DISPLAY DEVICE

Hereinafter, the present invention according to embodiment detailed with reference to the attached drawing for example less than 1000.

Figure 1 shows a touch sensor representing the present invention according to organic light emitting display device having sensors mounted thereon also are disclosed.

Organic light emitting display device having a touch sensor 1 also shown is also shown in touch electrodes touch period 2 (152e, 154e) of the user through the input capacitance (mutual capacitance) (Cm; touch sensor) whether the touch sensing controls and touch position the swashplate. And, organic light emitting display device having a light-emitting element 1 is also shown in touch sensor (120) including through a unit pixel to display an Image substrate. (R) unit pixel red, green (G) and blue (B) pixel device to (PXL), red (R), green (G), and white (W) to blue (B) pixel (PXL) consists of.

To this end, 1 also are shown in the organic light emitting display device substrate (111) disposed in a matrix form on a number of sub-pixels (PXL) and, disposed on a number of pixels (PXL) portion encasing (140) on, encapsulation part (140) disposed on mutual capacitance (Cm) with each other.

(PXL) number of sub-pixels each pixel driving circuit, a pixel driving circuit connected to the light-emitting element (120) contact with each other.

The pixel driving circuitry switching [thu lan (T1), (T2) and a drive transistor storage capacitor (Cst) with each other. On the other hand, in the present invention 2 (T) transistor capacitor (C) on 1 pixel driving circuit is a structural example described but for example, defining the same are not correct. I.e., on at least one transistor (T) 3 1 (C) having at least one capacitor structure or 3T 2C 3T 1C of disapproval using pixel driving circuits.

Switching transistor (T1) is supplied scan line (SL) is turned on and data line (DL)- scan pulses to the data signal supplied to the gate electrode of the storage capacitor (Cst) length (T2) supplied.

A gate electrode of the drive transistor (T2) (T2) has a curved drive transistor in response to a data signal that is supply voltage (VDD) light emitting elements from a supply line (120) the current flowing to a number (I) by light-emitting device (120) is equal to adjust the amount of light. And, even switching transistor (T1) is turned on and off - storage capacitor (Cst) (T2) is charged by way of electric voltages until the next frame of data signals is supplied drive transistor constant to supply electrical current to light emitting element (120) comprises a light-emitting remain other.

The driving thin film transistor (T2,130) as shown in the 3 also includes a buffer layer (112) disposed on a semiconductor layer (134) and, a gate insulating film (102) between the semiconductor layer (134) which overlaps a gate electrode (132) and, an interlayer insulating film (114) formed on a semiconductor layer (134) in contact with the source and drain electrodes (136,138) with each other. Wherein, semiconductor layer (134) amorphous semiconductor material, polycrystalline semiconductor material and oxide semiconductor material formed at least any one.

Light-emitting device (120) includes an anode electrode (122) and, anode electrode (122) are formed on the electroluminescent stacks (124) and, electroluminescent stacks (124) formed on the cathode electrode (126) with each other.

An anode electrode (122) a protection film (116) and pixel a planarizing layer (118) exposed through drain electrode of thin film transistor (T2, 130) through pixel underlayer (138) electrically connected with each other.

At least one electroluminescent stacks (124) bank (128) anode electrode provided by light emitting regions (122) in a transfer liquid. At least one electroluminescent stacks (124) is the anode electrode (122) on hole related layer, the organic light emitting layer, a second layer formed or laminated electronic related order. In addition electroluminescent stacks (124) between the number 1 and number 2 facing each other charge generation layer having light emitting stacks disapproval. In this case, one of the organic emissive layer number 1 and number 2 for generating blue light emitting stack, the other one of the number 1 and number 2 of organic emissive layer by generating a green light and yellow light emitting stack number 1 number 2 - white light emitting via its isomorphs. A light-emitting stack (124) generated light passes electroluminescent stacks (124) to be located beneath a top or color filter can be incident on the color input video. In addition without separate color filters each electroluminescent stacks (124) to produce each pixel that corresponds to the color color input video may be filled. I.e., red (R) pixel electroluminescent stacks (124) red light, green (G) pixel electroluminescent stacks (124) green light, blue (B) pixel electroluminescent stacks (124) along the blue may be filled.

Cathode electrode (126) comprises a light emitting stack (124) and an outer anode electrode (122) formed so as to face a low voltage (VSS) supply line and connected with each other.

Encapsulation part (140) is also weak oxygen moisture in the light emitting element (120) made of stainless steel of the penetration of moisture or oxygen are shut off. To this end, encapsulation part (140) includes a plurality of inorganic sealing layers (142,146) and, of inorganic sealing layers (142,146) that is located between the organic sealing layer (144) which, inorganic sealing layer (146) most layer are arranged in a substrate. At this time, encapsulation part (140) at least 2 layer inorganic sealing layer (142,146) and at least 1 layer organic sealing layer (144) with each other. In the present invention number 1 and number 2 inorganic sealing layers (142,146) between organic sealing layer (144) disposed encapsulation part (140) for example as an example to explain structure of less than 1000.

Number 1 inorganic sealing layer (142) is a light-emitting element (120) nearest the cathode electrode to on (126) are formed (101) in a transfer liquid. The inorganic sealing layer number 1 (142) is nitride (SiNx), silicon oxide (SiOx), oxide nitride (SiON) or aluminum oxide (Al2O 3) inorganic insulating material such as stop layer is formed. The, number 1 inorganic sealing layer (142) deposited in the temperature of the atmosphere, inorganic sealing layer number 1 (142) atmosphere of high temperatures during the deposition process with the servers electroluminescent stacks (124) connected to the front plate can be prevent.

Organic sealing layer (144) by removing a part of the organic light emitting device according to serve as a stress between layers of each density cushioning, planarization enhancing performance substrate. The organic sealing layer (144) is acrylic resin, epoxy resin, polyimide, organic insulating material such as polyethylene or silicon jade hour carbon (SiOC) formed.

Such an organic sealing layer (144) if the ink jet so as to, in the form of a liquid organic sealing layer (144) substrate (111) that is at the edge of to prevent dam (106) disposed thereon. Dam (106) organic sealing layer (144) a substrate (111) closer to the most sites disposed thereon. This dam (106) by, substrate (111) lamps are disposed of touch pad (170) and display pad (180) includes a pad area is arranged organic sealing layer (144) can be prevent diffused. To this end, dam (106) also 2 as shown in the light emitting element (120) is arranged that may fully encloses the active region, the active region can be formed only between the pad region may be filled. Touch pad (170) and display pad (180) includes a pad area is arranged substrate (111) that when disposed on one side of, dam (106) substrate (111) only one side of disposed thereon. And, touch pad (170) and display pad (180) includes a pad area is arranged substrate (111) that when disposed on opposite sides of, dam (106) substrate (111) located on each side of substrate. At this time, a number of dams at a predetermined spacing (106) can be parallel to each other. On the other hand, also in the present invention as shown in 2 and 3 also dam (106) surrounding the active closed number 1 dam (106a) and, number 1 dam (106a) and pad region that is located between the number 2 dam (106b) insert holes as an example described but for example, defining the same are not correct.

The number 1 and number 2 dams (106a, 106) formed each single or multilayer structure. For example, number 1 and number 2 dams (106a, 106) each bank (128) and spacer (not shown) is formed at least one simultaneously equal material, further processing and cost increase of mask can be.

Number 2 inorganic sealing layer (146) organic sealing layer (144) are formed (111) organic sealing layer (144) and inorganic sealing layer number 1 (142) covering each top surface and sides are formed on the base. The, number 2 inorganic sealing layer (146) outside moisture or oxygen from number 1 inorganic sealing layer (142) and organic sealing layer (144) crystallized minimizing or shut off. This number 2 inorganic sealing layer (146) is nitride (SiNx), silicon oxide (SiOx), insulating material such as aluminum oxide or nitride oxide (SiON) (Al2O 3) seal and disposed therein.

Such encapsulation part (140) on the touch insulating film (156) and an outer tube touch sensing line (154) and touch drive line (152) been located by touch sensing line (154) touch and drive line (152) be provided at the intersection of capacitance (mutual capacitance) (Cm) formed therein. The, mutual capacitance touch drive line (Cm) (152) charging a touch drive pulse supplied to the charge transfer material, terminals touch sensing line (154) serves to discharge chamber is equal to the touch sensor.

Touch drive line (152) includes a plurality of number 1 touch electrodes (152e) and, a plurality of number 1 touch electrodes (152e) number 1 electrically connecting bridges (152b) with each other.

A plurality of number 1 touch electrodes (152e) touch insulating film (156) spaced at regular intervals along a direction X direction on number 1. A plurality of such number 1 touch electrodes (152e) each number 1 bridge (152b) adjacent number 1 through the counter (152e) electrically connected thereto.

Number 1 bridge (152b) is number 2 inorganic sealing layer (146) formed on touch insulating film (156) touch through contact hole (150) of the counter are exposed through a number 1 (152e) electrically connected with each other. The number 1 bridge (152b) the calculation (128) overlapping the number 1 rotates to bridge (152b) aperture ratio by preventing damage to the can.

Touch sensing line (154) includes a plurality of number 2 touch electrodes (154e) and, a plurality of number 2 touch electrodes (154e) number 2 electrically connecting bridges (154b) with each other.

A plurality of number 2 touch electrodes (154e) touch insulating film (156) number 2 on Y direction along spaced apart at regular intervals. A plurality of such number 2 touch electrodes (154e) each number 2 bridge (154b) adjacent through the counter number 2 (154e) electrically connected thereto.

Number 2 bridge (154b) is the counter number 2 (154e) is coplanar touch insulating film (156) disposed on the counter without exposing additional number 2 (154e) electrically connected with each other. The number 2 bridge (154b) is number 1 bridge (152b) on in the same manner as bank (128) overlapping the number 2 rotates to bridge (154b) aperture ratio by preventing damage to the can.

Such, of the present invention touch drive line (152) and touch sensing line (154) each routing line (160) and touch pad (170) touch driver (not shown) through on-coupled with each other.

Touch pad (170) touch driver (not shown) is mounted on the base and connected with each other. The touch pad (170) of the substrate (111) and encapsulation part (140) that is located between the buffer layer (112), an interlayer insulating film (114), protective film (116) is arranged on at least one of speed with each other. For example, touch pad (170) is an interlayer insulating film (114) is arranged on the interlayer insulation film (114) and configured to contact a as an example to explain for example less than 1000. This touch pad (170) includes a touch pad lower electrode (172) and, touch pad upper electrode (174) connected to the chamber.

Touch pad lower electrode (172) (T2,130) gate electrode of the driving transistor (132), source and drain electrodes (136,138) equal to at least one material, single or multi-layer structure formed on the same plane. For example, touch pad lower electrode (172) the source and drain electrodes (136,138) equal to interlayer dielectric material (114) is formed on, touch pad lower electrode (172) the lower surface of the interlayer insulating film (114) brought into contact with the substrate.

Touch pad upper electrode (174) a protection film (116) and touch insulating film (156) through touch pad contact hole (176) touchpad exposed through the lower electrode (172) electrically connected with each other. This touch pad upper electrode (174) routing line (160) using the same material routing line (160) formed the same mask process. The touch pad upper electrode (174) routing line (160) extending from the contact hole since additional formed without routing line (160) electrically connected with each other.

On the other hand, touch pad (170) is outside to active (bezel) region the display pad (180) disposed thereon together. For example, as shown in display pads also 2 (180) touch pads (170) are disposed between the, touch pads (170) display pads (180) be disposed between the disapproval. In addition, touch pad (170) arranged on one side and backlight is of a, display pad (180) may be disposed on the other side backlight is of a disapproval. On the other hand, touch pad (170) and display pad (180) and the placement structure of Figure 2 is not limited to, display device using light along design configured pivotably.

Display pad (180) includes a touch pad (170) on the layered structure is made different, as shown in also 3 touch pad (170) formed the same stacked arrangement.

3 Also shown in display pad (180) includes a display pad lower electrode (182) and, display pad upper electrode (184) connected to the chamber.

Display pad lower electrode (182) the light emitting device (120) is formed within the active region scan line (SL), data line (DL), low potential power supply (VSS) line and a high potential (VDD) line connected with at least one of signal line are formed on the base. The display pad lower electrode (182) gate electrode of the driving transistor (T2,130) (132), source and drain electrodes (136,138) equal to at least one material, single or multi-layer structure formed on the same plane. For example, display pad lower electrode (182) touch pad lower electrode (172) as well as, source and drain electrodes (136,138) equal to interlayer dielectric material (114) in a transfer liquid.

Display pad upper electrode (184) a protection film (116) and touch insulating film (156) through display pad contact hole (186) display pad exposed through the lower electrode (182) and electrically connected with each other. These display pad upper electrode (184) routing line (160) using the same material routing line (160) formed the same mask process.

Routing line (160) generated in a drive pulse and touch driver touch touch pad (170) touch through drive line (152) transmits, touch sensing line (154) the bar from touch pad (170) transmits through touch driving unit. The, routing line (160) is number 1 and number 2 of the counter (152e, 154e) each, touch pad (170) is formed on the number 1 and number 2 of the counter (152e, 154e) each, touch pad (170) are connected to electrically. Wherein, routing line (160) is photosensitive resin composition 2 as shown in the counter number 1 (152e) from active region (AA) of left and right at least either side extended touch pad (170) and connected to a, routing line (160) of the counter the number 2 (154e) from the upper and the lower active region extends at least either side touch pad (170) connected to a substrate. This routing line (160) design of arrangement of said display device configured using light along pivotably.

Routing line (160) is dam (106) at the top number 1 and number 2 dam (106a, 106b) disposed thereon so as to intersect. Number 1 and number 2 dams (106a, 106b) number 1 and number 2 between dams (106a, 106b) and fills the space between so as to compensate (120) on non-overlapping substrate (111) outer area in an uneven (158) disposed thereon. In this case, routing line (160) organic sealing layer (144) includes the inner outer uneven (158) to cover the upper surface of the disposed thereon. Outer uneven (158) arranged to cover the upper surface routing line (160) an uneven pixel (118) of the upper surface of the disposed thereon. The outer uneven (158) the acrylic-based, epoxy series or siloxane (Siloxan) sequence selected from the group consisting of hydrocarbon organic insulating material having a seal and disposed therein.

Hydrocarbon organic insulation function which retains a pipe made of a material selected from the group consisting an uneven (158) is dams (106a, 106b) between dam (106a, 106b) thickness similar seal and disposed therein. In this case, an uneven outer (158) the top surface of the dam (106a, 106b) disposed so as to cover the inorganic sealing layer number 2 (146) or disposed on the upper surface of the coplanar, dam (106a, 106b) or disposed on the upper surface of the coplanar, inorganic sealing layer (146) of the top and dam (106a, 106b) between the upper surface of the disposed thereon. The, dam (106a, 106b) caused by the height of the outer uneven steps (158) around so that, an uneven outer (158) and dam (106a, 106b) disposed on the top of routing line (160) substantially without any stepped difference formed flat. As a result, dam (160) across the routing line (160) or conductive can be prevent.

Relative thereto, an uneven outer (158) routing line 4a to 4c a number comparison method also does not relate to tank through a browser which processes and also, an uneven outer (158) in the embodiment having a number associated with a routing line 5a to 5c bath method also through a browser-sensors S. also.

Comparison contemplated embodiments, an outer diameter of the dams also shown in 4a (160a, 160b) touch to cover insulating film (156) on a conductive layer (178a) after the front deposited, conductive layer (178a) photoresist on (188a) is coated. At this time, photoresist (188a) since the liquid is in the form of organic insulating material, dams (106a, 106) formed in the upper area of photoresist (188a) than the thickness of the dams (160a, 160b) between region of photoresist (188a) thick thickness of overcoat is coated. At this time, dams (160a, 160b) formed in the upper area of photoresist (188a) as a reference to determine the thickness of the exposure regions, dams (160a, 160b) in the area between the encroaches on the photoresist (188a) number is a pad nitride layer photoresist the cup just as shown in 4b also undergoes no exposure throughput (188c) be used in other. The cup just such (188c) having photoresist pattern (188b) using conductive layer (178a) layer are same, 4c also shown in the cup just as photoresist (188c) and corresponding conductive layer (178a) adjacent remaining routing lines (160) encoded is short.

While dams (106a, 106b) connected between a planarizing layer (158) in the case of having in the embodiment, as shown in 5a also outer uneven (158) are formed (111) on a conductive layer (178a) after deposition front, conductive layer (178a) photoresist on (188a) is coated. At this time, dams (160a, 160b) between outer uneven (158) disposed in the embodiment of, dam (106a, 106b) formed in the upper area of photoresist (188a) thickness of, dams (160a, 160b) between region of photoresist (188a) thickness of has identically formed. This photoresist (188a) by developing the exposure and also 5b as shown in dam (106a, 106b) and an upper region of dams (160a, 160b) in the area between the bottom of the photoresist pattern having (188b) formed therein. Should (188b) using as a mask is higher than conductive layer (178a) 5c also patterned so that desired design value as shown in the routing lines having a line width (160) formed therein. The, in an alternative embodiment of the present invention embodiment adjacent routing lines (160) can be prevent short between.

In this way, touch sensor of the present invention number 1 embodiment having organic light emitting display device according to example in dams (106a, 106b) and fills the space between the outer uneven (158) with each other. The, dams (106a, 106b) for forming a space between the photoresist cup guard can be routing line includes a plurality of blocking dams (106a, 106b) routing line an upper surface (160) between the insulation can be installed. In addition, conventional organic light emitting display device is an organic light emitting display device through adhesive number while the present invention according to organic light emitting display device is attached to the touch screen portion encasing (140) touch electrodes (152e, 154e) disposed through the bonding process is not required by a plating process be simplified.

Figure 6 shows a touch sensor of the present invention number 2 embodiment having organic light emitting display device according to example representing cross-section also are disclosed.

6 Organic light emitting display device 3 is also shown in organic light emitting display device also shown in on an uneven outer operates (158) the dams (106a, 106b) as well as the space between, organic sealing layer (144) and number 1 dam (106a) and fills the space between line and the same number and a components with each other. The, same component description dispensed the on-sensors other.

As shown in fig. 6, an uneven outer (158) is dams (106a, 106b) as well as the space between, organic sealing layer (144) and nearest the number 1 dam (106a) and, organic sealing layer (144) and fills the space between are formed on the base. At this time, outer uneven (158) the top surface of the dam (106a, 106b) disposed so as to cover the inorganic sealing layer number 2 (146) or disposed on the upper surface of the coplanar, dam (106a, 106b) or organic sealing layer on the top surface (144) or disposed on the upper surface of the coplanar, dam (106a, 106b) portions of the top and organic sealing layer (144) between the upper surface of the disposed thereon. In this case, dams (106a, 106b) between space, number 1 dam (106a) and, organic sealing layer (144) in a space between the, routing line intercepting cup guard for forming photoresist can be generated. The, dams (106a, 106b) between space, number 1 dam (106a) and organic sealing layer (144) in space between routing line (160) between the insulation can be installed.

Routing line (160) is number 1 and number 2 dam (106a, 106b) arranged to cover the outer uneven (158) such that the disposed thereon. The routing line (160) organic sealing layer (144) touch the upper insulating film (156) routing through contact hole (162) are exposed through the number 1 and number 2 a of the counter (152e, 154e) each connected with each other.

Touch pad (170) outer is uneven (158) on routing line (160) and connected with each other. This touch pad (170) includes a touch pad lower electrode (172) and, touch pad upper electrode (174) with each other.

Touch pad lower electrode (172) routing line (160) using the same material routing line (160) formed the same mask process. The touch pad lower electrode (172) of outer uneven (158) on routing line (160) extending from the contact hole since additional formed without routing line (160) electrically connected with each other.

Touch pad upper electrode (174) touch insulating film (156) through touch pad contact hole (176) touchpad exposed through the lower electrode (172) electrically connected with each other. This touch pad upper electrode (174) is number 2 bridge (154b) using the same material number 2 bridge (154b) formed the same mask process.

This touch pad (170) is outside to active (bezel) region the display pad (180) disposed thereon together. Display pad (180) includes a display pad lower electrode (182) and, display pad upper electrode (184) connected to the chamber.

Display pad lower electrode (182) the light emitting device (120) is formed within the active region scan line (SL), data line (DL), low potential power supply (VSS) line and a high potential (VDD) line connected with at least one of signal line are formed on the base. The display pad lower electrode (182) gate electrode of the driving transistor (T2,130) (132), source and drain electrodes (136,138) equal to at least one material, single or multi-layer structure formed on the same plane. For example, display pad lower electrode (182) the source and drain electrodes (136,138) equal to interlayer dielectric material (114) is arranged on the.

Display pad upper electrode (184) a protection film (116), an uneven external (158) and touch insulating film (156) through display pad contact hole (186) display pad exposed through the lower electrode (172) electrically connected with each other. These display pad upper electrode (184) is number 2 bridge (154b) using the same material number 2 bridge (154b) formed the same mask process.

In addition, display pad upper electrode (184) also 7 as shown in the display pad contact hole (186) without display pad lower electrode (182) can be directly connected and disapproval. In this case, display pad upper electrode (184) display pad lower electrode (182) so that a lens barrel from a lower surface disposed thereon. These display pad upper electrode (184) is the anode electrode (122), cathode electrode (126) and number 2 bridge (154b) equals one same material formed on the equal mask process.

The present invention according to number of organic light emitting display device having touch sensor also 8a to 8d also includes a tank for drawing to explain method are disclosed. Relative thereto, are shown in the organic light emitting display device as an example to explain 6 also for example less than 1000.

The reference also 8a, switching transistor, the drive transistor (T2,130), light-emitting device (120), dam (106) and encapsulation part (140) semiconductor package structure (111) outer on an uneven (158) formed therein.

Specifically, switching transistor, the drive transistor (T2,130), light-emitting device (120), dam (106) and encapsulation part (140) semiconductor package structure (111) front organic insulating material is coated. At this time, organic insulating material comprises organic sealing layer (144) is than an area which is organic sealing layer (144) is in thick 1200 is coated. Then, organic sealing layer (144) number 2 on inorganic sealing layer (146) until a planarizing layer exposed selectively dry etching the conductive outer front (158) formed therein. Outer uneven (158) also 6 as shown in the light emitting element (120) is formed active region is recorded number active region disposed thereon.

On the other hand, 3 also are shown in the outer uneven (158) is dams (106a, 106b) only the area between the organic insulating material to the conductive pad formed patterning so that leave a photolithography process. And, 7 also are shown in the outer uneven (158) the light emitting device (120) is disposed active region, display pad lower electrode (182) organic insulating material formed to expose pad patterning so that photolithography process.

The, 3 and 7 also also are shown in the outer uneven (158) formed through photolithography using the line resultant while 6 also are shown in the outer uneven (158) is higher than formed without photolithography process. The, 3 also shown in display device shown in display device 7 and also relative to the ancestral number is also 6 can be can be single-side tank.

The 8b also reference, an uneven outer (158) are formed (111) number 1 on bridge (152b), touch pad lower electrode (172) and routing line (160) formed therein.

Specifically, an uneven outer (158) are formed (111) after number 1 on deposited conductive layer, the conductive layer is patterned using photolithography and etching photomask process number 1. The, outer uneven (158) are formed (111) number 1 on bridge (152b), touch pad lower electrode (172) and routing line (160) formed therein. Wherein, number 1 Al conductive layer, Ti, Cu, Mo, Ta, such as single or multi-layer structure using MoTi metal seal and disposed therein.

The 8c also reference, number 1 bridge (152b touch pad lower electrode (172) and routing line (160) are formed (111) touch contact hole (150), routing contact hole (162), touch pad contact hole (176) and display pad contact hole (186) having touch insulating film (156) formed therein.

Specifically, number 1 bridge (152b), touch pad lower electrode (172) and routing line (160) are formed (111) on the insulating layer, or organic insulating material applied by front touch insulating film (156) formed therein. Wherein, touch insulating film (156) include SiNx, SiON, such as SiO2 or the insulating layer or Photoacryl, Parylene, or siloxane-based organic insulating material is disclosed. Then, photomask process is performed using photolithography photoresist pattern exposes a touch insulating film (156) and then etching, display pad lower electrode (182) that are located above the outer uneven (158) and protective film (116) sequentially etched. The, touch contact hole (150), routing contact hole (162), touch pad contact hole (176) and display pad contact hole (186) formed therein. Wherein, touch contact hole (150), routing contact hole (158), touch pad contact hole (176) touch insulating film (156) is formed through the, display pad contact hole (186) touch insulating film (156), an uneven outer (158) and protective film (116) are formed on the base through.

The reference also 8d, touch contact hole (150), routing contact hole (162), touch pad contact hole (176) and display pad contact hole (186) having touch insulating film (156) are formed (111) on the counter number 1 and number 2 (152e, 154e) and, number 2 bridge (154b), touch pad upper electrode (174) and display pad upper electrode (184) formed therein.

Specifically, touch contact hole (150), routing contact hole (162), touch pad contact hole (176) and display pad contact hole (186) are formed (111) conductive layer number 2 on the deposition process. Wherein, conductive layer include IGZO number 2, IZO, ITO or ZnO is used substrate. Then, etching the conductive layer so that the number 1 and number 2 of the counter number 2 photolithography patterning process (152e, 154e) and, number 2 bridge (154b), touch pad upper electrode (174) and display pad upper electrode (184) formed therein.

Figure 9 shows a touch sensor of the present invention number 3 embodiment having organic light emitting display device according to example representing cross-section also are disclosed.

9 Also organic light emitting display device 3 is also shown in, organic light emitting display device also 6 and 7 also shown on reduction in the encapsulation part (140) and touch electrode (152e, 154e) that is located between the color filter (192) and further with the same number components with each other. The, same component description dispensed the on-sensors other.

Color filter (192) is touch sensing line (154) and touch drive line (152) each, light-emitting device (120) formed between the. The color filter (192) touched by sensing line (154) and touch drive line (152) each, light-emitting device (120) is long distance between vehicle from the outside. The, touch sensing line (154) and touch drive line (152) each, light-emitting device (120) formed between the second insulating layer capacitance values can be minimize the touch sensing line (154) and touch drive line (152) each, light-emitting device (120) between the input coupling (coupling) can be against. In addition, color filter (192) is touch sensing line (154) and touch drive line (152) number of used in chemical process for preparing (developer or etching solution etc.) or moisture from the outside like electroluminescent stacks (124) can be penetrates into the intercepting sewer. The, color filter (192) includes a drug solution or moisture frangible electroluminescent stacks (124) to prevent damage to the can. On the other hand, as shown in also 9 color filter (192) the touch electrode (152e, 154e) disposed for example described in size but, in addition color filter (192) is touch electrodes (152e, 154e) disposed on may be filled. In this case, the counter (152e, 154e) color filter (192) on encapsulation part (140) disposed thereon between.

Such a color filters (192) between the black matrix (194) is disposed thereon. Black matrix (194) while dividing the respective pixel region between adjacent gate lines formed at light interference and serves to be coated. The content matrix (194) is joined black isolation material is made, red (R), green (G) and blue (B) color filter (192) formed by laminating at least one color filter 2. In addition, color filter (192) and black matrix (194) semiconductor package structure (111) planarizing the touch (196) formed therein. The touch an uneven (196) by color filter (192) and black matrix (194) semiconductor package structure (111) is planarized substrate.

On the other hand, in the present invention also display pad as shown in 9 (180) and touch pad (170) touch protective film exposing (198) further may be filled. The touch protective film (198) touch electrode (152e, 154e), bridge (152b, 154bb) and routing line (160) to cover the external impact or moisture they are corrupted by servicing the like. This touch protective film (198) made of an epoxy or acrylic organic insulating material or JPO.

In addition, in the present invention number 1 and number 2 of the counter (152e, 154e) and number 1 and number 2 bridge (152b, 154b) is also 2 as shown in plate using a transparent conductive film is in the form for example described in size but, in addition 10 also in the form of a mesh as shown in disapproval. I.e., number 1 and number 2 of the counter (152e, 154e) number 1 and bridge (152b) such as ITO or IZO is transparent conductive film (151a) and, transparent conductive film (151a) analysis in the form of opaque conductive layer disposed upper or lower (151b) can be made. Or, the counter number 1 and number 2 (152e, 154e) number 1 and bridge (152b) mesh in the form of opaque conductive layer (151b) can be cap. In this case, opaque conductive layer (151b) transparent conductive film (151a) than good conductive Ti, Al, Mo, MoTi, Ta and Cu to at least one layer structure using at least one of seal and disposed therein. For example, number 1 and number 2 of the counter (152e, 154e) number 1 and bridge (152b) is Ti/Al/Ti, or Ti/Al/Mo MoTi/Cu/MoTi stacked 3 layer structure such as seal and disposed therein.

The, transparent conductive film (151a) than good conductive opaque conductive layer (151b) including number 1 and number 2 a of the counter (152e, 154e) number 1 and bridge (152b) electrical characteristics of and capacitance required to, touch sensitivity is reduced to improve the RC time constant can be. In addition, number 1 and number 2 of the counter in the form of mesh (152e, 154e) number 1 and bridge (152b) is extremely thin line width of number 1 and number 2 of the counter (152e, 154e) number 1 and bridge (152b) due to the first and second pressure drop can be prevent.

In addition, touch electrodes (152e, 154e) is composed of a different number 2 in a plane which is opaque conductive bridge (154b) 10 is also shown in an outer diameter of the slit (153) with each other. Several slit (153) with number 2 bridge (154b) has a slit (153) as compared to not having a reducing area can be laid. The, number 2 bridge (154b) first and second external light reflection visibility deterioration can be prevent. This slit (153) with number 2 bridge (154b) the calculation (128) and is composed of a number 2 by overlapping the opaque conductive bridge (154b) prevent by lowering the aperture ratio can be.

As well as, in the present invention touch insulating film (156) and an outer tube ohmic contact with touch sensing line (154) and touch drive line (152) including a touch sensor as an example of for example described but other dosage form, in addition magnetic (Self) also be applied to forms of touch sensor capacitance may be filled. Each of the plurality of touch electrodes electrically independent magnetic electrostatic dosage form in the periphery of the magnetic capacitance, by sensing a change in capacitance of the user self-capacity type touch sensor used as substrate. I.e., magnetic electrostatic dosage form a plurality of touch electrodes connected with the routing lines (160) includes a plurality of dams (106) and fills the space between the outer planarizing a planarizing layer (158) is arranged on the. The, routing lines (160) to prevent short circuit of second teeth can be improved.

The present invention generally described to exemplify the more description is only according to which, in the present invention by technical idea of the present invention is provided to various inputted from deviating from a person with skill in the art will deformable. The disclosure of the present invention specification defining the embodiment to the present invention examples tastes. Below the range of the present invention claim must be interpreted by, and communicate with all techniques of the present invention interprets range in a range equal to tell it what also are disclosed.