H10K71/H10K71/0 H10K71/00 H10K71/2 H10K71/23 H10K71/231

IPC - классификация

C C3 C30 C30B C30B3 C30B33 C30B33/C30B33/1 C30B33/12 H H0 H01 H01L H01L2 H01L21 H01L21/H01L21/3 H01L21/30 H01L21/31 H01L21/311 H01L21/3111 H01L21/31116 H1 H10 H10K H10K1 H10K10 H10K102 H10K102/H10K102/0 H10K102/00 H10K5 H10K59 H10K59/H10K59/1 H10K59/12 H10K59/13 H10K59/131 H10K7 H10K71 H10K71/H10K71/0 H10K71/00

Цитирование НПИ

156/60
257/40
438/22
Phucanh Nguyen et al., “Novel technique to pattern silver using CF4 and CF4/O2 glow discharges,” Journal of Vacuum Science & Technology B, 2001, pp. 158-165, vol. 19, No. 1, American Institute of Physics.
S.D. Park et al., “Etch characteristics of silver by inductively coupled fluorine-based plasmas,” Thin Solid Films 445, 2003, pp. 138-143.
Young-Joon Lee et al., “Characteristics of Ag Etching using Inductively Coupled Cl2-based plasmas,” Jpn. J. Appl. Phys., 2003, pp. 286-290, vol. 42, Part 1, No. 1.

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